公开(公告)号：US08148680B2

公开(公告)日：2012-04-03

申请号：US12513954

申请日：2007-11-07

Applicant: Alexander Makarov ,  Reinhold Pesch ,  Robert Malek ,  Viacheslav Kozlovskiy

Inventor： Alexander Makarov ,  Reinhold Pesch ,  Robert Malek ,  Viacheslav Kozlovskiy

IPC: H01J37/301 ,  H01J49/04 ,  H01J49/24 ,  H01J3/18

CPC classification number: H01J49/062 ,  H01J3/14

Abstract: A method of transporting gas and entrained ions between higher and lower pressure regions of a mass spectrometer comprises providing an ion transfer conduit 60 between the higher and lower pressure regions. The ion transfer conduit 60 includes an electrode assembly 300 which defines an ion transfer channel. The electrode assembly 300 has a first set of ring electrodes 305 of a first width D1, and a second set of ring electrodes of a second width D2 (≧D1) and interleaved with the first ring electrodes 305. A DC voltage of magnitude V1 and a first polarity is supplied to the first ring electrodes 205 and a DC voltage of magnitude V2 which may be less than or equal to the magnitude of V1 but with an opposed polarity is applied to the second ring electrodes 310. The pressure of the ion transfer conduit 60 is controlled so as to maintain viscous flow of gas and ions within the ion transfer channel.

Abstract translation: 在质谱仪的较高压力区域和较低压力区域之间输送气体和夹带离子的方法包括在较高压力区域和较低压力区域之间提供离子转移导管60。 离子传递管道60包括限定离子传递通道的电极组件300。 电极组件300具有第一组宽度为D1的环形电极305和第二组宽度D2（≧D1）的第二组环形电极，并与第一环形电极305交错。 将第一极性提供给第一环形电极205，并且可以将小于或等于V1的大小但具有相对极性的幅度为V2的DC电压施加到第二环形电极310.离子转移的压力 管道60被控制以便保持气体和离子在离子传递通道内的粘性流动。

公开(公告)号：US07525106B2

公开(公告)日：2009-04-28

申请号：US11684953

申请日：2007-03-12

Applicant: Kouhei Imoto ,  Shigeyuki Uzawa

Inventor： Kouhei Imoto ,  Shigeyuki Uzawa

IPC: H01J61/24 ,  H01J37/301

CPC classification number: G03F7/70916 ,  G03F7/70808 ,  G03F7/70841 ,  H01J2237/188

Abstract: An exposure apparatus exposes a substrate in a vacuum atmosphere through an optical system. The apparatus includes a partition which separates a first space including at least part of the optical system from a second space adjacent to it, and includes an opening to pass light through it. The apparatus further includes a first pressure regulator which regulates the pressure in the first space, a second pressure regulator which regulates the pressure in the second space, and a controller which outputs manipulated variables for the first and second pressure regulators. The controller outputs the manipulated variables for the first and second pressure regulators to change the pressure in the first space and the pressure in the second space in the range of a vacuum to the atmospheric pressure while maintaining a pressure relationship in which the pressure in the first space is higher than that in the second space.

Abstract translation: 曝光装置通过光学系统在真空气氛中曝光基板。 该装置包括一个分隔件，该分隔件将包括至少部分光学系统的第一空间与其邻近的第二空间分开，并且包括使光通过其的开口。 该装置还包括调节第一空间中的压力的​​第一压力调节器，调节第二空间中的压力的​​第二压力调节器，以及为第一和第二压力调节器输出操纵变量的控制器。 控制器输出用于第一和第二压力调节器的操作变量，以将第一空间中的压力和在真空范围内的第二空间中的压力改变为大气压，同时保持压力关系，其中第一 空间高于第二空间。

