公开(公告)号：US20150206704A1

公开(公告)日：2015-07-23

申请号：US14411286

申请日：2013-04-12

Applicant: Hitachi High-Technologies Corporation

Inventor： Yasuyuki Momoi ,  Shigeru Haneda ,  Naoki Sakamoto ,  Masashi Shibahara ,  Akito Tanokuchi

IPC: H01J37/20 ,  G02B21/06 ,  H01J37/29 ,  G02B21/26

CPC classification number: H01J37/20 ,  G02B21/06 ,  G02B21/26 ,  G05B19/402 ,  G05D3/12 ,  H01J37/28 ,  H01J37/292 ,  H01J2237/20221 ,  H01J2237/20264

Abstract: In order to provide a stage apparatus with high speed stability in addition to being able to achieve positioning with a high degree of accuracy, and a sample observation apparatus, such as an optical microscope and a scanning electron microscope, including the stage apparatus, the stage apparatus and the sample observation apparatus of the present invention correct a command voltage value of standard waveform data or an output timing of a command voltage value such that a difference between a first time history response and a second time history response is reduced to zero, the first time history response for displacement or speed when the stage mechanism is driven with use of the standard waveform data showing the command voltage value at each predetermined time and the second time history response for displacement or speed when a speed of the stage mechanism is constant, to be set as drive waveform data to be outputted to a drive unit of the stage mechanism.

Abstract translation: 为了提供除了能够高精度地定位以外的高速稳定性的舞台装置以及包括舞台装置的诸如光学显微镜和扫描电子显微镜的样本观察装置，舞台装置 本发明的装置和样本观察装置将标准波形数据的指令电压值或指令电压值的输出定时校正，使得第一时间历史响应和第二时间历程响应之间的差减小到零， 当舞台机构的速度恒定时，使用表示每个预定时间的指令电压值的标准波形数据和位移或速度的第二时间历程响应来驱动舞台机构时的位移或速度的第一时间历程响应， 被设置为驱动波形数据以输出到级机构的驱动单元。

公开(公告)号：US20150155133A1

公开(公告)日：2015-06-04

申请号：US14560845

申请日：2014-12-04

Applicant: Hermes Microvision Inc.

Inventor： Zhongwei Chen ,  Jack Jau ,  Weiming Ren

IPC: H01J37/26 ,  H01J37/22 ,  H01J37/20 ,  H01J37/10 ,  H01J37/14

CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J37/10 ,  H01J37/14 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/261 ,  H01J37/285 ,  H01J37/292 ,  H01J2237/04926 ,  H01J2237/1405 ,  H01J2237/24475 ,  H01J2237/24495 ,  H01J2237/24528 ,  H01J2237/2801 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2814

Abstract: The present invention provides apparatuses to inspect small particles on the surface of a sample such as wafer and mask. The apparatuses provide both high detection efficiency and high throughput by forming Dark-field BSE images. The apparatuses can additionally inspect physical and electrical defects on the sample surface by form SE images and Bright-field BSE images simultaneously. The apparatuses can be designed to do single-beam or even multiple single-beam inspection for achieving a high throughput.

公开(公告)号：US20150083912A1

公开(公告)日：2015-03-26

申请号：US14560784

申请日：2014-12-04

Applicant: Hermes Microvision Inc.

Inventor： Zhongwei Chen ,  Jack Jau ,  Weiming Ren

IPC: H01J37/26 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J37/10 ,  H01J37/14 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/261 ,  H01J37/285 ,  H01J37/292 ,  H01J2237/04926 ,  H01J2237/1405 ,  H01J2237/24475 ,  H01J2237/24495 ,  H01J2237/24528 ,  H01J2237/2801 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2814

Abstract: The present invention provides apparatuses to inspect small particles on the surface of a sample such as wafer and mask. The apparatuses provide both high detection efficiency and high throughput by forming Dark-field BSE images. The apparatuses can additionally inspect physical and electrical defects on the sample surface by form SE images and Bright-field BSE images simultaneously. The apparatuses can be designed to do single-beam or even multiple single-beam inspection for achieving a high throughput.

