公开(公告)号：US20190006143A1

公开(公告)日：2019-01-03

申请号：US16105632

申请日：2018-08-20

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears ,  Harsh Sinha ,  David Trease ,  David Kaz ,  Wei Ye

IPC: H01J37/153

Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.

公开(公告)号：US10090131B2

公开(公告)日：2018-10-02

申请号：US15371557

申请日：2016-12-07

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/147

Abstract: An electron-optical system for performing electron microscopy is disclosed. The system includes an electron beam source configured to generate a primary electron beam. The system includes a source lens, a condenser lens and an objective lens disposed along an optical axis. The system includes a first Wien filter disposed along the optical axis and a second Wien filter disposed along the optical axis. The first Wien filter and the second Wien filter are disposed between the source lens and the objective lens. The first Wien filter is configured to correct chromatic aberration in the primary beam. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.

公开(公告)号：US20160260576A1

公开(公告)日：2016-09-08

申请号：US15058062

申请日：2016-03-01

Applicant: KLA-Tencor Corporation

Inventor： Christopher Sears ,  Ben Clarke

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/153 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/265 ,  H01J2237/004 ,  H01J2237/153 ,  H01J2237/226

Abstract: A scanning electron microscopy apparatus for mitigating charging artifacts includes a scanning electron microscopy sub-system for acquiring multiple images from a sample. The images include one or more sets of complimentary images. The one or more sets of complimentary images include a first image acquired along a first scan direction and a second image acquired along a second scan direction opposite to the first scan direction. The apparatus includes a controller communicatively coupled to the scanning electron microscopy sub-system. The controller is configured to receive images of the sample from the scanning electron microscopy sub-system. The controller is further configured to generate a composite image by combining the one or more sets of complimentary images.

Abstract translation: 用于减轻充电伪像的扫描电子显微镜装置包括用于从样品获取多个图像的扫描电子显微镜子系统。 图像包括一组或多组互补图像。 一组或多组互补图像包括沿着第一扫描方向获取的第一图像和沿着与第一扫描方向相反的第二扫描方向获取的第二图像。 该装置包括通信地耦合到扫描电子显微镜子系统的控制器。 控制器被配置为从扫描电子显微镜子系统接收样品的图像。 控制器还被配置为通过组合一组或多组互补图像来生成合成图像。

公开(公告)号：US11302511B2

公开(公告)日：2022-04-12

申请号：US15173144

申请日：2016-06-03

Applicant: KLA-Tencor Corporation

Inventor： Alan Brodie ,  Rainer Knippelmeyer ,  Christopher Sears ,  John Rouse ,  Grace Hsiu-Ling Chen

IPC: H01J37/12 ,  H01J37/28 ,  H01J37/21 ,  H01J37/153

Abstract: Multi-beam e-beam columns and inspection systems that use such multi-beam e-beam columns are disclosed. A multi-beam e-beam column configured in accordance with the present disclosure may include an electron source and a multi-lens array configured to produce a plurality of beamlets utilizing electrons provided by the electron source. The multi-lens array may be further configured to shift a focus of at least one particular beamlet of the plurality of beamlets such that the focus of the at least one particular beamlet is different from a focus of at least one other beamlet of the plurality of beamlets.

公开(公告)号：US10790114B2

公开(公告)日：2020-09-29

申请号：US15672797

申请日：2017-08-09

Applicant: KLA-Tencor Corporation

Inventor： Ichiro Honjo ,  Christopher Sears ,  Hedong Yang ,  Thanh Ha ,  Jianwei Wang ,  Huina Xu

IPC: H01J37/28 ,  G02B21/00 ,  H01J37/22 ,  H01J37/30 ,  H01J37/10 ,  G06N3/08 ,  G06N3/04

Abstract: Objective lens alignment of a scanning electron microscope review tool with fewer image acquisitions can be obtained using the disclosed techniques and systems. Two different X-Y voltage pairs for the scanning electron microscope can be determined based on images. A second image based on the first X-Y voltage pair can be used to determine a second X-Y voltage pair. The X-Y voltage pairs can be applied at the Q4 lens or other optical components of the scanning electron microscope.

