公开(公告)号：US20240105418A1

公开(公告)日：2024-03-28

申请号：US18367066

申请日：2023-09-12

Applicant: Integrated Dynamic Electron Solutions, Inc.

Inventor： Ruth BLOOM ,  Sang Tae PARK ,  Bryan REED ,  Daniel MASIEL

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/244

CPC classification number: H01J37/26 ,  H01J37/1474 ,  H01J37/244 ,  H01J2237/2802 ,  H01J2237/2804

Abstract: Methods and systems for acquiring transmission electron microscope video data on a rolling-shutter detector at an enhanced frame rate and without temporal distortions are described. Also described are methods to enhance the dynamic range of image and diffraction data acquired using a transmission electron microscope. The disclosed methods and systems may also be applicable to photon detection and imaging systems.

公开(公告)号：US11804359B2

公开(公告)日：2023-10-31

申请号：US16939576

申请日：2020-07-27

Applicant: Integrated Dynamic Electron Solutions, Inc.

Inventor： Ruth Bloom ,  Sang Tae Park ,  Bryan Reed ,  Daniel Masiel

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/244

CPC classification number: H01J37/26 ,  H01J37/1474 ,  H01J37/244 ,  H01J2237/2802 ,  H01J2237/2804

Abstract: Methods and systems for acquiring transmission electron microscope video data on a rolling-shutter detector at an enhanced frame rate and without temporal distortions are described. Also described are methods to enhance the dynamic range of image and diffraction data acquired using a transmission electron microscope. The disclosed methods and systems may also be applicable to photon detection and imaging systems.

公开(公告)号：US20190035597A1

公开(公告)日：2019-01-31

申请号：US16043958

申请日：2018-07-24

Applicant: HITACHI, LTD.

Inventor： Thantip KRASIENAPIBAL ,  Yasuhiro SHIRASAKI ,  Momoyo ENYAMA ,  Sayaka KURATA

IPC: H01J37/22 ,  G06K9/32 ,  G06K9/46 ,  H01J37/20 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/222 ,  G06K9/0014 ,  G06K9/3233 ,  G06K9/4661 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20235 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/282

Abstract: In this invention, information of material composition, process conditions and candidates of crystal structure either known or imported from material database is used to determine sample stage tilt angle and working distance (WD). Under these determined tilt angle and WD, the intensity of the electrons emitted at different angles and with different energies is measured using a scanning electron microscope (SEM) system comprising: a use of materials database containing materials composition, formation process, crystal structure and its electron yield; a sample stage that is able to move, rotate and tilt; an processing section for calculating optimum working distance for an observation from material database and measurement condition; means for acquiring an image of crystal information of a desired area of a sample based on an image obtained from SEM observation.

公开(公告)号：US20180158646A1

公开(公告)日：2018-06-07

申请号：US15830304

申请日：2017-12-04

Applicant: JEOL Ltd.

Inventor： Akiho Nakamura

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/20 ,  H01J37/147 ,  H01J37/244

CPC classification number: H01J37/222 ,  H01J37/147 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/20207 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2614 ,  H01J2237/2802 ,  H01J2237/2804 ,  H01J2237/2809

Abstract: There is provided a method of image acquisition capable of reducing the effects of diffraction contrast. This method of image acquisition is implemented in an electron microscope for generating electron microscope images with electrons transmitted through a sample. The method starts with obtaining the plural electron microscope images while causing relative variations in the direction of incidence of an electron beam with respect to the sample. An image is generated by accumulating the plural electron microscope images.

公开(公告)号：US20170243715A1

公开(公告)日：2017-08-24

申请号：US15434618

申请日：2017-02-16

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: H01J37/244 ,  H01J37/26 ,  H01J37/20 ,  H01J37/29

CPC classification number: H01J37/244 ,  H01J37/20 ,  H01J37/263 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/043 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/24592 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: According to one embodiment, an inspection apparatus includes an irradiation device irradiating an inspection target substrate with multiple beams, a detector detecting each of a plurality of charged particle beams formed by charged particles emitted from the inspection target substrate as an electrical signal, and a comparison processing circuitry performing pattern inspection by comparing image data of a pattern formed on the inspection target substrate, the pattern being reconstructed in accordance with the detected electrical signals, and reference image data. The detector includes a plurality of detection elements that accumulate charges, and a detection circuit that reads out the accumulated charges. The plurality of detection elements are grouped into a plurality of groups. The detection circuit operates in a manner of, during a period in which the charged particle beams are applied to the detection elements included in one group, reading out the charges accumulated in the detection elements included in one or more other groups.

公开(公告)号：US20170084422A1

公开(公告)日：2017-03-23

申请号：US15245911

申请日：2016-08-24

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Mark A. McCord ,  Richard R. Simmons ,  Rainer Knippelmeyer

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/06 ,  H01J37/29

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/24465 ,  H01J2237/2804

Abstract: Multi-beam scanning electron microscope (SEM) inspection systems with dark field imaging capabilities are disclosed. An SEM inspection system may include an electron source and at least one optical device. The at least one optical device may be configured to produce a plurality of primary beamlets utilizing electrons provided by the electron source and deliver the plurality of primary beamlets toward a target. The apparatus may also include an array of detectors configured to receive a plurality of image beamlets emitted by the target in response to the plurality of primary beamlets and produce at least one dark field image of the target.

