-
公开(公告)号：US11477877B2
公开(公告)日：2022-10-18
申请号：US16665335
申请日：2019-10-28
Applicant: Gigaphoton Inc.
Inventor： Hitoshi Nagano , Yasunori Wada , Tatsuya Yanagida , Osamu Wakabayashi
IPC: H05G2/00 , H01S3/107 , G03F7/20 , H01S3/23 , H01S3/00 , H01S3/10 , G21K1/06 , H01L21/027 , H01S3/13 , H01S3/16 , H01S5/40 , H01S3/115
Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.
-
公开(公告)号：US11465233B2
公开(公告)日：2022-10-11
申请号：US16378102
申请日：2019-04-08
Applicant: Gigaphoton Inc.
Inventor： Kouji Kakizaki , Osamu Wakabayashi
IPC: B23K26/06 , B23K26/0622 , B23K26/064 , B23K26/03 , B23K26/08 , B23K26/12 , B23K26/16 , B23K26/362 , B23K26/40 , H01S3/13 , H01S3/225 , H01S3/23 , B23K26/14 , B23K103/00 , B23K101/40
Abstract: A laser processing system includes: a wavelength-variable laser device configured to output each of a laser beam at an absorption line as a wavelength at which light is absorbed by oxygen and a laser beam at a non-absorption line as a wavelength at which the amount of light absorption by oxygen is smaller than at the absorption line; an optical system configured to irradiate a workpiece with the laser beam; and a laser control unit configured to control the wavelength-variable laser device, set the wavelength of the laser beam output from the wavelength-variable laser device to be the non-absorption line when laser processing is performed on the surface of the workpiece in gas containing oxygen, and set the wavelength of the laser beam output from the wavelength-variable laser device to be the absorption line when ozone cleaning is performed on the surface of the workpiece in gas containing oxygen.
-
公开(公告)号：US11451003B2
公开(公告)日：2022-09-20
申请号：US17009160
申请日：2020-09-01
Applicant: Gigaphoton Inc.
Inventor： Hiroaki Tsushima , Satoshi Tanaka , Yousuke Fujimaki , Takeshi Asayama , Osamu Wakabayashi
Abstract: A laser gas regenerating apparatus regenerates a discharged gas discharged from at least one ArF excimer laser apparatus and supplies the regenerated gas to the at least one ArF excimer laser apparatus connected to a first laser gas supply source that supplies a first laser gas and to a second laser gas supply source that supplies a second laser gas. The laser gas regenerating apparatus includes a data obtaining unit that obtains data on a supply amount of the second laser gas supplied to the at least one ArF excimer laser apparatus; a xenon adding unit that adds, to the regenerated gas, a third laser gas; and a control unit that controls, based on the supply amount, an addition amount of the third laser gas by the xenon adding unit.
-
公开(公告)号：US11353857B2
公开(公告)日：2022-06-07
申请号：US16729990
申请日：2019-12-30
Applicant: Gigaphoton Inc.
Inventor： Yutaka Igarashi , Yuji Minegishi , Osamu Wakabayashi
IPC: G05B19/418 , G03F7/20
Abstract: A data analyzer includes a data collector that acquires data on each analysis target parameter of each of a plurality of apparatuses from the apparatus, the plurality of apparatuses including a light source apparatus, an exposure apparatus that exposes a wafer to pulsed light outputted from the light source apparatus, and a wafer inspection apparatus that inspects the exposed wafer, an image generator that visualizes the data on each of the parameters collected by the data collector from the apparatuses that process the wafer for each predetermined area of the wafer to convert the data into an image and generates a plurality of mapped images for each of the parameters of the apparatuses, and a correlation computing section that performs pattern matching on arbitrary ones of the mapped images generated from the wafer to determine a correlation value between arbitrary ones of the parameters of the apparatuses.
-
公开(公告)号：US11353801B2
公开(公告)日：2022-06-07
申请号：US17134944
申请日：2020-12-28
Applicant: Gigaphoton Inc.