Abstract translation: 本发明提供了检查诸如晶片和掩模之类的样品表面上的小颗粒的装置。 这些装置通过形成暗场BSE图像提供高检测效率和高吞吐量。 这些装置可以通过同时形成SE图像和亮场BSE图像另外检查样品表面上的物理和电气缺陷。 这些装置可被设计成进行单光束或甚至多个单光束检查以实现高吞吐量。

公开(公告)号：US20140368186A1

公开(公告)日：2014-12-18

申请号：US14109575

申请日：2013-12-17

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Takahiro IKEDA

IPC: H01J37/26 ,  G01N27/00

CPC classification number: H01J37/244 ,  G01N23/22 ,  H01J37/292 ,  H01J2237/2444 ,  H01J2237/24495 ,  H01J2237/24564

Abstract: In accordance with an embodiment, an inspection apparatus includes an electron beam applying unit, a voltage applying unit, a substantially flat component with a lattice pattern, and a first detector. The electron beam applying unit generates an electron beam and applies the electron beam to a sample at a first voltage. The voltage applying unit applies a second voltage to the sample. The polarity of the second voltage is opposite to that of the first voltage. The absolute value of the second voltage exceeds the absolute value of the first voltage. The component is provided at a position where the electron beam specularly reflected by the second voltage before reaching the sample is focused. The first detector detects a secondary electron generated from the component which the specularly reflected electron beam has entered and outputs a first signal.

Abstract translation: 根据实施例，检查装置包括电子束施加单元，电压施加单元，具有格子图案的基本平坦的部件和第一检测器。 电子束施加单元产生电子束，并以第一电压将电子束施加到样品。 电压施加单元对样品施加第二电压。 第二电压的极性与第一电压的极性相反。 第二电压的绝对值超过第一电压的绝对值。 该组件设置在聚焦到达到样品之前由第二电压镜面反射的电子束的位置。 第一检测器检测由镜面反射电子束已经进入的分量产生的二次电子并输出第一信号。

公开(公告)号：US20120298863A1

公开(公告)日：2012-11-29

申请号：US13568922

申请日：2012-08-07

Applicant: Minoru Yamazaki ,  Akira Ikegami ,  Hideyuki Kazumi ,  Osamu Nasu

Inventor： Minoru Yamazaki ,  Akira Ikegami ,  Hideyuki Kazumi ,  Osamu Nasu

IPC: G01N23/225

CPC classification number: G01N23/2251 ,  G01R29/24 ,  H01J37/28 ,  H01J37/292 ,  H01J2237/221 ,  H01J2237/244 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/2594

Abstract: An object of the present invention is to provide a method and apparatus for measuring a potential on a surface of a sample using a charged particle beam while restraining a change in the potential on the sample induced by the charged particle beam application, or detecting a compensation value for a change in a condition for the apparatus caused by the sample being electrically charged. In order to achieve the above object, the present invention provides a method and apparatus for applying a voltage to a sample so that a charged particle beam does not reach the sample (hereinafter, this may be referred to as “mirror state”) in a state in which the charged particle beam is applied toward the sample, and detecting information relating to a potential on the sample using signals obtained by that voltage application.

Abstract translation: 本发明的目的是提供一种方法和装置，用于使用带电粒子束测量样品表面上的电位，同时抑制由带电粒子束施加引起的样品上的电位变化，或检测补偿 用于由样品带电引起的装置的状况改变的值。 为了实现上述目的，本发明提供了一种向样品施加电压使得带电粒子束未到达样品的方法和装置（以下称为镜像状态），其状态为 将带电粒子束施加到样品，并使用通过该电压施加获得的信号来检测与样品上的电位有关的信息。

公开(公告)号：US07411190B2

公开(公告)日：2008-08-12

申请号：US11450459

申请日：2006-06-12

Applicant: Hiroshi Makino ,  Hisaya Murakoshi ,  Hiroyuki Shinada ,  Hideo Todokoro

Inventor： Hiroshi Makino ,  Hisaya Murakoshi ,  Hiroyuki Shinada ,  Hideo Todokoro

IPC: H01J37/301

CPC classification number: H01J37/292 ,  G01N23/04 ,  H01J2237/2817

Abstract: An inspection apparatus comprising an electron emitting unit for sequentially emitting an electron beam in the direction of an inspection area of a sample; a deceleration unit for drawing back the electron beam in the vicinity of the inspection area; an imaging unit for forming images of the drawing back electron beam on multiple different image forming conditions; an image detecting unit for capturing the electron beam that formed an image corresponding to each image forming condition; and an image processing unit for comparing the images on different image forming conditions with one another to detect a defect in the inspection area.

