公开(公告)号：US07749930B2

公开(公告)日：2010-07-06

申请号：US11630405

申请日：2006-03-30

Applicant: Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

Inventor： Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

IPC: C03C3/06 ,  C03C3/04 ,  C03C15/00 ,  C03B19/00 ,  C03B21/00 ,  C03B32/00 ,  C03B25/00

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/09 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/24 ,  C03B2201/32 ,  C03C15/00 ,  C03C19/00 ,  C03C23/0025 ,  C03C23/006 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2203/54 ,  C30B25/12 ,  C30B31/14 ,  C30B35/00 ,  Y02P40/57

Abstract: An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.

Abstract translation: 用于具有蚀刻效果的环境中的晶片夹具的理想石英玻璃的特征在于高纯度和高耐干蚀刻性。 为了表明基本满足这些要求的石英玻璃，根据本发明提出，石英玻璃至少在近表面积中掺杂氮，其平均含量小于30重量ppm， 其虚拟温度低于1250℃，在1200℃的温度下其粘度至少为1013dPa·s。制备这种石英玻璃的经济方法包括以下方法步骤：将SiO 2原料熔化得到 将石英玻璃坯料，SiO 2原料或石英玻璃坯料进行脱水处理，将SiO2原料或石英玻璃坯料加热至1050℃〜1850℃的氮化温度， 含有氨的气氛，将石英玻璃坯料的石英玻璃设定为1250℃以下的假想温度的温度处理，以及格式化的石英玻璃坯料的表面处理 在石英玻璃夹具上。

公开(公告)号：US20080053151A1

公开(公告)日：2008-03-06

申请号：US11897406

申请日：2007-08-30

Applicant: Tatsuhiro Sato

Inventor： Tatsuhiro Sato

IPC: C03B19/00 ,  C03C3/078 ,  C03C3/095 ,  C03C3/112

CPC classification number: C03C1/00 ,  C03B19/063 ,  C03B32/005 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/24 ,  C03B2201/36 ,  C03C3/06 ,  C03C3/112 ,  C03C4/20 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/3411 ,  C03C2201/3435 ,  C03C2201/36

Abstract: A mixed quartz powder contains quartz powder and two or more types of doping element in an amount of from 0.1 to 20 mass %. The aforementioned doped elements include a first dope element selected from the group consisting of N, C and F, and a second dope element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, the lanthanides and the actinides. The “quartz powder” is a powder of crystalline quartz or it is a powder of glassy SiO2 particles. It is made form natural occurring quartz or it is fabricated synthetically. The “quartz powder” may be doped. The compounding ratio of the total amount (M1) of the aforementioned first elements and the total amount (M2) of the aforementioned second elements as the ratio of the number of atoms (M1)/(M2) is preferably from 0.1 to 20. Al as well as the aforementioned doped elements is preferably included in a mixed quartz powder of this invention.

Abstract translation: 混合石英粉含有0.1〜20质量％的石英粉和2种以上的掺杂元素。 上述掺杂元素包括选自N，C和F的第一掺杂元素和选自Mg，Ca，Sr，Ba，Sc，Y，Ti，Zr，Hf的第二掺杂元素， 镧系元素和锕系元素。 “石英粉”是结晶石英的粉末，或是玻璃状SiO 2颗粒的粉末。 它由天然石英制成，或者由合成制成。 可以掺杂“石英粉”。 上述第一元素的总量（M1）与上述第二元素的总量（M2）的配位比优选为0.1〜20。作为原子数（M1）/（M2）的比例，优选为0.1〜20。 以及上述掺杂元素优选包括在本发明的混合石英粉末中。

公开(公告)号：US06449420B1

公开(公告)日：2002-09-10

申请号：US10068968

申请日：2002-02-07

Applicant: Ikerionwu Asiegbu Akwani ,  Robert Alan Bellman ,  Thomas Paul Grandi ,  Paul Arthur Sachenik

Inventor： Ikerionwu Asiegbu Akwani ,  Robert Alan Bellman ,  Thomas Paul Grandi ,  Paul Arthur Sachenik

