公开(公告)号：US06982232B2

公开(公告)日：2006-01-03

申请号：US10842979

申请日：2004-05-11

Applicant: Nicholas F. Borrelli ,  Charlene M. Smith ,  Johannes Moll

Inventor： Nicholas F. Borrelli ,  Charlene M. Smith ,  Johannes Moll

IPC: C03C3/06

CPC classification number: G03F7/70041 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0085 ,  C03C23/002 ,  C03C2201/21 ,  C03C2201/23 ,  G03F7/70058 ,  G03F7/70941 ,  G03F7/70958 ,  G03F7/70966

Abstract: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02×1018 molecules/cm3 and about 0.18×1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.

Abstract translation: 公开了平版印刷方法。 在一种这样的方法中，用于产生具有小于约300nm的波长的紫外光刻辐射的脉冲紫外辐射源，其注量小于10mJ / cm 2 /脉冲和高纯度熔融石英光刻 分子氢浓度在约0.02×10 18分子/ cm 3至约0.18×10 18分子/ cm 3之间的玻璃 。 用紫外光刻法形成光刻图案; 光刻图案被减少以产生减小的光刻图案; 并且将还原的光刻图案投影到紫外线照射敏感光刻介质上以形成印刷光刻图案。 形成，还原和突出步骤中的至少一个步骤包括通过高纯度熔融石英光刻玻璃传输紫外光刻辐射。 还描述了平版印刷系统和高纯度熔融石英光刻玻璃。

公开(公告)号：US20050044893A1

公开(公告)日：2005-03-03

申请号：US10926619

申请日：2004-08-25

Applicant: Jeffrey Coon ,  John Lasala ,  Candace Quinn ,  Robert Sabia ,  Ronald Stewart ,  James Tingley ,  Ljerka Ukrainczyk ,  Joseph Whalen

Inventor： Jeffrey Coon ,  John Lasala ,  Candace Quinn ,  Robert Sabia ,  Ronald Stewart ,  James Tingley ,  Ljerka Ukrainczyk ,  Joseph Whalen

IPC: C03B19/12 ,  C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  C03C23/00 ,  G02B6/34 ,  C03B37/00 ,  H01S3/081

CPC classification number: G02B6/29343 ,  C03B19/12 ,  C03B19/1453 ,  C03B32/00 ,  C03B32/005 ,  C03B2201/075 ,  C03B2201/23 ,  C03B2201/31 ,  C03C3/06 ,  C03C23/008 ,  C03C2201/23 ,  C03C2201/31 ,  C03C2203/50 ,  G02B6/29311

Abstract: Disclosed are optical resonators having low OH content in at least the near-surface region and a process for making low OH glass article by chlorine treatment of consolidated glass of the article. Cl2 gas was used to remove OH from depth as deep as 350 μm from the surface of the consolidated glass. The process can be used for treating flame-polished preformed optical resonator disks. A new process involving hot pressing or thermal reflowing for making planar optical resonator disks without the use of flame polishing is also disclosed.

Abstract translation: 公开了至少在近表面区域具有低OH含量的光学谐振器和通过氯处理制品的固结玻璃来制造低OH玻璃制品的方法。 使用Cl2气体从固结玻璃表面去除深度为350微米的OH。 该方法可用于处理火焰抛光的预制光学谐振器盘。 还公开了一种涉及用于制造平面光学谐振器盘而不使用火焰抛光的热压或热回流的新方法。

公开(公告)号：US20040095566A1

公开(公告)日：2004-05-20

申请号：US10614200

申请日：2003-07-08

Inventor： Norio Komine ,  Seishi Fujiwara ,  Akiko Yoshida ,  Hiroki Jinbo ,  Norihisa Yamaguchi

IPC: G03B027/54

CPC classification number: C03B19/1415 ,  C03B19/1407 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/22 ,  C03B2207/24 ,  C03B2207/32 ,  C03B2207/36 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/50 ,  C03C2203/40

Abstract: An optical member made of silica glass manufactured by the direct method where a material gas comprising an organosilicon compound is allowed to react in an oxidizing flame, said optical member having a 2null1014 molecules/cm3 or less concentration of formyl radical generated by X-ray irradiation whose dose is 0.01 Mrad or more and 1 Mrad or less.

Abstract translation: 通过直接法制造的由石英玻璃制成的光学构件，其中包含有机硅化合物的材料气体在氧化火焰中反应，所述光学构件具有2×10 14分子/ cm 3或更低浓度的甲酰基 其剂量为0.01Mrad以上且1Mrad以下的X射线照射产生。

公开(公告)号：US06622527B2

公开(公告)日：2003-09-23

申请号：US10154511

申请日：2002-05-23

Applicant: Gerhard Schötz ,  Jan Vydra

Inventor： Gerhard Schötz ,  Jan Vydra

IPC: C03B37018

CPC classification number: C03C13/045 ,  C03B19/1453 ,  C03B37/01446 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C25/002 ,  C03C25/607 ,  C03C2201/21 ,  C03C2201/23

Abstract: A core glass for making a preform for an optical fiber particularly useful for the transmission of ultraviolet radiation and methods for making the core glass are disclosed. The core glass is obtained by the flame hydrolysis of a silicon compound, deposition of finely granular SiO2 on a substrate with direct vitrification and formation of a synthetic quartz glass. The quartz glass has a hydrogen content of less than 1×1018 molecules/cm3.

