公开(公告)号：US20220199352A1

公开(公告)日：2022-06-23

申请号：US17540169

申请日：2021-12-01

Applicant: KLA Corporation

Inventor： Tomas Plettner ,  Doug Larson ,  Mark Cawein ,  Jason W. Huang

IPC: H01J37/10 ,  H01J37/28 ,  H01J37/20

Abstract: A multi-beam electronics scanning system using swathing. The system includes an electron emitter source configured to emit an illumination beam. The illumination beam is split into multiple electron beams by a beam splitter lens array. The system also includes an electronic deflection system configured to deflect each of the electron beams in a plurality of directions, including a first direction, along two different axes. Last, a swathing stage is used to move a sample with a constant velocity in a second direction that is parallel to the first direction.

公开(公告)号：US11322335B2

公开(公告)日：2022-05-03

申请号：US16801555

申请日：2020-02-26

Applicant: EBARA CORPORATION

Inventor： Shinichi Okada

IPC: H01J37/317 ,  H01J37/10 ,  H01J37/063 ,  H01J37/32 ,  H01J37/30

Abstract: A charged particle multi-beam device includes a charged particle source, a collimator lens, a multi-light-source forming unit, and a reduction projection optical system. The multi-light-source forming unit has first to third porous electrodes disposed side by side in an optical axis direction. A plurality of holes for causing the multi-beams to pass is formed in each of the first to third porous electrodes. The first porous electrode and the third porous electrode have the same potential and the second porous electrode has potential different from the potential of the first porous electrode and the third porous electrode. A diameter of the holes on the second porous electrode is formed larger further away from an optical axis such that a surface on which the multi-light sources are located is formed in a shape convex to the charged particle source side.

公开(公告)号：US11276551B2

公开(公告)日：2022-03-15

申请号：US16823658

申请日：2020-03-19

Applicant: Hitachi, Ltd.

Inventor： Atsuko Shintani ,  Yasunari Sohda ,  Noritsugu Takahashi ,  Hikaru Koyama

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/244 ,  H01J37/10 ,  H01J37/30 ,  H01J37/21

Abstract: An inspection device includes a charged particle optical system that includes a charged particle beam source emitting a charged particle beam and plural lenses focusing the charged particle beam on a sample, a detector that detects secondary charged particles emitted by an interaction of the charged particle beam and the sample, and a calculation unit that executes auto-focusing at a time a field of view of the charged particle optical system moves over plural inspection spots, the calculation unit irradiates the charged particle beam to the sample under an optical condition that is obtained by introducing astigmatism of a predetermined specification to an optical condition that is for observing a pattern by the charged particle optical system, and executes the auto-focusing using an image formed from a signal outputted by the detector in detecting the secondary charged particles.

公开(公告)号：US11158482B2

公开(公告)日：2021-10-26

申请号：US16993392

申请日：2020-08-14

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Stefan Schubert

IPC: H01J37/09 ,  H01J37/05 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28

Abstract: A multi-beam particle microscope includes a multi-beam particle source, an objective lens, a detector arrangement, and a multi-aperture plate with a multiplicity of openings. The multi-aperture plate is between the objective lens and the object plane. The multi-aperture plate includes a multiplicity of converters which convert backscattered electrons which are generated by primary particle beams at an object into electrons with a lower energy, which provide electrons that form electron beams detected by the detector arrangement.

公开(公告)号：US11145483B2

公开(公告)日：2021-10-12

申请号：US16214603

申请日：2018-12-10

Applicant: NuFlare Technology, Inc.

Inventor： Takahito Nakayama ,  Takanao Touya

IPC: H01J37/04 ,  H01J37/10 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00

Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.

