公开(公告)号：US20240304426A1

公开(公告)日：2024-09-12

申请号：US18667944

申请日：2024-05-17

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Sheng-chun YANG ,  Po-Wei LIANG ,  Chao-Hung WAN ,  Yi-Ming LIN ,  Liu Che KANG

IPC: H01J37/32

CPC classification number: H01J37/32651 ,  H01J37/32082 ,  H01J2237/0266

Abstract: A radio frequency (RF) screen for a microwave powered ultraviolet (UV) lamp system is disclosed. In one example, a disclosed RF screen includes: a sheet comprising a conductive material; and a frame around edges of the sheet. The conductive material defines a predetermined mesh pattern of individual openings across substantially an operative area of the screen. Each of the individual openings has a triangular shape.

公开(公告)号：US20180218885A1

公开(公告)日：2018-08-02

申请号：US15878532

申请日：2018-01-24

Applicant: NGK INSULATORS, LTD.

Inventor： Daiki Maeda ,  Yutaka Unno

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/683 ,  C23C16/505 ,  C23C16/458

CPC classification number: H01J37/32724 ,  C23C16/4586 ,  C23C16/505 ,  C23C16/5096 ,  H01J37/32082 ,  H01J37/32559 ,  H01J2237/0266 ,  H01J2237/3321 ,  H01J2237/334 ,  H01L21/67103 ,  H01L21/6831 ,  H01L21/6833

Abstract: A wafer support of the present invention includes shield sheet embedded in the ceramic base between the plasma generation electrode and the heater electrode in a state not contacting both the electrodes; and a shield pipe electrically connected to the shield sheet and laid to extend to outside of the ceramic base from the surface of the ceramic base on the side opposite to the wafer placement surface, wherein the wiring member for the plasma generation electrode is inserted through inside of the shield pipe in a state not contacting the shield pipe, and the wiring member for the heater electrode is disposed outside the shield pipe in a state not contacting the shield pipe.

公开(公告)号：US20130094008A1

公开(公告)日：2013-04-18

申请号：US13612496

申请日：2012-09-12

Applicant: Jerry Johannes Martinus Peijster

Inventor： Jerry Johannes Martinus Peijster

IPC: G03B27/58 ,  H02K41/02

CPC classification number: G03B27/58 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70841 ,  H01J37/20 ,  H01J37/3177 ,  H01J2237/0266 ,  H01J2237/16 ,  H01J2237/2006 ,  H01J2237/20221 ,  H01J2237/20285 ,  H02K41/02

Abstract: A target positioning device, in particular for a lithography system, comprising a carrier for carrying a target, and a stage for carrying and moving the carrier along a first direction (X). The stage comprising two X-stage bases, both arranged on top of a common base plate, each X-stage base carries an X-stage carriage, and a Y-beam comprising a Y-stage for carrying said carrier and moving the carrier said carrier in a second direction (Y). The Y-beam bridges the space between the X-stage carriages and is connected to the X-stage carriages via a flexible coupling. The device further comprises two motors each for driving a corresponding X-stage carriage along its corresponding X-stage base. The two motors are arranged at least substantially below the stage. Each motor of said two motors is coupled to an eccentric cam or crank which is connected to the corresponding X-stage carriage via a crank shaft.

Abstract translation: 特别是用于光刻系统的目标定位装置，包括用于承载目标的载体，以及用于沿着第一方向（X）承载和移动载体的载物台。 该平台包括两个X平台，两者都布置在公共基板的顶部上，每个X级底座承载X级托架，Y形梁包括Y级，用于承载所述托架并使托架移动 载体在第二方向（Y）上。 Y型梁桥接X级滑架之间的空间，并通过柔性联轴器连接到X级滑架。 该装置还包括两个电动机，每个电动机用于沿其相应的X级基座驱动相应的X档架。 这两个电动机至少在平台的下方布置。 所述两个电动机的每个电动机联接到偏心凸轮或曲柄，所述偏心凸轮或曲柄通过曲柄轴连接到相应的X档架上。

公开(公告)号：US20120305763A1

公开(公告)日：2012-12-06

申请号：US13149318

申请日：2011-05-31

Applicant: Konstantine Chirko ,  Alon Litman ,  Yoav Nachum

Inventor： Konstantine Chirko ,  Alon Litman ,  Yoav Nachum

IPC: G01N23/00

CPC classification number: G01R33/025 ,  H01J37/28 ,  H01J2237/0266 ,  H01J2237/2485

Abstract: A system and method for noise compensation of a charged particle beam location includes one or more sensors that are spaced apart from each other for sensing magnetic noises within at least one predefined frequency band thereby to provide magnetic noise measurements with synchronous detection of the location of a charged particle beam. Based on the magnetic noise measurements and on relationships between values of the magnetic noises and particle beam location errors, magnetic noise compensations signals are generated. An object is then scanned by a particle beam in response to a desired particle beam scan pattern and the magnetic noise compensation signals.

