公开(公告)号：US11929232B2

公开(公告)日：2024-03-12

申请号：US17026044

申请日：2020-09-18

Applicant: ASML Netherlands B.V.

Inventor： Frank Nan Zhang ,  Zhongwei Chen ,  Yixiang Wang ,  Ying Crystal Shen

IPC: H01J37/26 ,  H01J37/04 ,  H01J37/28

CPC classification number: H01J37/265 ,  H01J37/045 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/0048 ,  H01J2237/0453 ,  H01J2237/0455 ,  H01J2237/0458 ,  H01J2237/049 ,  H01J2237/28 ,  H01J2237/2817

Abstract: Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.

公开(公告)号：US20170309447A1

公开(公告)日：2017-10-26

申请号：US15495874

申请日：2017-04-24

Applicant: Arturo Ponce-Pedraza ,  Miguel Jose Yacaman ,  John Eder Sanchez

Inventor： Arturo Ponce-Pedraza ,  Miguel Jose Yacaman ,  John Eder Sanchez

IPC: H01J37/26 ,  G01R33/07 ,  H01J37/141 ,  H01J37/20

CPC classification number: H01J37/266 ,  G01R33/07 ,  H01J37/141 ,  H01J37/20 ,  H01J2237/262

Abstract: In some embodiments, a system for measuring magnetic fields produced within a microscope comprising an electromagnetic lens includes a sensor support element configured to be mounted to a distal end of an elongated support member that is configured to be inserted into the microscope, and a magnetic field sensor supported by the sensor support element, the magnetic field sensor being configured to sense magnetic fields at a position within the electron microscope at which specimens are imaged during operation of the microscope.

公开(公告)号：US20130009057A1

公开(公告)日：2013-01-10

申请号：US13580288

申请日：2011-02-09

Applicant: Toshiyuki Yokosuka ,  Minoru Yamazaki ,  Hideyuki Kazumi ,  Kazutami Tago

Inventor： Toshiyuki Yokosuka ,  Minoru Yamazaki ,  Hideyuki Kazumi ,  Kazutami Tago

IPC: H01J37/29

CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J37/266 ,  H01J37/268 ,  H01J2237/0048 ,  H01J2237/24564 ,  H01J2237/2594

Abstract: The present invention has for its object to provide a charged particle beam irradiation method and a charged particle beam apparatus which can suppress unevenness of electrification even when a plurality of different kinds of materials are contained in a pre-dosing area or degrees of density of patterns inside the pre-dosing area differs with positions.To accomplish the above object, a charged particle beam irradiation method and a charged particle beam apparatus are provided according to which the pre-dosing area is divided into a plurality of divisional areas and electrifications are deposited to the plural divisional areas by using a beam under different beam irradiation conditions. With the above construction, the electrifications can be deposited to the pre-dosing area on the basis of such an irradiation condition that the differences in electrification at individual positions inside the pre-dosing area can be suppressed and consequently, an influence an electric field has upon the charged particle beam and electrons given off from the sample can be suppressed.

Abstract translation: 本发明的目的是提供一种带电粒子束照射方法和带电粒子束装置，其即使在预给料区域中包含多种不同种类的材料或图案密度程度时也能抑制通电不均匀性 预给药区域内的位置与位置不同。 为了实现上述目的，提供一种带电粒子束照射方法和带电粒子束装置，根据该装置，预给料区域被分成多个分区，并且通过使用下面的束将电气沉积到多个分区域 不同的束照射条件。 通过上述结构，可以基于这样一种照射条件将电气沉积到预给料区域，即可以抑制预给料区域内各个位置的通电差异，从而影响电场 可以抑制带电粒子束和从样品发出的电子。

公开(公告)号：US20080210868A1

公开(公告)日：2008-09-04

申请号：US12010702

申请日：2008-01-29

Applicant: Teruo Kohashi ,  Takashi Ohshima ,  Takao Matsumoto ,  Hirokazu Nishida

