公开(公告)号：US06319634B1

公开(公告)日：2001-11-20

申请号：US09397572

申请日：1999-09-16

Applicant: George Edward Berkey ,  Lisa Anne Moore ,  Michelle Diane Pierson

Inventor： George Edward Berkey ,  Lisa Anne Moore ,  Michelle Diane Pierson

IPC: G03F900

CPC classification number: C03C4/0085 ,  C03B19/1453 ,  C03B19/1469 ,  C03B23/043 ,  C03B23/045 ,  C03B23/051 ,  C03B23/07 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C3/06 ,  C03C2201/12 ,  C03C2203/50 ,  G03F1/60

Abstract: The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content ≦10 ppm, a F wt. % concentration ≧0.5 wt. %.

Abstract translation: 本发明是制造光刻光掩模和光掩模坯料的方法。 制造光刻光掩模和光掩模坯料的方法包括提供OH含量低于50ppm的氟氧化硅玻璃管。 该方法还包括切割氟氧化硅玻璃管，使氟氧化硅玻璃管扁平化，并将扁平切割的氟氧化硅玻璃管形成具有平坦表面的光掩模坯料。 本发明包括玻璃光刻掩模预制件。 玻璃光刻掩模预制件是具有OH含量<= 10ppm的纵向硅氧氟化物玻璃管，F wt。 ％浓度> = 0.5wt。 ％。

公开(公告)号：US5719698A

公开(公告)日：1998-02-17

申请号：US711471

申请日：1996-09-06

Applicant: Hiroyuki Hiraiwa ,  Issey Tanaka

Inventor： Hiroyuki Hiraiwa ,  Issey Tanaka

IPC: C03B8/04 ,  C03B19/14 ,  C03C3/06 ,  C03C4/00 ,  G02B1/00 ,  G02B13/14 ,  G03F7/20 ,  C03C3/04 ,  C03C8/04

CPC classification number: C03B19/1423 ,  C03B19/1453 ,  C03C3/06 ,  C03C4/0085 ,  G02B1/00 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2203/22 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/36 ,  C03C2201/21 ,  C03C2203/44 ,  C03C2203/52 ,  Y10S359/90 ,  Y10S501/905

Abstract: Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. The present invention provides a silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also, there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.

Abstract translation: 需要最近的UV光刻来提供线宽为0.5μm或更小的精细且清晰的图案。 本发明提供一种二氧化硅玻璃构件，其通过考虑本领域中尚未考虑的波面像差的RMS值和折射率的倾斜元素，用作用于UV光刻的光学元件。 另外，在二氧化硅玻璃的合成中，通过引入氢分子，而不是使用二次氢气导入来提供对紫外线照射的耐久性优异的二氧化硅玻璃。

公开(公告)号：US5702495A

公开(公告)日：1997-12-30

申请号：US479130

申请日：1995-06-07

Applicant: Hiroyuki Hiraiwa ,  Kazuhiro Nakagawa ,  Hiroki Jinbo ,  Jun Takano ,  Seishi Fujiwara

Inventor： Hiroyuki Hiraiwa ,  Kazuhiro Nakagawa ,  Hiroki Jinbo ,  Jun Takano ,  Seishi Fujiwara

IPC: C03B8/04 ,  C03B19/14 ,  C03C3/06 ,  C03C4/00 ,  G02B1/00 ,  G02B13/14 ,  G03F7/20 ,  C03B20/00

CPC classification number: C03B19/1423 ,  C03B19/1453 ,  C03C3/06 ,  C03C4/0085 ,  G02B1/00 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2203/22 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/36 ,  C03C2201/21 ,  C03C2203/44 ,  C03C2203/52 ,  Y10S359/90 ,  Y10S501/905

Abstract: Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. A silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.

Abstract translation: 需要最近的UV光刻来提供线宽为0.5μm或更小的精细且清晰的图案。 通过考虑本领域中尚未考虑的波面像差的RMS值和折射率的倾斜元件，适于用作UV光刻的光学元件的二氧化硅玻璃构件。 另外，通过在合成二氧化硅玻璃时引入氢分子，可以提供在紫外线照射下的耐久性优异的二氧化硅玻璃构件，而不是二次处理导入氢。

公开(公告)号：US5699183A

公开(公告)日：1997-12-16

申请号：US484863

申请日：1995-06-07

Applicant: Hiroyuki Hiraiwa ,  Seishi Fujiwara ,  Hiroki Jinbo ,  Jun Takano ,  Norio Komine ,  Kazuhiro Nakagawa ,  Issey Tanaka

Inventor： Hiroyuki Hiraiwa ,  Seishi Fujiwara ,  Hiroki Jinbo ,  Jun Takano ,  Norio Komine ,  Kazuhiro Nakagawa ,  Issey Tanaka

IPC: C03B8/04 ,  C03B19/14 ,  C03C3/06 ,  C03C4/00 ,  G02B1/00 ,  G02B13/14 ,  G03F7/20 ,  G03B27/42

CPC classification number: C03B19/1423 ,  C03B19/1453 ,  C03C3/06 ,  C03C4/0085 ,  G02B1/00 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2203/22 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/36 ,  C03C2201/21 ,  C03C2203/44 ,  C03C2203/52 ,  Y10S359/90 ,  Y10S501/905

Abstract: Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. The present invention provides a silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also, there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.

