METHOD AND SYSTEM OF EVALUATING DISTRIBUTION OF LATTICE STRAIN ON CRYSTAL MATERIAL
    31.
    发明申请
    METHOD AND SYSTEM OF EVALUATING DISTRIBUTION OF LATTICE STRAIN ON CRYSTAL MATERIAL 失效
    评估水晶材料应变分布的方法与系统

    公开(公告)号:US20120292504A1

    公开(公告)日:2012-11-22

    申请号:US13475408

    申请日:2012-05-18

    Inventor: Kazuhiro NOJIMA

    Abstract: A crystal material lattice strain evaluation method includes illuminating a sample having a crystal structure with an electron beam in a zone axis direction, and selectively detecting a certain diffracted wave diffracted in a certain direction among a plurality of diffracted waves diffracted by the sample. The method further includes repeating the illuminating step and the selectively detecting step while scanning the sample, and obtaining a strain distribution image in a direction corresponding to the certain diffracted wave from diffraction intensity at each point of the sample.

    Abstract translation: 晶体晶格应变评估方法包括在区域轴线方向上照射具有电子束的晶体结构的样品,并且选择性地检测在由样品衍射的多个衍射波中的某个方向上衍射的某个衍射波。 该方法还包括在扫描样品时重复照明步骤和选择性检测步骤,并且从样品的每个点的衍射强度获得与特定衍射波相对应的方向的应变分布图像。

    SACP Method and Particle Optical System for Performing the Method
    33.
    发明申请
    SACP Method and Particle Optical System for Performing the Method 有权
    用于执行该方法的SACP方法和粒子光学系统

    公开(公告)号:US20110108736A1

    公开(公告)日:2011-05-12

    申请号:US12942477

    申请日:2010-11-09

    Applicant: Dirk Preikszas

    Inventor: Dirk Preikszas

    Abstract: An SACP method includes directing a beam of charged particles onto an object surface of an object using a particle optical system, and detecting intensities of particles emanating from the object. The method further includes: (a1) adjusting an excitation of the second beam deflector for adjusting an impingement location of the beam on the object surface; (a2) adjusting an excitation of the first beam deflector for adjusting an angle of incidence of the beam on the object surface without changing the impingement location and detecting the intensity; and (a3) repeating the adjusting of the excitation of the first beam deflector for adjusting the angle of incidence without changing the impingement location such that a corresponding intensity is detected for each of at least 100 different angles of incidence at the same impingement location.

    Abstract translation: SACP方法包括使用粒子光学系统将带电粒子束引导到物体的物体表面上,并且检测从物体发出的粒子的强度。 该方法还包括:(a1)调整第二光束偏转器的激发,用于调节光束在物体表面上的冲击位置; (a2)调整所述第一光束偏转器的激发,用于调整所述光束在所述物体表面上的入射角,而不改变所述撞击位置并检测所述强度; 和(a3)重复调节第一光束偏转器的激发以调节入射角而不改变冲击位置,使得在相同的撞击位置处对于至少100个不同入射角中的每一个检测到相应的强度。

    Method and apparatus for measuring the physical properties of micro region
    35.
    发明申请
    Method and apparatus for measuring the physical properties of micro region 失效
    测量微区物理性质的方法和装置

    公开(公告)号:US20060113473A1

    公开(公告)日:2006-06-01

    申请号:US11326399

    申请日:2006-01-06

    Abstract: A method and apparatus for measuring the physical properties of a micro region measures the two-dimensional distribution of stress/strain in real time at high resolution and sensitivity and with a high level of measuring position matching. A sample is scanned and irradiated with a finely focused electron beam (23, 26), and the displacement of position of a diffraction spot (32, 33) is measured by a two-dimensional position-sensitive electron detector (13). The displacement amount is outputted as a voltage value that is then converted into the magnitude of the stress/strain according to the principle of a nano diffraction method, and the magnitude is displayed in synchronism with a sample position signal.