公开(公告)号：US20060000986A1

公开(公告)日：2006-01-05

申请号：US10883871

申请日：2004-07-02

Applicant: Satyendra Kumar ,  Carlos Vargas-Aburto ,  Qingbing Wing

Inventor： Satyendra Kumar ,  Carlos Vargas-Aburto ,  Qingbing Wing

IPC: H01J37/301

CPC classification number: G02F1/13378 ,  H01J37/317 ,  H01J2237/164

Abstract: An apparatus (10, 10″) for producing an alignment surface on an associated substrate (12, 12″) of a liquid crystal display. An electron source (40) produces a collimated electron beam (50). A substrate support (20, 20″) supports the associated substrate (12, 12″) with a surface normal (80) of the substrate arranged at a preselected angle (α) relative to the collimated electron beam (50). The collimated electron beam (50) is rastered across the associated substrate (12, 12″) at the preselected angle (α) while the substrate moves through the electron beam.

公开(公告)号：US5951886A

公开(公告)日：1999-09-14

申请号：US998135

申请日：1997-12-23

Applicant: Guenther G. Schubert ,  Joseph L. Lovett

Inventor： Guenther G. Schubert ,  Joseph L. Lovett

IPC: B23K15/10 ,  H01J37/301

CPC classification number: H01J37/301 ,  B23K15/10 ,  H01J2237/188 ,  H01J2237/3104

Abstract: Electron beam is focussed in a focussing column in a high vacuum environment and emitted downward through upper, middle, and lower orifices. A second stage vacuum housing concentrically surrounds a lower portion of the beam focussing column and separates the upper and middle orifices. A first stage vacuum housing concentrically surrounds the second stage vacuum housing and separates the middle and lower orifices. An outer wall surrounding the second housing tapers downward to the lower orifice, allowing it to be positioned as closely as desired to a workpiece regardless of surface topography. The apparatus comprises an orifice housing having an internal cavity which receives the lower part of the beam focussing column, an inner wall which defines the outer boundary of the second housing, and a support spool borne against by the outer wall, which is fixed to the bottom of the orifice housing and fixes the other components relative to each other in the housing.

Abstract translation: 电子束在高真空环境中聚焦在聚焦柱中，并通过上，中，下孔向下发射。 第二级真空壳体同心地围绕束聚焦柱的下部并分离上孔和中孔。 第一级真空壳体同心地围绕第二级真空壳体并分离中部和下部孔。 围绕第二壳体的外壁向下逐渐变细到下孔口，允许其被定位成尽可能靠近工件的位置，而与表面形貌无关。 该装置包括具有内腔的孔口壳体，该内腔容纳梁聚焦柱的下部，限定第二壳体的外边界的内壁和由该外壁固定的支撑卷轴， 孔的底部并且在壳体中相对于彼此固定其它部件。

公开(公告)号：US5210426A

公开(公告)日：1993-05-11

申请号：US774970

申请日：1991-10-15

Applicant: Yoshiyasu Itoh ,  Yutaka Ishiwata ,  Masataka Tamura

Inventor： Yoshiyasu Itoh ,  Yutaka Ishiwata ,  Masataka Tamura

IPC: G21K5/00 ,  H01J5/18 ,  H01J33/04 ,  H01J37/301

CPC classification number: H01J33/04 ,  H01J5/18

Abstract: This invention provides an electron beam irradiation device employing a material containing a Ti-A1 intermetallic composite as the material of an electron beam permeable window for allowing passage to the outside of a chamber of an electron beam generated in the chamber. Also, this invention provides a method of manufacturing an electron beam permeable window containing a Ti-A1 intermetallic composite by manufacturing a window-frame mounted titanium foil by fixing titanium foil between an outer window frame and an inner window frame of an electron beam permeable window, coating this with aluminium and titanium by converting aluminium and titanium to a metallic vapor state and subjecting this to thermal diffusion treatment.