公开(公告)号：US11087955B2

公开(公告)日：2021-08-10

申请号：US16939706

申请日：2020-07-27

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Michael Schall ,  Joerg Jacobi ,  Michel Le Maire

IPC: H01J37/22 ,  H01J37/10 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28

Abstract: A system combination includes a particle beam system and a light-optical system. The particle beam system can be an individual particle beam system or a multiple particle beam system. A light entry mechanism can provided at a branching site of a beam tube arrangement within a beam switch. A light beam of the light-optical system can enter into the beam tube arrangement through the light entry mechanism such that the light beam impinges, in substantially collinear fashion with particle radiation, on an object to be inspected. Parts of the light-optical beam path and parts of the particle-optical beam path can extend parallel to one another or overlap with one another. This arrangement can allow light of the light-optical system to be incident in perpendicular fashion on an object to be inspected, optionally without impairing the particle-optical resolution of the particle beam system.

公开(公告)号：US20210233738A1

公开(公告)日：2021-07-29

申请号：US17230650

申请日：2021-04-14

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta Kawamoto ,  Akira IKEGAMI ,  Yasushi EBIZUKA ,  Nobuo FUJINAGA

IPC: H01J37/153 ,  H01J37/10 ,  H01J37/147

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

公开(公告)号：US10971326B2

公开(公告)日：2021-04-06

申请号：US16572114

申请日：2019-09-16

Applicant: FEI Company

Inventor： Ali Mohammadi-Gheidari ,  Peter Christiaan Tiemeijer ,  Erik Rene Kieft ,  Gerard Nicolaas Anne van Veen

IPC: H01J37/153 ,  H01J37/09 ,  H01J37/10 ,  H01J37/28 ,  H01J37/147 ,  H01J37/20

Abstract: A multi-electron beam imaging apparatus is disclosed herein. An example apparatus at least includes an electron source for producing a precursor electron beam, an aperture plate comprising an array of apertures for producing an array of electron beams from said precursor electron beam, an electron beam column for directing said array of electron beams onto a specimen, where the electron beam column is configured to have a length less than 300 mm, and where the electron beam column comprises a single individual beam crossover plane in which each of said electron beams forms an intermediate image of said electron source, and a single common beam crossover plane in which the electron beams in the array cross each other.

公开(公告)号：US20210090854A1

公开(公告)日：2021-03-25

申请号：US17028381

申请日：2020-09-22

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Toshihiro MOCHIZUKI ,  Haruyuki ISHI ,  Atsushi UEMOTO

IPC: H01J37/22 ,  H01J37/20 ,  H01J37/10

Abstract: A focused ion beam apparatus (100) includes: a focused ion beam lens column (20); a sample table (51); a sample stage (50); a memory (6M) configured to store in advance three-dimensional data on the sample table and an irradiation axis of the focused ion beam, the three-dimensional data being associated with stage coordinates of the sample stage; a display (7); and a display controller (6A) configured to cause the display to display a virtual positional relationship between the sample table (51v) and the irradiation axis (20Av) of the focused ion beam, which is exhibited when the sample stage is operated to move the sample table to a predetermined position, based on the three-dimensional data on the sample table and the irradiation axis of the focused ion beam.

公开(公告)号：US20210090844A1

公开(公告)日：2021-03-25

申请号：US17099476

申请日：2020-11-16

Applicant: KLA Corporation

Inventor： Robert Haynes ,  Aron Welk ,  Tomas Plettner ,  John Gerling ,  Mehran Nasser Ghodsi

IPC: H01J37/10 ,  H01J37/02 ,  H01J37/14 ,  H01J37/147 ,  H01J37/28 ,  H01J37/285

Abstract: A multi-column scanning electron microscopy (SEM) system includes a column assembly, where the column assembly includes a first substrate array assembly and at least a second substrate array assembly. The system also includes a source assembly, the source assembly including two or more illumination sources configured to generate two or more electron beams and two or more sets of a plurality of positioners configured to adjust a position of a particular illumination source of the two or more illumination sources in a plurality of directions. The system also includes a stage configured to secure a sample, where the column assembly directs at least a portion of the two or more electron beams onto a portion of the sample.