    Abstract translation: 用于测量微区物理特性的方法和装置以高分辨率和灵敏度实时测量应力/应变的二维分布以及高水平的测量位置匹配。 扫描样品并用精细聚焦的电子束(23,26)照射,并且通过二维位置敏感电子检测器(13)测量衍射光斑(32,33)的位置位移。 将位移量作为电压值输出,然后根据纳米衍射方法的原理将其转换为应力/应变的大小,并且与样本位置信号同步地显示幅度。

    Observation apparatus and observation method using an electron beam
    36.
    发明申请
    Observation apparatus and observation method using an electron beam 失效
    使用电子束的观察装置和观察方法

    公开(公告)号:US20030006373A1

    公开(公告)日:2003-01-09

    申请号:US10183157

    申请日:2002-06-28

    Applicant: Hitachi. Ltd.

    CPC classification number: H01J37/2955 H01J2237/2802

    Abstract: Disclosed is an observation apparatus and method using an electron beam, capable of measuring information regarding a crystal structure in a specimen (such as information regarding stress and strain in the specimen) with high sensitivity and high resolution from an electron beam diffraction image obtained by irradiating the specimen with an electron beam. An observation method according to the invention includes: a step of mounting a specimen on a specimen stage; an enlarged image acquiring step of irradiating a predetermined area in the specimen with an electron beam while scanning the electron beam, and acquiring an enlarged image of a specimen internal structure in the predetermined area in the specimen by using the electron beam passed through the specimen; a diffraction image acquiring step of irradiating a specific portion included in the predetermined area in the specimen with the electron beam and acquiring a diffraction image including information of a crystal structure in the specimen in the specific portion in the specimen, formed by the electron beam diffracted in the specimen; a crystal structure information extracting step of extracting information of the crystal structure in the specimen from the diffracted image acquired in the diffraction image acquiring step; and a superimposing and displaying step of displaying the information of the crystal structure in the specimen extracted in the crystal structure information extracting step so as to be superimposed on the enlarged image acquired in the enlarged image acquiring step. The observation method according to the invention can obtain information of the crystal structure in a specimen with high sensitivity and high resolution.

    Abstract translation: 公开了一种使用电子束的观察装置和方法,其能够从通过照射获得的电子束衍射图像以高灵敏度和高分辨率测量样品中的晶体结构的信息(诸如样品中的应力和应变的信息) 具有电子束的样品。 根据本发明的观察方法包括:将试样安装在试样台上的步骤; 放大图像获取步骤,在扫描电子束的同时用电子束照射样本中的预定区域,并且通过使用通过样本的电子束获取样本中的预定区域中的样本内部结构的放大图像; 衍射图像获取步骤,用电子束照射样本中的预定区域中的特定部分,并获取包含由电子束衍射形成的样本中的样本中的样本中的晶体结构信息的衍射图像 在标本中 晶体结构信息提取步骤,从衍射图像获取步骤中获取的衍射图像提取样本中的晶体结构的信息; 以及叠加显示步骤,用于在晶体结构信息提取步骤中提取的样本中显示晶体结构的信息,以便叠加在放大图像获取步骤中获取的放大图像上。 根据本发明的观察方法可以获得具有高灵敏度和高分辨率的样品中的晶体结构的信息。

    Arrangement and method for using electron channeling patterns to detect substrate damage
    37.
    发明授权
    Arrangement and method for using electron channeling patterns to detect substrate damage 失效
    使用电子通道图案检测基板损伤的布置和方法

    公开(公告)号:US06452176B1

    公开(公告)日:2002-09-17

    申请号:US09359103

    申请日:1999-07-22

    Inventor: Brennan V. Davis

    CPC classification number: H01J37/2955

    Abstract: According to one aspect of the disclosure, a method for detecting a degree of substrate damage in an integrated circuit die is provided. In one example embodiment, the back side of the die is thinned and an examination region is exposed. An electron beam is used to scan the region, and backscattered electrons are detected in response. The detected backscattered electrons are used to provide an electron channeling pattern for the scanned region. The electron channeling pattern is then compared to a reference pattern and used to determine a degree of substrate damage.

