公开(公告)号：US08236427B2

公开(公告)日：2012-08-07

申请号：US12087174

申请日：2006-12-27

Applicant: Hiroaki Arita ,  Kazuhiro Fukuda ,  Koji Ozaki ,  Issei Suzuki

Inventor： Hiroaki Arita ,  Kazuhiro Fukuda ,  Koji Ozaki ,  Issei Suzuki

IPC: B32B19/04 ,  B32B27/32 ,  G11B5/64

CPC classification number: G02B5/30 ,  B05D1/62 ,  B05D7/04 ,  B32B9/00 ,  C23C16/0272 ,  C23C16/401 ,  C23C16/509 ,  C23C16/545 ,  C23C28/00 ,  C23C28/04 ,  G02B1/105 ,  G02B1/18 ,  G02F1/133528 ,  G02F2001/133311 ,  Y10T428/265 ,  Y10T428/31659

Abstract: A moistureproof cellulose ester film which has satisfactory optical performances, excellent moisture permeability, and excellent dimensional stability; and a protective film for polarizers which comprises the film. This moistureproof cellulose ester film comprises: a cellulose ester film and, deposited on at least one side thereof in the following order, one or more adhesion layers each having a carbon content in terms of atom number concentration of 1-40% and comprising an inorganic compound as the main component, one or more barrier layers each having a carbon content in terms of atom number concentration of 0.1% or lower, comprising silicon oxide as the main component, and having a film density of 2.16-2.60, and one or more protective layers each having a carbon content in terms of atom number concentration of 1-40% and comprising an inorganic compound as the main component. The total thickness of these deposit layers on one side is 1-100 nm. It is characterized in that the barrier layers on one side have a thickness of 0.1-30 nm.

Abstract translation: 具有良好的光学性能，优异的透湿性和优异的尺寸稳定性的防湿纤维素酯膜; 以及包含该膜的偏振器用保护膜。 这种防水纤维素酯薄膜包括：纤维素酯薄膜，并按以下顺序在其至少一面上沉积一个或多个粘合层，每个粘合层的原子数浓度为1-40％，含有无机物 化合物作为主要成分，一个或多个阻挡层各自具有以原子数浓度为0.1％或更低的碳含量，包括氧化硅作为主要成分，并且具有2.16-2.60的膜密度和一种或多种 保护层各自具有以原子数浓度为1-40％的碳含量并且包含无机化合物作为主要成分。 这些沉积层的一侧的总厚度为1-100nm。 其特征在于，一侧的阻挡层的厚度为0.1-30nm。

公开(公告)号：US20120098147A1

公开(公告)日：2012-04-26

申请号：US13380843

申请日：2010-06-25

Applicant: Hiroyuki Takaba

Inventor： Hiroyuki Takaba

IPC: H01L21/312 ,  H01L23/58

CPC classification number: H01J37/32192 ,  B05D1/62 ,  B05D5/083 ,  B05D7/52 ,  C23C16/0272 ,  C23C16/26 ,  C23C16/45563 ,  H01J37/32091 ,  H01L21/0212 ,  H01L21/022 ,  H01L21/02274 ,  H01L21/3127

Abstract: A method for manufacturing a semiconductor device having fluorocarbon layers as insulating layers includes the steps of forming a first fluorocarbon (CFx1) layer using plasma excited by microwave power and forming a second fluorocarbon (CFx2) layer using plasma excited by an RF power.