IPC: G02B600

CPC classification number: C01B21/0821 ,  C01P2006/32 ,  C01P2006/60 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/24 ,  C03B2201/31 ,  C03C3/045 ,  C03C3/111 ,  C03C2201/24 ,  C03C2201/31 ,  Y10T428/265

Abstract: A composition represented by the formula Si1−xGexO2(1−y)N1.33y, wherein x is from about 0.05 to about 0.6 and y is from about 0.14 to about 0.74 exhibits properties highly suited for use in fabricating waveguides for liquid crystal based optical devices. In particular, the compositions have an index of refraction of from about 1.6 to about 1.8 for light at a wavelength of 1550 nm, and/or a coefficient of thermal expansion of from about 2.5×10−6°C−1 to about 5.0×10−6° C.−1. The compositions also have inherently low hydrogen content, and a high hydrogen permeability which allows better hydrogen removal by thermal annealing to provide a material which exhibits low optical losses and better etching properties than alternative materials.

Abstract translation: 由式Si1-xGexO2（1-y）N1.33y表示的组合物，其中x为约0.05至约0.6，y为约0.14至约0.74，表现出非常适合用于制造液晶基光学波导的性能 设备。 特别地，组合物对于波长1550nm的光具有约1.6至约1.8的折射率，和/或约2.5×10-6℃-1至约5.0×10-3的热膨胀系数， 6℃-1。 组合物还具有固有的低氢含量和高的氢渗透性，其允许通过热退火更好的氢去除以提供与替代材料相比表现出低的光损耗和更好的蚀刻性能的材料。

公开(公告)号：US20020078709A1

公开(公告)日：2002-06-27

申请号：US09942779

申请日：2001-08-31

Applicant: TOSOH CORPORATION

Inventor： Hiroya Nagata ,  Masayuki Kudo ,  Koji Tsukuma ,  Yoshikazu Kikuchi ,  Tomoyuki Akiyama

IPC: C03B019/00

CPC classification number: C03C3/06 ,  C03B19/09 ,  C03C11/007 ,  C03C2201/24 ,  C03C2201/80 ,  C03C2203/10 ,  Y10S65/08 ,  Y10T428/1317 ,  Y10T428/249969

Abstract: An opaque silica glass article comprising a transparent portion and an opaque portion, wherein the opaque portion has an apparent density of 1.70-2.15 g/cm3 and contains 5null104-5null106 bubbles per cm3, said bubbles having an average diameter of 10-100 nullm; and the transparent portion has an apparent density of 2.19-2.21 g/cm3 and the amount of bubbles having a diameter of at least 100 nullm in the transparent portion is not more than 1null103 per cm3. The opaque silica glass article is made by a process wherein a mold is charged with a raw material for forming the opaque portion, which is a mixture comprising a silica powder with a small amount of a silicon nitride powder, and a raw material for forming the transparent portion so that the two raw materials are located in the positions corresponding to the opaque and the transparent portions, respectively, of the silica glass article to be produced; and the raw materials are heated in vacuo to be thereby vitrified.

Abstract translation: 一种不透明的玻璃制品，包括透明部分和不透明部分，其中不透明部分的表观密度为1.70-2.15g / cm 3，并且每立方厘米含有5×10 4〜5×10 6个气泡，所述气泡的平均直径为10〜100μm; 并且透明部分的表观密度为2.19-2.21g / cm 3，透明部分中直径至少为100μm的气泡量不超过1×103 / cm3。 不透明的石英玻璃制品通过以下方法制造，其中模具装有用于形成不透明部分的原料，该不透明部分是包含少量氮化硅粉末的二氧化硅粉末的混合物，以及用于形成 透明部分，使得两个原料分别位于与待制造的石英玻璃制品的不透明部分和透明部分相对应的位置; 并将原料真空加热，从而玻璃化。

公开(公告)号：US06405563B1

公开(公告)日：2002-06-18

申请号：US09942779

申请日：2001-08-31

Applicant: Hiroya Nagata ,  Masayuki Kudo ,  Koji Tsukuma ,  Yoshikazu Kikuchi ,  Tomoyuki Akiyama

Inventor： Hiroya Nagata ,  Masayuki Kudo ,  Koji Tsukuma ,  Yoshikazu Kikuchi ,  Tomoyuki Akiyama

