公开(公告)号：US20030195107A1

公开(公告)日：2003-10-16

申请号：US10317068

申请日：2002-12-12

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Noriaki Shimodaira ,  Akio Masui ,  Shuhei Yoshizawa

IPC: C03C010/16 ,  C03C003/112

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C23/002 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57 ,  Y10S65/16 ,  Y10S501/90 ,  Y10S501/905

Abstract: A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cmnull1 (I2250) to the scattering peak intensity of 800 cmnull1 (I800), i.e. I2250/I800, of at most 1null10null4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2null10null3 cmnull1.

Abstract translation: 一种用于光学用的合成石英玻璃，其用于通过在含有氟的紫外线区域至真空紫外线区域的范围内的光照射而使用，该散射峰强度比例为2250cm <上标> -1 >（I <下标> 2250 ）到800 cm <上标> -1>（I <下标> 800 ）的散射峰强度，即I <下标> 2250 / I 在激光拉曼光谱中，最多为1×10 <上标> -4>的<下标> 800 ，其吸光系数为245nm，最多为2×10 <上标> -3> cm -1>。

公开(公告)号：US20030131626A1

公开(公告)日：2003-07-17

申请号：US10262395

申请日：2002-10-01

Applicant: Schott Glas

Inventor： Lars Ortmann ,  Matthias Schmidt ,  Gordon von der Gonna ,  Rolf Martin

IPC: C03B019/06

CPC classification number: C03B19/1423 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/36 ,  C03B2207/60 ,  C03B2207/70

Abstract: For improving the refractive index homogeneity of quartz glass bodies, at least one burner is disposed movably in a melting device with respect to the quartz glass object which is to be produced. The burner has three essentially concentrically disposed groups of nozzles for metering the raw material, supplying the hydrogen and supplying the oxygen. Corresponding to the changes in the distribution of OH and H2 between the center and the edge of the quartz glass object, the volumes of hydrogen and/or oxygen of the burner gases flowing change as a function of the burner position with respect to the quartz glass object in order to bury the mixing ratio in the burner gas.

Abstract translation: 为了提高石英玻璃体的折射率均匀性，至少一个燃烧器相对于待生产的石英玻璃物体可移动地设置在熔化装置中。 燃烧器具有三个基本上同心设置的喷嘴组，用于计量原料，供应氢气和供应氧气。 对应于石英玻璃物体的中心和边缘之间的OH和H2的分布变化，燃烧器气体的氢气和/或氧气的体积相对于石英玻璃作为燃烧器位置的函数而变化 以便将燃烧器气体中的混合比掩埋。

公开(公告)号：US06564585B2

公开(公告)日：2003-05-20

申请号：US09851126

申请日：2001-05-09

Applicant: Jun Abe ,  Seiki Ejima ,  Akira J. Ikushima ,  Takumi Fujiwara

Inventor： Jun Abe ,  Seiki Ejima ,  Akira J. Ikushima ,  Takumi Fujiwara

IPC: C03C2100

CPC classification number: C03C23/009 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/31 ,  C03B2203/26 ,  C03C3/06 ,  C03C23/002 ,  C03C23/007 ,  C03C23/0095 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/31 ,  C03C2203/54 ,  G02F1/3555 ,  G02F1/3558

Abstract: There is disclosed second-order nonlinear glass material wherein a part having second-order nonlinearity contains Ge, H and OH and has second-order nonlinear optical constant d of 1 pm/V or more, and a method for producing second-order nonlinear glass material comprising treating a porous glass material containing Ge with hydrogen, sintering it and subjecting it to a ultraviolet poling treatment. There can be provided second-order nonlinear glass material having second-order nonlinearity which is a sufficiently high and has a sufficiently long lifetime for a practical purpose, in use of the glass material for optical functional elements or the like.

