公开(公告)号：US20110268253A1

公开(公告)日：2011-11-03

申请号：US12975135

申请日：2010-12-21

Applicant: Jean-Pierre Brasile

Inventor： Jean-Pierre Brasile

IPC: G21K1/10

CPC classification number: H01J35/08 ,  G21K2201/06 ,  H01J35/28 ,  H01J2235/082 ,  H01J2235/088 ,  H05G2/00

Abstract: A compact device for generating X-rays by scattering includes a means for producing a beam of electrons, which comprises a grid of wires arranged in a useful scattering cone, so that the beam of electrons encounters at least one of the wires of the wire grid.

Abstract translation: 用于通过散射产生X射线的紧凑装置包括用于产生电子束的装置，其包括布置在有用的散射锥体中的电线格栅，使得电子束遇到线栅中的至少一根线 。

公开(公告)号：US20110199600A1

公开(公告)日：2011-08-18

申请号：US13124501

申请日：2009-09-03

Applicant: Wouter Anthon Soer

Inventor： Wouter Anthon Soer

IPC: G03B27/54

CPC classification number: G03F7/70825 ,  G03F7/70175 ,  G21K2201/06

Abstract: A collector assembly includes a first collector mirror for reflecting radiation from a radiation emission point, such as an extreme ultraviolet radiation emission point, to an intermediate focus from where the radiation is used in the lithography apparatus for device manufacture. A second collector mirror, forward of the radiation emission point, collects additional radiation, reflecting it back to a third mirror and from there to the intermediate focus. The mirrors may allow radiation to be collected with high efficiency and without increase in the etendue. The collector assembly may reduce or remove non-uniformity in the collected radiation, for instance arising from obscuration of collected radiation by a laser beam stop used to prevent laser excitation radiation from entering the lithographic apparatus.

Abstract translation: 收集器组件包括用于将来自辐射发射点（例如极紫外辐射发射点）的辐射反射到用于设备制造的光刻设备中的辐射的中间焦点的第一收集器镜。 辐射发射点前方的第二个收集镜收集额外的辐射，将其反射回第三个反射镜并从那里到中间焦点。 反射镜可以允许以高效率收集辐射，而不增加光密度。 收集器组件可以减少或消除收集的辐射中的不均匀性，例如由于用于防止激光激发辐射进入光刻设备的激光束停止而收集的辐射的遮蔽而引起的。

公开(公告)号：US20110158493A1

公开(公告)日：2011-06-30

申请号：US13060112

申请日：2009-10-28

Applicant: Kentaro Nagai ,  Toru Den

Inventor： Kentaro Nagai ,  Toru Den

IPC: G06K9/00

CPC classification number: G06T7/0002 ,  A61B6/4291 ,  A61B6/484 ,  G01J9/02 ,  G01N23/04 ,  G01N23/20075 ,  G01N2223/401 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/067

Abstract: An analysis method for use in a radiation imaging apparatus employing intensity information of interference fringes of radiation rays that have passed through a detected object includes the steps of generating first phase information of the detected object wrapped into a range of 2π from the intensity information of the interference fringes; generating information on an absorption intensity gradient of the detected object from the intensity information of the interference fringes; generating a weighting function on the basis of an absolute value of a gradient in the information on the absorption intensity gradient; and generating second phase information by unwrapping the first phase information by using the weighting function.

Abstract translation: 一种在使用已经通过检测对象的辐射线的干涉条纹的强度信息的放射线成像装置中的分析方法包括以下步骤：产生被检测物体的第一相位信息，包含在2＆amp; 从干涉条纹的强度信息; 根据干涉条纹的强度信息生成关于被检测物体的吸收强度梯度的信息; 基于关于吸收强度梯度的信息中的梯度的绝对值生成加权函数; 以及通过使用所述加权函数展开所述第一相位信息来产生第二相位信息。

公开(公告)号：US07732793B2

公开(公告)日：2010-06-08

申请号：US11705954

申请日：2007-02-13

Applicant: Alexander I. Ershov ,  William F. Marx ,  Norbert Bowering ,  Bjorn A. M. Hansson ,  Oleh Khodykin ,  Igor V. Fomenkov

Inventor： Alexander I. Ershov ,  William F. Marx ,  Norbert Bowering ,  Bjorn A. M. Hansson ,  Oleh Khodykin ,  Igor V. Fomenkov

IPC: C25F1/00

CPC classification number: B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/7085 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

Abstract translation: 公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。 在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。 在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。 在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。 在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

公开(公告)号：US07720197B2

公开(公告)日：2010-05-18

申请号：US12130574

申请日：2008-05-30

Applicant: Licai Jiang

Inventor： Licai Jiang

IPC: G21K1/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: An x-ray optical system for producing high intensity x-ray beams. The system includes an optic with a surface formed by revolving a defined contour around a revolving axis that is different than the geometric symmetric axis of the optic. Accordingly, the system may use a source that has a circular emission profile or a large source to provide increased flux to a sample.