Abstract translation: 制造具有氟碳层作为绝缘层的半导体器件的方法包括以下步骤：使用由微波功率激发的等离子体形成第一氟碳化合物（CFx1）层，并使用由RF功率激发的等离子体形成第二氟碳化合物（CFx2）层。

公开(公告)号：US20120089084A1

公开(公告)日：2012-04-12

申请号：US13377389

申请日：2010-06-15

Applicant: Joe O'Keeffe ,  Peter Dobbyn ,  John O'Donoghus ,  Liam O'Neil

Inventor： Joe O'Keeffe ,  Peter Dobbyn ,  John O'Donoghus ,  Liam O'Neil

IPC: A61M37/00 ,  C07K14/745 ,  C07K14/435 ,  C08B37/08 ,  C08B37/04 ,  C08B1/00 ,  A61L15/26 ,  A61K35/14 ,  A61K35/16 ,  A61K47/34 ,  A61K47/42 ,  A61K47/36 ,  A61K47/38 ,  A61K38/43 ,  A61K35/12 ,  A61K38/02 ,  A61K31/711 ,  A61K31/727 ,  A61K39/00 ,  A61K31/726 ,  A61K38/21 ,  A61K35/32 ,  A61K35/28 ,  C07K14/78

CPC classification number: A61L26/0057 ,  A61B18/042 ,  A61L2/0011 ,  A61L2/14 ,  A61L26/0019 ,  A61L26/0023 ,  A61L26/0033 ,  A61L26/0042 ,  A61L26/0066 ,  A61L26/009 ,  A61L2300/254 ,  A61L2300/258 ,  A61L2300/404 ,  A61L2300/412 ,  A61L2300/606 ,  A61L2300/64 ,  B05D1/62 ,  H05H1/2406 ,  H05H1/42 ,  H05H1/48 ,  H05H2001/483 ,  H05H2240/20 ,  H05H2245/122 ,  C08L67/04 ,  C08L5/08 ,  C08L5/04 ,  C08L1/00

Abstract: A plasma coating device for treating a wound comprises a plasma chamber having: one or more electrodes, a gas supply inlet, a plasma outlet exposed to ambient pressure, and an ignition system operatively connected to the electrodes for providing a non-thermal equilibrium plasma within the plasma chamber. An aerosol delivery system is operable to introduce a bioresorbable material as an aerosol into the plasma, to produce a coating on the wound surface.

Abstract translation: 用于处理伤口的等离子体涂覆装置包括等离子体室，其具有：一个或多个电极，气体供应入口，暴露于环境压力的等离子体出口以及与电极可操作地连接以提供非热平衡等离子体的点火系统 等离子体室。 气溶胶输送系统可操作以将作为气溶胶的生物可吸收材料引入等离子体中，以在伤口表面上产生涂层。

公开(公告)号：US08123799B1

公开(公告)日：2012-02-28

申请号：US09997449

申请日：2001-11-30

Applicant: Shamim M. Malik ,  Charles D. Claude ,  Syed F. A. Hossainy

Inventor： Shamim M. Malik ,  Charles D. Claude ,  Syed F. A. Hossainy

IPC: A61F2/06

CPC classification number: A61L31/10 ,  A61F2/82 ,  A61L31/022 ,  A61L2400/18 ,  B05D1/62 ,  B05D2502/00 ,  C23C16/26 ,  H01J37/32082 ,  C08L33/08

Abstract: A medical device, such as a stent, is disclosed having a modified surface. A method of making the modification is also disclosed. The modification includes depositing a substance within the surface of the device and forming a film layer on the surface of the device. The substance can include carbon and the film layer can be a polymeric layer, such as a plasma polymerized organic film layer.

Abstract translation: 公开了一种诸如支架的医疗装置，具有改进的表面。 还公开了进行修饰的方法。 该修改包括将物质沉积在器件的表面内并在器件的表面上形成膜层。 该物质可以包括碳，并且膜层可以是聚合物层，例如等离子体聚合的有机膜层。

公开(公告)号：US20120043640A1

公开(公告)日：2012-02-23

申请号：US13264885

申请日：2010-04-16

Applicant: Sembukuttiarachilage Ravi Pradip Silva ,  José Virgilio Anguita Rodriguez Estefania

Inventor： Sembukuttiarachilage Ravi Pradip Silva ,  José Virgilio Anguita Rodriguez Estefania