公开(公告)号：US20160276130A1

公开(公告)日：2016-09-22

申请号：US15072929

申请日：2016-03-17

Applicant: FEI Company

Inventor： Luigi Mele ,  Albertus Aemillius Seyno Sluijterman ,  Gerard Nicolaas Anne van Veen

IPC: H01J37/26 ,  G01T1/20

CPC classification number: G01T1/2006 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/24485 ,  H01J2237/2802 ,  H01J2237/2804 ,  H01L27/14643 ,  H01L27/148 ,  H01L31/107 ,  H04N5/32

Abstract: A Transmission Charged-Particle Microscope, comprising: A specimen holder, for holding a specimen; A source, for producing a beam of charged particles; An illuminator, for directing said beam so as to irradiate the specimen; An imaging system, for receiving a flux of charged particles transmitted through the specimen and directing it onto a spectroscopic apparatus comprising: A dispersing device, for dispersing said flux into an energy-resolved array of spectral sub-beams distributed along a dispersion direction; A detector, said detector comprising an assembly of sub-detectors arranged along said dispersion direction, whereby different sub-detectors are adjustable to have different detection sensitivities.

公开(公告)号：US20160163504A1

公开(公告)日：2016-06-09

申请号：US14905170

申请日：2014-05-21

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Kazuyuki TAKEDA ,  Tohru ANDO ,  Tsutomu SAITO

IPC: H01J37/26 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/265 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/20207 ,  H01J2237/20221 ,  H01J2237/24475 ,  H01J2237/2804

Abstract: A charged particle beam device allowing an analysis position in a sample analyzable with an EBSD detector to be acquired beforehand, and allowing a sample to be adjusted to a desired analysis position in a short time. A charged particle beam device is provided with a charged particle source (111), a charged particle optical system (115), an EBSD detector (101), a sample stage (116), an image display unit (117) for displaying a portion of the sample observable with the EBSD detector and a non-observable portion of the sample such that said portions are distinguished from each other, an operation input unit (121) where a position to be observed by the EBSD detector is entered, and a control unit (118) for controlling a planar movement, an inclination movement and a rotation movement of the sample stage so as to allow the observation position entered from the operation input unit to be observed with the EBSD detector.

Abstract translation: 允许预先获取可以用EBSD检测器分析的样品中的分析位置的带电粒子束装置，并且允许在短时间内将样品调节到期望的分析位置。 带电粒子束装置具有带电粒子源（111），带电粒子光学系统（115），EBSD检测器（101），样本台（116），用于显示部分的图像显示单元 使用EBSD检测器可观察到的样本和样本的不可观察部分，使得所述部分彼此区分;输入由EBSD检测器观察的位置的操作输入单元（121），以及控制 单元（118），用于控制样品台的平面运动，倾斜运动和旋转运动，以允许用EBSD检测器观察从操作输入单元输入的观察位置。

公开(公告)号：US20140291508A1

公开(公告)日：2014-10-02

申请号：US14224164

申请日：2014-03-25

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Atsushi UEMOTO ,  Xin MAN ,  Tatsuya ASAHATA

IPC: H01J37/04

CPC classification number: H01J37/28 ,  G01N23/2255 ,  G01N2223/045 ,  H01J37/222 ,  H01J2237/226 ,  H01J2237/24585 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2807

Abstract: A focused ion beam apparatus including: a focused ion beam irradiation mechanism forming first and second cross-sections; a first image generation unit generating a first image, including a reflected electron image or a secondary electron image, of the first and second cross-sections; a second image generation unit generating a second image, including an EDS image or a secondary ion image, of the first and second cross-sections; and a control section causing the second image generation unit to generate the second image of the second cross-section, in a case where the first and second images of the first cross-section are acquired, the first image of the second cross-section is acquired, and the first image of the second cross-section includes a region different from a region representing a specific composition in the first image of the first cross-section.

Abstract translation: 一种聚焦离子束装置，包括：形成第一和第二横截面的聚焦离子束照射机构; 产生包括第一和第二横截面的反射电子图像或二次电子图像的第一图像的第一图像生成单元; 产生包括第一和第二横截面的EDS图像或二次离子图像的第二图像的第二图像生成单元; 以及控制部，其使得所述第二图像生成部生成所述第二横截面的第二图像，在获取所述第一横截面的所述第一图像和所述第二图像的情况下，所述第二横截面的所述第一图像为 并且第二横截面的第一图像包括与表示第一横截面的第一图像中的特定构图的区域不同的区域。

公开(公告)号：US20140197310A1

公开(公告)日：2014-07-17

申请号：US14150012

申请日：2014-01-08

Applicant: CARL ZEISS MICROSCOPY LTD.

Inventor： Edward Hill ,  Stewart Bean

IPC: G01N23/22 ,  H01J37/26

CPC classification number: H01J37/26 ,  G01N23/2254 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2808 ,  H01J2237/2809

Abstract: The invention refers to a method and a charged particle beam device for analyzing an object using a charged particle beam interacting with the object. The object comprises a sample embedded in a resin. Interaction radiation in the form of cathodoluminescence light is detected for identifying areas in which the resin is arranged and in which the sample is arranged. Interaction particles are detected to identify particles within the resin and the sample for further analysis by using EDX analysis.

Abstract translation: 本发明涉及一种用于使用与物体相互作用的带电粒子束来分析物体的方法和带电粒子束装置。 该物体包括嵌入树脂中的样品。 检测呈阴极发光的形式的相互作用的放射线用于识别布置树脂的区域，其中布置样品。 通过使用EDX分析，检测相互作用颗粒以鉴定树脂和样品中的颗粒进行进一步分析。