Abstract translation: 一种用于产生高强度X射线束的X射线光学系统。 该系统包括具有通过围绕不同于光学器件的几何对称轴线的旋转轴线旋转限定轮廓而形成的表面的光学元件。 因此，系统可以使用具有圆形发射轮廓或大的源的源来向样品提供增加的通量。

公开(公告)号：US07651270B2

公开(公告)日：2010-01-26

申请号：US11848700

申请日：2007-08-31

Applicant: Bonglea Kim

Inventor： Bonglea Kim

IPC: A61B6/08

CPC classification number: G03F7/7085 ,  G03F7/70008 ,  G21K1/02 ,  G21K2201/06

Abstract: A system for x-ray optical alignment. The system includes an x-ray source, an optic, a collimation element, and alignment sensors. The x-ray source generates an x-ray beam that is directed by the optic at a sample. The collimation element is located between the optic and the sample to define the profile of the x-ray beam. The sensors receive the x-ray beam from the optic and generated signal indicative of the system alignment. The sensors may be located on a surface of the collimation element facing the optic. The inner edge of the sensors may be located at equal intervals radially about the collimation element and may form an aperture having a symmetric shape.

Abstract translation: 一种用于x射线光学对准的系统。 该系统包括X射线源，光学元件，准直元件和对准传感器。 x射线源产生由光学元件在样本处引导的X射线束。 准直元件位于光学元件和样品之间以限定X射线束的轮廓。 传感器从光学器件接收X射线束并产生指示系统对准的信号。 传感器可以位于准直元件面向光学元件的表面上。 传感器的内边缘可以围绕准直元件径向相等的间隔定位并且可以形成具有对称形状的孔。

公开(公告)号：US20100006762A1

公开(公告)日：2010-01-14

申请号：US12565324

申请日：2009-09-23

Applicant: Atsuya Yoshida ,  Hiroshi Horiuchi

Inventor： Atsuya Yoshida ,  Hiroshi Horiuchi

IPC: G01J1/42 ,  G01J1/58

CPC classification number: G01T1/202 ,  C09K11/613 ,  C09K11/7733 ,  G21K4/00 ,  G21K2201/06

Abstract: A reflective resin sheet is bonded to one face of a supporting substrate transmitting a radiation ray and a resin sheet of the same material as that of the reflective resin sheet to the other face of the supporting substrate. A phosphor layer converting a radiation ray into visible light is formed additionally on the reflective resin sheet formed on one face of the supporting substrate. The phosphor layer is enclosed with an additional moisture-proof layer and the reflective resin sheet. It is possible to obtain a scintillator panel higher in sensitivity characteristics, stabilized in quality and more cost-effective by placing the reflective resin sheet between the supporting substrate and the phosphor layer.

Abstract translation: 将反射树脂片粘合到支撑基板的一个面上，该支撑基板将与辐射线和与反射树脂片材相同的材料的树脂片材传送到支撑基板的另一个面。 在形成在支撑基板的一个面上的反射树脂片上另外形成将辐射线转换成可见光的荧光体层。 荧光体层被附加的防潮层和反射树脂片包围。 通过将反射树脂片放置在支撑基板和荧光体层之间，可以获得灵敏度特性更高，质量稳定，成本更高的闪烁体面板。

公开(公告)号：US07511902B2

公开(公告)日：2009-03-31

申请号：US11723554

申请日：2007-03-21

Applicant: Gerd Wings ,  Christian Hoffmann ,  Klaus Wulf ,  Carsten Michaelsen

Inventor： Gerd Wings ,  Christian Hoffmann ,  Klaus Wulf ,  Carsten Michaelsen

IPC: G02B7/02

CPC classification number: G02B7/1824 ,  G21K2201/06

Abstract: A device for adjusting optical elements, in particular, for X-ray analysis, comprising a holding device (2) for receiving the optical element and at least two adjusting units at least one of the two longitudinal ends of the holding device (2), wherein the adjusting units each comprise one plunger (6, 6a, 6b, 6c, 6d), characterized in that each adjusting unit comprises a rotatably disposed adjusting ring (4, 4a, 4b, 4c, 4d) with an eccentric recess, and the optical element is mechanically coupled to the inner surfaces (7) of the adjusting rings (4, 4a, 4b, 4c, 4d) via the plungers (6, 6a, 6b, 6c, 6d). The adjusting device is compact, can be flexibly used and provides simple adjustment of the optical element.