IPC: H01L29/06 ,  B29C59/14 ,  C08F10/06 ,  B29C59/12 ,  C08F2/34 ,  C08F2/48

CPC classification number: C08F2/48 ,  B05D1/62 ,  B05D3/067 ,  B05D2507/02 ,  C08F2/52 ,  C08F2/54 ,  C08J3/246 ,  C08J3/28 ,  C08J7/123 ,  C08J2323/10 ,  H01G4/145 ,  H01G4/18

Abstract: There is disclosed a method for producing a highly cross-linked polypropylene material by plasma polymerisation of a carbon containing gas, not specifically propylene, exhibiting low relative permittivity, high thermal stability and enhanced mechanical properties, said method and material being suitable for application not limited to interlayer dielectric deposition in microchip fabrication.

Abstract translation: 公开了通过等离子体聚合含碳气体而不是特别是丙烯生产高度交联的聚丙烯材料的方法，其表现出低相对介电常数，高热稳定性和增强的机械性能，所述方法和材料适用于不限于 到微芯片制造中的层间电介质沉积。

公开(公告)号：US20110252861A1

公开(公告)日：2011-10-20

申请号：US12303871

申请日：2007-06-07

Applicant: Jean-Michel Rius

Inventor： Jean-Michel Rius

IPC: G01L27/00 ,  G01L9/14 ,  G01L9/00

CPC classification number: C23C16/045 ,  B05D1/62 ,  B05D7/227 ,  C23C16/511 ,  C23C16/54 ,  H01J37/32192

Abstract: A machine for plasma treatment of containers, including a chamber for receiving a container to be treated, the chamber connected to a primary vacuum circuit. A pressure sensor is connected to the chamber. There is a first mechanism for communicating the pressure sensor with the chamber; a secondary vacuum circuit dependent on the first circuit and connected to the pressure sensor; and second mechanism for communicating the pressure sensor with the secondary vacuum circuit.

Abstract translation: 一种用于等离子体处理容器的机器，包括用于接收待处理容器的室，连接到初级真空回路的室。 压力传感器连接到腔室。 存在用于将压力传感器与室连通的第一机构; 二次真空电路取决于第一电路并连接到压力传感器; 以及用于将压力传感器与二次真空回路连通的第二机构。

公开(公告)号：US08039052B2

公开(公告)日：2011-10-18

申请号：US11965689

申请日：2007-12-27

Applicant: Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao

Inventor： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao

IPC: C23C16/00 ,  H05H1/24

CPC classification number: C23C16/45565 ,  B05B14/30 ,  B05B16/80 ,  B05D1/10 ,  B05D1/62 ,  C23C16/4412 ,  C23C16/45589 ,  C23C16/4584 ,  C23C16/4585 ,  C23C16/4587 ,  C23C16/50 ,  Y10S438/942

Abstract: The various embodiments of the invention provide for relative movement of the substrate and a process head to access the entire wafer in a minimal space to conduct combinatorial processing on various regions of the substrate. The heads enable site isolated processing within the chamber described and method of using the same are described.

Abstract translation: 本发明的各种实施例提供了基板和工艺头在最小空间中访问整个晶片的相对运动，以在基板的各个区域上进行组合处理。 这些头使得所描述的室内的现场隔离处理和使用其的方法被描述。

公开(公告)号：US20110195582A1

公开(公告)日：2011-08-11

申请号：US13122745

申请日：2009-08-11

Applicant: Xiaobing Zhou

Inventor： Xiaobing Zhou

IPC: H01L21/314 ,  H01L21/316 ,  H01L21/318 ,  C07F7/10

CPC classification number: H01L21/02271 ,  B05D1/62 ,  C23C16/30 ,  C23C16/345 ,  C23C16/36 ,  C23C16/401 ,  C23C16/45553 ,  H01L21/02126 ,  H01L21/02167 ,  H01L21/02219 ,  H01L21/02274 ,  H01L21/3148 ,  H01L21/31633 ,  H01L21/3185

Abstract: A method of producing silicon containing thin films by the thermal polymerization of a reactive gas mixture bisaminosilacyclobutane and source gas selected from a nitrogen providing gas, an oxygen providing gas and mixtures thereof. The films deposited may be silicon nitride, silicon carbonitride, silicon dioxide or carbon doped silicon dioxide. These films are useful as dielectrics, passivation coatings, barrier coatings, spacers, liners and/or stressors in semiconductor devices.