    Abstract translation: 根据本公开的一个方面,提供了一种用于检测集成电路管芯中的衬底损伤程度的方法。 在一个示例性实施例中,模具的背面变薄并且检查区域被暴露。 电子束用于扫描该区域,响应中检测到反向散射的电子。 使用检测的反向散射电子来为扫描区域提供电子通道图案。 然后将电子沟道图案与参考图案进行比较,并用于确定衬底损伤程度。

    Detector for diffracted electrons
    38.
    发明授权
    Detector for diffracted electrons 失效
    用于衍射电子的检测器

    公开(公告)号:US5387794A

    公开(公告)日:1995-02-07

    申请号:US178693

    申请日:1994-01-10

    Applicant: Takao Marui

    Inventor: Takao Marui

    CPC classification number: H01J37/2955 H01J37/22 H01J2237/2445

    Abstract: A detector for electrons diffracted by a sample irradiated with an electron beam uses a fluorescent screen to output optical signals representing the diffraction pattern formed by the diffracted electrons, and a TV camera to convert these optical signals to electrical signals. A photoelectric converter is used to determine the brightness of each position on the fluorescent screen but its position is controlled such that the converter will not obstruct the view of the fluorescent screen from the TV camera. Coordinate data on the positions at which the measured brightness is greater than a specified standard brightness value may be stored and relied upon in moving the photoelectric converter, or the light-receiving end of an optical fiber connected thereto, relative to the fluorescent screen.

    Abstract translation: 由用电子束照射的样品衍射的电子的检测器使用荧光屏输出表示由衍射电子形成的衍射图案的光信号,以及TV摄像机将这些光信号转换为电信号。 使用光电转换器来确定荧光屏上每个位置的亮度,但其位置被控制,使得转换器不会阻碍荧光屏从电视摄像机的视野。 在测量亮度大于指定标准亮度值的位置上的坐标数据可以相对于荧光屏移动光电转换器或与其连接的光纤的光接收端移动。

    Differential phase contrast scanning transmission electron microscope
    39.
    发明授权
    Differential phase contrast scanning transmission electron microscope 失效
    差分相位扫描透射电子显微镜

    公开(公告)号:US5004918A

    公开(公告)日:1991-04-02

    申请号:US468750

    申请日:1990-01-24

    CPC classification number: H01J37/263 H01J37/222 H01J37/2955

    Abstract: A differential phase contrast scanning transmission electron microscope capable of obtaining a clear differential phase contrast image. This microscope includes a charge-coupled image sensor on which a diffraction image is projected. The region covered by the image sensor is divided into two parts by a straight line. The difference between the amounts of electrons impinging on these two parts is calculated, and the resulting differential signal is supplied to a display unit to display an image of the specimen.

    Abstract translation: 能够获得清晰的差分相位差图像的差分相位扫描透射电子显微镜。 该显微镜包括投影衍射图像的电荷耦合图像传感器。 由图像传感器覆盖的区域由直线分成两部分。 计算入射在这两个部分上的电子量之间的差异,并将得到的差分信号提供给显示单元以显示样本的图像。

    CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS

    公开(公告)号:US20240355577A1

    公开(公告)日:2024-10-24

    申请号:US18683071

    申请日:2022-08-11

    Abstract: A charged-particle beam device for charged-particle crystallography of a crystalline sample comprises a charged-particle source for generating a charged-particle beam to be radiated onto a sample and a charged-particle-optical system downstream the charged-particle source, which is configured to form in a diffraction mode a substantially parallel charged-particle beam at a predefined sample position and in an imaging mode a focused charged-particle beam having a focus at the predefined sample position. The charged-particle-optical system comprises a charged-particle zoom lens system consisting of a first magnetic lens, a second magnetic lens downstream the first magnetic lens and a third magnetic lens downstream the second magnetic lens, wherein at least the second magnetic lens, preferably each one of the first, the second and the third magnetic lens has a variable focal length. The charged-particle-optical system further comprises a single beam limiting aperture with a fixed aperture diameter arranged at a fixed position between the second magnetic lens and the third magnetic lens for limiting the diameter of the charged-particle beam at the sample position. The charged-particle-optical system is configured such that the diameter of the charged-particle beam at the sample position is in a range between 100 nanometer and 1000 nanometer, in particular between 220 nanometer and 250 nanometer, in the diffraction mode, and in a range between 10 nanometer and 200 nanometer in the imaging mode.

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