公开(公告)号：US20240242918A1

公开(公告)日：2024-07-18

申请号：US18559160

申请日：2021-05-21

Applicant: Hitachi High-Tech Corporation

Inventor： RYO SUGIYAMA ,  Kenji TANIMOTO ,  Shuhei ISHIKAWA

IPC: H01J37/07 ,  H01J37/063 ,  H01J37/08

CPC classification number: H01J37/07 ,  H01J37/063 ,  H01J37/08 ,  H01J2237/038 ,  H01J2237/04735 ,  H01J2237/061

Abstract: Provided are a structure for particle acceleration and a charged particle beam apparatus, which enable the suppression of electric field concentration occurring near a negative electrode part. The structure for particle acceleration includes: a ceramic body 1 having a through hole 10 formed by an inner wall surface; and a negative electrode 2 and a positive electrode 3 which are arranged, respectively, on one end and the other end of the through hole 10 in the ceramic body. The inner wall surface of the ceramic body 1 is configured such that a first region 22, which is electrically connected with the negative electrode 2, and a second region 23, which is electrically connected with the positive electrode 3, are electrically connected to each other. The surface resistivity of the first region 22 is lower than the surface resistivity of the second region 23.

公开(公告)号：US11961703B2

公开(公告)日：2024-04-16

申请号：US16904798

申请日：2020-06-18

Applicant: NuFlare Technology, Inc.

Inventor： Chosaku Noda

IPC: H01J37/317 ,  H01J37/063 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/063 ,  H01J37/10 ,  H01J37/3177 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A beam arrangement portion is provided to arrange multiple primary electron beams on a substrate. The beam arrangement portion arranges the multiple primary electron beams in a square lattice along a first moving direction of a stage allowing the substrate to be placed thereon and a second moving direction perpendicular to the first moving direction in a state where, when the multiple primary electron beams are viewed as a whole, beams around four corners of the square lattice are omitted.

公开(公告)号：US20190193192A1

公开(公告)日：2019-06-27

申请号：US16195970

申请日：2018-11-20

Applicant: Arcam AB

Inventor： Mattias Fager ,  Johan Backlund

IPC: B23K15/00 ,  H01J37/147 ,  H01J37/063 ,  H01J37/18 ,  H01J37/09 ,  H01J37/10 ,  B33Y10/00 ,  B33Y30/00

CPC classification number: B23K15/0086 ,  B22F3/1055 ,  B22F2003/1056 ,  B22F2003/1057 ,  B23K15/002 ,  B23K15/0026 ,  B23K15/0046 ,  B23K15/06 ,  B29C64/153 ,  B29C64/268 ,  B29C64/393 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  H01J37/063 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/18 ,  H01J37/301 ,  H01J37/3045 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/3128 ,  H01J2237/316

Abstract: An electron beam source comprising a cathode, an anode, a means for deflecting an electron beam over a target surface and at least one vacuum pump, the electron beam source further comprising a contraction area arranged between the anode and the means for deflecting the electron beam where a hole in the contraction area is aligned with a hole in the anode with respect to the cathode, a first vacuum pump is arranged between the contraction area and the anode and a second vacuum pump is arranged above the anode, a gas inlet is provided between the contraction area and the means for deflecting the electron beam, wherein a first crossover of the electron beam is arranged between the cathode and the anode and a second crossover is arranged at or in close proximity to the contraction area.

公开(公告)号：US09818569B2

公开(公告)日：2017-11-14

申请号：US14587634

申请日：2014-12-31

Applicant: Rad Source Technologies, Inc.

Inventor： Phillip Kent Ausburn

IPC: H01J35/32 ,  H01J35/18 ,  H01J35/08 ,  H01J37/06 ,  H01J19/32 ,  H01J19/48 ,  H01J1/16 ,  H01J1/40 ,  H01J37/063 ,  H01J35/06 ,  H01J35/16 ,  H01J1/94 ,  A61B6/00 ,  H01J19/57

CPC classification number: H01J19/32 ,  A61B6/40 ,  A61B6/482 ,  H01J1/16 ,  H01J1/40 ,  H01J1/94 ,  H01J19/48 ,  H01J19/57 ,  H01J35/06 ,  H01J35/08 ,  H01J35/16 ,  H01J35/18 ,  H01J35/32 ,  H01J37/063 ,  H01J2235/087 ,  H01J2235/186 ,  H01J2893/0006 ,  H01J2893/0012

Abstract: A high dose output, through transmission target X-ray tube and methods of use includes, in general an X-ray tube for accelerating electrons under a high voltage potential having an evacuated high voltage housing, a hemispherical shaped through transmission target anode disposed in said housing, a cathode structure to deflect the electrons toward the hemispherical anode disposed in said housing, a filament located in the geometric center of the anode hemisphere disposed in said housing, a power supply connected to said cathode to provide accelerating voltage to the electrons.

