公开(公告)号：US20120258389A1

公开(公告)日：2012-10-11

申请号：US13442550

申请日：2012-04-09

Applicant: Shigeru Maida ,  Hisatoshi Otsuka ,  Tetsuji Ueda ,  Masanobu Ezaki

Inventor： Shigeru Maida ,  Hisatoshi Otsuka ,  Tetsuji Ueda ,  Masanobu Ezaki

IPC: G03F1/24 ,  C03B19/06

CPC classification number: G03F1/24 ,  C03B19/1415 ,  C03B19/1423 ,  C03B2201/42 ,  C03B2207/64 ,  C03C3/06 ,  C03C4/0085 ,  C03C4/08 ,  C03C2201/42 ,  C03C2203/42 ,  G03F1/50

Abstract: On an EUV light-reflecting surface of titania-doped quartz glass, an angle (θ) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.

Abstract translation: 在二氧化钛掺杂的石英玻璃的EUV光反射表面上，包括在连接反射表面中心的原点（O）到双折射测量点（A）的直线和快速轴线之间的角度（＆amp; 在测量点（A）处的双折射的平均值大于45度。 由于双折射的快轴以同心的方式分布，所以可获得适用于EUV光刻的具有高平坦度的二氧化钛掺杂石英玻璃基板。

公开(公告)号：US20120121857A1

公开(公告)日：2012-05-17

申请号：US13295652

申请日：2011-11-14

Applicant: Akio Koike ,  Takahiro Mitsumori ,  Yasutomi Iwahashi ,  Tomonori Ogawa

Inventor： Akio Koike ,  Takahiro Mitsumori ,  Yasutomi Iwahashi ,  Tomonori Ogawa

IPC: C03C3/04 ,  B32B3/00 ,  C03B25/00

CPC classification number: C03B19/1453 ,  B82Y10/00 ,  B82Y40/00 ,  C03B32/00 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/42 ,  C03C2203/52 ,  G03F1/24

Abstract: The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1(° C.), holding the glass body after transparent vitrification in a temperature region of from T1−90(° C.) to T1−220(° C.) for 120 hours or more.

Abstract translation: 本发明涉及一种制备TiO 2 -SiO 2玻璃体的方法，包括以下步骤：当将透明玻璃化后的TiO 2 -SiO 2玻璃体的退火点作为T1（℃）时，将玻璃体 在从T1-90（℃）到T1-220（℃）的温度区域透明玻璃化120小时以上。

公开(公告)号：US20110301015A1

公开(公告)日：2011-12-08

申请号：US13210673

申请日：2011-08-16

Applicant: Takahiro MITSUMORI ,  Yasutomi Iwahashi ,  Akio Koike

Inventor： Takahiro MITSUMORI ,  Yasutomi Iwahashi ,  Akio Koike

IPC: C03C3/04 ,  C03B20/00

CPC classification number: C03B19/1423 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/20 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/44

Abstract: The present invention relates to a process for producing a porous quarts glass body containing hydrolyzing a metal dopant precursor and an SiO2 precursor in a flame of a burner to form glass fine particles, and depositing and growing the formed glass fine particles on a base material, in which the burner has at least two nozzles, and in which a mixed gas containing (A) a metal dopant precursor gas, (B) an SiO2 precursor gas, (C) one gas of H2 and O2, and (D) one or more gases selected from the group consisting of a rare gas, N2, CO2, a hydrogen halide and H2O, with a proportion of the gas (D) being from 5 to 70 mol %; and (E) the other gas of H2 and O2 of (C), are fed into different nozzles of the burner from each other.

Abstract translation: 本发明涉及一种制造多孔石英玻璃体的方法，该方法包括在燃烧器的火焰中水解金属掺杂剂前体和SiO 2前体以形成玻璃微粒，并将形成的玻璃微粒沉积和生长在基材上， 其中燃烧器具有至少两个喷嘴，其中包含（A）金属掺杂剂前体气体，（B）SiO 2前体气体，（C）H 2和O 2的一种气体的混合气体和（D）一种或 选自稀土气体，N 2，CO 2，卤化氢和H 2 O的更多气体，一部分气体（D）为5-70mol％; 和（E）（C）的H 2和O 2的其它气体彼此供给到燃烧器的不同喷嘴中。

公开(公告)号：US08055115B2

公开(公告)日：2011-11-08

申请号：US11773869

申请日：2007-07-05

Applicant: Bertrand Morasse ,  Jean-Philippe De Sandro ,  Eric Gagnon

Inventor： Bertrand Morasse ,  Jean-Philippe De Sandro ,  Eric Gagnon

IPC: G02B6/00

CPC classification number: C03C13/046 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/34 ,  C03B2201/36 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2203/30 ,  C03B2203/42 ,  C03C3/097 ,  C03C4/065 ,  Y10T428/2913 ,  Y10T428/2933

Abstract: An optically active glass and an optical fiber comprising such glass, having reduced photodarkening properties are provided. The optically active glass is mainly composed of silica representing from about 50 to 98 mol % of the glass. It also includes at least one active ion, such as a rear-earth ion, which induces a photodarkening effect in optical properties of the glass. Moreover, the glass includes an effective amount of phosphorus oxide providing the photodarkening reducing effect, preferably in an amount of from about 1 to 30 mol %. A method for reducing a photodarkening effect in optical properties of an optically active glass including the step of introducing phosphorus oxide to the glass is also provided.