Abstract translation: 公开了一种用于制造用于传输紫外线辐射的特别有用的光纤预制棒的芯玻璃和用于制造芯玻璃的方法。 核心玻璃通过硅化合物的火焰水解获得，通过直接玻璃化沉积细颗粒SiO 2并形成合成石英玻璃。 石英玻璃的氢含量小于1×10 18分子/ cm 3。

公开(公告)号：US20030115905A1

公开(公告)日：2003-06-26

申请号：US10310349

申请日：2002-12-05

Inventor： Bodo Kuhn ,  Bruno Uebbing ,  Martin Trommer ,  Stefan Ochs ,  Stephan Thomas ,  Steffen Kaiser ,  Jan Vydra

IPC: C03B019/00

CPC classification number: C03C4/0071 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57

Abstract: The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties: a glass structure essentially free of oxygen defect sites, an H2-content in the range of 0.1null1016 molecules/cm3 to 4.0null1016 molecules/cm3, an OH-content in the range of 125 wt-ppm to 450 wt-ppm, an SiH group-content of less than 5null1016 molecules/cm3, a refractive index inhomogeneity, nulln, of less than 2 ppm, and a stress birefringence of less than 2 nm/cm. In the use according to the invention, the quartz glass blank complies with dimensioning rules (2), (3), and (4) in terms of its minimal and maximal hydrogen contents and OH-content, CH2min, CH2max, and COH, respectively, with P being the pulse number and null being the energy density (in mJ/cm2): CH2minnullmolecules/cm3nullnull1null106 null2Pnullnull(2), CH2maxnullmolecules/cm3nullnull2null1018 nullnullnull(3), COHnullwt-ppmnullnull1,700nullnullnullmJ/cm2null0.4null50nullnull(4). The procedure according to the invention is characterized in that a mixed quartz glass is generated from a first and a second quartz glass by mixing the two quartz glasses in the course of a homogenization treatment.

Abstract translation: 本发明涉及用于传输波长为250nm或更短波长的紫外线辐射的光学部件的石英玻璃坯料，以及微波平版印刷中使用石英玻璃毛坯与波长为250nm的紫外线辐射或 较短 此外，本发明涉及石英玻璃坯料的制造工序。 所述类型的石英玻璃坯料应显示出很少的诱导吸收，并且在压实和分解时优化。 根据本发明的石英玻璃坯料的特征在于以下性质：基本上不含氧缺陷部位的玻璃结构，H 2含量在0.1×10 16分/ cm 3至4.0×10 16分子/ cm 3范围内，OH-含量 125重量ppm至450重量ppm的范围，小于5×10 16分/厘米3的SiH基含量，小于2ppm的折射率不均匀性，DELTAn，应力双折射小于2nm / cm 。 在根据本发明的使用中，石英玻璃空白分别符合其最小和最大氢含量和OH-含量，CH 2 min，CH 2 max和COH的尺寸规则（2），（3）和（4） ，其中P是脉冲数，εi是能量密度（mJ / cm 2）：CH 2min [分子/ cm 3] = 1×10 6 epsi 2 P（2），CH 2 max [分子/ cm 3] =2x1018εi（3） ppm] = 1,700xepsi [mJ / cm 2] 0.4±50（4）。 根据本发明的方法的特征在于，通过在均化处理过程中混合两个石英玻璃从第一和第二石英玻璃产生混合石英玻璃。

公开(公告)号：US20030051507A1

公开(公告)日：2003-03-20

申请号：US10283055

申请日：2002-10-30

Applicant: Asahi Glass Company, Limited

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Akio Masui ,  Noriaki Shimodaira ,  Shuhei Yoshizawa

IPC: C03C015/00

CPC classification number: G03F7/70958 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C23/00 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54 ,  Y02P40/57

Abstract: A process for producing a synthetic silica glass optical component which contains at least 1null1017 molecules/cm3 and has an OH concentration of at most 200 ppm and substantially no reduction type defects, by treating a synthetic silica glass having a hydrogen molecule content of less than 1null1017 molecules/cm3 at a temperature of from 300 to 600null C. in a hydrogen gas-containing atmosphere at a pressure of from 2 to 30 atms.

Abstract translation: 通过处理氢分子含量小于1×10 17的合成石英玻璃，制造合成石英玻璃光学组件的方法，该方法含有至少1×10 17分子/ cm 3且具有至多200ppm的OH浓度且基本上没有还原型缺陷 分子/ cm3，温度为300-600℃，在氢气气氛中，压力为2-30atm。

公开(公告)号：US06499317B1

公开(公告)日：2002-12-31

申请号：US09581263

申请日：2000-10-17

Applicant: Yoshiaki Ikuta ,  Shinya Kikugawa ,  Noriaki Shimodaira ,  Akio Masui ,  Shuhei Yoshizawa

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Noriaki Shimodaira ,  Akio Masui ,  Shuhei Yoshizawa

IPC: G01N2300

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C23/002 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57 ,  Y10S65/16 ,  Y10S501/90 ,  Y10S501/905

Abstract: A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cm−1 (I2250) to the scattering peak intensity of 800 cm−1 (I800), i.e. I2250/I800, of at most 1×10−4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2×10−3 cm−1.