公开(公告)号：US20200118784A1

公开(公告)日：2020-04-16

申请号：US16230325

申请日：2018-12-21

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01J37/12 ,  H01J37/06

Abstract: An optical characterization system utilizing a micro-lens array (MLA) is provided. The system may include an electron source and a MLA including a micro-deflection array (MDA). The MDA may include an insulator substrate and a plurality of hexapole electrostatic deflectors disposed on the insulator substrate. The MDA may further include a plurality of voltage connecting lines configured to electrically couple the plurality of hexapole electrostatic deflectors to one or more voltage sources. The MDA may be configured to split a primary electron beam from the electron source into a plurality of primary electron beamlets. The system may be configured to focus the plurality of primary electron beamlets at a wafer plane.

公开(公告)号：US10338013B1

公开(公告)日：2019-07-02

申请号：US15879611

申请日：2018-01-25

Applicant: KLA-Tencor Corporation

Inventor： Alan D. Brodie ,  Christopher Sears

IPC: G01N23/22 ,  H01J37/10 ,  G01N23/2251 ,  G01N23/2255

CPC classification number: G01N23/2251 ,  G01N23/2255 ,  G01N2223/6116

Abstract: A multi-beam metrology system includes an illumination source configured to generate a beam array, an illumination sub-system to direct the beam array to a sample at an array of measurement locations, an imaging sub-system to image the array of measurement locations as an array of imaged spots in a detection plane, and a detection assembly to generate detection signal channels associated with each of the imaged spots. The detection assembly includes an array of detection elements configured to receive the imaged spots with separate detection elements, and one or more position detectors to measure positions of the imaged spots in the detection plane. The detection assembly further generates feedback signals for the imaging sub-system based on the measured positions of the imaged spots to adjust the positions of one or more of the imaged spots in the detection plane to maintain alignment of the array of detection elements.

公开(公告)号：US20180358200A1

公开(公告)日：2018-12-13

申请号：US15616749

申请日：2017-06-07

Applicant: KLA-Tencor Corporation

Inventor： Robert Haynes ,  John Gerling ,  Aron Welk ,  Christopher Sears ,  Felipe Fuks ,  Mehran Nasser-Ghodsi ,  Tomas Plettner

IPC: H01J37/147 ,  H01J37/14 ,  H01J37/285 ,  H01J37/18

CPC classification number: H01J37/1474 ,  H01J37/14 ,  H01J37/1471 ,  H01J37/18 ,  H01J37/285

Abstract: A multi-column scanning electron microscopy (SEM) system is disclosed. The SEM system includes a source assembly. The source assembly includes two or more electron beam sources configured to generate a plurality of electron beams. The source assembly also includes two or more sets of positioners configured to actuate the two or more electron beam sources. The SEM system also includes a column assembly. The column assembly includes a plurality of substrate arrays. The column assembly also includes two or more electron-optical columns formed by a set of column electron-optical elements bonded to the plurality of substrate arrays. The SEM system also includes a stage configured to secure a sample that at least one of emits or scatters electrons in response to the plurality of electron beams directed by the two or more electron-optical columns to the sample.

公开(公告)号：US20180158644A1

公开(公告)日：2018-06-07

申请号：US15371557

申请日：2016-12-07

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/10

CPC classification number: H01J37/1474 ,  H01J37/10 ,  H01J37/28 ,  H01J2237/1508 ,  H01J2237/28

Abstract: An electron-optical system for performing electron microscopy is disclosed. The system includes an electron beam source configured to generate a primary electron beam. The system includes a source lens, a condenser lens and an objective lens disposed along an optical axis. The system includes a first Wien filter disposed along the optical axis and a second Wien filter disposed along the optical axis. The first Wien filter and the second Wien filter are disposed between the source lens and the objective lens. The first Wien filter is configured to correct chromatic aberration in the primary beam. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.

公开(公告)号：US20170047193A1

公开(公告)日：2017-02-16

申请号：US15231728

申请日：2016-08-08

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears ,  Harsh Sinha ,  David Trease ,  David Kaz ,  Wei Ye

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/153 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.

Abstract translation: 用于检查或检查样品的边缘部分的电子光学系统包括被配置为产生一个或多个电子束的电子束源，被配置为固定样品的样品台和包括一组电子光学的电子 - 光学柱 被配置为将一个或多个电子束的至少一部分引导到样品的边缘部分上的元件。 该系统还包括围绕样品设置的样品位置参考装置和设置在样品边缘与样品位置参考装置之间的保护环装置，以补偿一个或多个边缘场。 保护环装置的一个或多个特性是可调节的。 该系统还包括被配置为检测从样品表面发出的电子的检测器组件。