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41.发明申请公开(公告)号：US20220371121A1
公开(公告)日：2022-11-24
申请号：US17817197
申请日：2022-08-03
Applicant: Gigaphoton Inc.
Inventor： Koichi FUJII , Osamu WAKABAYASHI
IPC: B23K26/046 , B23K26/082 , B23K26/0622 , B23K26/03 , B23K26/359
Abstract: An exposure system that performs scanning exposure of a semiconductor substrate by irradiating a reticle with a pulse laser beam includes a laser apparatus configured to emit a pulse laser beam, an illumination optical system through which the pulse laser beam is guided to the reticle, a reticle stage, and a processor configured to control emission of the pulse laser beam from the laser apparatus and movement of the reticle by the reticle stage. The reticle includes a region in which multiple kinds of patterns are arranged in a mixed manner in a scanning width direction orthogonal to a scanning direction of the scanning exposure. The processor instructs the laser apparatus about a target wavelength such that the laser apparatus emits the pulse laser beam of a wavelength with which dispersion of best focus positions corresponding to respective patterns of the multiple kinds of patterns is minimum.
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42.发明授权公开(公告)号：US11502478B2
公开(公告)日：2022-11-15
申请号：US16674918
申请日：2019-11-05
Applicant: Gigaphoton Inc.
Inventor： Hiroyuki Masuda , Osamu Wakabayashi
Abstract: A laser apparatus according to the present disclosure includes: a laser output unit configured to perform laser oscillation; and a control unit configured to acquire first laser performance data obtained when the laser output unit performs laser oscillation based on a first laser control parameter, and second laser performance data obtained when the laser output unit performs laser oscillation based on a second laser control parameter, while laser output from the laser output unit to an external device is stopped, and determine whether the second laser performance data has been improved as compared to the first laser performance data.
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43.发明授权公开(公告)号：US11500194B2
公开(公告)日：2022-11-15
申请号：US17036412
申请日：2020-09-29
Applicant: Gigaphoton Inc.
Inventor： Takashi Suganuma , Takahiro Tatsumi
Abstract: A beam delivery system according to an aspect of the present disclosure is used for an extreme ultraviolet light generation apparatus and includes a propagation mirror disposed on an optical path between a laser apparatus and a condensation optical system and configured to change the propagation direction of a pulse laser beam, and a curvature mirror disposed on an optical path between the propagation mirror and the condensation optical system and having a concave reflective surface configured to convert the pulse laser beam to be incident on the condensation optical system into a convergent beam. The curvature mirror has a focal length selected so that the beam spread angle of the pulse laser beam from the curvature mirror is constant irrespective of thermal deformation of the propagation mirror or constant with change in a predetermined allowable range irrespective of thermal deformation of the propagation mirror.
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公开(公告)号：US20220350120A1
公开(公告)日：2022-11-03
申请号：US17858765
申请日：2022-07-06
Applicant: Gigaphoton Inc.
Inventor： Hirotaka MIYAMOTO , Osamu WAKABAYASHI
IPC: G02B17/02 , G02B27/28 , G02B5/30 , G02B26/08 , H01S3/00 , H01S3/23 , H01S3/225 , H01S3/08 , G03F7/20
Abstract: A pulse width expansion apparatus according to an aspect of the present disclosure includes a polarization beam splitter and a transfer optical system. The transfer optical system includes ¼-wavelength and reflection mirror pairs. The ¼-wavelength mirror pair include first and second ¼-wavelength mirrors. The first ¼-wavelength mirror provides ¼-wavelength phase shift and reflects a pulse laser beam. The second ¼-wavelength mirror provides ¼-wavelength phase shift and reflects the pulse laser beam reflected by the first ¼-wavelength mirror. The reflection mirror pair are disposed on an optical path before and after or between the ¼-wavelength mirror pair. The transfer optical system transfers an image of an input pulse laser beam on the polarization beam splitter to the optical path between the ¼-wavelength mirror pair at one-to-one magnification as a first transfer image and transfers the first transfer image to the polarization beam splitter at one-to-one magnification as a second transfer image.
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45.发明申请公开(公告)号：US20220342311A1
公开(公告)日：2022-10-27
申请号：US17858674
申请日：2022-07-06
Applicant: Gigaphoton Inc.
