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    Arrangement for transporting radicals
    56.
    发明申请
    Arrangement for transporting radicals 有权
    运输自由基的安排

    公开(公告)号：US20150332899A1

    公开(公告)日：2015-11-19

    申请号：US14805509

    申请日：2015-07-22

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Pieter KRUIT ,  Marc SMITS

    IPC: H01J37/32 ,  H01J37/30 ,  H01J37/317

    CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  F15D1/025 ,  G03F7/70925 ,  G21K2201/06 ,  H01J9/38 ,  H01J37/3007 ,  H01J37/3177 ,  H01J37/32862 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/327 ,  Y10T137/2082 ,  Y10T137/87571

    Abstract: The invention relates to an arrangement for transporting radicals. An electron beam system is presented comprising a beamlet generator; a beamlet manipulator (204) comprising an array of apertures; a plasma generator comprising a chamber for forming a plasma, an inlet receiving input gas and outlets removing plasma or radicals created therein, the plasma generator further comprising outlets in flow connection with the plasma chamber outlets; and a hollow guiding body (309b) guiding radicals formed in the plasma towards the array of apertures for removing contaminant deposition. The hollow guiding body (309b) is removably connectable to an extended portion (307b) of the plasma generator outlet. A cover (400) can be placed over a connection between the hollow guiding body (309b) and the extended portion (307b). The extended portion (307b) of the plasma generator outlet and the hollow guiding body (309b) can be similarly formed as a slit.

    Abstract translation: 本发明涉及一种输送自由基的装置。 提出了一种电子束系统，包括一个小波发生器; 小梁操纵器（204），包括孔阵列; 等离子体发生器，其包括用于形成等离子体的腔室，接收输入气体的入口和去除其中产生的等离子体或自由基的出口，等离子体发生器还包括与等离子体室出口流动连接的出口; 以及空心引导体（309b），其将形成在等离子体中的自由基朝向孔阵列排出以除去污染物沉积物。 中空引导体（309b）可移除地连接到等离子体发生器出口的延伸部分（307b）。 盖（400）可以放置在中空引导体（309b）和延伸部分（307b）之间的连接处。 等离子体发生器出口的延伸部分（307b）和中空引导体（309b）可类似地形成为狭缝。

    ENCLOSURE FOR A TARGET PROCESSING MACHINE
    57.
    发明申请
    ENCLOSURE FOR A TARGET PROCESSING MACHINE 审中-公开
    目标加工机的外壳

    公开(公告)号：US20150321356A1

    公开(公告)日：2015-11-12

    申请号：US14705928

    申请日：2015-05-06

    Applicant: Mapper Lithography IP B.V.

    Inventor： Joep Gerard Vijverberg ,  Laurens Vincent Plandsoen ,  Bas van Gelder ,  Guido de Boer ,  Michel Pieter Dansberg

    IPC: B25J11/00 ,  G03F9/00

    CPC classification number: B25J11/00 ,  G03F7/7075 ,  G03F7/70808 ,  G03F7/70841 ,  G03F9/7096 ,  H01J37/16 ,  H01J37/3177 ,  H01J2237/024 ,  H01J2237/166 ,  H01L21/6719 ,  H01L21/67225 ,  H01L21/67775

    Abstract: The invention relates to an assembly for enclosing a target processing machine. The assembly comprises an enclosure and a transfer unit. The enclosure comprises a base plate for arranging said target processing machine thereon, side wall panels, which are fixed to said base plate, and a top wall panel which is fixed to said side wall panels. In addition, the enclosure comprises an access opening in a side wall of the enclosure. The transfer unit comprising one or more transfer elements for moving the transfer unit with respect to the base plate. The transfer unit further comprises a door panel which is arranged for closing the access opening, wherein the door panel is movably mounted to the transfer unit by means of a flexible coupling which allows a movement of the door panel with respect to the transfer unit at least in a direction towards and/or away from the enclosure.

    Abstract translation: 本发明涉及用于封闭目标加工机器的组件。 组件包括外壳和转移单元。 外壳包括用于在其上布置所述目标加工机的基板，固定到所述基板的侧壁板和固定到所述侧壁板的顶壁板。 此外，外壳包括在外壳的侧壁中的进入开口。 转印单元包括用于相对于基板移动转印单元的一个或多个转印元件。 传送单元还包括门板，其被布置成用于关闭进入开口，其中门板通过柔性联接件可移动地安装到传送单元，该柔性联接器允许门板相对于传送单元至少移动 在朝向和/或远离外壳的方向上。

    MULTI-AXIS DIFFERENTIAL INTERFEROMETER
    58.
    发明申请
    MULTI-AXIS DIFFERENTIAL INTERFEROMETER 有权
    多轴差分干涉仪

    公开(公告)号：US20150241200A1

    公开(公告)日：2015-08-27

    申请号：US14431765

    申请日：2013-09-26

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Godefridus Cornelius Antonius Couweleers ,  Thomas Adriaan Ooms ,  Niels Vergeer

    IPC: G01B9/02 ,  G01B11/26 ,  G03F7/20 ,  G01B11/14

    CPC classification number: G01B9/02015 ,  G01B9/02021 ,  G01B9/02027 ,  G01B9/02051 ,  G01B11/14 ,  G01B11/26 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/7085 ,  H01J37/3174 ,  Y10T156/10

    Abstract: The invention relates to a multi-axis differential interferometer (1) for measuring a displacement and/or rotation between a first reflective surface (21, 321) and a second reflective surface (81, 381), wherein said measuring is carried out using at least two pairs of beams, wherein each pair is formed by a measurement beam (Mb) to be emitted onto a first one (21, 321) of said reflective surfaces, and a reference beam (Rb) to be emitted onto another one (81, 381) of said reflective surfaces, said interferometer (1) comprising: a first optical module (20) and a second optical module (40), wherein each optical module (20, 40) is configured for receiving a respective coherent beam and for creating one of said pairs therefrom. The invention further relates to a lithography system comprising such an interferometer and to a method for assembling such a multi-axis differential interferometer.

