公开(公告)号：USRE41667E1

公开(公告)日：2010-09-14

申请号：US11981033

申请日：2001-09-28

Applicant: Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

Inventor： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

IPC: G03F7/20 ,  G21K5/04 ,  G21K1/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B27/0905 ,  G02B27/0961 ,  G02B27/0983 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/06 ,  G21K2201/064

Abstract: There is provided an illumination system for microlithography with wavelengths≦193 nm that includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical element and the second optical element are reflective. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed, at least partially, on a field in the image plane. The first optical component includes a collector unit and a second optical element having a plurality of second raster elements. The illumination system also includes a first optical axis between the collector unit and the first optical element, a second optical axis between the first optical element and the second optical element, and a third optical axis between the second optical element and the second optical component. A directional vector of the first optical axis and a directional vector of the second optical axis define a plane and wherein the first and second optical elements are tilted to cause a crossing of the projection of the third optical axis in to the plane and the first optical axis.

Abstract translation: 提供了一种用于微波光刻的照明系统，其具有包括初级光源，第一光学部件，第二光学部件，图像平面和出射光瞳的波长＆amp; 193nm。 第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。 第一光学元件和第二光学元件是反射性的。 第一光学部件包括具有成像到图像平面中的多个第一光栅元件的第一光学元件，至少部分地叠加在图像平面中的场上产生多个图像。 第一光学部件包括收集器单元和具有多个第二光栅元件的第二光学元件。 所述照明系统还包括在所述收集单元与所述第一光学元件之间的第一光轴，所述第一光学元件和所述第二光学元件之间的第二光轴以及所述第二光学元件和所述第二光学元件之间的第三光轴。 第一光轴的方向矢量和第二光轴的方向矢量限定一个平面，并且其中第一和第二光学元件被倾斜以使第三光轴的投影与平面交叉，并且第一光学 轴。

公开(公告)号：US07522708B2

公开(公告)日：2009-04-21

申请号：US11700152

申请日：2007-01-31

Applicant: Björn Heismann ,  Eckhard Hempel ,  Stefan Popescu

Inventor： Björn Heismann ,  Eckhard Hempel ,  Stefan Popescu

IPC: G21K1/00

CPC classification number: A61B6/06 ,  A61B6/00 ,  A61B6/032 ,  A61B6/4014 ,  A61B6/4092 ,  A61B6/4233 ,  A61B6/4266 ,  A61B6/4291 ,  A61B6/4441 ,  A61B6/484 ,  G03B42/02 ,  G21K2201/06 ,  G21K2207/005

Abstract: A focus/detector system of an X-ray apparatus is disclosed for generating projective or tomographic phase contrast recordings. In at least one embodiment, the system includes a beam source, including a focus and a focus-side source grating, arranged in the beam path to generate a field of ray-wise coherent X-rays; and a grating/detector arrangement having a phase grating with grating lines arranged parallel to the source grating for generating an interference pattern and a detector having a multiplicity of detector elements arranged flat for measuring the radiation intensity behind the phase grating. Further, the detector elements are formed by a multiplicity of elongate detection strips, which are aligned parallel to the grating lines of the phase grating. Furthermore, at least one embodiment also relates to the use of this focus/detector system in an X-ray system for generating projective recordings or in C-arc equipment or a CT system, and/or to a method for generating projective and tomographic X-ray recordings of a subject.

Abstract translation: 公开了用于产生投影或层析相位对比记录的X射线装置的焦点/检测器系统。 在至少一个实施例中，系统包括布置在光束路径中以产生射线相干X射线场的束源，包括焦点和焦点侧源光栅; 以及具有相位光栅的光栅/检测器装置，其具有平行于源光栅排列的光栅线，用于产生干涉图案;以及检测器，具有平坦布置的多个检测器元件，用于测量相位光栅后面的辐射强度。 此外，检测器元件由多个细长的检测条形成，其平行于相位光栅的光栅线排列。 此外，至少一个实施例还涉及在X射线系统中用于产生投影记录或在C弧设备或CT系统中使用该焦点/检测器系统和/或用于产生投影和断层X的方法 录音的主题。

公开(公告)号：US07514186B2

公开(公告)日：2009-04-07

申请号：US11167560

申请日：2005-06-28

Applicant: Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Marco Le Kluse

Inventor： Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Marco Le Kluse

IPC: G03F1/00

CPC classification number: G03F7/70941 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/38 ,  G03F1/40 ,  G03F7/707 ,  G03F7/70708 ,  G21K2201/06

Abstract: A reticle includes an area provided with a conductive metal-based compound coating for electrically grounding the reticle. The reticle is suitable for use with a lithography apparatus whereby the reticle pattern is imaged using extreme ultra violet radiation. One or more conducting pins, held at zero potential, may be pressed against the conductive coating for electrically grounding the reticle either during patterning the reticle by electron beam writing or during use in the lithographic apparatus. The areas coated with the metal-based compounds are wear resistant which reduces the occurrence of particles due to damage caused by mechanical contact between the conducting pins and the conductive coating.