Abstract translation: 通过反应性气体混合物双氨基硅烷环丁烷和选自氮气提供气体，氧气提供气体及其混合物的源气体的热聚合制备含硅薄膜的方法。 沉积的膜可以是氮化硅，碳氮化硅，二氧化硅或碳掺杂的二氧化硅。 这些膜可用作半导体器件中的电介质，钝化涂层，阻挡涂层，间隔物，衬垫和/或应力源。

公开(公告)号：US20110143129A1

公开(公告)日：2011-06-16

申请号：US13024521

申请日：2011-02-10

Applicant: Raghunath Padiyath ,  Moses M. David

Inventor： Raghunath Padiyath ,  Moses M. David

IPC: B32B27/06

CPC classification number: C08J7/045 ,  B05D1/62 ,  B05D7/546 ,  B05D7/58 ,  C08J7/123 ,  C23C16/26 ,  C23C16/545 ,  H01L51/448 ,  H01L51/5243 ,  H01L51/5256 ,  Y10T428/26 ,  Y10T428/265 ,  Y10T428/30 ,  Y10T428/31504 ,  Y10T428/31935

Abstract: A barrier assembly having a flexible or rigid substrate overcoated with an all polymer multilayer stack. A multilayer on the substrate includes alternating diamond-like glass or carbon layers with polymer layers. Another multilayer includes alternating polymer layers using different types of polymers. The barrier layers can be used to mount, cover, encapsulate or form composite assemblies for protection of moisture or oxygen sensitive articles

Abstract translation: 具有用全部聚合物多层堆叠外涂的柔性或刚性基材的阻挡组件。 衬底上的多层包括具有聚合物层的交替的类金刚石玻璃或碳层。 另一种多层包括使用不同类型聚合物的交替聚合物层。 阻挡层可用于安装，覆盖，包封或形成复合组件，以保护水分或氧敏感物品

公开(公告)号：US20110121108A1

公开(公告)日：2011-05-26

申请号：US12624828

申请日：2009-11-24

Applicant: Stephan Rodewald ,  Frederic Gerard Auguste Siffer

Inventor： Stephan Rodewald ,  Frederic Gerard Auguste Siffer

IPC: B05B1/00

CPC classification number: H05H1/42 ,  B05B7/22 ,  B05B13/0207 ,  B05B13/0214 ,  B05D1/34 ,  B05D1/62 ,  B05D3/141 ,  H05H2001/3478 ,  H05H2001/3484

Abstract: A nozzle provides plasma polymerization on a cylindrical surface of an object. The nozzle includes a cylindrical body having a longitudinal axis, a coaxial cylindrical inlet for receiving plasma and the object, a radial inlet for receiving an organic precursor, and a mixing chamber for receiving the plasma and the object from the coaxial cylindrical inlet thereby providing mixing of the plasma and the organic precursor and a uniform deposition of polymer on the cylindrical surface of the object.

Abstract translation: 喷嘴在物体的圆柱形表面上提供等离子体聚合。 喷嘴包括具有纵向轴线的圆柱体，用于接收等离子体的同轴圆柱形入口和物体，用于接收有机前体的径向入口和用于从同轴圆柱形入口接收等离子体和物体的混合室，从而提供混合 的等离子体和有机前体，以及聚合物在物体的圆柱形表面上的均匀沉积。