Abstract translation: 公开了二阶非线性玻璃材料，其中具有二阶非线性的部分包含Ge，H和OH，并且具有1pm / V以上的二次非线性光学常数d，以及二阶非线性玻璃的制造方法 包括用氢处理含有Ge的多孔玻璃材料，烧结并对其进行紫外线处理。 在使用光学功能元件等的玻璃材料时，可以提供具有二次非线性的二阶非线性玻璃材料，该二次非线性度足够高并且在实际应用中具有足够长的使用寿命。

公开(公告)号：US06518210B1

公开(公告)日：2003-02-11

申请号：US09593441

申请日：2000-06-14

Applicant: Hiroki Jinbo ,  Norio Komine ,  Hiroyuki Hiraiwa

Inventor： Hiroki Jinbo ,  Norio Komine ,  Hiroyuki Hiraiwa

IPC: C03C306

CPC classification number: G03F7/70958 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/44 ,  C03C2203/52 ,  G03F7/70241 ,  Y02P40/57

Abstract: A silica glass has a structure determination temperature of 1200 K or lower and an OH group concentration of at least 1,000 ppm. The silica glass is used for photolithography together with light in a wavelength region of 400 nm or shorter.

Abstract translation: 石英玻璃的结构测定温度为1200K以下，OH基浓度为1,000ppm以上。 石英玻璃与波长400nm以下的光一起用于光刻。

公开(公告)号：US20020061810A1

公开(公告)日：2002-05-23

申请号：US09998328

申请日：2001-12-03

Applicant: Sumitomo Electric Industries, Ltd.

Inventor： Akira Urano ,  Toshio Danzuka ,  Tatsuhiko Saito ,  Yasuhiko Shishido ,  Masaharu Mogi ,  Michihisa Kyoto

IPC: C03C013/04 ,  C03C003/06

CPC classification number: G02B6/102 ,  C03B19/1453 ,  C03B32/00 ,  C03B37/01446 ,  C03B37/14 ,  C03B37/15 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0085 ,  C03C13/045 ,  C03C23/002 ,  C03C23/0025 ,  C03C23/003 ,  C03C23/0035 ,  C03C23/0095 ,  C03C25/6208 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/50 ,  G02B6/02 ,  Y02P40/57 ,  Y10S501/905

Abstract: A process of manufacturing a silica glass article comprising the steps of: (1) irradiating a silica glass article with electromagnetic waves to generate defects therein; and (2) immersing the thus irradiated silica glass article in an atmosphere comprising a hydrogen gas, thereby providing the resulting silica glass article with a characteristic that is effective for preventing it substantially from increasing its absorption within an ultraviolet region due to ultraviolet ray irradiation. Also disclosed are a silica glass article or a glass fiber produced according to the manufacturing process.

Abstract translation: 一种制造石英玻璃制品的方法，包括以下步骤：（1）用电磁波照射石英玻璃制品以在其中产生缺陷; 和（2）将这样照射的二氧化硅玻璃制品浸入包括氢气的气氛中，从而使得到的石英玻璃制品具有有效地防止紫外线辐射在紫外线区域内大幅吸收的特征。 还公开了根据制造方法制造的石英玻璃制品或玻璃纤维。

公开(公告)号：US06376401B1

公开(公告)日：2002-04-23

申请号：US09387773

申请日：1999-09-01

Applicant: Shinichi Kondo ,  Takayuki Nakamura ,  Kazuhiko Fukuda ,  Naoyoshi Kamisugi ,  Nobu Kuzuu ,  Yoshinao Ihara ,  Hidetoshi Wakamatsu

Inventor： Shinichi Kondo ,  Takayuki Nakamura ,  Kazuhiko Fukuda ,  Naoyoshi Kamisugi ,  Nobu Kuzuu ,  Yoshinao Ihara ,  Hidetoshi Wakamatsu

IPC: C03B2000

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/02 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/23 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2203/44

Abstract: A synthetic silica glass having a high transmittance for vacuum ultraviolet rays, for example F2 excimer laser beam with a wavelength of 157 nm, a high uniformity and a high durability and useful for ultraviolet ray-transparent optical glass materials is produced from a high-purity silicon compound, for example silicon tetrachloride, by heat treating an accumulated porous silica material at a temperature not high enough to convert the porous silica material to a transparent silica glass in an inert gas atmosphere for a time sufficient to cause the OH groups to be condensed and removed from the glass, and exhibits substantially no content of impurities other than OH group a difference between highest and lowest fictional temperatures of 50° C. or less and a transmittance of 157 nm ultraviolet rays through a 10 mm optical path of 60% or more, and optically a OH group content of 1 to 70 ppm, a Cl content less than 1 ppm, a total content of impurity metals of 50 ppb or less, a content of each individual impurity metal less than 10 ppb, and an ultraviolet ray-transmittance at 172 to 200 nm of 40% or more even after the glass is exposed to an irradiation of ultraviolet rays at 160 to 300 nm for one hour.