Abstract translation: 掩模版包括设置有用于将掩模版电接地的导电金属基复合涂层的区域。 掩模版适用于光刻设备，由此使用极紫外辐射对掩模版图案进行成像。 保持在零电位的一个或多个导电引脚可以被压靠在导电涂层上，以在通过电子束写入或在光刻设备中的使用期间在掩模版图案化期间将掩模版电接地。 涂覆有金属基化合物的区域是耐磨的，其减少由于导电引脚和导电涂层之间的机械接触而引起的损伤的发生。

公开(公告)号：US07405871B2

公开(公告)日：2008-07-29

申请号：US11054040

申请日：2005-02-08

Applicant: Jose Sasian

Inventor： Jose Sasian

IPC: G02B5/08

CPC classification number: G03F7/702 ,  G02B17/0605 ,  G02B17/0615 ,  G02B27/0043 ,  G03F7/70175 ,  G21K2201/06

Abstract: A collector that includes a laser produced plasma (LPP) extreme ultra violet (EUV) light source and a first optical path from the source to a mirror. The mirror is the first mirror that light emitted from the source and traveling along the first optical path impinges upon. The collector also includes a second optical path from the source to another mirror. The other mirror is the first mirror that light emitted from the source and raveling along the second path impinges upon. The mirror and the other mirror are oriented relative to the source such that light from the source traveling along the first optical path travels in a direction opposite to light traveling from the source along the second optical path. A collector having a discharge extreme ultra violet (EUV) light source.

Abstract translation: 包括激光产生的等离子体（LPP）极紫外（EUV）光源和从光源到镜子的第一条光路的收集器。 镜子是从光源发射并沿着第一光路行进的光照射的第一个反射镜。 收集器还包括从源到另一个反射镜的第二光路。 另一个镜子是从源头发出的光并沿着第二条路径射出的第一个反射镜。 反射镜和另一个反射镜相对于光源定向，使得沿着第一光路行进的光的光沿与第二光路从光源行进的光相反的方向行进。 具有放电极紫外（EUV）光源的集电极。

公开(公告)号：US07257193B2

公开(公告)日：2007-08-14

申请号：US11347668

申请日：2006-02-03

Applicant: Ian Radley ,  Michael D. Moore ,  Mark Fitzgerald

Inventor： Ian Radley ,  Michael D. Moore ,  Mark Fitzgerald

IPC: H05G1/26

CPC classification number: H05G1/36 ,  G21K2201/06 ,  H01J2235/1291 ,  H05G1/025

Abstract: An x-ray source assembly includes an anode having a spot upon which electrons impinge based on power level supplied to the assembly, and an optic coupled to receive divergent x-rays generated at the spot and transmit output x-rays from the assembly. A control system is provided for maintaining intensity of the output x-rays dynamically during operation of the x-ray source assembly, notwithstanding a change in at least one operating condition of the x-ray source assembly, by changing the power level supplied to the assembly. The control system may include at least one actuator for effecting the change in the power level supplied to the assembly, by, e.g., controlling a power supply associated with the assembly. The control system may also change the temperature and/or the position of the anode to maintain the output intensity.

Abstract translation: x射线源组件包括阳极，阳极基于提供给组件的功率电平而撞击电子的点，以及光耦合以接收在该点处产生的发散的x射线，并从组件传输输出x射线。 提供了一种控制系统，用于在x射线源组件的操作期间动态地保持输出x射线的强度，尽管通过改变提供给X射线源组件的功率电平，尽管x射线源组件的至少一个操作状态发生变化 部件。 控制系统可以包括至少一个致动器，用于通过例如控制与组件相关联的电源来实现提供给组件的功率水平的变化。 控制系统还可以改变阳极的温度和/或位置以维持输出强度。

