Heat treatment facility for synthetic vitreous silica bodies
    47.
    发明授权
    Heat treatment facility for synthetic vitreous silica bodies 失效
    合成玻璃体二氧化硅体热处理设备

    公开(公告)号:US5713979A

    公开(公告)日:1998-02-03

    申请号:US335789

    申请日:1994-11-10

    Abstract: An induction-heated furnace, suitable for heat treatment of synthetic silica bodies, under conditions of high purity, includes a tubular susceptor (1) disposed with its axis vertical and an induction coil (3) for raising the temperature of the susceptor. The susceptor is made from graphite and/or silicon carbide, and is enclosed within a vacuum envelope (2) made from vitreous silica or fused quartz, the envelope being surrounded by the induction coil which is liquid-cooled. The design is such that the vacuum envelope (2) operates at temperatures below those at which either devitrification or sagging of the envelope might occur even when the tubular susceptor (1) is heated to a temperature of 1700.degree. C. Thus sintering of a porous synthetic silica body (9) can be carried out under atmospheric or reduced pressure, the furnace including a shaft (7) adapted to support the body to be heated and capable of rotation about and movement along said vertical axis of the tubular susceptor (1).

    Abstract translation: PCT No.PCT / GB93 / 00983 Sec。 371日期:1994年11月10日 102(e)1994年11月10日日期PCT 1993年5月13日PCT公布。 公开号WO93 / 23341 日期:1993年11月25日在高纯度条件下适用于合成二氧化硅体的热处理的感应加热炉包括以其轴线垂直设置的管状基座(1)和用于提高温度的感应线圈(3) 感受器。 基座由石墨和/或碳化硅制成,并被封闭在由玻璃状二氧化硅或熔融石英制成的真空外壳(2)中,外壳被液冷的感应线圈包围。 该设计使得真空外壳(2)的工作温度低于即使将管状基座(1)加热至1700℃的温度,也可能出现外壳的失透或下垂的温度。因此,将多孔 合成二氧化硅体(9)可在大气压或低压下进行,该炉包括适于支撑被加热物体的轴(7),并且能够沿管状基座(1)的所述垂直轴线旋转并移动, 。

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