Abstract translation: 需要最近的UV光刻来提供线宽为0.5μm或更小的精细且清晰的图案。 本发明提供一种二氧化硅玻璃构件，其通过考虑本领域中尚未考虑的波面像差的RMS值和折射率的倾斜元素，用作用于UV光刻的光学元件。 另外，在二氧化硅玻璃的合成中，通过引入氢分子，而不是使用二次氢气导入来提供对紫外线照射的耐久性优异的二氧化硅玻璃。

公开(公告)号：US5410428A

公开(公告)日：1995-04-25

申请号：US779737

申请日：1991-10-23

Applicant: Shigeru Yamagata ,  Michiyou Kuriyama ,  Kyoichi Inaki ,  Ralf Takke

Inventor： Shigeru Yamagata ,  Michiyou Kuriyama ,  Kyoichi Inaki ,  Ralf Takke

IPC: C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  C03C4/00 ,  G02B1/00 ,  G03F7/20 ,  H01S3/034 ,  C03C4/08

CPC classification number: G03F7/70958 ,  C03B19/1453 ,  C03B32/00 ,  C03C3/06 ,  C03C4/0071 ,  G02B1/00 ,  G03F7/70241 ,  H01S3/034 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/10 ,  C03C2203/54 ,  Y10S359/90 ,  Y10S501/905

Abstract: This invention relates to an optical member made of highly transparent, high-purity synthetic silica glass, to a method for manufacturing a blank or an optical member of such glass, and to the optical members themselves. The optical members have an absolute refractive index, n.sub.d, of 1.460 or more and a hydrogen molecule concentration of at least 5.times.10.sup.16 molecules/cm.sup.3 uniformly distributed throughout the glass and are particularly well suited for use in apparatus in which they are exposed to a high-power laser beam such as that produced by an excimer laser.

Abstract translation: 本发明涉及由高透明，高纯度的合成石英玻璃制成的光学构件，制造这种玻璃的坯料或光学构件的方法以及光学构件本身。 光学构件的绝对折射率nd为1.460以上，氢分子浓度至少为5×10 16分/ cm 3，均匀分布在整个玻璃中，特别适用于将其暴露于高分子量的设备中， 功率激光束，例如由准分子激光器产生的激光束。

公开(公告)号：US4426216A

公开(公告)日：1984-01-17

申请号：US337451

申请日：1982-01-06

Applicant: Shin Satoh ,  Kenzo Susa ,  Iwao Matsuyama ,  Tsuneo Suganuma

Inventor： Shin Satoh ,  Kenzo Susa ,  Iwao Matsuyama ,  Tsuneo Suganuma

IPC: C03B19/12 ,  C03C1/00 ,  C03B19/06

CPC classification number: C03B19/12 ,  C03C1/006 ,  C03B2201/02 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/06 ,  C03B2201/07 ,  C03B2201/075 ,  Y10S65/901

Abstract: Optical glass is produced by heating a porous gel to a high temperature to partly sinter it, heating it in a chlorine-containing atmosphere to subject it to hydroxyl group removal treatment, and then further heating it to sinter it. The optical glass produced by this process does not rise in bubbles even when heated.

Abstract translation: 通过将多孔凝胶加热至高温部分烧结而制成光学玻璃，在含氯气氛中加热，进行羟基去除处理，然后进一步加热烧结。 通过该方法制造的光学玻璃即使在加热时也不会起泡。

公开(公告)号：US09834468B2

公开(公告)日：2017-12-05

申请号：US14769382

申请日：2014-02-19

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Bodo Kuehn

IPC: F21V9/00 ,  G02B5/02 ,  G02C7/10 ,  G02F1/361 ,  G03B11/00 ,  C03C3/06 ,  C03B19/14 ,  C03B32/00 ,  G02B1/00 ,  G02B1/02 ,  C03B32/02 ,  C03C4/04 ,  C03C15/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B32/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03C4/04 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2203/54 ,  C03C2204/00 ,  G02B1/00 ,  G02B1/02 ,  Y02P40/57

Abstract: An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×1016 to 1.0×1018 molecules/cm3, an SiH group content of less than 2×1017 molecules/cm3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×109 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M193 nm when measured using the applied wavelength of 193 nm and a second measured value M633 nm when measured using a measured wavelength of 633 nm. The ratio M193 nm/M633 nm is less than 1.7.