公开(公告)号：US4818838A

公开(公告)日：1989-04-04

申请号：US141812

申请日：1988-01-11

Applicant: Lydia J. Young ,  Lee H. Veneklasen

Inventor： Lydia J. Young ,  Lee H. Veneklasen

IPC: G03F7/20 ,  H01J37/301 ,  H01L21/027 ,  H01L21/30 ,  H01L21/677 ,  B23K15/00

CPC classification number: H01J37/301 ,  H01L21/67778

Abstract: Disclosed is a particle beam lithography system (10) having a workpiece loading/unloading position to one side of a particle beam (32) and beam column (12) where a workpiece (14), to be processed, is placed in a vacuum chuck (100) to eliminate any irregularity or warpage of the workpiece (14). At this same position, the workpiece (14) is oriented and fixed at a preselected distance from a standard by gap setting means (162, 162b). This distance correlates with a preselected gap (G) between a seal apparatus (16) and the workpiece (14) during workpiece processing. The workpiece (14) and chuck (100) are then moved beneath the seal apparatus (16) and beam column (12) for workpiece processing. After processing, the workpiece (14) and chuck (100) are returned to the loading/unloading position to be removed from the lithography system (10). An interface plate (64) is moved from the loading/unloading position to the workpiece processing position by an X-Y stage (50) and a workpiece transport system (130) is provided to transport the workpieces (14) to and from the lithography system (10) to appropriate cassettes (132,134).

公开(公告)号：US4734586A

公开(公告)日：1988-03-29

申请号：US836883

申请日：1986-03-06

Applicant: Charles E. Crist ,  Harry C. Ives ,  Gordon T. Leifeste ,  Robert B. Miller

Inventor： Charles E. Crist ,  Harry C. Ives ,  Gordon T. Leifeste ,  Robert B. Miller

IPC: H01J33/00 ,  H01J37/301 ,  H05H7/00 ,  H01J33/04

CPC classification number: H05H7/00 ,  H01J33/00 ,  H01J37/301

Abstract: A self-contained hermetically sealed foil changer for advancing a portion of foil web into a position normal to the path of a high energy particle beam. The path of the beam is defined generally by an aperture plate and cooperating axially movable barrel such that the barrel can be advanced toward the plate thereby positioning a portion of the foil across the beam path and sealing the foil between the barrel and the plate to form a membrane across said beam path. A spooling apparatus contained in the foil changer permits selectively advancing a fresh supply of foil across the beam path without breaking the foil changer seal.

Abstract translation: 一种独立的密封箔片更换器，用于将箔片的一部分推进到垂直于高能粒子束路径的位置。 梁的路径通常由孔板和配合的可轴向移动的筒限定，使得筒可朝向板推进，从而将箔的一部分定位在梁路径上并将箔密封在筒和板之间以形成 穿过所述光束路径的膜。 包含在箔片更换器中的缠绕装置允许选择性地将新鲜的箔片供给穿过光束路径而不破坏箔片更换器密封件。

公开(公告)号：US4607167A

公开(公告)日：1986-08-19

申请号：US701439

申请日：1985-02-12

Applicant: Paul F. Petric

Inventor： Paul F. Petric

IPC: H01J37/301 ,  H01J37/317 ,  H01J37/18 ,  H01J33/02

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/301 ,  H01J37/3174 ,  H01J2237/162 ,  H01J2237/188 ,  H01J2237/20

Abstract: A charged particle beam lithography machine includes a beam source and beam steering and forming elements within an evacuated column. A stage assembly for supporting a semiconductor wafer or mask is positioned in ambient and proximate the exit end of said beam steering and forming elements. A vacuum envelope apparatus is affixed to the exit end of the beam steering and forming elements so that the outer surface or tip of the vacuum envelope apparatus rests in spaced apart, close coupled opposition to the wafer or mask supported on the stage. The vacuum envelope apparatus includes internal structural members which define an internal vacuum processing zone and at least one surrounding intermediate vacuum zone. A graded vacuum seal is formed between the tip of the vacuum envelope and the mask or wafer. The seal extends from the internal vacuum processing zone to the external ambient. Lithographic operations are conducted on the mask or wafer as relative motion between the stage assembly and the beam steering and forming elements is accomplished.