公开(公告)号：US09711321B2

公开(公告)日：2017-07-18

申请号：US14586066

申请日：2014-12-30

Applicant: General Electric Company

Inventor： Sergio Lemaitre

IPC: H01J35/06 ,  H01J37/063 ,  H01J19/10 ,  H01J3/38 ,  H01J19/48

CPC classification number: H01J35/06 ,  H01J3/38 ,  H01J19/10 ,  H01J19/48 ,  H01J37/063 ,  H01J2229/4844 ,  H01J2229/4896 ,  H01J2235/06

Abstract: In the present invention, a cathode for an x-ray tube is formed with a large area flat emitter. To reduce aberrations to a minimum the emission area in the flat emitter has a non-rectangular shape and focusing pads arranged around the emitter. In an exemplary embodiment, the flat emitter has a non-rectangular polygonal shape for an emission area on the emitter in order to increase the emission current from the emitter at standard voltage levels without the need to run the emitters at a higher temperature, add additional emitters to the cathode and/or to coat the emitters with a low work function material.

公开(公告)号：US20170125202A1

公开(公告)日：2017-05-04

申请号：US15404440

申请日：2017-01-12

Applicant: Hermes Microvision Inc.

Inventor： Shuai Li

IPC: H01J37/143 ,  H01J37/28

CPC classification number: H01J37/143 ,  H01J3/20 ,  H01J37/063 ,  H01J37/065 ,  H01J37/09 ,  H01J37/14 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/063 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/0653 ,  H01J2237/083 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

公开(公告)号：US08957390B2

公开(公告)日：2015-02-17

申请号：US14179283

申请日：2014-02-12

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik GmbH

Inventor： Pavel Adamec

IPC: H01J37/073 ,  H01J37/02 ,  H01J37/063 ,  H01J37/24

CPC classification number: H01J37/063 ,  H01J3/027 ,  H01J37/073 ,  H01J2237/022

Abstract: A gun arrangement configured for generating a primary electron beam for a wafer imaging system is described. The arrangement includes a controller configured for switching between a normal operation and a cleaning operation, a field emitter having an emitter tip adapted for providing electrons and emitting an electron beam along an optical axis, an extractor electrode adapted for extracting the electron beam from the emitter tip electrode, a suppressor electrode, and at least one auxiliary emitter electrode arranged radially outside the suppressor electrode, and provided as a thermal electron emitter for thermally emitting electrons towards the optical axis.

Abstract translation: 描述了构造成用于产生用于晶片成像系统的一次电子束的枪装置。 该装置包括配置用于在正常操作和清洁操作之间切换的控制器，具有适于提供电子并沿光轴发射电子束的发射极尖端的场发射器，适于从发射器提取电子束的提取器电极 尖端电极，抑制电极，以及设置在抑制电极的径向外侧的至少一个辅助发射极，并且被设置为用于向光轴发射电子的热电子发射器。

公开(公告)号：US08330344B2

公开(公告)日：2012-12-11

申请号：US12586792

申请日：2009-09-28

Applicant: Hiroshi Yasuda ,  Takeshi Haraguchi ,  Hiroshi Shimoyama ,  Hidekazu Murata

Inventor： Hiroshi Yasuda ,  Takeshi Haraguchi ,  Hiroshi Shimoyama ,  Hidekazu Murata

IPC: H01J29/50 ,  H01J29/00

CPC classification number: H01J37/063 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/06316 ,  H01J2237/06375 ,  H01J2237/065

Abstract: An electron gun includes: an electron source; an accelerating electrode; an extraction electrode for extracting electrons from an electron emission surface of the electron source; a suppressor electrode for suppressing emission of electrons from a side surface of the electron source; and an electron beam converging unit for converging an electron beam of thermal field emission electrons emitted from the electron emission surface by applying an electric field to the electron emission surface. The electron beam converging unit is an electrostatic lens electrode which is placed between the extraction electrode and the accelerating electrode and having an opening portion in its center. A voltage is applied to the electrostatic lens electrode to converge the electron beam.

