Methods for designing, fabricating, and predicting shape formations in a material
    53.
    发明授权
    Methods for designing, fabricating, and predicting shape formations in a material 有权
    在材料中设计,制造和预测形状结构的方法

    公开(公告)号:US08557613B2

    公开(公告)日:2013-10-15

    申请号:US13159335

    申请日:2011-06-13

    Abstract: A method for designing, fabricating, and predicting a desired structure in and/or on a host material through defining etch masks and etching the host material is provided. The desired structure can be micro- or nanoscale structures, such as suspended nanowires and corresponding supporting pillars, and can be defined one layer at a time. Arbitrary desired structures can also be defined and obtained through etching. Further, given the desired structure, a starting structure can be predicted where etching of the starting structure yields the desired structure.

    Abstract translation: 提供了一种通过限定蚀刻掩模和蚀刻主体材料来设计,制造和预测主体材料中和/或主体材料上的所需结构的方法。 所需的结构可以是微结构或纳米级结构,例如悬浮的纳米线和相应的支撑柱,并且可以一次定义一层。 也可以通过蚀刻来定义和获得任意的所需结构。 此外,给定所需的结构,可以预测起始结构的蚀刻产生所需结构的起始结构。

    Lithographically defined adhesion microstructures
    55.
    发明授权
    Lithographically defined adhesion microstructures 有权
    光刻定义的粘结微观结构

    公开(公告)号:US08241547B2

    公开(公告)日:2012-08-14

    申请号:US12572036

    申请日:2009-10-01

    Abstract: A method for adhering two layers of materials is described. An additional layer of material deposited on one of the layers is used. The additional layer of material is perforated and undercut by etching away one of the layers thereby generating anchor shaped holes. The other layer is then deposited on the additional layer filling the anchor shaped holes therefore, providing adhesion.

    Abstract translation: 描述了粘合两层材料的方法。 使用沉积在其中一层上的附加材料层。 附加的材料层通过蚀刻掉一个层而被穿孔和底切,从而产生锚定孔。 然后将另一层沉积在填充锚定孔的附加层上,从而提供粘附。

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