CONDUCTIVE DOPED METAL-GLASS COMPOSITIONS AND METHODS
    67.
    发明申请
    CONDUCTIVE DOPED METAL-GLASS COMPOSITIONS AND METHODS 审中-公开
    导电金属玻璃组合物和方法

    公开(公告)号:US20150353414A1

    公开(公告)日:2015-12-10

    申请号:US14831957

    申请日:2015-08-21

    Inventor: Himanshu JAIN

    Abstract: Provided herein are conductive glass-metal compositions, as well as methods of making and using such compositions. In one example, the compositions include gold (Au) doped lithium-borate glasses shown to exhibit a transition from ionic to electronic conduction within the same sample. This is achieved via appropriate heat treatment, and particularly by heat treatment after annealing, wherein the post-annealing heat treatment is performed at temperatures below the glass transition temperature (Tg). The methods described herein are believed to introducing polarons formed from the trapping of electrons at partially ionized gold atoms. This unique electrical response provides new functionality to this class of nanocomposites. Additionally, increased thermal conductivity can be provided to an otherwise low conductive glass composition using the inventive methods and other subject matter provided herein.

    Abstract translation: 本文提供了导电玻璃 - 金属组合物,以及制备和使用这些组合物的方法。 在一个实例中,组合物包括掺杂的金(Au)掺杂的硼酸锂玻璃,其显示出在相同样品内从离子到电导通的转变。 这通过适当的热处理,特别是通过退火后的热处理来实现,其中后退热处理在低于玻璃化转变温度(Tg)的温度下进行。 据信本文描述的方法引入由部分电离的金原子捕获电子形成的极化子。 这种独特的电响应为这类纳米复合材料提供了新的功能。 另外,使用本发明的方法和本文提供的其他主题,可以提供另外低导电性玻璃组合物的增加的导热性。

    Very low CTE slope doped silica-titania glass
    70.
    发明授权
    Very low CTE slope doped silica-titania glass 有权
    非常低的CTE斜率掺杂二氧化硅 - 二氧化钛玻璃

    公开(公告)号:US08901019B2

    公开(公告)日:2014-12-02

    申请号:US13835039

    申请日:2013-03-15

    Abstract: The present disclosure is directed to a doped silica-titania glass, DST glass, consisting essentially of 0.1 wt. % to 5 wt. % halogen, 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the halogen content can be in the range of 0.2 wt. % to 3 wt. % along with 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the DST glass has an OH concentration of less than 100 ppm. In another embodiment the OH concentration is less than 50 ppm. The DST glass has a fictive temperature Tf of less than 875° C. In an embodiment Tf is less than 825° C. In another embodiment Tf is less than 775° C.

    Abstract translation: 本公开涉及掺杂的二氧化硅 - 二氧化钛玻璃,DST玻璃,其基本上由0.1重量% %至5wt。 %卤素,50ppm-wt。 至6重量% %的一种或多种Al,Ta和Nb的氧化物,3wt。 %至10重量% %的TiO 2和其余的SiO 2。 在一个实施方案中,卤素含量可以在0.2wt。 %〜3重量% %和50ppm-wt。 至6重量% %的一种或多种Al,Ta和Nb的氧化物,3wt。 %〜10重量% %的TiO 2和其余的SiO 2。 在一个实施方案中,DST玻璃的OH浓度小于100ppm。 在另一个实施方案中,OH浓度小于50ppm。 DST玻璃具有小于875℃的假想温度Tf。在一个实施方案中,Tf小于825℃。在另一个实施方案中,Tf小于775℃

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