Abstract translation: 电子枪包括：电子源; 加速电极; 用于从电子源的电子发射表面提取电子的提取电极; 用于抑制从电子源的侧表面发射电子的抑制电极; 以及电子束会聚单元，用于通过向电子发射表面施加电场而会聚从电子发射表面发射的热场发射电子的电子束。 电子束会聚单元是放置在提取电极和加速电极之间并且在其中心具有开口部分的静电透镜电极。 电压施加到静电透镜电极以会聚电子束。

公开(公告)号：US08242674B2

公开(公告)日：2012-08-14

申请号：US12449919

申请日：2008-02-28

Applicant: Josef Sellmair

Inventor： Josef Sellmair

IPC: H01J1/50

CPC classification number: H01J37/073 ,  H01J37/063 ,  H01J37/08 ,  H01J37/141 ,  H01J37/143 ,  H01J37/28 ,  H01J2237/06341 ,  H01J2237/06375 ,  H01J2237/0807 ,  H01J2237/0815 ,  H01J2237/142

Abstract: The invention relates to an apparatus and a method for production of a device for thermally induced field emission of particles for particle optical devices such as in particular electron or ion microscopes, having at least one particle emitter (3) arranged in or pointing into a vacuum space (2) with at least one field emitter tip (4) for the emission of the particles, and having a magnetic field generator (6) attributed to the particle emitter (3) for focussing of the emitted particle beam (5), with the particle emitter (3) with its field emitter tip (4) is built by emitter structures (9) positioned on the surface (7) of a substrate (8) which is turned away from the magnetic field generator (6), and the substrate (8) formed as separating wall between vacuum space (2) and the atmospheric space (10) situated outside the vacuum space (2) at the side (14) of the substrate (8) which is turned away from the emitter structures (9).

Abstract translation: 本发明涉及一种用于制造用于颗粒光学器件（例如电子或离子显微镜）的颗粒光学器件的热感应场发射装置的装置和方法，所述装置和方法具有布置在或指向真空中的至少一个粒子发射器（3） 具有用于发射颗粒的至少一个场发射器尖端（4）的空间（2），并且具有归因于用于聚焦发射的粒子束（5）的粒子发射器（3）的磁场发生器（6），与 具有其场发射极尖端（4）的粒子发射器（3）由位于离开磁场发生器（6）的衬底（8）的表面（7）上的发射器结构（9）构成，并且 基板（8），其形成为位于真空空间（2）和位于真空空间（2）外侧的大气空间（10）之间的分离壁，所述空间（2）位于离开发射器结构的基板（8）的侧面（14） 9）。

公开(公告)号：US20120091359A1

公开(公告)日：2012-04-19

申请号：US12910240

申请日：2010-10-22

Applicant: Stefan LANIO ,  Jürgen FROSIEN

Inventor： Stefan LANIO ,  Jürgen FROSIEN

IPC: H01J3/14

CPC classification number: H01J37/063 ,  H01J37/06 ,  H01J37/08 ,  H01J37/09 ,  H01J37/16 ,  H01J2237/06375

Abstract: An emitter assembly for emitting a charged particle beam along an optical axis is described. The emitter assembly being housed in a gun chamber and includes an emitter having an emitter tip, wherein the emitter tip is positioned at a first plane perpendicular to the optical axis and wherein the emitter is configured to be biased to a first potential, an extractor having an opening, wherein the opening is positioned at a second plane perpendicular to the optical axis and wherein the extractor is configured to be biased to a second potential, wherein the second plane has a first distance from the first plane of 2.25 mm and above.

Abstract translation: 描述了用于沿光轴发射带电粒子束的发射器组件。 发射器组件被容纳在枪室中并且包括具有发射极尖端的发射器，其中发射极尖端位于垂直于光轴的第一平面处，并且其中发射器被配置为偏置到第一电位，提取器具有 开口，其中所述开口定位在垂直于所述光轴的第二平面处，并且其中所述提取器构造成被偏置到第二电位，其中所述第二平面具有距离所述第一平面2.25mm及以上的第一距离。