公开(公告)号：US07490541B2

公开(公告)日：2009-02-17

申请号：US10482170

申请日：2002-07-03

Applicant: Takeshi Kawata ,  Kenji Watanabe ,  Kenji Okuzono ,  Nobunao Tsuchida

Inventor： Takeshi Kawata ,  Kenji Watanabe ,  Kenji Okuzono ,  Nobunao Tsuchida

IPC: F01B31/10

CPC classification number: F04C29/026 ,  F01C21/10

Abstract: A compressor comprises a compressing mechanism which compresses fluid including a lubricant, a separation chamber into which the fluid compressed by the compressing mechanism is introduced and in which at least a portion of the lubricant included in the fluid is separated from the fluid, and an oil-storage chamber in which the lubricant separated from the fluid in the separation chamber is stored. An oil-introducing passage is formed between the separation chamber and the oil-storage chamber to bring these chambers into communication with each other, the oil-introducing passage introduces the lubricant separated in the separation chamber into the oil-storage chamber, an opening of the oil-introducing passage on the side of the oil-storage chamber is lower than an oil level of the lubricant stored in the oil-storage chamber in the vertical direction.

Abstract translation: 压缩机包括压缩机构，其压缩包括润滑剂的流体，分离室，由压缩机构压缩的流体被引入到该分离室中，其中包含在流体中的润滑剂的至少一部分与流体分离， 其中存储有与分离室中的流体分离的润滑剂的储存室。 在分离室和储油室之间形成有油引入通道，使这些室相互连通，导油通路将分离室中分离的润滑剂引入储油室， 储油室一侧的导油通路低于储存在储油室中的润滑油在垂直方向上的油位。

公开(公告)号：US07483560B2

公开(公告)日：2009-01-27

申请号：US10679290

申请日：2003-10-07

Applicant: Chle Shishido ,  Ryo Nakagaki ,  Maki Tanaka ,  Kenji Watanabe ,  Yuya Toyoshima

Inventor： Chle Shishido ,  Ryo Nakagaki ,  Maki Tanaka ,  Kenji Watanabe ,  Yuya Toyoshima

IPC: G06K9/00

CPC classification number: H01L22/34 ,  G01N21/956 ,  G06T7/0004 ,  G06T2207/30148 ,  H01L2924/0002 ,  H01L2924/00

Abstract: In a method of measuring a three dimensional shape of an arbitrary fine pattern on a semiconductor device, an optical measurement system carries out a measurement to obtain cross-section information, and an electron microscope obtains an electron beam image of the arbitrary fine pattern. Plane information and cross-section information obtained from the electron beam image of the arbitrary fine pattern are combined to measure the three dimensional shape of the arbitrary fine pattern.

Abstract translation: 在半导体装置中测定任意精细图案的三维形状的方法中，光学测量系统进行测量以获得横截面信息，并且电子显微镜获得任意精细图案的电子束图像。 从任意精细图案的电子束图像获得的平面信息和横截面信息被组合以测量任意精细图案的三维形状。

公开(公告)号：US07423267B2

公开(公告)日：2008-09-09

申请号：US11528673

申请日：2006-09-28

Applicant: Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Kenji Watanabe ,  Takao Kato ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shoji Yoshikawa ,  Toshifumi Kimba ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima

Inventor： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Kenji Watanabe ,  Takao Kato ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shoji Yoshikawa ,  Toshifumi Kimba ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima

IPC: G01N23/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G01N23/225 ,  H01J37/06 ,  H01J37/063 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/0635 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

Abstract: The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.