Abstract translation: 对于真空紫外线具有高透射率的合成二氧化硅玻璃，例如波长为157nm的F2准分子激光束，高均匀性和高耐久性并且可用于紫外线透明光学玻璃材料由高纯度 硅化合物，例如四氯化硅，通过在不足够高的温度下热处理积聚的多孔二氧化硅材料，以在惰性气体气氛中将多孔二氧化硅材料转化为透明的石英玻璃足以使OH基团冷凝的时间 并且从玻璃中除去，并且基本上不含OH基团中的杂质含量，最高和最低虚构温度之间的差别为50℃或更低，通过10mm光路的157nm紫外线的透射率为60％或 更多地，光学地含有1至70ppm的OH基含量，小于1ppm的Cl含量，50ppb以下的杂质金属的总含量， 即使玻璃暴露于160〜300nm的紫外线照射1小时，每一种杂质金属小于10ppb，而在172〜200nm的紫外线透射率为40％以上。

公开(公告)号：US6143676A

公开(公告)日：2000-11-07

申请号：US214894

申请日：1999-01-14

Applicant: Norio Ohashi ,  Michiyo Kuriyama ,  Shigeru Yamagata ,  Shigemasa Sunada

Inventor： Norio Ohashi ,  Michiyo Kuriyama ,  Shigeru Yamagata ,  Shigemasa Sunada

IPC: C03B19/14 ,  C03B23/047 ,  C03B32/00 ,  C03C3/06 ,  C03B9/10 ,  G02B1/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B23/047 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/32 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/52

Abstract: An object of the present invention is to provide a synthetic silica glass optical material which exhibits excellent transmittance as well as durability for high output power vacuum ultraviolet rays, being emitted from, for example, ArF excimer lasers and Xe.sub.2 excimer lamps, and to provide a method for producing the same. A synthetic silica glass optical material for high output power vacuum ultraviolet rays made from ultra high purity synthetic silica glass for use in the wavelength region of from 165 to 195 nm, containing OH groups at a concentration of from 5 to 300 wtppm with a fluctuation width in OH group concentration (.DELTA.OH/cm) of 10 wtppm or less, containing hydrogen molecules at a concentration of from 1.times.10.sup.17 to 1.times.10.sup.19 molecule/cm.sup.3 with a fluctuation width in hydrogen molecule concentration (.DELTA.H.sub.2 /cm) of 1.times.10.sup.17 molecule/cm.sup.3 or lower, and containing chlorine at a concentration of 50 wtppm or lower. Also claimed is a method for producing the same.

Abstract translation: PCT No.PCT / EP98 / 02965 Sec。 371日期1999年1月14日第 102（e）日期1999年1月14日PCT提交1998年5月20日PCT公布。 第WO98 / 52879号公报 日期：1998年11月26日本发明的目的是提供一种合成石英玻璃光学材料，其表现出优异的透射率以及从例如ArF准分子激光器和Xe2准分子灯发射的高输出功率真空紫外线的耐久性 并提供其制造方法。 一种用于高浓度合成石英玻璃的高输出功率真空紫外线的合成二氧化硅玻璃光学材料，用于波长范围为165至195nm的OH基，其浓度为5至300重量ppm，具有波动宽度 OH分子浓度（DELTA OH / cm）为10重量ppm以下，含有浓度为1×10 17〜1×10 19分子/ cm 3的氢分子，氢分子浓度的波动宽度（DELTA H2 / cm）为1×10 17分子/ cm 3， 较低，含有浓度为50重量ppm以下的氯。 还要求保护其的方法。

公开(公告)号：US5141786A

公开(公告)日：1992-08-25

申请号：US485954

申请日：1990-02-27

Applicant: Takaaki Shimizu ,  Masatoshi Takita

Inventor： Takaaki Shimizu ,  Masatoshi Takita

IPC: C03B8/02 ,  C03B19/06 ,  C03B19/10 ,  C03B19/12 ,  C03C1/00 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B19/1065 ,  C03B19/12 ,  C03B20/00 ,  C03C1/006 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/23 ,  C03C2201/23 ,  C03C2203/26 ,  Y10S65/90 ,  Y10T428/131 ,  Y10T428/1314

Abstract: A synthetic silica glass article made by hydrolyzing an alkoxysilane and thermally sintering the resulting silica; this synthetic silica glass article has a viscosity of not lower than 10.sup.10 poise at 140.degree. C., and contains, as metallic impurities, less than 1 ppm at Al, less than 0.2 ppm of Fe, less than 0.2 ppm of Na, less than 0.2 ppm of K, less than 0.01 ppm of Li, less than 0.2 ppm of Ca, less than 0.02 ppm of Ti, less than 0.01 ppm of B, less than 0.01 of P, less than 0.01 ppm of As.