Abstract translation: 提供了具有降低的光暗化性能的光学活性玻璃和包含这种玻璃的光纤。 光学活性玻璃主要由表示玻璃的约50至98摩尔％的二氧化硅构成。 它还包括至少一种活性离子，例如后土离子，其引起玻璃的光学性质的光暗化效果。 此外，玻璃包括提供光暗化还原效果的有效量的氧化磷，优选为约1至30mol％的量。 还提供了一种用于降低光学活性玻璃的光学性能的光暗化效果的方法，包括将氧化磷引入玻璃的步骤。

公开(公告)号：US20110256329A1

公开(公告)日：2011-10-20

申请号：US13044684

申请日：2011-03-10

Applicant: Windsor P. Thomas ,  Daniel Warren Hawtof

Inventor： Windsor P. Thomas ,  Daniel Warren Hawtof

IPC: B32B17/00 ,  C03B19/01 ,  B32B1/00 ,  C03B19/06

CPC classification number: C03B19/1492 ,  C03B19/1453 ,  C03B2201/31 ,  C03B2201/42 ,  C03B2201/58 ,  F42B10/46 ,  F42B15/34 ,  Y10T428/131 ,  Y10T428/1317

Abstract: A near-net or net shape fused silica glass article, such as a radome. The article is formed by depositing silica soot onto a mandrel having a shape that corresponds to the shape of the fused silica glass article. In some embodiments, the mandrel is inductively heated to a temperature that is sufficient to consolidate or sinter the silica soot upon deposition onto the mandrel to form fused silica glass. The fused silica glass article may have an outer layer that is under compression and/or multiple layers comprising various dopants that can alter or affect physical, mechanical, electrical, and/or optical properties.

Abstract translation: 近净或净形熔融石英玻璃制品，如天线罩。 该制品通过将二氧化硅烟灰沉积到具有对应于熔融石英玻璃制品的形状的形状的心轴上而形成。 在一些实施例中，心轴被感应加热到足以在沉积到心轴上时固化或烧结二氧化硅烟炱以形成熔融石英玻璃的温度。 熔融石英玻璃制品可以具有处于压缩下的外层和/或包含可以改变或影响物理，机械，电和/或光学性质的各种掺杂剂的多层。

公开(公告)号：US08039409B2

公开(公告)日：2011-10-18

申请号：US12904236

申请日：2010-10-14

Applicant: Kenta Saitou ,  Akio Koike ,  Mitsuhiro Kawata

Inventor： Kenta Saitou ,  Akio Koike ,  Mitsuhiro Kawata

IPC: C03C3/06 ,  C03C3/076

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/30 ,  C03B2201/42 ,  C03C3/076 ,  C03C4/0085 ,  C03C23/0095 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  Y02P40/57

Abstract: The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO2-containing silica glass for optical member for EUV lithography, having a TiO2 concentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T400-700, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T400-3,000, of 70% or more.

Abstract translation: 本发明提供一种含TiO 2的二氧化硅玻璃，可以得到透明度极高的透明性高且热膨胀系数基本上为零的温度区域的玻璃。 本发明涉及TiO 2浓度为3〜14质量％的用于EUV光刻用的光学部件的含TiO 2的二氧化硅玻璃， 在400〜700nm波长范围内，每1mm厚的内透射率，T400-700，97％以上; 在400〜3000nm的波长范围内，每1mm厚的内透射率，T400-3,000，70％以上。

公开(公告)号：US20110239706A1

公开(公告)日：2011-10-06

申请号：US13078426

申请日：2011-04-01

Applicant: Chikaya Tamitsuji ,  Kunio Watanabe ,  Akio Koike

Inventor： Chikaya Tamitsuji ,  Kunio Watanabe ,  Akio Koike

IPC: C03B20/00

CPC classification number: C03B19/1461 ,  C03B19/1453 ,  C03B2201/12 ,  C03B2201/42

Abstract: The present invention relates to a method for production of a synthetic quartz glass having a fluorine concentration of 1,000 ppm by mass or higher, comprising the following processes steps (a) to (c): (a) depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass-forming material onto a substrate, to thereby form a porous glass body; (b) maintaining the porous glass body in a reaction vessel under an elemental fluorine (F2)-containing atmosphere of 400° C. or lower, to thereby obtain a fluorine-containing porous glass body; and (c) heating the fluorine-containing porous glass body in a vitrification furnace to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body, wherein, in step (b), elemental fluorine (F2) is continuously or intermittently supplied to the reaction vessel and the gas in the reaction vessel is continuously or intermittently discharged from the reaction vessel.