Abstract translation: 本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。 在电子束装置中，电子枪具有用于发射一次电子束的阴极。 阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。 多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

公开(公告)号：US07411207B2

公开(公告)日：2008-08-12

申请号：US11782760

申请日：2007-07-25

Applicant: Hidetoshi Nishiyama ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Kenji Watanabe ,  Tetsuya Watanabe ,  Takahiro Jingu

Inventor： Hidetoshi Nishiyama ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Kenji Watanabe ,  Tetsuya Watanabe ,  Takahiro Jingu

IPC: G01N21/88

CPC classification number: G01N21/274 ,  G01N21/47 ,  G01N21/4738 ,  G01N21/8806 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01N2021/8854

Abstract: An apparatus for inspecting particles and/or pattern defects of an object under inspection. Data processing means obtains information on size of the particles and/or the pattern defects from an intensity of the scattered light detected by the light detecting means by referring to a relationship between an intensity of scattered light from a standard particle and a size of the standard particle, and using a calibration coefficient for compensating for a change in intensity of the light of the illuminating means from a predetermined intensity.

Abstract translation: 一种用于检查被检查物体的颗粒和/或图案缺陷的装置。 数据处理装置通过参考来自标准粒子的散射光的强度与标准尺寸之间的关系，从光检测装置检测到的散射光的强度获得关于颗粒尺寸和/或图案缺陷的信息 并且使用用于从预定强度补偿照明装置的光的强度变化的校准系数。

公开(公告)号：US20080099697A1

公开(公告)日：2008-05-01

申请号：US11898358

申请日：2007-09-11

Applicant: Kenji Watanabe ,  Takeshi Murakami ,  Ryo Tajima ,  Masahiro Hatakeyama ,  Masatoshi Tsuneoka ,  Nobuharu Noji

Inventor： Kenji Watanabe ,  Takeshi Murakami ,  Ryo Tajima ,  Masahiro Hatakeyama ,  Masatoshi Tsuneoka ,  Nobuharu Noji

IPC: G21K5/10

CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J37/153 ,  H01J37/29 ,  H01J2237/0047 ,  H01J2237/1532 ,  H01J2237/216

Abstract: [Problem] To adjust astigmatism quickly with a simple algorithm by utilizing an autofocus estimation value of an image obtained from a pattern formed on a sample. [Means] A charged particle beam apparatus 300 for observing and estimating a sample W by applying a charged particle beam to sample W to detect secondary charged particles, such as electrons emitted from the sample, reflected electrons and backscattered electrons comprises astigmatism adjusting means 17 for adjusting astigmatism of the charged particle beam. Astigmatism adjusting means 17 is supplied with a correction voltage which maximizes a focus estimation value obtained from a pattern formed on sample W. Astigmatism adjusting means 17 is a multipole including a plurality of pairs of electrodes or coils facing each other to place the optical axis of the charged particle beam at the center. Also disclosed is a charged particle beam apparatus 400 capable of observation and estimation of a sample surface in a condition where no charge up exists over the whole sample W.

Abstract translation: [问题]通过利用从样品上形成的图案获得的图像的自动聚焦估计值，通过简单的算法快速调节像散。 用于通过对样品W施加带电粒子束以检测从样品发射的电子，反射电子和反向散射电子的二次带电粒子来观察和估计样品W的带电粒子束装置300包括散光调节装置17，用于 调整带电粒子束的散光。 散光调节装置17被提供校正电压，该校正电压使得从样本W上形成的图案获得的聚焦估计值最大化。散光调节装置17是包括多对电极或线圈彼此面对的多极，以将光轴 带电粒子束在中心。 还公开了一种能够在整个样品W上不存在电荷的情况下能够观察和估计样品表面的带电粒子束装置400。

公开(公告)号：US07336303B2

公开(公告)日：2008-02-26

申请号：US10347585

申请日：2003-01-22

Applicant: Kenichi Shimomura ,  Yoshikazu Kondo ,  Youichi Kato ,  Kenji Watanabe

Inventor： Kenichi Shimomura ,  Yoshikazu Kondo ,  Youichi Kato ,  Kenji Watanabe

IPC: H04N5/262

CPC classification number: G06T3/4007 ,  H04N5/232 ,  H04N5/23296 ,  H04N5/2628 ,  H04N5/3454 ,  H04N5/361

Abstract: An imaging control unit specifies a scan region, including an effective pixel region and a blanking region, of an image based on a magnification for electronic zooming, and converts an input optical signal into an electrical signal by scanning the scan region. The imaging control unit reads the electrical signal stored and delivers the electrical signal to an image sensor unit as picture data. An RW control unit stores the picture data in a register based on the magnification for electronic zooming, and then reads the picture data at a predetermined frame rate. A resolution converter performs interpolation processing of the picture data based on the magnification for electronic zooming.