Inventor： Teruo Kohashi ,  Takashi Ohshima ,  Takao Matsumoto ,  Hirokazu Nishida

IPC: G01N23/00

CPC classification number: H01J37/266 ,  H01J37/265 ,  H01J2237/06383 ,  H01J2237/1514 ,  H01J2237/24557 ,  H01J2237/2588 ,  H01J2237/2614

Abstract: Chirality distribution in the molecular structure of protein or the like and magnetic domain structure are analyzed with high resolution less than 10 nm. A transmission electron microscope equipped with a spin-polarized electron source is used for holography observation. The phase of transmission spin-polarized electrons changes due to the existence of chirality structure or magnetization in a sample, which is observed as an interference pattern phase shift in holography measurement.

Abstract translation: 蛋白质等分子结构中的手性分布和磁畴结构以高分辨率小于10nm进行分析。 配备有自旋极化电子源的透射电子显微镜用于全息观察。 透射自旋极化电子的相位由于样品中手性结构或磁化的存在而改变，在全息测量中被观察为干涉图案相移。

公开(公告)号：US07375538B2

公开(公告)日：2008-05-20

申请号：US11166231

申请日：2005-06-27

Applicant: Mari Nozoe

Inventor： Mari Nozoe

IPC: G01R31/305

CPC classification number: H01J37/222 ,  G01R31/307 ,  H01J37/256 ,  H01J37/263 ,  H01J37/265 ,  H01J37/266 ,  H01J2237/043 ,  H01J2237/24564 ,  H01J2237/2594 ,  H01J2237/2813 ,  H01J2237/2817 ,  H01J2237/304

Abstract: Electron beam is irradiated to a wafer in the midst of steps at predetermined intervals by a plurality of times under a condition in which a junction becomes rearward bias and a difference in characteristic of a time period of alleviating charge in the rearward bias is monitored. As a result, charge is alleviated at a location where junction leakage is caused in a time period shorter than that of a normal portion and therefore, a potential difference is produced between the normal portion and a failed portion and is observed in a potential contrast image as a difference in brightness. By consecutively repeating operation of acquiring the image, executing an image processing in real time and storing a position and brightness of the failed portion, the automatic inspection of a designated region can be executed. Information of image, brightness and distribution of the failed portion is preserved and outputted automatically after inspection.

Abstract translation: 电子束在连接点成为向后偏置的状态下以预定间隔在步骤中照射到晶片，并且监视在向后偏置中减轻电荷的时间段的特性差。 结果，在比正常部分短的时间段内产生结漏电的位置处的电荷被减轻，因此在正常部分和失效部分之间产生电位差，并且在潜在对比图像中观察到电荷 作为亮度的差异。 通过连续重复获取图像的操作，实时执行图像处理并存储失败部分的位置和亮度，可以执行指定区域的自动检查。 故障部分的图像，亮度和分布信息在检查后自动保存并输出。

公开(公告)号：US20070235644A1

公开(公告)日：2007-10-11

申请号：US11806573

申请日：2007-06-01

Applicant: Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hiroshi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

Inventor： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hiroshi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

IPC: G01N23/00

CPC classification number: H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

Abstract translation: 电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

公开(公告)号：US4982091A

公开(公告)日：1991-01-01

申请号：US130716

申请日：1987-12-09

Applicant: Simon C. J. Garth ,  John N. Sackett ,  Denis F. Spicer

Inventor： Simon C. J. Garth ,  John N. Sackett ,  Denis F. Spicer

IPC: H01J37/05 ,  H01J37/14 ,  H01J37/26

CPC classification number: H01J37/14 ,  H01J37/05 ,  H01J37/266

Abstract: Electron beam apparatus for use in testing integrated circuits uses a magnetic electron objective lens having a first end adjacent the circuit under test and a second end remote from the circuit. The magnetic field of the lens increases steeply to a maximum near the first end and falls gradually towards the second end. Secondary electrons emitted from the circuit are accelerated strongly by an electrostatic field into the first end of the lens and are retarded abruptly to speeds of the same order as their emission speeds in the region of maximum magnetic field. Further gradual retardation of the electrons takes place so that the electrons approach the second end of the lens parallel to the axis of the lens at substantially their emission speeds. A filter grid located at the second end of the lens and a collector of electrons passing through the filter grid enable the emission speeds of the secondary electrons to be measured.