Inventor： Yutaka IGARASHI , Satoru KIKUCHI , Kunihiko ABE , Yuji MINEGISHI
Abstract: An information processing device includes a processor and a storage device. The processor is configured to acquire data for each parameter provided from each of a light source device which generates pulse light and an exposure apparatus which performs exposure on a wafer with the pulse light output from the light source device, and time data associated with the data; to perform classification, based on the acquired data and time data, for each record of the data associated with same time data for distinguishing whether being data during exposure in which the wafer is irradiated with the pulse light or being data during non-exposure; to associate attribute information indicating an attribute according to the classification with each of the records; to cause the storage device to store the data and the time data associated with the attribute information; and to generate a chart using data read from the storage device.
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Patent Agency Ranking
46.发明授权公开(公告)号：US11483917B2
公开(公告)日：2022-10-25
申请号：US17156376
申请日：2021-01-22
Applicant: Gigaphoton Inc.
Inventor： Atsushi Ueda , Takayuki Osanai , Koichiro Koge
Abstract: A chamber device may include a concentrating mirror, a central gas supply port, an inner wall, an exhaust port, a recessed portion, and a lateral gas supply port. The recessed portion may be on a side lateral to the focal line and recessed outward from the inner wall when viewed from a direction perpendicular to the focal line. The lateral gas supply port is formed at the recessed portion and may supply gas toward gas supplied from the central gas supply port so that a flow direction of the gas supplied from the central gas supply port is bent from a direction along the focal line toward the exhaust port and an internal space of the recessed portion.
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47.发明授权公开(公告)号：US11410785B2
公开(公告)日：2022-08-09
申请号：US17230456
申请日：2021-04-14
Applicant: Gigaphoton Inc.
Inventor： Yoshiyuki Honda , Masayuki Morita
Abstract: An extreme ultraviolet light concentrating mirror may include a substrate, a multilayer reflection film provided on the substrate and configured to reflect extreme ultraviolet light, and a protective film provided on the multilayer reflection film. Here, the protective film may include a mixed film in which a network-forming oxide is mixed with an amorphous titanium oxide, or a mixed film in which two or more amorphous titanium oxide layers and two or more network-forming oxide layers are each alternately laminated.
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公开(公告)号：US20220232690A1
公开(公告)日：2022-07-21
申请号：US17457342
申请日：2021-12-02
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Takayuki YABU , Hiroaki NAKARAI
Abstract: An extreme ultraviolet light generation system includes a target supply unit configured to supply a target substance to a first predetermined region, a laser system configured to output pulse laser light to be radiated to the target substance in the first predetermined region, a first sensor configured to detect an arrival timing at which the target substance has reached a second predetermined region between the target supply unit and the first predetermined region, an optical adjuster arranged on an optical path of the pulse laser light between the laser system and the first predetermined region, and a processor configured to control transmittance of the pulse laser light through the optical adjuster based on the arrival timing.
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49.发明授权公开(公告)号：US11337292B1
公开(公告)日：2022-05-17
申请号：US17458148
申请日：2021-08-26
Applicant: Gigaphoton Inc.
Inventor： Gouta Niimi , Georg Soumagne
Abstract: A tin trap device may include a housing including a gas inlet port into which gas containing tin flows from a chamber device, an internal space which communicates with the gas inlet port, and a gas exhaust port which exhausts the gas while communicating with the internal space; a multiple tube including a plurality of tube members, arranged on a flow path of the gas traveling to the gas exhaust port from the gas inlet port through the internal space, and having a temperature at which the tin deposited from the gas adheres to the tube member; and a gas travel direction changing member configured to change a travel direction of at least fastest gas of the gas traveling from the gas inlet port to the multiple tube.
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公开(公告)号：US20220110205A1
公开(公告)日：2022-04-07
申请号：US17468395
申请日：2021-09-07
Applicant: Gigaphoton Inc.
Inventor： Takayuki YABU , Yoshifumi UENO
Abstract: An extreme ultraviolet light generation system may include a laser device configured to emit pulse laser light, an EUV light concentrating mirror configured to reflect and concentrate extreme ultraviolet light generated by irradiating a target with the pulse laser light, and a processor configured to receive a first energy parameter of the extreme ultraviolet light and control an irradiation frequency of the pulse laser light with which the target is irradiated so that change in a second energy parameter related to energy per unit time of the extreme ultraviolet light reflected by the EUV light concentrating mirror is suppressed.
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