公开(公告)号：US09287092B2

公开(公告)日：2016-03-15

申请号：US12767775

申请日：2010-04-26

Applicant: Victor Brouk ,  Randy Heckman

Inventor： Victor Brouk ,  Randy Heckman

IPC: C23C14/00 ,  C25B11/00 ,  C25B13/00 ,  H01J37/32 ,  C23C14/54

CPC classification number: H01J37/32045 ,  C23C14/54 ,  H01J37/32009 ,  H01J37/32082 ,  H01J37/32174 ,  H01J37/32935 ,  H01J37/3299

Abstract: Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary system includes an ion-energy control portion, and the ion-energy control portion provides at least one ion-energy control signal responsive to at least one ion-energy setting that is indicative of a desired distribution of energies of ions bombarding a surface of a substrate. A controller is coupled to the switch-mode power supply, and the controller provides at least two drive-control signals. In addition, a switch-mode power supply is coupled to the substrate support, the ion-energy control portion and the controller. The switch-mode power supply includes switching components configured to apply power to the substrate responsive to the drive signals and the ion-energy control signal so as to effectuate the desired distribution of the energies of ions bombarding the surface of the substrate.

Abstract translation: 公开了用于调节等离子体室中的离子能量的系统，方法和装置。 示例性系统包括离子能量控制部分，并且离子能量控制部分响应于至少一个离子能量设定提供至少一个离子能量控制信号，该至少一个离子能量设定指示轰击表面的离子的所需能量分布 的基底。 控制器耦合到开关模式电源，并且控制器提供至少两个驱动控制信号。 此外，开关模式电源耦合到衬底支撑件，离子能量控制部分和控制器。 开关电源包括响应于驱动信号和离子能量控制信号而被配置为向基板施加功率的开关部件，以实现轰击基板表面的离子的能量的期望分布。

公开(公告)号：US09160240B2

公开(公告)日：2015-10-13

申请号：US14416474

申请日：2012-09-05

Applicant: Itsuo Yuzurihara ,  Toshiyuki Adachi ,  Shinichi Kodama

Inventor： Itsuo Yuzurihara ,  Toshiyuki Adachi ,  Shinichi Kodama

IPC: H05B31/26 ,  H02M3/335 ,  H05H1/46 ,  H02J1/00 ,  H01T1/02 ,  H01T15/00 ,  H05H1/48

CPC classification number: H02M3/33507 ,  H01J37/32027 ,  H01J37/32045 ,  H01T1/02 ,  H01T15/00 ,  H02J1/00 ,  H02M1/36 ,  H02M3/156 ,  H02M7/5387 ,  H02M2001/007 ,  H02M2001/325 ,  H05H1/46 ,  H05H1/48 ,  H05H2001/4682

Abstract: A phase of the pulse control signal upon restarting is synchronized with the phase of the pulse control signal upon suspending, thereby suppressing fluctuations of output voltage in each phase of the inverter upon restarting and further suppressing fluctuations of voltage supplied to the load. Upon supplying DC power to a plasma generator, when arc discharge occurs in the plasma generator, supplying of the DC power is suspended to reduce damage on the electrodes and substrate, and further upon extinguishing of the arc discharge, supplying of the DC power is restarted. In suspending and resuming the DC output, the current flowing in the chopper upon suspending is held in the form of circulating current, and upon restarting the inverter, this circulating current is supplied to the load. Accordingly, it is possible to reduce a delay in supplying the DC power to the load, upon resuming the DC output.