Abstract translation: 一种用于光学用的合成石英玻璃，其用于通过在从含有氟的紫外线区域到真空紫外线区域的光的照射下使用，其具有2250cm -1（I2250）的散射峰强度比， 对于激光拉曼光谱中至多为1×10 -4的800cm -1（I800）的散射峰强度（I800），即I2250 / I800，其吸光系数为245nm，最多为2×10 -3 cm -3， 1。

公开(公告)号：US06413682B1

公开(公告)日：2002-07-02

申请号：US09576006

申请日：2000-05-22

Applicant: Yukio Shibano ,  Hisatoshi Otsuka

Inventor： Yukio Shibano ,  Hisatoshi Otsuka

IPC: G03F900

CPC classification number: G03F1/60 ,  C03B19/12 ,  C03B19/1453 ,  C03B19/1469 ,  C03B32/00 ,  C03B2201/23 ,  C03C3/06 ,  C03C2201/23 ,  C03C2203/20 ,  C03C2203/40

Abstract: A synthetic quartz glass substrate is prepared by annealing a synthetic quartz glass member having a higher hydroxyl content in a peripheral portion than in a central portion, machining off the peripheral portion of the member, slicing the member into a plate shaped substrate, chamfering and etching the substrate. The synthetic quartz glass substrate has a minimized birefringence and is suited for use as a photomask in photolithography.

Abstract translation: 合成石英玻璃基板通过在周边部分比在中心部分退火具有较高羟基含量的合成石英玻璃构件来制备，将构件的周边部分切除，将构件切割成板状基板，倒角和蚀刻 底物。 合成石英玻璃基板具有最小的双折射，并且适合用作光刻中的光掩模。

公开(公告)号：US20020077244A1

公开(公告)日：2002-06-20

申请号：US09967841

申请日：2001-09-27

Inventor： Nicholas F. Borrelli ,  Charlene M. Smith ,  Johannes Moll

IPC: C03C003/06

CPC classification number: G03F7/70041 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0085 ,  C03C23/002 ,  C03C2201/21 ,  C03C2201/23 ,  G03F7/70058 ,  G03F7/70941 ,  G03F7/70958 ,  G03F7/70966

Abstract: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02null1018 molecules/cm3 and about 0.18null1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.

Abstract translation: 公开了平版印刷方法。 在一种这样的方法中，用于产生波长短于约300nm的波长小于10mJ / cm 2 /脉冲的紫外光刻辐射的脉冲紫外辐射源和具有分子氢浓度的高纯度熔融石英光刻玻璃 提供约0.02×10 18分子/ cm 3和约0.18×10 18分子/ cm 3。 用紫外光刻法形成光刻图案; 光刻图案被减少以产生减小的光刻图案; 并且将还原的光刻图案投影到紫外线照射敏感光刻介质上以形成印刷光刻图案。 形成，还原和突出步骤中的至少一个步骤包括通过高纯度熔融石英光刻玻璃传输紫外光刻辐射。 还描述了平版印刷系统和高纯度熔融石英光刻玻璃。

公开(公告)号：US20020041737A1

公开(公告)日：2002-04-11

申请号：US09964842

申请日：2001-09-28

Inventor： Shinji Ishikawa ,  Akira Urano ,  Masayuki Kiya

IPC: G02B006/26 ,  G02B006/255

CPC classification number: G02B6/03633 ,  C03B37/01211 ,  C03B37/01446 ,  C03B2201/20 ,  C03B2201/23 ,  C03B2201/31 ,  C03B2203/22 ,  C03C13/045 ,  G02B6/0283 ,  G02B6/03627 ,  G02B6/2835 ,  G02B6/29332

Abstract: In a single mode optical fiber employed in an optical fiber coupler, letting r be the radial distance from the optical axis center, nulln (r) be the relative refractive index difference at the position r within a core portion with reference to the refractive index of a cladding portion placed about the core portion, nullnpeak be the peak value of the relative refractive index difference nulln (r) at the position rpeak, and a be the core radius, the relative refractive index difference nulln (r) satisfies the relationship of nulln (r)nullnullnpeak null1null(r/a)3null in the range of rpeaknullrnulla; and the refractive index of the cladding portion gradually decreases outward in its radial direction.

Abstract translation: 在光纤耦合器中使用的单模光纤中，使r为距离光轴中心的径向距离，DELTAn（r）为芯部内位置r处的相对折射率差，参照折射率 围绕芯部放置的包覆部分，DELTAnpeak是位置rpeak处的相对折射率差ΔDTAn（r）的峰值，而作为芯部半径，相对折射率差DELTAn（r）满足DELTAn （r）<= DELTAnpeak [1-（r / a）3]在rpeak <= r <= a; 并且包层部的折射率在径向方向上向外逐渐减小。