公开(公告)号：US2921006A

公开(公告)日：1960-01-12

申请号：US29154152

申请日：1952-06-03

Applicant: GEN ELECTRIC

Inventor： SCHMITZ JOHN V ,  LAWTON ELLIOTT J

IPC: B29B13/08 ,  B29C35/08 ,  C08F2/46 ,  C08F2/48 ,  C08F2/54 ,  C08F283/01 ,  G21K5/10 ,  H01J33/00

CPC classification number: H01J33/00 ,  B29B13/08 ,  B29C35/08 ,  B29C2035/0877 ,  B29K2055/00 ,  B29K2067/06 ,  B29K2105/0002 ,  B29K2105/0085 ,  C08F2/46 ,  C08F283/01 ,  G21K5/10 ,  Y10S8/18

公开(公告)号：US2333842A

公开(公告)日：1943-11-09

申请号：US45030842

申请日：1942-07-09

Applicant: HENRY A DE PHILLIPS

Inventor： DOMENICO CASCIO ,  KOCH STANLEY J

IPC: H01J33/00

CPC classification number: H01J33/00

公开(公告)号：US1907507A

公开(公告)日：1933-05-09

申请号：US2646925

申请日：1925-04-28

Applicant: GEN ELECTRIC

Inventor： COOLIDGE WILLIAM D

IPC: H01J5/18 ,  H01J33/00

CPC classification number: H01J5/18 ,  H01J33/00

公开(公告)号：US09960007B2

公开(公告)日：2018-05-01

申请号：US15251554

申请日：2016-08-30

Applicant: Toshiba Memory Corporation

Inventor： Kazuto Matsuki ,  Ryoichi Susuki ,  Hiroyuki Kashiwagi ,  Takashi Sato

IPC: H01J37/073 ,  H01J37/20

CPC classification number: H01J37/073 ,  G21K5/04 ,  H01J33/00 ,  H01J37/20 ,  H01J2237/202

Abstract: An electron beam irradiation device includes a stage, a main body unit, and a first mechanism. The main body unit includes a substrate, first members, and a first layer. The first members are arranged to be separated in a second direction intersecting a first direction and is provided at a first surface of the substrate opposing the stage. The first layer is provided between the stage and the first members and between the stage and the substrate. The first layer converts a light ray into an electron beam. The first mechanism is provided in the stage and moves the stage in the second direction. A distance of the movement is not less than a spacing between a center in the second direction of the first member and a center in the second direction of one other first member adjacent to the first member.

公开(公告)号：US20160299103A1

公开(公告)日：2016-10-13

申请号：US15026953

申请日：2014-10-02

Applicant: PHOTON DYNAMICS INC.

Inventor： Nedal Saleh ,  Daniel Toet ,  Enrique Sterling ,  Ronen Loewinger ,  Sriram Krishnaswami ,  Arie Glazer

IPC: G01N27/70 ,  H01J37/32

CPC classification number: G01N27/70 ,  G01R31/305 ,  H01J33/00 ,  H01J37/3233 ,  H01J37/32449 ,  H01J37/32825 ,  H01J2237/063 ,  H01J2237/164 ,  H01J2237/188 ,  H01J2237/317 ,  H05H2240/10 ,  H05H2245/123

Abstract: An electron-beam induced plasmas is utilized to establish a non-mechanical, electrical contact to a device of interest. This plasma source may be referred to as atmospheric plasma source and may be configured to provide a plasma column of very fine diameter and controllable characteristics. The plasma column traverses the atmospheric space between the plasma source into the atmosphere and the device of interest and acts as an electrical path to the device of interest in such a way that a characteristic electrical signal can be collected from the device. Additionally, by controlling the gases flowing into the plasma column the probe may be used for surface modification, etching and deposition.

Abstract translation: 利用电子束诱导的等离子体来建立与感兴趣的器件的非机械的电接触。 该等离子体源可以被称为大气等离子体源，并且可以被配置为提供非常细的直径和可控特性的等离子体柱。 等离子体柱穿过等离子体源之间的大气空间到大气中和感兴趣的器件，并且作为到目的器件的电通路，使得可以从器件收集特征电信号。 此外，通过控制流入等离子体柱的气体，探针可用于表面改性，蚀刻和沉积。

公开(公告)号：US20150306261A1

公开(公告)日：2015-10-29

申请号：US14649242

申请日：2013-11-29

Applicant: TETRA LAVAL HOLDINGS & FINANCE S.A.