Abstract translation: 再起动时的脉冲控制信号的相位在暂停时与脉冲控制信号的相位同步，从而抑制重启时逆变器的各相的输出电压的波动，进一步抑制向负载提供的电压的波动。 在向等离子体发生器供给直流电力时，当等离子体发生器发生电弧放电时，暂停直流电源的供给，以减少对电极和基板的损坏，并且在熄灭电弧放电后，重新开始直流电力的供给 。 在暂停和恢复直流输出时，暂停时在斩波器中流动的电流以循环电流的形式保持，重新启动逆变器时，该循环电流被提供给负载。 因此，恢复直流输出时，可以减少向负载供给直流电力的延迟。

公开(公告)号：US09137885B2

公开(公告)日：2015-09-15

申请号：US14414816

申请日：2012-09-07

Applicant: Itsuo Yuzurihara ,  Toshiyuki Adachi ,  Shinichi Kodama

Inventor： Itsuo Yuzurihara ,  Toshiyuki Adachi ,  Shinichi Kodama

IPC: H05B31/26 ,  H05H1/46 ,  H02M3/335 ,  H05H7/00

CPC classification number: H05H1/46 ,  H01J37/32027 ,  H01J37/32045 ,  H02M3/33507 ,  H02M3/337 ,  H02M2001/007 ,  H05H7/001 ,  H05H2001/4682

Abstract: Intermittent short-circuit control is performed in the ignition mode, thereby allowing short-circuit current to flow in the current source step-down type chopper. Energy of the short-circuit current is temporarily accumulated in the inductor provided in the current source step-down type chopper. The accumulated energy boosts the output voltage from the direct current power supply device during the period until the next short circuiting, via the current, the multiphase inverter, and the rectifier. The voltage boosting operation where accumulation of the current energy by short circuiting and boosting of the output voltage by conduction are repeated, controls an increase of the output voltage which is applied to the plasma generator.

Abstract translation: 在点火模式下执行间歇性短路控制，从而允许短路电流流过电流源降压型斩波器。 短路电流的能量临时累积在设置在电流源降压型斩波器中的电感器中。 累积的能量通过电流，多相逆变器和整流器在直到下一次短路的时段内提高直流电源装置的输出电压。 通过重复通过短路使输出电压的短路和升压来积聚电流能量的升压操作，控制施加到等离子体发生器的输出电压的增加。

公开(公告)号：US09105449B2

公开(公告)日：2015-08-11

申请号：US12145389

申请日：2008-06-24

Applicant: Neil Benjamin

Inventor： Neil Benjamin

IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  H01J37/32

CPC classification number: H01J37/32045 ,  H01J37/32174 ,  Y10T307/258

Abstract: A distributed power arrangement to provide local power delivery in a plasma processing system during substrate processing is provided. The distributed power arrangement includes a set of direct current (DC) power supply units. The distributed power arrangement also includes a plurality of power generators, which is configured to receive power from the set of DC power supply units. Each power generator of the plurality of power generators is coupled to a set of electrical elements, thereby enabling the each power generator of the plurality of power generators to control the local power delivery.

Abstract translation: 提供了一种用于在衬底处理期间在等离子体处理系统中提供局部电力输送的分布式电力装置。 分布式电源装置包括一组直流（DC）电源单元。 分布式电力布置还包括多个发电机，其被配置为从所述一组直流电源单元接收电力。 多个发电机的每个发电机耦合到一组电气元件，从而使多个发电机中的每个发电机能够控制局部电力输送。

公开(公告)号：US20150180346A1

公开(公告)日：2015-06-25

申请号：US14416474

申请日：2012-09-05

Applicant: Itsuo Yuzurihara ,  Toshiyuki Adachi ,  Shinichi Kodama

Inventor： Itsuo Yuzurihara ,  Toshiyuki Adachi ,  Shinichi Kodama

IPC: H02M3/335 ,  H01T1/02 ,  H05H1/48 ,  H01T15/00

CPC classification number: H02M3/33507 ,  H01J37/32027 ,  H01J37/32045 ,  H01T1/02 ,  H01T15/00 ,  H02J1/00 ,  H02M1/36 ,  H02M3/156 ,  H02M7/5387 ,  H02M2001/007 ,  H02M2001/325 ,  H05H1/46 ,  H05H1/48 ,  H05H2001/4682

Abstract: A phase of the pulse control signal upon restarting is synchronized with the phase of the pulse control signal upon suspending, thereby suppressing fluctuations of output voltage in each phase of the inverter upon restarting and further suppressing fluctuations of voltage supplied to the load. Upon supplying DC power to a plasma generator, when arc discharge occurs in the plasma generator, supplying of the DC power is suspended to reduce damage on the electrodes and substrate, and further upon extinguishing of the arc discharge, supplying of the DC power is restarted. In suspending and resuming the DC output, the current flowing in the chopper upon suspending is held in the form of circulating current, and upon restarting the inverter, this circulating current is supplied to the load. Accordingly, it is possible to reduce a delay in supplying the DC power to the load, upon resuming the DC output.