Abstract translation: 带电粒子束光刻机包括一个射束源和一个抽真空柱内的光束转向和成形元件。 用于支撑半导体晶片或掩模的台架组件被定位在环境中并且靠近所述光束转向和成形元件的出口端。 真空包封装置固定到光束转向和成形元件的出口端，使得真空包封装置的外表面或尖端以与支撑在平台上的晶片或掩模隔开，紧密耦合的方式相对。 真空包封装置包括限定内部真空处理区和至少一个周围的中间真空区的内部结构构件。 在真空外壳的尖端和掩模或晶片之间形成渐变的真空密封。 密封件从内部真空处理区域延伸到外部环境。 在平台组件和光束转向和成形元件之间的相对运动完成时，在掩模或晶片上进行平版印刷操作。

公开(公告)号：US4034256A

公开(公告)日：1977-07-05

申请号：US691041

申请日：1976-05-27

Applicant: Peter Sommerkamp ,  Walter Heil

Inventor： Peter Sommerkamp ,  Walter Heil

IPC: H01J37/06 ,  H01J37/067 ,  H01J37/30 ,  H01J37/301 ,  H01J37/305 ,  H01J37/315 ,  H01J7/24 ,  H01J29/76

CPC classification number: H01J37/301 ,  H01J37/067 ,  H01J37/305 ,  H01J37/315

Abstract: An electron gun for heating, fusing and vaporizing having a high voltage portion, an electron emitting cathode and at least one beam forming electrode associated with the cathode. An accelerating anode, a beam guiding tube extending in the direction of the beam path and surrounded by a jacket tube and an electromatic lens are also provided. One or more deflection systems are positioned in the space formed between the beam guiding tube and the jacket tube. The beam guiding tube, the jacket tube, the electromatic lens and the deflection systems are contained in a single, replaceable unit which is joined by a plurality of hollow posts parallel to the gun axis to the high-voltage portion of the gun. The space for the electromagnetic lens and the deflection systems communicates with the atmosphere through at least one of the hollow posts.

Abstract translation: 一种用于加热，熔化和汽化具有高电压部分的电子枪，电子发射阴极和与阴极相关的至少一个光束形成电极。 还提供加速阳极，沿着光束路径的方向延伸并被套管和电子透镜包围的光束引导管。 一个或多个偏转系统定位在形成在光束引导管和护套管之间的空间中。 光束引导管，护套管，电子透镜和偏转系统被包含在单个可更换单元中，其通过平行于枪轴线的多个中空柱连接到枪的高压部分。 用于电磁透镜和偏转系统的空间通过至少一个空心柱与大气连通。

公开(公告)号：US3816698A

公开(公告)日：1974-06-11

申请号：US33212973

申请日：1973-02-13

Applicant: HELL R GMBH

Inventor： WELLENDORF K ,  PADBERG P ,  STRUCK B

IPC: B41C1/05 ,  H01J37/301 ,  B23K15/00

CPC classification number: B41C1/05 ,  H01J37/301

Abstract: An engraving apparatus for producing a printing matrix such as a printing cylinder including an electron beam producing device having a vacuum chamber opened at its end facing the cylinder and forming a gap with it, the device is adapted to more over the cylinder surface to perform the engraving operation, an end member attached to both ends of the cylinder to assure that the vacuum is not lost by the beam producing device when the engraving is performed at both ends of the cylinder, the end members forming a surface continuity with the cylinder and are removable after the engraving has been performed.

Abstract translation: 一种用于制造诸如印刷滚筒的印刷基体的雕刻装置，所述印刷滚筒包括电子束产生装置，该电子束产生装置具有在其面向所述滚筒的一端开口的真空室，并与其形成间隙，所述装置适于更多地超过所述滚筒表面， 雕刻操作，附接到气缸的两端的端部构件，以确保当在气缸的两端执行雕刻时，梁产生装置不会损失真空，端部构件与气缸形成表面连续性，并且 在执行雕刻之后可移动。