Abstract translation: 一种检查装置，包括：电子发射单元，用于沿试样的检查区域的方向依次发射电子束; 减速单元，用于在检查区域附近拉回电子束; 用于在多个不同的图像形成条件下形成背面电子束的图像的成像单元; 图像检测单元，用于捕获形成与每个图像形成条件相对应的图像的电子束; 以及图像处理单元，用于将不同图像形成条件上的图像彼此进行比较，以检测检查区域中的缺陷。

公开(公告)号：US20070194229A1

公开(公告)日：2007-08-23

申请号：US11601723

申请日：2006-11-20

Applicant: Hirohito Okuda ,  Takashi Hiroi ,  Masaki Hasegawa ,  Shigeya Tanaka

Inventor： Hirohito Okuda ,  Takashi Hiroi ,  Masaki Hasegawa ,  Shigeya Tanaka

IPC: G21K7/00

CPC classification number: H01J37/026 ,  H01J37/292 ,  H01J2237/0048 ,  H01J2237/2817

Abstract: The present invention provides a mirror electron projection (MPJ) type (SEPJ type included) scanning electron beam apparatus that is capable of performing condition setup, and a method and apparatus for inspecting pattern defects with the scanning electron beam apparatus. A mirror electron projection type defect inspection apparatus, which comprises a charging device for emitting a charging electron beam, electron beam irradiation means for shedding a mirror electron projection electron beam onto an inspection region near which an electrical potential distribution is formed, detection means for detecting secondary electrons or reflected electrons generated from a surface and proximity of the specimen, and defect detection means for detecting a defect by processing a mirror image signal that is detected by the detection means, includes irradiation condition optimization means for optimizing charging electron beam irradiation conditions.

Abstract translation: 本发明提供一种能够进行条件建立的镜电子投射（MPJ）型（包括SEPJ型）扫描电子束装置，以及用扫描电子束装置检查图案缺陷的方法和装置。 镜电子投影型缺陷检查装置，其包括用于发射充电电子束的充电装置，用于将镜电子投影电子束切除到形成有电位分布的检查区域的电子束照射装置，用于检测 从检体的表面和邻近产生的二次电子或反射电子，以及用于通过处理由检测装置检测出的镜像信号来检测缺陷的缺陷检测装置，包括用于优化充电电子束照射条件的照射条件优化装置。

公开(公告)号：US3657593A

公开(公告)日：1972-04-18

申请号：US3657593D

申请日：1969-04-03

Applicant: JOHN ROBERT GARROOD ,  WILLIAM CHARLES NIXON

Inventor： GARROOD JOHN ROBERT ,  NIXON WILLIAM CHARLES

IPC: H01J37/28 ,  H01J37/29 ,  H01J29/80

CPC classification number: H01J37/292 ,  H01J37/28

Abstract: In scanning electron beam apparatus such as a scanning electron microscope or micro-analyser the scanning is done in at least three successive stages so that the angle of incidence of the beam on the specimen surface is constant during the scanning cycle. It can be varied at will and by rapid switching between two alternative angles and corresponding switching of the imageforming means, stereoscopic effects are obtainable.

Abstract translation: 在诸如扫描电子显微镜或微量分析仪的扫描电子束装置中，至少在三个连续的阶段进行扫描，使得在扫描周期中，试样表面上的光束的入射角是恒定的。 它可以随意变化，并且通过两个替代角度之间的快速切换和图像形成装置的相应切换，可以获得立体效果。

公开(公告)号：US3558885A

公开(公告)日：1971-01-26

申请号：US3558885D

申请日：1968-10-08

Applicant: INT STANDARD ELECTRIC CORP

Inventor： FLEMMING JOHN P W

IPC: H01J37/256 ,  H01J37/28 ,  H01J37/29 ,  H01J37/26 ,  G01N23/04

CPC classification number: H01J37/292 ,  H01J37/256 ,  H01J37/28

Abstract: The invention includes a scanning mirror microscope having a feedback control loop between target and cathode to stabilize the target current. It is then possible to obtain a quantitative plot of the target voltage by scanning an electron beam over the target surface. The invention also includes a scanning electron microscope having a feedback control loop between the target and the output of a velocity analyzer of secondary electrons emitted from the target to obtain the same quantitative plot. In either case, examination tests on semiconductor integrated circuits are made possible.

公开(公告)号：US11657999B2

公开(公告)日：2023-05-23

申请号：US17353333

申请日：2021-06-21

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Stefan Schubert

IPC: H01J37/10 ,  H01J37/244 ,  H01J37/28 ,  H01J37/29 ,  H01J37/05

CPC classification number: H01J37/10 ,  H01J37/05 ,  H01J37/244 ,  H01J37/28 ,  H01J37/292 ,  H01J2237/0453 ,  H01J2237/24465 ,  H01J2237/24485 ,  H01J2237/24507 ,  H01J2237/24564 ,  H01J2237/24585 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01J2237/2857

Abstract: A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.