Inventor： Kunihiko Abe , Yuji Minegishi , Osamu Wakabayashi
Abstract: A maintenance management method for a lithography system according to a viewpoint of the present disclosure includes organizing and saving operating information for each of lithography cells that are each an apparatus group formed of a set of apparatuses and form the lithography system, organizing and saving maintenance information on consumables for each of the lithography cells, calculating a standard maintenance timing for each of the consumables for each of the lithography cells based on the operating information and the maintenance information on the consumable for each of the lithography cells, creating a maintenance schedule plan for each of the lithography cells or for each of manufacturing lines based on the standard maintenance timing, information on a downtime, and information on a loss cost due to the downtime for each of the lithography cells or for each of the manufacturing lines, and outputting the result of the creation of the maintenance schedule plan.
-
Patent Agency Ranking
公开(公告)号：US11081850B2
公开(公告)日：2021-08-03
申请号：US16853489
申请日：2020-04-20
Applicant: Gigaphoton Inc.
Inventor： Natsushi Suzuki , Osamu Wakabayashi , Hiroaki Tsushima , Masanori Yashiro
IPC: H01S3/036 , H01S3/104 , H01S3/225 , B01D53/34 , B01D53/82 , H01S3/23 , B01D53/04 , B01D53/68 , B01D53/86
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
-
公开(公告)号：US10892592B2
公开(公告)日：2021-01-12
申请号：US15953835
申请日：2018-04-16
Applicant: Gigaphoton Inc.
Inventor： Natsushi Suzuki , Masanori Yashiro , Osamu Wakabayashi
Abstract: A laser gas purifying system to purify laser gas emitted from a laser apparatus and return purified gas to the laser apparatus may include a first pipe configured to pass the laser gas emitted from the laser apparatus, a purifying apparatus connected to the first pipe and configured to purify the laser gas emitted from the laser apparatus, a second pipe connected to the purifying apparatus and configured to return the purified gas purified by the purifying apparatus to the laser apparatus, and an exhausting device provided in at least one of the first pipe, the purifying apparatus, and the second pipe.
-
公开(公告)号：US10797465B2
公开(公告)日：2020-10-06
申请号：US16266357
申请日：2019-02-04
Applicant: Gigaphoton Inc.
Inventor： Hirotaka Miyamoto , Osamu Wakabayashi
Abstract: A laser apparatus includes first and second wavelength dispersion elements, an optical element, first and second actuators, and a control unit. The first wavelength dispersion element generates wavelength dispersion in a direction orthogonal to an electric discharge direction between a pair of electric discharge electrodes. The second wavelength dispersion element generates wavelength dispersion in a direction parallel to the electric discharge direction. The optical element corrects wavelength dispersion generated by the second wavelength dispersion element. The first actuator drives the first wavelength dispersion element. The second actuator drives the optical element. The control unit controls the first actuator so that the center wavelength of the laser light approaches to a target wavelength and controls the second actuator so as to correct the wavelength dispersion generated by the second wavelength dispersion element.
-
公开(公告)号：US10764986B2
公开(公告)日：2020-09-01
申请号：US15347716
申请日：2016-11-09
Applicant: GIGAPHOTON INC.
Inventor： Shinji Nagai , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
IPC: H05G2/00 , G03F7/20 , G21K1/06 , B23K26/352 , G21K5/02 , G21K5/00 , B23K10/00 , G03B27/32 , B23K26/36 , B23K26/12
Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction, unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
-
70.发明授权公开(公告)号：US10512148B2
公开(公告)日：2019-12-17
申请号：US15447013
申请日：2017-03-01
Applicant: GIGAPHOTON INC.
Inventor： Hitoshi Nagano , Yasunori Wada , Tatsuya Yanagida , Osamu Wakabayashi
Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.
-
-
-
-
-
-
-
-
-
Search Results
167
records
(took 0.021 seconds)