Abstract translation: 再起动时的脉冲控制信号的相位在暂停时与脉冲控制信号的相位同步，从而抑制重启时逆变器的各相的输出电压的波动，进一步抑制向负载提供的电压的波动。 在向等离子体发生器供给直流电力时，当等离子体发生器发生电弧放电时，暂停直流电源的供给，以减少对电极和基板的损坏，并且在熄灭电弧放电后，重新开始直流电力的供给 。 在暂停和恢复直流输出时，暂停时在斩波器中流动的电流以循环电流的形式保持，重新启动逆变器时，该循环电流被提供给负载。 因此，恢复直流输出时，可以减少向负载供给直流电力的延迟。

公开(公告)号：US08866400B2

公开(公告)日：2014-10-21

申请号：US13848319

申请日：2013-03-21

Applicant: HUETTINGER Elektronik GmbH + Co. KG

Inventor： Thomas Kirchmeier ,  Michael Glueck

IPC: H05B37/02

CPC classification number: G01R21/06 ,  G01R23/02 ,  H01J37/32045 ,  H02M7/003 ,  H02M7/5383 ,  H03H7/40 ,  H05B41/2806 ,  H05H1/46 ,  Y02B20/22

Abstract: A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network, wherein the at least one output network includes at least one inductance that has at least one magnetic field strengthening element that is a Perminvar ferrite.

Abstract translation: 等离子体供给装置以大于3MHz的基本上恒定的基本频率产生大于500W的输出功率，并对供给所产生的输出功率的等离子体处理进行供电，并从反射功率返回到等离子体供应装置。 等离子体供给装置包括至少一个连接到DC电源的逆变器，该逆变器具有至少一个开关元件和输出网络，其中至少一个输出网络包括至少一个具有至少一个磁场强化的电感 元素是Perminvar铁氧体。

公开(公告)号：US20140217892A1

公开(公告)日：2014-08-07

申请号：US14343549

申请日：2012-08-29

Applicant: Siegfried Krassnitzer ,  Daniel Lendi ,  Juerg Hagmann

Inventor： Siegfried Krassnitzer ,  Daniel Lendi ,  Juerg Hagmann

IPC: H05H1/24

CPC classification number: H05H1/24 ,  H01J27/022 ,  H01J37/32045 ,  H01J37/32064

Abstract: The present invention relates to a plasma source which is arranged in floating fashion on a vacuum chamber, wherein the plasma source comprises a source housing, and a filament is provided in the source housing and is arranged so as to be insulated therefrom, wherein means for measuring the potential drop between the source housing and the filament are provided. The measured potential drop can be used for regulating the voltage heating the filament. According to the invention, corresponding means are provided.

Abstract translation: 本发明涉及一种以浮动方式设置在真空室上的等离子体源，其中等离子体源包括源壳体，并且灯丝设置在源壳体中并且被布置成与其绝缘，其中用于 提供测量源壳体和灯丝之间的电位降。 测量的电位降可用于调节灯丝的电压加热。 根据本发明，提供了相应的装置。

公开(公告)号：US08796933B2

公开(公告)日：2014-08-05

申请号：US12965072

申请日：2010-12-10

Applicant: Uwe Hermanns

Inventor： Uwe Hermanns

IPC: H01J7/24

CPC classification number: H01J37/3299 ,  H01J37/32045 ,  H01J37/32935

Abstract: Generating plasmas in pulsed power systems. In one aspect, a system includes a plasma chamber having one or more anodes and cathodes arranged for generating a plasma in the plasma chamber, two or more plasma power supplies each having a pulsed power output suitable for generating the plasma and coupled to respective of the one or more anodes and cathodes of the plasma chamber and a signal generator supplying the input signal coupled to the inputs of the plasma power supplies. The input signal is selected to trigger the pulsing, by the arc management circuitry, of the power output from the plasma power supplies. The plasma power supplies each include arc management circuitry and an input coupled to trigger, in response to an input signal, pulsing, by the arc management circuitry, of the power output from the plasma power supply.