公开(公告)号：US09611169B2

公开(公告)日：2017-04-04

申请号：US14958024

申请日：2015-12-03

Applicant: Corning Incorporated

Inventor： Sezhian Annamalai ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina

IPC: C03C3/06 ,  C03B19/14 ,  C03B25/02 ,  C03C3/112 ,  C03C4/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1461 ,  C03B25/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/14 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2201/50 ,  C03B2201/54 ,  C03C3/112 ,  C03C4/00 ,  C03C2201/12 ,  C03C2201/14 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2201/50 ,  C03C2201/54 ,  C03C2203/52

Abstract: A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %. Further, the glass article has an expansivity slope of less than 0.5 ppb/K2 at 20° C. The second dopant can be optional. The composition of the glass article may also contain an OH concentration of less than 100 ppm.

公开(公告)号：US20170022094A1

公开(公告)日：2017-01-26

申请号：US15086169

申请日：2016-03-31

Applicant: OFS Fitel, LLC

Inventor： Man F. Yan ,  Peter I. Borel ,  Tommy Geisler ,  Rasmus V. Jensen ,  Ole A. Levring ,  Jorgen Ostgaard Olsen ,  David W. Peckham ,  Dennis J. Trevor ,  Patrick W. Wisk ,  Benyuan Zhu

IPC: C03C13/04 ,  C03B37/027 ,  G02B6/036

CPC classification number: C03C13/046 ,  C03B37/01208 ,  C03B37/01853 ,  C03B37/027 ,  C03B2201/07 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/28 ,  C03B2201/50 ,  C03B2203/223 ,  C03B2203/23 ,  C03C3/06 ,  C03C4/10 ,  C03C13/045 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/28 ,  C03C2201/50 ,  G02B6/03627 ,  G02B6/0365

Abstract: An optical fiber has a core region that is doped with one or more viscosity-reducing dopants in respective amounts that are configured, such that, in a Raman spectrum with a frequency shift of approximately 600 cm−, the fiber has a nanoscale structure having an integrated D2 line defect intensity of less than 0.025. Alternatively, the core region is doped with one or more viscosity-reducing dopants in respective amounts that are configured such that the fiber has a residual axial compressive stress with a stress magnitude of more than 20 MPa and a stress radial extent between 2 and 7 times the core radius.According to another aspect of the invention a majority of the optical propagation through the fiber is supported by an identified group of fiber regions comprising the core region and one or more adjacent cladding regions. The fiber regions are doped with one or more viscosity-reducing dopants in respective amounts and radial positions that are configured to achieve viscosity matching among the fiber regions in the identified group.

Abstract translation: 根据本发明的另一方面，通过光纤的大部分光学传播由包括芯区域和一个或多个相邻包层区域的所识别的纤维区域组支撑。 纤维区域掺杂有相应量和径向位置中的一种或多种降低粘度的掺杂剂，其被配置为实现所识别的组中的纤维区域之间的粘度匹配。

公开(公告)号：US08596094B2

公开(公告)日：2013-12-03

申请号：US12902238

申请日：2010-10-12

Applicant: Carlos Duran ,  Kenneth Edward Hrdina ,  Ulrich Wilhelm Heinz Neukirch

Inventor： Carlos Duran ,  Kenneth Edward Hrdina ,  Ulrich Wilhelm Heinz Neukirch

IPC: C03B13/00 ,  C03B15/00 ,  C03B19/00 ,  C03B25/00 ,  C03C3/06

CPC classification number: C03B25/02 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/22 ,  C03B2201/23

Abstract: A method of making a silica glass having a uniform fictive temperature. The glass article is heated at a target fictive temperature, or heated or cooled at a rate that is less than the rate of change of the fictive temperature, for a time that is sufficient to allow the fictive temperature of the glass to come within 3° C. of the target fictive temperature. The silica glass is then cooled from the target fictive temperature to a temperature below the strain point of the glass at a cooling rate that is greater than the relaxation rate of the glass at the target fictive temperature. The silica glass has a fictive temperature that varies by less than 3° C. after the annealing step. A silica glass made by the method is also described.

Abstract translation: 制造具有均匀的假想温度的二氧化硅玻璃的方法。 将玻璃制品在目标假想温度下加热，或以低于假想温度变化率的速率加热或冷却一段足以使玻璃的假想温度达到3°的时间 C.目标虚构温度。 然后将二氧化硅玻璃从目标假想温度冷却至低于玻璃应变点的温度，其冷却速率大于目标假想温度下玻璃的松弛率。 二氧化硅玻璃具有在退火步骤之后变化小于3℃的假想温度。 还描述了通过该方法制备的二氧化硅玻璃。