Abstract translation: 用于带电粒子束位置的噪声补偿的系统和方法包括彼此间隔开的一个或多个传感器，用于感测至少一个预定频带内的磁噪声，由此提供磁噪声测量，同时检测位置的一个 带电粒子束。 基于磁噪声测量以及磁噪声和粒子束位置误差之间的关系，产生磁噪声补偿信号。 然后响应于期望的粒子束扫描图案和磁噪声补偿信号，通过粒子束扫描物体。

公开(公告)号：US20020046944A1

公开(公告)日：2002-04-25

申请号：US09893811

申请日：2001-06-27

Inventor： Ehood Geva

IPC: C23C014/34

CPC classification number: H01J37/34 ,  C23C14/34 ,  C23C14/54 ,  H01J2237/0266

Abstract: A sputter deposition chamber may be fitted with measures to prevent or reduce electrical noise that might otherwise interfere with a controller for the sputter deposition chamber. A grounded shield plate may be coupled to an insulating member by which a sputtering target is mounted in the chamber. A ground line, separate from a power supply line, may be coupled to the chamber's enclosure wall and to a varying power supply. One or more filters may be coupled in series between chamber components and a controller associated with the chamber.

Abstract translation: 溅射沉积室可以配备有防止或减少可能干扰溅射沉积室的控制器的电噪声的措施。 接地的屏蔽板可以耦合到绝缘构件，溅射靶通过该绝缘构件安装在腔室中。 与电源线分开的接地线可以耦合到室的外壳壁和变化的电源。 一个或多个过滤器可以串联耦合在腔室部件和与腔室相关联的控制器之间。

公开(公告)号：US11670491B2

公开(公告)日：2023-06-06

申请号：US16929881

申请日：2020-07-15

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Sheng-chun Yang ,  Po-Wei Liang ,  Chao-Hung Wan ,  Yi-Ming Lin ,  Liu Che Kang

IPC: H01J37/32

CPC classification number: H01J37/32651 ,  H01J37/32082 ,  H01J2237/0266

Abstract: A radio frequency (RF) screen for a microwave powered ultraviolet (UV) lamp system is disclosed. In one example, a disclosed RF screen includes: a sheet comprising a conductive material; and a frame around edges of the sheet. The conductive material defines a predetermined mesh pattern of individual openings across substantially an operative area of the screen. Each of the individual openings has a triangular shape.

公开(公告)号：US08999105B2

公开(公告)日：2015-04-07

申请号：US14370107

申请日：2013-01-04

Applicant: President and Fellows of Harvard College

Inventor： Marko Loncar ,  Mikhail D. Lukin ,  Michael J. Burek ,  Nathalie de Leon ,  Brendan Shields

IPC: H05H1/00 ,  H01L21/683 ,  H01L33/00 ,  H01L21/3065 ,  G02B6/136 ,  H01J37/32 ,  H01L21/027 ,  H01L21/308 ,  H01L29/04 ,  H01L29/06 ,  G02B6/122

CPC classification number: H01L21/3065 ,  G02B6/1225 ,  G02B6/136 ,  H01J37/32577 ,  H01J37/32651 ,  H01J37/32715 ,  H01J2237/0266 ,  H01J2237/2007 ,  H01J2237/334 ,  H01J2237/3341 ,  H01L21/027 ,  H01L21/308 ,  H01L29/04 ,  H01L29/0665

Abstract: An etch mask is formed on a substrate. The substrate is positioned in an enclosure configured to shield an interior of the enclosure from electromagnetic fields exterior to the enclosure; and the substrate is etched in the enclosure, including removing a portion of the substrate to form a structure having at least a portion that is isolated and/or suspended over the substrate.

