公开(公告)号：US20200070223A1

公开(公告)日：2020-03-05

申请号：US16374871

申请日：2019-04-04

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hyun-Joo JEON ,  Dae-Sung KIM ,  Seung-Han LEE ,  Sung-Hyup KIM

IPC: B08B13/00 ,  B05C11/00 ,  B08B3/02 ,  B65G65/00

Abstract: A jig configured to clean a bowl of a spin coater includes a base disposed on a spin chuck of the spin coater, the base being configured to rotate by the spin chuck. The jig further includes a guide member extending in a first direction from an edge portion of the base toward an inner cover of the bowl and configured to guide a lower cleaning agent injected to a lower surface of the base to the inner cover of the bowl. The inner cover of the bowl is configured to receive photoresist from under the spin chuck.

公开(公告)号：US10471457B2

公开(公告)日：2019-11-12

申请号：US15010242

申请日：2016-01-29

Applicant: Semes Co., Ltd

Inventor： Keunhwa Yang ,  Yoon Jong Ju ,  Kihoon Choi ,  Kwangsup Kim

IPC: H01L21/66 ,  B05C11/00 ,  B05B17/06 ,  B05B1/14 ,  B05B13/02 ,  B05B14/44

Abstract: A substrate treating apparatus includes a treatment unit including a container, and a support member in the interior of the container to support a substrate, the treatment unit being configured to treat the substrate a nozzle unit having a treatment liquid nozzle for supplying a treatment liquid to the substrate provided in the treatment unit and an inspection unit that inspects whether the treatment liquid is normally discharged from the treatment liquid nozzle. The nozzle further includes a nozzle driver that moves the treatment liquid nozzle from a process position at which the substrate is treated by the treatment unit and an inspection position at which the treatment liquid nozzle is inspected by the inspection unit.

公开(公告)号：US20190339060A1

公开(公告)日：2019-11-07

申请号：US16473600

申请日：2017-11-28

Applicant: NTN Corporation

Inventor： Hiroaki OHBA

IPC: G01B11/06 ,  G01N21/45 ,  B05C5/02 ,  B05C11/00

Abstract: There is provided a method of measuring a film thickness of a transparent material on a substrate. A first object (transparent material) is applied onto a first substrate surface, and a second object (transparent material) is applied onto a second substrate surface. The method includes: measuring a first relative height of a front surface of the first object with respect to the first substrate surface at a position without the first object; measuring a second relative height of the front surface with respect to a back surface of the first object; and calculating a refractive index of the transparent material, based on the first relative height and the second relative height. The method includes measuring a film thickness of the second object, using a third relative height of a front surface of the second object with respect to a back surface of the second object and the calculated refractive index.

公开(公告)号：US10442185B2

公开(公告)日：2019-10-15

申请号：US14396911

申请日：2013-04-23

Applicant: Tresu A/S

Inventor： Mads Kylling ,  Marko Ryynänen ,  Erik Gydesen ,  Petri Sirviö

IPC: B41F35/02 ,  B41F33/16 ,  B41F35/00 ,  B41F23/08 ,  B05C1/00 ,  B05C11/00

Abstract: A cleaning arrangement for a coater that has a plate cylinder, the cleaning arrangement having a cleaning web, a tangential moving mechanism configured to controllably move the cleaning web in at least one direction in a plane defined by the cleaning web, a radial moving mechanism configured to controllably move the cleaning web in at least one direction out of the plane, and a controller coupled to the tangential and radial moving mechanisms which is configured to control the moving of the cleaning web into and out of contact with the plate cylinder in conformity with input signals received by the controller.

公开(公告)号：US20190259172A1

公开(公告)日：2019-08-22

申请号：US16333511

申请日：2017-06-15

Applicant: SCREEN HOLDINGS CO., LTD.

Inventor： Hiroaki KAKUMA ,  Kensuke SAKATA

IPC: G06T7/70 ,  G01V8/10 ,  B05C11/00 ,  B05C5/00 ,  B05D1/00

Abstract: Provided is a technique for detecting whether or not there is a drop of a liquid in a non-supply period. There are performed the steps of: imaging in a non-supply period during which supply of liquid to a target nozzle among one or more nozzles is stopped while allowing an imaging visual field to include a dropping path through which the liquid drops from an opening of the target nozzle; and detecting whether or not there is a drop of the liquid using an imaging result in the imaging step. This enable detecting whether or not there is a drop of the liquid from the target nozzle in a non-supply period during which supply of the liquid toward the target nozzle is stopped.

公开(公告)号：US10300639B2

公开(公告)日：2019-05-28

申请号：US15063909

申请日：2016-03-08

Applicant: DAI NIPPON PRINTING CO., LTD.

Inventor： Yuki Aritsuka ,  Naoko Nakata

IPC: B29C43/58 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00 ,  B05C11/00 ,  B05D3/12 ,  B05D3/06 ,  B05D1/42 ,  B29C33/62 ,  G03F7/004 ,  G03F7/027

Abstract: An imprint method includes, in the peeling step of peeling a mold off the material layer to be transferred, a region-of-contact recognition operation of recognizing and determining a region of contact of the mold with the material layer to be transferred, a center-of-gravity locating operation of determining a center of gravity of a morphology of the thus recognized region of contact on the basis of that morphology, and a peeling operation of determining a point of force for applying peeling force to the mold or the imprinting substrate in relation to the center of gravity determined by the center-of-gravity locating operation, thereby acting the peeling force on the point of force.