Inventor： Lars-Ake NASLUND ,  Kristoffer BENGTSSON ,  Hakan MELLBIN ,  HANS HALLSTADIUS ,  Fredrik HANSEN ,  Marco LAVALLE

IPC: A61L2/08 ,  G01T1/02

CPC classification number: A61L2/087 ,  A61L2202/14 ,  A61L2202/23 ,  B65B55/08 ,  G01T1/02 ,  H01J33/00

Abstract: The present invention relates to an irradiation device for irradiating objects with electron beams. The irradiation device comprises at least one electron beam emitter having an electron exit window and at least one sensor device for detecting a first dose control parameter of the electron beam. The electron beam emitter is adapted to move past the sensor device such that the electron beam emitted from the electron exit window passes within a sensing area of the sensor device. The sensor device comprises more than one conductor each having a conductor surface in the sensing area of the sensor device, and the conductor surface is adapted to be exposed to electrons of the electron beam. The invention also relates to a method.

Abstract translation: 本发明涉及一种用电子束照射物体的照射装置。 照射装置包括至少一个具有电子出射窗的电子束发射器和用于检测电子束的第一剂量控制参数的至少一个传感器装置。 电子束发射器适于移动通过传感器装置，使得从电子出射窗口发射的电子束通过传感器装置的感测区域内。 传感器装置包括多于一个导体，每个导体在传感器装置的感测区域中具有导体表面，并且导体表面适于暴露于电子束的电子。 本发明还涉及一种方法。

公开(公告)号：US20130284587A1

公开(公告)日：2013-10-31

申请号：US13993594

申请日：2011-12-16

Applicant: Kaveh Bakhtari

Inventor： Kaveh Bakhtari

IPC: B01J19/08

CPC classification number: B01J19/085 ,  C01B13/10 ,  H01J3/02 ,  H01J33/00 ,  H01J37/3233 ,  H01J37/32357 ,  H01J37/32816

Abstract: This invention proposes, among other things, systems and methods for providing ozone generators or plasma generators that generate an electric field in an electron generation chamber that is separate from a reaction chamber. An electron beam emitter in an electron generation chamber is configured to emit a beam of electrons and is separated from the reaction chamber by an electron permeable barrier that provides a window through which the beam of electrons passes. The electrons are accelerated to the required energy in the electron generation chamber and transmitted through the barrier to the reaction chamber, where an input gas source introduces an input gas into the reaction chamber. The input gas may react with the beam of electrons inside the reaction chamber to form an output gas comprising a plasma or a concentration of ozone, and the output gas passes from the reaction chamber to a wafer processing chamber.

Abstract translation: 本发明尤其提出了用于提供在与反应室分离的电子发生室中产生电场的臭氧发生器或等离子体发生器的系统和方法。 电子发生室中的电子束发射器被配置为发射电子束，并且通过电子可透过屏障与反应室分离，所述电子透过屏障提供电子束通过的窗口。 电子被加速到电子发生室中所需的能量，并通过势垒传递到反应室，其中输入气体源将输入气体引入反应室。 输入气体可以与反应室内的电子束反应形成包含等离子体或浓度的臭氧的输出气体，并且输出气体从反应室通到晶片处理室。

公开(公告)号：US20110020174A1

公开(公告)日：2011-01-27

申请号：US12866574

申请日：2008-11-28

Applicant: Johannes Rauschnabel ,  Steffen Ebert ,  Oliver Ullmann ,  Reinhold Schmieg

Inventor： Johannes Rauschnabel ,  Steffen Ebert ,  Oliver Ullmann ,  Reinhold Schmieg

IPC: A61L2/00 ,  G21G5/00

CPC classification number: A61L2/087 ,  A61L2202/122 ,  B29C71/04 ,  B29C2035/0877 ,  G21K5/10 ,  H01J33/00

Abstract: The invention relates to a device for treating formed parts with high-energy electron beams. The electron beams are guided by two opposite stationary or displaceable electron discharge windows onto the formed part and bounding a process space for the formed part. A transport device is present for the formed part, by which the formed part can be guided through the process space to the electron discharge windows disposed substantially vertically perpendicular to the transport direction. A channel is disposed in the process space for transporting the formed part and largely shielded against the X-ray radiation.