公开(公告)号：US5086352A

公开(公告)日：1992-02-04

申请号：US535205

申请日：1990-06-08

Applicant: Shigeru Yamagata ,  Kyoichi Inaki ,  Toshikatu Matsuya ,  Ralf Takke ,  Stephan Thomas ,  Heinz Fabian

Inventor： Shigeru Yamagata ,  Kyoichi Inaki ,  Toshikatu Matsuya ,  Ralf Takke ,  Stephan Thomas ,  Heinz Fabian

IPC: C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  C03C23/00 ,  G02B1/00 ,  G03F7/20

CPC classification number: G03F7/70241 ,  C03B19/1423 ,  C03B19/1453 ,  C03B32/00 ,  C03C23/007 ,  C03C3/06 ,  G02B1/00 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/08 ,  C03B2207/12 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/42 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/54 ,  Y02P40/57 ,  Y10S65/90

Abstract: The invention relates to lenses, prisms or other optical members which are subjected to high-power ultraviolet light having a wavelength of about 360 nm or less, or ionizing radiation, particularly optical members for use in laser exposure apparatus for lithography, and to blanks for such optical members. The homogeneity of the refractive index distribution and the resistance to optical deterioration when the optical members are exposed for a long period of time to short wavelength ultraviolet light from a laser beam are improved. The optical members are made of high-purity synthetic silica glass material containing at least about 50 wt. ppm of OH groups, and are doped with hydrogen. The refractive index distribution caused by the fictive temperature distribution during heat treatment in the process of producing high-purity silica glass blanks for optical members in accordance with the present invention is offset by the combined refractive index distribution determined by the OH group concentration distribution or by the OH group concentration distribution and the Cl concentration distribution in the glass.

Abstract translation: 本发明涉及经受大约360nm或更小的波长的大功率紫外光的透镜，棱镜或其它光学构件，或者电离辐射，特别是用于光刻的激光曝光装置的光学构件，以及用于 这种光学构件。 当光学元件长时间暴露于来自激光束的短波长紫外光时，折射率分布的均匀性和光学劣化的抵抗性得到改善。 光学构件由含有至少约50重量％的高纯度合成石英玻璃材料制成。 ppm的OH基团，并掺杂氢气。 在根据本发明的用于制造用于光学部件的高纯度二氧化硅玻璃毛坯的过程中由热处理期间的假想温度分布引起的折射率分布由由OH基浓度分布或由OH基浓度分布确定的组合折射率分布或由 玻璃中的OH基浓度分布和Cl浓度分布。

公开(公告)号：US09487426B2

公开(公告)日：2016-11-08

申请号：US14621732

申请日：2015-02-13

Applicant: Shin-Etsu Chemical Co., Ltd.

Inventor： Hisashi Yagi ,  Masaki Takeuchi ,  Daijitsu Harada

IPC: C03B25/02 ,  C03B19/14 ,  C03B32/00

CPC classification number: C03B25/02 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/23

Abstract: A method for heat treating a synthetic quartz glass having a hydroxyl concentration with a maximum/minimum difference (ΔOH) of less than 350 ppm involves the steps of first heat treatment of holding at 1,150-1,060° C. for a time of 0.5-10 hours, cooling down to a second heat treatment temperature at a rate of −7° C./hr to −30° C./hr, second heat treatment of holding at 1,030-950° C. for a time of 5-20 hours, and annealing at a rate of −25° C./hr to −85° C./hr. Two stages of heat treatment ensures that the glass has a low birefringence.

Abstract translation: 用于热处理具有最小/最小差（ΔOH）小于350ppm的羟基浓度的合成石英玻璃的方法包括以下步骤：首先热处理在1,150-160℃下保持0.5-10分钟 小时，以-7℃/小时至-30℃/小时的速率冷却至第二热处理温度，第二次热处理在1030-950℃保持5-20小时 ，并以-25℃/小时至-85℃/小时的速率退火。 两个阶段的热处理确保玻璃具有低双折射率。