公开(公告)号：US10128160B2

公开(公告)日：2018-11-13

申请号：US15818223

申请日：2017-11-20

Applicant: Lam Research Corporation

Inventor： Yukinori Sakiyama ,  Ishtak Karim ,  Yaswanth Rangineni ,  Adrien LaVoie ,  Ramesh Chandrasekharan ,  Edward Augustyniak ,  Douglas Keil

IPC: B05C11/00 ,  H01L21/66 ,  H01J37/32 ,  H01L21/3065 ,  H01L21/67 ,  C23C16/458 ,  H01L21/263 ,  H01L21/683 ,  C23C16/50 ,  C23C16/52 ,  C23C16/455 ,  C23C16/509 ,  H01L21/02

Abstract: A wafer is positioned on a wafer support apparatus beneath an electrode such that a plasma generation region exists between the wafer and the electrode. Radiofrequency power is supplied to the electrode to generate a plasma within the plasma generation region during multiple sequential plasma processing cycles of a plasma processing operation. At least one electrical sensor connected to the electrode measures a radiofrequency parameter on the electrode during each of the multiple sequential plasma processing cycles. A value of the radiofrequency parameter as measured on the electrode is determined for each of the multiple sequential plasma processing cycles. A determination is made as to whether or not any indicatory trend or change exists in the values of the radiofrequency parameter as measured on the electrode over the multiple sequential plasma processing cycles, where the indicatory trend or change indicates formation of a plasma instability during the plasma processing operation.

公开(公告)号：US20180275071A1

公开(公告)日：2018-09-27

申请号：US15762177

申请日：2016-09-23

Applicant: SUNG AN MACHINERY CO., LTD.

Inventor： Dong Kwon CHOI ,  Ok Jin KIM ,  Young Min LEE ,  Young Jin KIM

IPC: G01N21/84 ,  B05C5/02 ,  B05C11/00

CPC classification number: G01N21/84 ,  B05C5/0254 ,  B05C11/00 ,  B05C11/1013 ,  G01N21/8422 ,  G01N2021/8416 ,  G01N2021/8427

Abstract: The present invention relates to a slot die coating device and a control method therefor. The slot die coating device according to one embodiment of the present invention comprises: a slot die for performing a coating process by coating a substrate with ink; an image capturing unit located adjacent to the slot die, and photographing a state of the slot die and a state of the ink coated on the substrate during the coating process; and a control unit for controlling an operation of the slot die according to a result of the comparison between an image captured by the image capturing unit and a reference image, wherein the slot die comprises: a first body having a cavity in which the ink supplied from the outside is accommodated; a second body arranged so as to be spaced apart from the first body; and a shim plate coupled between the first body and the second body, having an outlet communicating with the cavity so as to discharge the ink accommodated in the cavity, and having at least one protrusion part exposed to the outside of the first body and the second body, wherein the control unit sets the reference image on the basis of the at least one protrusion part and compares the image captured by the image capturing unit and the reference image.

公开(公告)号：US10081859B2

公开(公告)日：2018-09-25

申请号：US14926243

申请日：2015-10-29

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jeong Won Han

IPC: F28D11/06 ,  B05C11/00 ,  C23C14/04

CPC classification number: C23C14/042

Abstract: A plate flatness adjusting device includes at least one tendon, an accommodation portion, and a tensile strength adjuster. The at least one tendon penetrates a through-hole of a plate and has lateral ends protruding outside of the plate. The accommodation portion accommodates the lateral ends of the at least one tendon. The tensile strength adjuster is coupled to the accommodation portion to adjust a tensile strength of the at least one tendon. The adjusted tensile strength adjusts a degree of flatness of the plate.

公开(公告)号：US20180257101A1

公开(公告)日：2018-09-13

申请号：US15911375

申请日：2018-03-05

Applicant: Tokyo Electron Limited

Inventor： Kazuhito MIYAZAKI ,  Akira KAKINO ,  Wataru YOSHITOMI

IPC: B05C11/00 ,  B05D1/26 ,  B05C5/02 ,  G01B11/00

CPC classification number: B05C11/00 ,  B05C5/0216 ,  B05D1/26 ,  B41J11/0095 ,  B41J11/06 ,  B41J11/42 ,  G01B11/002 ,  H01J9/02 ,  H01L21/681 ,  H01L22/12 ,  H01L27/1292 ,  H01L51/0004 ,  H01L51/0005 ,  H01L51/5012 ,  H01L51/5056 ,  H01L51/5072 ,  H01L51/5088 ,  H01L51/5092 ,  H01L51/56

Abstract: Disclosed is droplet ejecting apparatus that ejects droplets of a functional liquid onto a workpiece to draw a pattern. The droplet ejecting apparatus includes: a workpiece table; a droplet ejecting head configured to eject the droplets onto the workpiece placed on the workpiece table; a movement mechanism configured to relatively move the workpiece table and the droplet ejecting head in a main scanning direction and a sub-scanning direction; and a control unit configured to: detect a position of the workpiece or a position of the workpiece table while relatively moving the workpiece table and the droplet ejecting head along a plurality of scanning lines extending in the main scanning direction and set side by side in the sub-scanning direction; and create, based on a detection result, a correction table that indicates a correlation between a position of the movement mechanism and a positional correction amount of the workpiece table.