Abstract:
A flexible ion generator device that includes a dielectric layer having a first end, a second end, a first side, a second side, a top side, and a bottom side, at least one trace positioned on the dielectric layer and having a plurality of emitters engaged to the at least one trace. A plurality of lights disposed on the dielectric layer.
Abstract:
An electron beam 3D printing machine, comprising a chamber for generating and accelerating an electron beam and an operating chamber in which a metal powder is melted, with the consequent production of a three-dimensional product. The chamber for generating and accelerating an electron beam houses means for generating an electron beam and means for accelerating the generated electron beam, while the operating chamber houses at least one platform for depositing the metal powder, metal powder handling means and electron beam deflection means. The accelerator means for the generated electron beam comprise a series of resonant cavities fed with an alternating signal.
Abstract:
A nozzle-type electron beam irradiation device includes a vacuum chamber, an electron beam generator disposed in the vacuum chamber, and a vacuum nozzle that is connected to the vacuum chamber so as to guide an electron beam from the electron beam generator and emit the electron beam to the outside. The nozzle-type electron beam irradiation device includes a high-vacuum pump capable of sucking gas from the vicinity of the connecting part of the vacuum nozzle in the vacuum chamber.
Abstract:
A cathode-housing suspension of an electron beam device having a tubular body of elongate shape with an exit window extending in the longitudinal direction and a connector end in one end of the tubular body is disclosed. The electron beam device further comprises a cathode housing having an elongate shape and comprising a free end and an attachment end remote to the free end, and the attachment end comprises an outwardly extending flange provided with threaded openings for set screws and non-threaded openings for attachment bolts, for attaching the attachment end to a corresponding socket of the tubular body, wherein a mechanism configured to bias the attachment end away from the socket are arranged in the tubular body.
Abstract:
A system and method for producing a continuous or pulsed source of high energy electrons at or near atmospheric pressure is disclosed. High energy electrons are used to ionize analyte molecules in ambient air through collisions with reactant ions. The device includes an electron emitter, electron optics, and a thin membrane in an evacuated tube. The electron emitter may include a photocathode surface mounted on an optically transparent window and an external source of UV photons. The transparent window may include a UV transparent window mounted on an evacuated tube and/or the evacuated tube may be a transparent tube on which a photocathode surface film is deposited. The electron optics may include successive electrodes biased at increasing voltages. The membrane may include a material transparent or semi-transparent to energetic electrons. Upon impacting the membrane, continuous or pulsed electron packets are partially transmitted through to a high pressure ionization region.
Abstract:
A particle-beam exposure apparatus and a particle-beam therapeutic apparatus are obtained, in which, by reducing diameter increase, due to scattering in a range shifter, of a charged particle beam, the charged particle beam whose diameter is so narrow that spatially accurate exposure into the target is possible can be supplied, as well as, by placing the range shifter at a position apart from a patient, intimidation caused by a movement noise, etc. can be prevented. A particle-beam exposure apparatus and a particle-beam therapeutic apparatus include a range shifter 4 for varying energy of a charged particle beam with a thickness of the range shifter 4 being changed during exposure of the charged particle beam, so that a range of the charged particle beam at a target 5 to be exposed is set to a desired value; and a set of quadrupole magnets 6, being placed between the range shifter 4 and the target 5, based on the magnetization amount of the set of quadrupole magnets 6 being controlled corresponding to the charged-particle-beam energy varied by the range shifter 4, for reducing diameter increase, due to scattering at the range shifter 4, of the charged particle beam at the target 5.
Abstract:
An SEM wherein the entire imaging apparatus of the SEM is supported on air bearings. A multi-stage differentially pumped vacuum seal area provides a localized vacuum zone for wafer examination. A wafer leveling mechanism insures that the top surface of the wafer being examined is placed and maintained in a position level with the surface upon which the air bearing supported SEM rests. The SEM can move on its air bearings such that any portion of the wafer can be examined. A voltage-isolating passageway for providing high voltage isolation between a component maintained at high DC voltage and a component maintained at a substantially lower voltage is described. The voltage-isolating passageway incorporates a transverse magnetic field across its passageway. The voltage-isolating passageway includes at least two magnets that are positioned along opposite and exterior surfaces of the passageway. A semi-conductive coating can be applied to the interior passageway surface.
Abstract:
An electron beam device has a cathode that generates a fan-shaped electron beam. A first focusing lens includes first and second plates on opposed sides of a filament. The edges of the plates closest to a positively charged anode are arcuate, so that as individual electrons are accelerated normal to the edge of the charged plates, the beam increases in length with departure from the filament. A second focusing lens includes third and fourth plates on opposed sides of the first focusing lens. Each of the third and fourth plates has an arcuate edge proximate to the positively charged anode. The plates of the first and second focusing lenses provide focusing in a widthwise direction, while defining the increase in the lengthwise direction. Preferably, the filament is also curved. In the preferred embodiment, the curvature of the plates of the first focusing lens defines a common radius with the plates of the second focusing lens. The electron beam may be projected from the interior of an evacuated tube and may have a length that is not limited by the length of the filament.
Abstract:
What is disclosed is a novel toxic waste remediation system designed to provide on-site destruction of a wide variety of hazardous organic volatile hydrocarbons, including but not limited to halogenated and aromatic hydrocarbons in the vapor phase. This invention utilizes a detoxification plenum and radiation treatment which transforms hazardous organic compounds into non-hazardous substances.