公开(公告)号：US20150021294A1

公开(公告)日：2015-01-22

申请号：US14333502

申请日：2014-07-16

Applicant: Hitachi High-Technologies Corporation

Inventor： Masahito Togami ,  Tatehito Usui ,  Kosa Hirota ,  Satomi Inoue ,  Shigeru Nakamoto

IPC: H01J37/32

CPC classification number: H01J37/32972 ,  H01J37/32458 ,  H01J37/32908 ,  H01J37/32963 ,  H01J37/3299 ,  H01J2237/0266 ,  H01J2237/2445 ,  H01J2237/3341

Abstract: A plasma processing apparatus includes: a detector configured to detect a change in an intensity of light emission from plasma formed inside a processing chamber; and a unit configured to adjust conditions for forming the plasma or processing a wafer arranged inside the processing chamber using an output from the detector, wherein the detector detects a signal of the intensity of light emission at plural time instants before an arbitrary time instant during processing, and wherein the adjusting unit removes the component of a temporal change of a long cycle of the intensity of light emission from this detected signal and detects the component of a short temporal change of the intensity of light emission, and adjusts the conditions for forming the plasma or processing a wafer arranged inside the processing chamber based on the short temporal change of the detected intensity of light emission.

Abstract translation: 一种等离子体处理装置，包括：检测器，被配置为检测处理室内形成的等离子体的发光强度的变化; 以及单元，被配置为使用来自检测器的输出来调整用于形成等离子体的条件或处理布置在处理室内的晶片，其中检测器在处理期间的任意时刻之前检测多个时刻的发光强度的信号 ，并且其中所述调整单元从所述检测信号中去除所述发光强度的长周期的时间变化的分量，并且检测所述分量的发光强度的短时间变化，并且调整形成所述发光的条件 基于检测到的发光强度的短时间变化，等离子体或处理布置在处理室内的晶片。

公开(公告)号：US20140210337A1

公开(公告)日：2014-07-31

申请号：US14240915

申请日：2011-08-30

Applicant: Yuichi Setsuhara ,  Akinori Ebe

Inventor： Yuichi Setsuhara ,  Akinori Ebe

IPC: H01J37/32

CPC classification number: H01J37/32651 ,  C23C14/358 ,  C23C16/509 ,  H01J37/32082 ,  H01J37/321 ,  H01J37/3211 ,  H01J2237/0266 ,  H05H1/46 ,  H05H2001/4667

Abstract: A radio-frequency antenna includes a linear antenna conductor, a dielectric protective pipe provided around the antenna conductor, and a deposit shield provided around the protective pipe, the deposit shield covering at least one portion of the protective pipe and having at least one opening on any line extending along the length of the antenna conductor. Although the thin-film material adheres to the surfaces of the protective pipe and the deposit shield, the deposited substance has at least one discontinuous portion in the longitudinal direction of the antenna conductor. Therefore, in the case where the thin-film material is electrically conductive, the blocking of the radio-frequency induction electric field is prevented. In the case where the thin-film material is not electrically conductive, an attenuation in the intensity of the radio-frequency induction electric field is suppressed.

Abstract translation: 射频天线包括线性天线导体，设置在天线导体周围的介质保护管，以及设置在保护管周围的沉积屏蔽层，该沉积屏蔽覆盖至少一部分保护管，并具有至少一个开口 任何沿着天线导体的长度延伸的线。 尽管薄膜材料粘附在保护管和沉积屏蔽的表面上，但沉积物质在天线导体的纵向上具有至少一个不连续部分。 因此，在薄膜材料导电的情况下，防止了射频感应电场的阻塞。 在薄膜材料不导电的情况下，抑制了射频感应电场强度的衰减。

公开(公告)号：US08633439B2

公开(公告)日：2014-01-21

申请号：US13175384

申请日：2011-07-01

Applicant: Chia-Chi Tsao ,  Syun-Jie Jhan ,  Yi-Cheng Shih ,  Chwen Yu

Inventor： Chia-Chi Tsao ,  Syun-Jie Jhan ,  Yi-Cheng Shih ,  Chwen Yu

IPC: G01N23/00 ,  G21K7/00

CPC classification number: H05K9/0007 ,  H01J37/09 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0264 ,  H01J2237/0266

Abstract: System and method for EMI shielding for a CD-SEM are described. One embodiment is a scanning electron microscope (“SEM”) comprising an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; and a dual-layer shield disposed around and enclosing the SE detector. The shield comprises a magnetic shielding lamina layer and a metallic foil layer.

Abstract translation: 描述了用于CD-SEM的EMI屏蔽的系统和方法。 一个实施例是包括用于产生朝向样品的电子束的电子枪的扫描电子显微镜（“SEM”）。 用于响应于电子束检测从样品反射的二次电子的二次电子（“SE”）检测器; 以及设置在SE检测器周围并包围SE检测器的双层屏蔽。 屏蔽包括磁屏蔽层和金属箔层。

公开(公告)号：US20130001419A1

公开(公告)日：2013-01-03

申请号：US13175384

申请日：2011-07-01

Applicant: Chia-Chi Tsao ,  Syun-Jie Jhan ,  Yi-Cheng Shih ,  Chwen Yu

Inventor： Chia-Chi Tsao ,  Syun-Jie Jhan ,  Yi-Cheng Shih ,  Chwen Yu

IPC: H01J37/28 ,  H05K9/00

CPC classification number: H05K9/0007 ,  H01J37/09 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0264 ,  H01J2237/0266

Abstract: System and method for EMI shielding for a CD-SEM are described. One embodiment is a scanning electron microscope (“SEM”) comprising an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; and a dual-layer shield disposed around and enclosing the SE detector. The shield comprises a magnetic shielding lamina layer and a metallic foil layer.

Abstract translation: 描述了用于CD-SEM的EMI屏蔽的系统和方法。 一个实施例是包括用于产生朝向样品的电子束的电子枪的扫描电子显微镜（SEM） 用于响应于电子束检测从样品反射的二次电子的二次电子（SE）检测器; 以及设置在SE检测器周围并包围SE检测器的双层屏蔽。 屏蔽包括磁屏蔽薄层和金属箔层。