Abstract translation: 成像控制单元基于用于电子变焦的放大率来指定包括图像的有效像素区域和消隐区域的扫描区域，并且通过扫描扫描区域将输入的光学信号转换为电信号。 成像控制单元读取存储的电信号并将电信号传送到图像传感器单元作为图像数据。 RW控制单元基于用于电子变焦的放大率将图像数据存储在寄存器中，然后以预定帧速率读取图像数据。 分辨率转换器基于用于电子变焦的倍率执行图像数据的插值处理。

公开(公告)号：US20080039511A1

公开(公告)日：2008-02-14

申请号：US11587862

申请日：2005-05-16

Applicant: Isao Takemura ,  Kenji Watanabe ,  Kunio Oshima ,  Nobuaki Ito ,  Junpei Haruta ,  Hidetaka Hiyama ,  Masatoshi Chihiro ,  Hideki Kawasome ,  Yoko Sakamoto ,  Hironobu Ishiyama ,  Takumi Sumida ,  Kazuhiko Fujita ,  Hideki Kitagaki

Inventor： Isao Takemura ,  Kenji Watanabe ,  Kunio Oshima ,  Nobuaki Ito ,  Junpei Haruta ,  Hidetaka Hiyama ,  Masatoshi Chihiro ,  Hideki Kawasome ,  Yoko Sakamoto ,  Hironobu Ishiyama ,  Takumi Sumida ,  Kazuhiko Fujita ,  Hideki Kitagaki

IPC: A61K31/425 ,  A61P17/00 ,  C07D277/00

CPC classification number: C07D495/04 ,  C07D277/24 ,  C07D277/56 ,  C07D417/06

Abstract: An object of the present invention is to provide a novel thiazole compound with specific inhibitory activity against phosphodiesterase 4. The present invention provides a compound represented by Formula (1), an optical isomer thereof, or a salt thereof: wherein R1 is a di-C1-6 alkoxyphenyl group; R2 is any one of the following groups (a) to (t): (a) a phenyl group; (b) a naphthyl group; (c) a pyridyl group; (d) a furyl group; (e) a thienyl group; (f) an isoxazolyl group; (g) a thiazolyl group; (h) a pyrrolyl group; (i) an imidazolyl group; (j) a tetrazolyl group; (k) a pyrazinyl group; (l) a thienothienyl group; (m) a benzothienyl group; (n) an indolyl group; (o) a benzimidazolyl group; (p) an indazolyl group; (q) a quinolyl group; (r) a 1,2,3,4-tetrahydroquinolyl group; (s) a quinoxalinyl group; and (t) a 1,3-benzodioxolyl group; and A is any one of the following groups (i) to (vi): (i) —CO—B— wherein B is a C1-6 alkylene group; (ii) —CO—Ba wherein Ba is a C2-6 alkenylene group; (iii) —CH(OH)—B—; (iv) —COCH(COOR3)-Bb- wherein R3 is a C1-6 alkyl group and Bb is a C1-6 alkylene group; and (v) -Bc- wherein Bc is a C2-6 alkylene group.