Abstract translation: 在基板上形成蚀刻掩模。 基板被定位在被配置为将外壳的内部屏蔽到外壳外部的电磁场的外壳中; 并且衬底在外壳中被蚀刻，包括去除衬底的一部分以形成至少一部分被分离和/或悬挂在衬底上的结构。

公开(公告)号：US20140367687A1

公开(公告)日：2014-12-18

申请号：US14370107

申请日：2013-01-04

Applicant: President and Fellows of Harvard College

Inventor： Marko Loncar ,  Mikhail D. Lukin ,  Michael J. Burek ,  Nathalie de Leon ,  Brendan Shields

IPC: H01L21/3065 ,  H01J37/32 ,  H01L29/04 ,  H01L29/06 ,  H01L21/027 ,  H01L21/308

CPC classification number: H01L21/3065 ,  G02B6/1225 ,  G02B6/136 ,  H01J37/32577 ,  H01J37/32651 ,  H01J37/32715 ,  H01J2237/0266 ,  H01J2237/2007 ,  H01J2237/334 ,  H01J2237/3341 ,  H01L21/027 ,  H01L21/308 ,  H01L29/04 ,  H01L29/0665

Abstract: An etch mask is formed on a substrate. The substrate is positioned in an enclosure configured to shield an interior of the enclosure from electromagnetic fields exterior to the enclosure; and the substrate is etched in the enclosure, including removing a portion of the substrate to form a structure having at least a portion that is isolated and/or suspended over the substrate.

Abstract translation: 在基板上形成蚀刻掩模。 基板被定位在被配置为将外壳的内部屏蔽到外壳外部的电磁场的外壳中; 并且衬底在外壳中被蚀刻，包括去除衬底的一部分以形成至少一部分被分离和/或悬挂在衬底上的结构。

公开(公告)号：US08436318B2

公开(公告)日：2013-05-07

申请号：US12754258

申请日：2010-04-05

Applicant: Frank Sinclair ,  Costel Biloiu ,  Bon-Woong Koo ,  Victor Benveniste ,  Shardul Patel

Inventor： Frank Sinclair ,  Costel Biloiu ,  Bon-Woong Koo ,  Victor Benveniste ,  Shardul Patel

IPC: H01J27/00

CPC classification number: H01J37/32495 ,  H01J27/16 ,  H01J37/08 ,  H01J37/3171 ,  H01J37/321 ,  H01J37/32412 ,  H01J37/32422 ,  H01J37/32522 ,  H01J2237/022 ,  H01J2237/0266 ,  H01J2237/0817

Abstract: An RF ion source utilizing a heating/RF-shielding element for controlling the temperature of an RF window and to act as an RF shielding element for the RF ion source. When the heating/RF shielding element is in a heating mode, it suppresses formation of unwanted deposits on the RF window which negatively impacts the transfer of RF energy from an RF antenna to a plasma chamber. When the heating/RF-shielding element is in a shielding mode, it provides an electrostatic shielding for the RF ion source.

Abstract translation: RF离子源，其利用加热/ RF屏蔽元件来控制RF窗口的温度并用作RF离子源的RF屏蔽元件。 当加热/ RF屏蔽元件处于加热模式时，它抑制在RF窗口上形成不需要的沉积物，这对RF能量从RF天线到等离子体室的转移产生负面影响。 当加热/ RF屏蔽元件处于屏蔽模式时，它为RF离子源提供静电屏蔽。

公开(公告)号：US08389962B2

公开(公告)日：2013-03-05

申请号：US13149318

申请日：2011-05-31

Applicant: Konstantine Chirko ,  Alon Litman ,  Yoav Nachum

Inventor： Konstantine Chirko ,  Alon Litman ,  Yoav Nachum

IPC: G11B9/10 ,  G01B17/02 ,  G06K9/00

CPC classification number: G01R33/025 ,  H01J37/28 ,  H01J2237/0266 ,  H01J2237/2485

Abstract: A system and method for noise compensation of a charged particle beam location includes one or more sensors that are spaced apart from each other for sensing magnetic noises within at least one predefined frequency band thereby to provide magnetic noise measurements with synchronous detection of the location of a charged particle beam. Based on the magnetic noise measurements and on relationships between values of the magnetic noises and particle beam location errors, magnetic noise compensations signals are generated. An object is then scanned by a particle beam in response to a desired particle beam scan pattern and the magnetic noise compensation signals.

Abstract translation: 用于带电粒子束位置的噪声补偿的系统和方法包括彼此间隔开的一个或多个传感器，用于感测至少一个预定频带内的磁噪声，由此提供磁噪声测量，同时检测位置的一个 带电粒子束。 基于磁噪声测量以及磁噪声和粒子束位置误差之间的关系，产生磁噪声补偿信号。 然后响应于期望的粒子束扫描图案和磁噪声补偿信号，通过粒子束扫描物体。