Abstract translation: 本发明涉及用高能电子束处理成形件的装置。 电子束由两个相对的静止或位移的电子放电窗口引导到形成的部分上，并且将所形成的部分的工艺空间界定。 存在用于成形部件的输送装置，通过该输送装置，可以将形成的部件通过处理空间引导到垂直于输送方向设置的电子放电窗口。 通道设置在处理空间中，用于输送形成的部分并且大大地屏蔽X射线辐射。

公开(公告)号：US20100171446A1

公开(公告)日：2010-07-08

申请号：US11872158

申请日：2007-10-15

Applicant: Michael Walter Retsky

Inventor： Michael Walter Retsky

IPC: H01J29/48

CPC classification number: H01J33/00

Abstract: A method and apparatus is disclosed for an electron beam directed energy device. The device consists of an electron gun with one or more electron beams. The device includes one or more accelerating plates with holes aligned for beam passage. The plates may be flat or preferably shaped to direct each electron beam to exit the electron gun at a predetermined orientation. In one preferred application, the device is located in outer space with individual beams that are directed to focus at a distant target to be used to impact and destroy missiles. The aimings of the separate beams are designed to overcome Coulomb repulsion. A method is also presented for directing the beams to a target considering the variable terrestrial magnetic field. In another preferred application, the electron beam is directed into the ground to produce a subsurface x-ray source to locate and/or destroy buried or otherwise hidden objects including explosive devices.

Abstract translation: 公开了一种用于电子束定向能量装置的方法和装置。 该装置由具有一个或多个电子束的电子枪组成。 该装置包括一个或多个加速板，其具有用于梁通道对准的孔。 板可以是平坦的或优选地成形以引导每个电子束以预定取向离开电子枪。 在一个优选的应用中，设备位于外部空间中，其中各个射束被引导以聚焦在远距离目标处以用于撞击和摧毁导弹。 单独梁的目的是克服库仑排斥。 还提出了一种考虑到可变地面磁场将光束引导到目标的方法。 在另一个优选的应用中，电子束被引导到地面中以产生地下x射线源来定位和/或破坏包括爆炸装置在内的隐藏的物体。

公开(公告)号：US20090045350A1

公开(公告)日：2009-02-19

申请号：US12106117

申请日：2008-04-18

Applicant: Heinz Humele ,  Jochen Krueger ,  Hans-Juergen Menz ,  Eberhard Foell

Inventor： Heinz Humele ,  Jochen Krueger ,  Hans-Juergen Menz ,  Eberhard Foell

IPC: G01N23/00

CPC classification number: B65B55/08 ,  A61L2/087 ,  A61L2202/23 ,  H01J33/00

Abstract: An apparatus (1) for sterilising containers (10), comprising a treatment head (5) which has an exit window (8) through which charge carriers can pass, comprising a charge carrier generation source which generates charge carriers, and comprising an acceleration device (6) which accelerates the charge carriers in the direction of the exit window (8). According to the invention, the cross section of the treatment head (5) is dimensioned such that the treatment head (5) can be guided through the mouth of the container (10), and the acceleration device (6) accelerates the charge carriers in such a way that the charge carriers exiting from the exit window (8) can be aimed preferably directly onto an inner wall (15) of the container (10).

Abstract translation: 一种用于对容器（10）进行灭菌的装置（1），包括具有出口窗（8）的处理头（5），电荷载体可通过该出口窗口（8），其包括产生电荷载体的电荷载流子产生源，并且包括加速装置 （6），其沿着出射窗（8）的方向加速电荷载体。 根据本发明，治疗头（5）的横截面的尺寸使得治疗头（5）能够被引导通过容器（10）的口，并且加速装置（6）加速电荷载体 使得从出射窗（8）离开的电荷载体可以优选地直接瞄准到容器（10）的内壁（15）上的方式。