Abstract translation: 用于测试集成电路的电子束装置使用具有与被测电路相邻的第一端和远离电路的第二端的磁性电子物镜。 透镜的磁场在第一端附近急剧增加到最大值，并逐渐向第二端逐渐下降。 从电路发射的二次电子被静电场强烈加速到透镜的第一端，并且突然延迟到与其在最大磁场区域的发射速度相同的速度。 发生电子的进一步的逐渐延迟，使得电子基本上以其发射速度接近平行于透镜的轴的透镜的第二端。 位于透镜第二端处的滤光器栅格和通过滤光栅的电子收集器能够测量二次电子的发射速度。

公开(公告)号：US4686466A

公开(公告)日：1987-08-11

申请号：US705983

申请日：1985-02-27

Applicant: Hans-Peter Feuerbaum ,  Peter Fazekas

Inventor： Hans-Peter Feuerbaum ,  Peter Fazekas

IPC: H01J37/28 ,  G01R31/305 ,  G01T1/28 ,  H01J37/26 ,  G01R31/00

CPC classification number: G01R31/305 ,  H01J37/266

Abstract: A method for setting voltage resolution in particle beam measuring devices wherein band width of a measured signal processing is modified. In order to set a desired voltage resolution simply, reliably, and with high precision, a signal noise of the measured signal is measured. This signal noise is compared to a desired value for the measured signal resolution, and the band width of the measured signal processing is modified such that the signal noise of the measured signal is less than or equal to the desired value for the measured signal resolution.

Abstract translation: 一种用于设置测量信号处理的带宽被修改的粒子束测量装置中的电压分辨率的方法。 为了简单，可靠地且高精度地设置所需的电压分辨率，测量测量信号的信号噪声。 将该信号噪声与测量信号分辨率的期望值进行比较，并且修改测量信号处理的带宽，使得测量信号的信号噪声小于或等于测量信号分辨率的期望值。

公开(公告)号：US4587425A

公开(公告)日：1986-05-06

申请号：US595569

申请日：1984-03-06

Applicant: Graham S. Plows

Inventor： Graham S. Plows

IPC: G01N23/225 ,  G01Q30/02 ,  H01J37/05 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01J49/48

CPC classification number: H01J37/244 ,  H01J37/05 ,  H01J37/266 ,  H01J2237/2443 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/24507 ,  H01J2237/24585

Abstract: Electron beam apparatus includes a voltage measuring electron collector including solid electrodes with central apertures. The electrodes comprise a corrector electrode (63) maintained at zero volts, an extractor electrode (15) at about 5 kilovolts positive, a filter electrode (16) which has an internally tapered tubular central part (67), a mirror electrode (64) and a scintillator (17) in the annular space between the mirror electrode and the filter electrode.

Abstract translation: PCT No.PCT / GB83 / 00174 Sec。 371日期1984年3月6日 102（e）日期1984年3月6日PCT提交1983年7月15日PCT公布。 公开号WO84 / 00443 日期：1984年2月2日。电子束装置包括电压测量电子收集器，其包括具有中心孔的固体电极。 电极包括保持在零伏特的校正器电极（63），大约5千伏正的提取器电极（15），具有内锥形管状中心部分（67）的过滤电极（16），镜电极（64） 以及在镜电极和滤光片电极之间的环形空间中的闪烁体（17）。

公开(公告)号：US3247495A

公开(公告)日：1966-04-19

申请号：US14205861

申请日：1961-10-02

Applicant: LAB FOR ELECTRONICS INC

Inventor： FULLER HARRISON W

IPC: G11B11/115 ,  H01J37/26

CPC classification number: G11B11/115 ,  H01J37/266