Abstract translation: 本发明涉及氟浓度为1000质量ppm以上的合成石英玻璃的制造方法，其特征在于，包括以下工序（a）〜（c）：（a）沉积并生长获得的石英玻璃微粒 通过将玻璃形成材料火焰水解成基材，从而形成多孔玻璃体; （b）在400℃以下的元素含氟（F2）的气氛下将多孔玻璃体保持在反应容器中，得到含氟多孔玻璃体; （c）将玻璃化炉中的含氟多孔质玻璃体加热至透明玻璃化温度，得到含氟透明玻璃体，其中，在步骤（b）中，元素氟（F2）连续或间歇地 供给反应容器，反应容器内的气体从反应容器连续地或间歇地排出。

公开(公告)号：US20110179827A1

公开(公告)日：2011-07-28

申请号：US13080704

申请日：2011-04-06

Applicant: Chikaya TAMITSUJI ,  Kunio Watanabe ,  Akio Koike

Inventor： Chikaya TAMITSUJI ,  Kunio Watanabe ,  Akio Koike

IPC: C03B8/04 ,  C03B20/00

CPC classification number: C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/42

Abstract: The present invention relates to a process for production of a synthetic quartz glass having a fluorine concentration of 1,000 mass ppm or more, the process comprising: (a) a step of depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass forming raw material onto a substrate, to thereby form a porous glass body; (b) a step of keeping the porous glass body in a reaction vessel that is filled with elemental fluorine (F2) or a mixed gas comprising elemental fluorine (F2) diluted with an inert gas and contains a solid metal fluoride, to thereby obtain a fluorine-containing porous glass body; and (c) a step of heating the fluorine-containing porous glass body to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.

Abstract translation: 本发明涉及一种氟浓度为1000质量ppm以上的合成石英玻璃的制造方法，其特征在于，包括：（a）沉积和生长通过玻璃成形的火焰水解得到的石英玻璃微粒子的工序 原料在基板上，从而形成多孔玻璃体; （b）将多孔玻璃体保持在填充有元素氟（F2）的反应容器或包含用惰性气体稀释的元素氟（F2）的混合气体并含有固体金属氟化物的步骤，从而获得 含氟多孔玻璃体; 和（c）将含氟多孔质玻璃体加热至透明玻璃化温度的步骤，得到含氟透明玻璃体。

公开(公告)号：US20110028299A1

公开(公告)日：2011-02-03

申请号：US12904236

申请日：2010-10-14

Applicant: Kenta SAITOU ,  Akio Koike ,  Mitsuhiro Kawata

Inventor： Kenta SAITOU ,  Akio Koike ,  Mitsuhiro Kawata

IPC: C03C3/04

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/30 ,  C03B2201/42 ,  C03C3/076 ,  C03C4/0085 ,  C03C23/0095 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  Y02P40/57

Abstract: The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO2-containing silica glass for optical member for EUV lithography, having a TiO2 concentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T400-700, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T400-3000, of 70% or more.

Abstract translation: 本发明提供一种含TiO 2的二氧化硅玻璃，可以得到透明度极高的透明性高且热膨胀系数基本上为零的温度区域的玻璃。 本发明涉及TiO 2浓度为3〜14质量％的用于EUV光刻用的光学部件的含TiO 2的二氧化硅玻璃， 在400〜700nm波长范围内，每1mm厚的内透射率，T400-700，97％以上; 在400〜3000nm的波长范围内，每1mm厚的内透射率为T400〜3000，为70％以上。

公开(公告)号：US20100179047A1

公开(公告)日：2010-07-15

申请号：US12718776

申请日：2010-03-05

Applicant: Akio KOIKE ,  Chikaya Tamitsuji ,  Kunio Watanabe ,  Tomonori Ogawa

Inventor： Akio KOIKE ,  Chikaya Tamitsuji ,  Kunio Watanabe ,  Tomonori Ogawa

IPC: C03C3/06 ,  C03C10/00

CPC classification number: C03C3/06 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1461 ,  C03B25/02 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/42 ,  C03B2207/36 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/54

Abstract: The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ΔTi3+/Ti3+, on an optical use surface, is 0.2 or less.

Abstract translation: 本发明涉及一种含有TiO2含量为3〜10质量％的含TiO 2的二氧化硅玻璃的光学构件， Ti3 +浓度为100重量ppm以下; 0-100℃的热膨胀系数，CTE0-100，为0±150ppb /℃。 并且在400〜700nm的波长范围内的内部透射率，每1mm厚度，T400〜700，为80％以上，其中光学部件具有Ti 3+浓度的变化比与Ti 3+的平均值的比值， 在光学用表面上的浓度＆Dgr; Ti 3+ / Ti 3+为0.2以下。