Abstract translation: 一种用于调整光学元件的装置，特别是用于X射线分析的装置，包括用于容纳光学元件的保持装置（2）和保持装置（2）的两个纵向端部中的至少一个的至少两个调节单元， 其中所述调节单元各自包括一个柱塞（6,6a，6b，6c，6d），其特征在于，每个调节单元包括具有偏心凹槽的可旋转地布置的调节环（4,4a，4b，4c，4d），并且 光学元件经由柱塞（6,6a，6b，6c，6d）机械耦合到调节环（4,4a，4b，4c，4d）的内表面（7）。 调节装置紧凑，可灵活使用，并提供光学元件的简单调整。

公开(公告)号：US07505561B1

公开(公告)日：2009-03-17

申请号：US11985649

申请日：2007-11-17

Applicant: Michael Keith Fuller

Inventor： Michael Keith Fuller

IPC: G01N23/201 ,  G01N23/20

CPC classification number: G01N23/223 ,  A61B6/00 ,  A61B6/4092 ,  A61B6/482 ,  A61B6/484 ,  G01N23/04 ,  G01N2223/076 ,  G21K2201/06

Abstract: A system for observing the internal features of an object, such that the object's internal absorption, refraction, reflection and/or scattering properties are visualized, is disclosed. An embodiment may include one or more beams of penetrating radiation, an object with internal features to be imaged, a single or an array of radiation optics, and a detection system for capturing the resultant shadowgraph images. The beam(s) of radiation transmitted through the object typically originate from a line-shaped source(s), which has high spatial purity along the narrow axis, and low spatial purity in the perpendicular, long axis. In the long axis, radiation optic(s) capture and focus diverging rays exiting from the object to form a high resolution image of the object, without which optic(s) the shadowgraph would have blurring in this axis. Such shadowgraph is naturally well defined in the opposite axis of narrow beam origin and can reveal an object's refraction, reflection and/or scattering properties along that axis. An embodiment may also include discriminators (stops, phase shifters, analyzer crystals, etc.) in the beam exiting the object. An embodiment may also include mechanisms for scanning whereby a two-dimensional or three-dimensional image of a large object is made possible. An embodiment may also include an image of an object's internal features being derived from an analysis of the radiation and/or radiation waveform exiting the object.

Abstract translation: 公开了一种用于观察物体的内部特征的系统，使得物体的内部吸收，折射，反射和/或散射特性被可视化。 一个实施例可以包括一个或多个穿透辐射束，具有要成像的内部特征的物体，单个或一组辐射光学器件，以及用于捕获所得到的阴影图像的检测系统。 透过物体的辐射束通常来源于沿着窄轴具有高空间纯度和垂直长轴的空间纯度低的线状源。 在长轴上，辐射光学器件捕获并聚焦从物体出射的发散光线，以形成物体的高分辨率图像，而没有这些光学元件的阴影图将在该轴上具有模糊。 这样的阴影图自然界定在窄波束起源的相反轴线上，并且可以沿着该轴显示物体的折射，反射和/或散射特性。 实施例还可以包括离开物体的光束中的鉴别器（停止点，移相器，分析器晶体等）。 一个实施例还可以包括用于扫描的机构，从而可以实现大对象的二维或三维图像。 实施例还可以包括物体的内部特征的图像，其从离开物体的辐射和/或辐射波形的分析得到。

公开(公告)号：US20090060144A1

公开(公告)日：2009-03-05

申请号：US11848700

申请日：2007-08-31

Applicant: Bonglea Kim

Inventor： Bonglea Kim

IPC: G21K1/02

CPC classification number: G03F7/7085 ,  G03F7/70008 ,  G21K1/02 ,  G21K2201/06

Abstract: A system for x-ray optical alignment. The system includes an x-ray source, an optic, a collimation element, and alignment sensors. The x-ray source generates an x-ray beam that is directed by the optic at a sample. The collimation element is located between the optic and the sample to define the profile of the x-ray beam. The sensors receive the x-ray beam from the optic and generated signal indicative of the system alignment. The sensors may be located on a surface of the collimation element facing the optic. The inner edge of the sensors may be located at equal intervals radially about the collimation element and may form an aperture having a symmetric shape.

Abstract translation: 一种用于x射线光学对准的系统。 该系统包括X射线源，光学元件，准直元件和对准传感器。 x射线源产生由光学元件在样本处引导的X射线束。 准直元件位于光学元件和样品之间以限定X射线束的轮廓。 传感器从光学器件接收X射线束并产生指示系统对准的信号。 传感器可以位于准直元件面向光学元件的表面上。 传感器的内边缘可以围绕准直元件径向相等的间隔定位并且可以形成具有对称形状的孔。