Abstract translation: 本发明的目的是提供一种对磷酸二酯酶4具有特异抑制活性的噻唑类化合物。本发明提供式（1）表示的化合物，其光学异构体或其盐：其中R1是二 C 1-6烷氧基苯基; R2是下述（a）〜（t）中的任一个：（a）苯基; （b）萘基; （c）吡啶基; （d）呋喃基; （e）噻吩基; （f）异恶唑基; （g）噻唑基; （h）吡咯基; （i）咪唑基; （j）四唑基; （k）吡嗪基; （1）噻吩并噻吩基; （m）苯并噻吩基; （n）吲哚基; （o）苯并咪唑基; （p）吲唑基; （q）喹啉基; （r）1,2,3,4-四氢喹啉基; 喹喔啉基; 和（t）1,3-苯并二恶唑基; A为下列基团（i）至（vi）中的任何一个：（i）-CO-B-其中B为C 1-6亚烷基; （ⅱ）-CO-Ba，其中Ba为C 2-6亚烯基; （ⅲ）-CH（OH）-B-; （ⅳ）-COCH（COOR3）-Bb-，其中R3是C 1-6烷基，Bb是C 1-6亚烷基; 和（v）-Bc-其中Bc是C 2-6亚烷基。

公开(公告)号：US07312449B2

公开(公告)日：2007-12-25

申请号：US11034873

申请日：2005-01-14

Applicant: Mamoru Nakasuji ,  Takao Kato ,  Tohru Satake ,  Kenji Watanabe ,  Takeshi Murakami ,  Nobuharu Noji

Inventor： Mamoru Nakasuji ,  Takao Kato ,  Tohru Satake ,  Kenji Watanabe ,  Takeshi Murakami ,  Nobuharu Noji

IPC: G01N23/00

CPC classification number: H01J37/28 ,  G01N23/04 ,  H01J2237/2817

Abstract: An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for an operation with high stability. In this electron beam system, an electron beam emitted from an electron gun is irradiated onto a sample and secondary electrons emanated from the sample are detected. The electron gun is a thermionic emission type and designed to operate in a space charge limited condition. A shaping aperture and a NA aperture are arranged in front locations of the electron gun. An image of the shaping aperture formed by an electron beam emitted from the thermionic emission electron gun is focused onto a surface of the sample through the two-stage lenses.

Abstract translation: 一种电子束系统，其中可以减少电子束的喷射噪声并且可以使束流更高，并且还可以通过两级透镜形成成形梁，以允许具有高稳定性的操作。 在该电子束系统中，从电子枪发射的电子束照射到样品上，并检测从样品发出的二次电子。 电子枪是一种热离子发射型，设计用于在空间电荷限制条件下工作。 成形孔径和NA孔径布置在电子枪的前部位置。 由从热电子发射电子枪发射的电子束形成的成形孔的图像通过两级透镜聚焦到样品的表面上。

公开(公告)号：US20070265797A1

公开(公告)日：2007-11-15

申请号：US11782760

申请日：2007-07-25

Applicant: Hidetoshi Nishiyama ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Kenji Watanabe ,  Tetsuya Watanabe ,  Takahiro Jingu

Inventor： Hidetoshi Nishiyama ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Kenji Watanabe ,  Tetsuya Watanabe ,  Takahiro Jingu

IPC: G06F15/00

CPC classification number: G01N21/274 ,  G01N21/47 ,  G01N21/4738 ,  G01N21/8806 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01N2021/8854

Abstract: An apparatus for inspecting particles and/or pattern defects of an object under inspection. Data processing means obtains information on size of the particles and/or the pattern defects from an intensity of the scattered light detected by the light detecting means by referring to a relationship between an intensity of scattered light from a standard particle and a size of the standard particle, and using a calibration coefficient for compensating for a change in intensity of the light of the illuminating means from a predetermined intensity.

Abstract translation: 一种用于检查被检查物体的颗粒和/或图案缺陷的装置。 数据处理装置通过参考来自标准粒子的散射光的强度与标准尺寸之间的关系，从光检测装置检测到的散射光的强度获得关于颗粒尺寸和/或图案缺陷的信息 并且使用用于从预定强度补偿照明装置的光的强度变化的校准系数。

公开(公告)号：US07241993B2

公开(公告)日：2007-07-10

申请号：US09891511

申请日：2001-06-27

Applicant: Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

Inventor： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

IPC: H01J37/28

CPC classification number: H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

Abstract translation: 电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。