IPC: C03B1900

CPC classification number: C03C3/06 ,  C03B19/09 ,  C03C11/007 ,  C03C2201/24 ,  C03C2201/80 ,  C03C2203/10 ,  Y10S65/08 ,  Y10T428/1317 ,  Y10T428/249969

Abstract: An opaque silica glass article comprising a transparent portion and an opaque portion, wherein the opaque portion has an apparent density of 1.70-2.15 g/cm3 and contains 5×104-5×106 bubbles per cm3, said bubbles having an average diameter of 10-100 &mgr;m; and the transparent portion has an apparent density of 2.19-2.21 g/cm3 and the amount of bubbles having a diameter of at least 100 &mgr;m in the transparent portion is not more than 1×103 per cm. The opaque silica glass article is made by a process wherein a mold is charged with a raw material for forming the opaque portion, which is a mixture comprising a silica powder with a small amount of a silicon nitride powder, and a raw material for forming the transparent portion so that the two raw materials are located in the positions corresponding to the opaque and the transparent portions, respectively, of the silica glass article to be produced; and the raw materials are heated in vacuo to be thereby vitrified.

Abstract translation: 一种不透明的玻璃制品，包括透明部分和不透明部分，其中不透明部分的表观密度为1.70-2.15g / cm 3，并且每立方厘米含有5×10 4〜5×10 6个气泡，所述气泡的平均直径为10〜100μm; 并且透明部分的表观密度为2.19-2.21g / cm 3，透明部分中直径至少为100μm的气泡量不超过1×10 3 / cm。 不透明的石英玻璃制品通过以下方法制造，其中模具装有用于形成不透明部分的原料，该不透明部分是包含少量氮化硅粉末的二氧化硅粉末的混合物，以及用于形成 透明部分，使得两个原料分别位于与待制造的石英玻璃制品的不透明部分和透明部分相对应的位置; 并将原料真空加热，从而玻璃化。

公开(公告)号：US06399526B2

公开(公告)日：2002-06-04

申请号：US09871979

申请日：2001-06-04

Applicant: Hiroshi Tomita ,  Tsuneo Ishii ,  Chie Hongo

Inventor： Hiroshi Tomita ,  Tsuneo Ishii ,  Chie Hongo

IPC: C03C306

CPC classification number: C03B32/00 ,  C03B20/00 ,  C03C3/06 ,  C03C23/002 ,  C03C2201/20 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2203/10 ,  C03C2203/50 ,  Y10S501/905

Abstract: A quartz glass which would not become a source for the contamination even if it contains metallic impurities. This quartz glass includes a region where a concentration of E′ center as measured by means of an. electron spin resonance analysis is 3×1019 cm−3 or more. This quartz glass can be manufactured by a method including the steps of forming an initial quartz glass by melting and quenching a raw material for quartz glass, and implanting therein an ion, which is capable of entering into an SiO2 network of the initial quartz glass and substantially incapable of externally diffusing, to increase a concentration of E′ center in at least part of the initial quartz glass. This quartz glass can be manufactured by a method making use of a quartz glass raw material containing 0.01 to 0.1% by weight of-silicon, by a method of irradiating ultraviolet ray to the initial quartz glass, or by a method of giving an abrasion damage to the surface of the initial quartz glass by means of sand blast.

Abstract translation: 即使含有金属杂质，也不会成为污染源的石英玻璃。 该石英玻璃包括通过以下方法测量的E'中心浓度的区域。 电子自旋共振分析为3×10 19 cm -3以上。 该石英玻璃可以通过以下方法制造：包括以下步骤：通过熔融和淬火用于石英玻璃的原料形成初始石英玻璃，并且在其中注入能够进入初始石英玻璃的SiO 2网络的离子，以及 基本上不能进行外部扩散，以增加至少部分初始石英玻璃中的E'中心的浓度。 该石英玻璃可以通过使用含有0.01〜0.1重量％硅的石英玻璃原料的方法，通过向初始石英玻璃照射紫外线的方法或通过给予磨损损伤的方法来制造 通过喷砂处理到初始石英玻璃的表面。