    Abstract translation: 本发明涉及一种用于测量第一反射表面（21,321）和第二反射表面（81,381）之间的位移和/或旋转的多轴差分干涉仪（1），其中所述测量使用 至少两对光束，其中每对由测量光束（Mb）形成以被发射到所述反射表面的第一个（21,321）上，以及将要发射到另一个的参考光束（Rb） ，381），所述干涉仪（1）包括：第一光学模块（20）和第二光学模块（40），其中每个光学模块（20,40）构造成用于接收相应的相干光束 从中产生一对所述的对。 本发明还涉及包括这种干涉仪的光刻系统和用于组装这种多轴差分干涉仪的方法。

    Method of handling a substrate support structure in a lithography system
    59.
    发明授权
    Method of handling a substrate support structure in a lithography system 有权
    在光刻系统中处理衬底支撑结构的方法

    公开(公告)号：US09117631B2

    公开(公告)日：2015-08-25

    申请号：US13860620

    申请日：2013-04-11

    Applicant: Mapper Lithography IP B.V.

    Inventor： Hendrik Jan De Jong

    IPC: H01J37/00 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00 ,  H01L21/00

    CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01L21/00

    Abstract: Method of handling a substrate support structure for clamping a substrate on a surface thereof in a lithography system. First, a substrate support structure adapted to absorb energy from a substrate clamped thereon and a substrate are provided. The substrate is clamped on a surface of the substrate support structure. The substrate support structure with the substrate clamped thereon is transferred to a lithography apparatus, in which a lithographic process is performed on the substrate clamped onto the substrate support structure. The substrate support structure with the substrate clamped thereon is then removed from the lithography system. The substrate is removed from the substrate support structure, and the substrate support structure is conditioned by removing energy stored in the substrate support structure before providing a new substrate onto the substrate support structure.

    Abstract translation: 处理基板支撑结构以在基板的表面上夹持基板的方法。 首先，提供适于从夹持在其上的基板和基板吸收能量的基板支撑结构。 衬底被夹持在衬底支撑结构的表面上。 将其上夹有衬底的衬底支撑结构转移到光刻设备，其中在夹持在衬底支撑结构上的衬底上进行光刻工艺。 然后将其上夹有衬底的衬底支撑结构从光刻系统移除。 从衬底支撑结构移除衬底，并且通过在将衬底提供到衬底支撑结构上之前去除存储在衬底支撑结构中的能量来调节衬底支撑结构。

    Method for forming an optical fiber array
    60.
    发明申请
    Method for forming an optical fiber array 有权
    光纤阵列形成方法

    公开(公告)号：US20150190994A1

    公开(公告)日：2015-07-09

    申请号：US14662346

    申请日：2015-03-19

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Guido DE BOER ,  Ralph VAN MELLE ,  Teunis VAN DE PEUT ,  Henk DERKS ,  Frederik Matthias SPIEGELHALDER ,  Roy Josephus Stephanus DERKS ,  Edwin Johannes Theodorus SMULDERS

    IPC: B32B37/14 ,  B32B38/00 ,  B32B37/12

    CPC classification number: B32B37/142 ,  B32B37/1284 ,  B32B37/1292 ,  B32B38/0012 ,  B32B2551/00 ,  B82Y10/00 ,  B82Y40/00 ,  G02B6/3612 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/2482 ,  Y10T156/1002

    Abstract: A method for forming an optical fiber array. A substrate having a first surface and an opposing second surface is provided. The substrate is provided with a plurality of apertures extending through the substrate from the first surface to the second surface. In addition, a plurality of fibers are provided. The fibers have fiber ends with a diameter smaller than the smallest diameter of the apertures. A first fiber is inserted in a first corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface. The inserted first fiber is bent in a predetermined direction such that the fiber abuts a side wall of the first aperture at a predetermined position. After the first fiber is bent, a second fiber is inserted in a second corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface. The inserted second fiber is bent in conformity with a shape of the first fiber, such that the fiber abuts a side wall of the second aperture at a predetermined position. The bent fibers are bonded together using an adhesive material.

    Abstract translation: 一种形成光纤阵列的方法。 提供具有第一表面和相对的第二表面的基板。 衬底设置有从第一表面延伸穿过衬底到第二表面的多个孔。 另外，提供多根纤维。 纤维具有直径小于孔的最小直径的纤维端。 第一光纤从衬底的第一表面侧插入到第一对应的孔中，使得光纤端位于紧邻第二表面的位置。 所插入的第一纤维沿预定方向弯曲，使得纤维在预定位置处抵靠第一孔的侧壁。 在第一纤维弯曲之后，第二纤维从衬底的第一表面侧插入到第二对应的孔中，使得光纤端位于紧邻第二表面的位置。 插入的第二纤维与第一纤维的形状一致地弯曲，使得纤维在预定位置处抵靠第二孔的侧壁。 弯曲的纤维使用粘合剂材料粘合在一起。

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