Abstract translation: 在脉冲电力系统中产生等离子体。 一方面，一种系统包括具有一个或多个阳极和等离子体室的等离子体室，其布置用于在等离子体室中产生等离子体;两个或更多个等离子体电源，每个等离子体电源具有适于产生等离子体的脉冲功率输出， 等离子体室的一个或多个阳极和阴极以及提供耦合到等离子体电源的输入的输入信号的信号发生器。 选择输入信号以通过电弧管理电路触发从等离子体电源输出的功率的脉冲。 等离子体电源各自包括电弧管理电路和耦合以响应于输入信号触发由电弧管理电路脉冲从等离子体电源的功率输出的输入。

公开(公告)号：US08436543B2

公开(公告)日：2013-05-07

申请号：US12685142

申请日：2010-01-11

Applicant: Thomas Kirchmeier ,  Michael Glueck

Inventor： Thomas Kirchmeier ,  Michael Glueck

IPC: H05B37/02

CPC classification number: G01R21/06 ,  G01R23/02 ,  H01J37/32045 ,  H02M7/003 ,  H02M7/5383 ,  H03H7/40 ,  H05B41/2806 ,  H05H1/46 ,  Y02B20/22

Abstract: A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network, wherein the at least one output network includes at least one inductance that has at least one magnetic field strengthening element that is a Perminvar ferrite.

Abstract translation: 等离子体供给装置以大于3MHz的基本上恒定的基本频率产生大于500W的输出功率，并对供给所产生的输出功率的等离子体处理进行供电，并从反射功率返回到等离子体供应装置。 等离子体供给装置包括至少一个连接到DC电源的逆变器，该逆变器具有至少一个开关元件和输出网络，其中至少一个输出网络包括至少一个具有至少一个磁场强化的电感 元素是Perminvar铁氧体。

公开(公告)号：US08044594B2

公开(公告)日：2011-10-25

申请号：US12424138

申请日：2009-04-15

Applicant: Forrest Morgan ,  Daryl Frost ,  Frank Heine ,  Doug Pelleymounter ,  Hendrik Walde

Inventor： Forrest Morgan ,  Daryl Frost ,  Frank Heine ,  Doug Pelleymounter ,  Hendrik Walde

IPC: H01J7/24

CPC classification number: H01J37/3299 ,  H01J37/32045 ,  H01J37/32174 ,  H01J37/32935 ,  H01J37/32944

Abstract: One embodiment comprises a plasma processing system having a plasma chamber, a generator, a feedback component, and a controller. The feedback component is adapted to receive at least one first signal having a level dependent upon the power signal supplied from the generator to the chamber. A feedback output is adapted to emit a second signal to the controller, which is adapted to supply a third signal to the power generator. The third signal is configured to control the power generator to supply the power signal at a power level for a particular processing application. The power generator is further controlled by the controller to one of reduce and remove power from the plasma processing chamber and subsequently increase the voltage level until the power level reaches a threshold level. The power generator is further controlled to subsequently modulate the voltage until the voltage returns to a first voltage level.

Abstract translation: 一个实施例包括具有等离子体室，发生器，反馈部件和控制器的等离子体处理系统。 反馈分量适于接收至少一个具有取决于从发生器提供给腔室的功率信号的电平的第一信号。 反馈输出适于向控制器发射第二信号，其适于向发电机提供第三信号。 第三信号被配置为控制发电机为特定处理应用的功率电平提供功率信号。 功率发生器由控制器进一步控制，以减少和去除等离子体处理室的功率，随后增加电压电平直到功率电平达到阈值水平。 进一步控制发电机以随后调制电压，直到电压恢复到第一电压电平。