公开(公告)号：US20070029512A1

公开(公告)日：2007-02-08

申请号：US11512821

申请日：2006-08-30

Applicant: Norbert Bowering ,  Bjorn Hansson

Inventor： Norbert Bowering ,  Bjorn Hansson

IPC: G01J3/10

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

Abstract translation: 公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。 在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。 管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。 在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。 在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。

公开(公告)号：US07110084B2

公开(公告)日：2006-09-19

申请号：US10769373

申请日：2004-01-30

Applicant: Toshihiko Tsuji

Inventor： Toshihiko Tsuji

IPC: G03B27/42

CPC classification number: G03F7/702 ,  G21K2201/06

Abstract: Attempting to provide an illumination optical system and an exposure apparatus using the same, which provide a more uniform angular distribution of light for illuminating a mask than the prior art, an illumination optical system for illuminating an object surface includes an optical unit that converts light from a light source section into approximately parallel light, and includes first and second mirrors, wherein the first mirror has an opening, through which light reflected by the second mirror passes.

Abstract translation: 为了提供照明光学系统和使用该照明光学系统的曝光装置，其提供了比现有技术更光亮的用于照射掩模的光的角度分布，用于照射物体表面的照明光学系统包括：光学单元，其将来自 光源部分成近似平行的光，并且包括第一和第二反射镜，其中第一反射镜具有开口，第二反射镜反射的光穿过该开口。

公开(公告)号：US07033679B2

公开(公告)日：2006-04-25

申请号：US10057822

申请日：2002-01-24

Applicant: Takahiro Okura ,  Kazuya Shimizu ,  Masakazu Takei

Inventor： Takahiro Okura ,  Kazuya Shimizu ,  Masakazu Takei

IPC: B32B15/04 ,  B32B15/20 ,  B32B33/00 ,  G03B21/28 ,  F21V7/00

CPC classification number: C23C14/081 ,  C23C14/0021 ,  C23C14/0694 ,  C23C14/08 ,  C23C14/083 ,  C23C14/10 ,  C23C14/14 ,  C23C14/32 ,  C30B23/02 ,  C30B29/02 ,  G02B5/0858 ,  G21K1/06 ,  G21K2201/06 ,  Y10T428/12174 ,  Y10T428/12736 ,  Y10T428/12896 ,  Y10T428/12993 ,  Y10T428/31678

Abstract: The metal film of the present invention is a dense film of a single crystal that has very low surface roughness and very good crystal orientation because an arithmetic mean roughness of the surface is not larger than 2 nm and a (111) peak intensity of X-ray diffraction is not less than 20 times the sum of all other peaks. Also the metal oxide film of the present invention is a dense film that includes less oxygen defects and almost no voids therein because a content of a non-oxidized metal is not higher than 1 mole % of a metal component that constitutes the metal oxide and a packing density is 0.98 or higher.

Abstract translation: 本发明的金属膜是具有非常低的表面粗糙度和非常好的晶体取向的单晶的致密膜，因为表面的算术平均粗糙度不大于2nm，并且（111）的X-射线衍射峰强度， X射线衍射不小于所有其他峰的总和的20倍。 另外，本发明的金属氧化物膜是由于非氧化金属的含量不高于构成金属氧化物的金属成分的1摩尔％而含有氧缺陷少，几乎无空隙的致密膜， 填充密度为0.98以上。

公开(公告)号：US20050031078A1

公开(公告)日：2005-02-10

申请号：US10872777

申请日：2004-06-22

Applicant: Muradin Kumakhov

Inventor： Muradin Kumakhov

IPC: G01N23/22 ,  A61B6/00 ,  A61B6/03 ,  G01N23/18 ,  G01N23/223 ,  G01T1/00 ,  G21K1/02 ,  G21K1/06 ,  G21K5/02 ,  G01N23/201 ,  G21K5/10

CPC classification number: G01N23/223 ,  G01N2223/076 ,  G21K2201/06

Abstract: Inventions related to the intra-vision means, designed for production of visually sensed images of the internal structure of an object, in particular, of a biological object, are aimed at higher accuracy of determining the relative density indices of the object's substance in the obtained image together with avoiding complex and expensive engineering; when used for diagnostic purposes in medicine, the dosage of tissues surrounding those that are examined is decreased. X-rays from source 1 is concentrated (for example, using X-ray lens 2) in the zone that includes the current point 4, to which the measurement results are attributed and which is located within the target area 7 of the object 5. Excited in this zone secondary scattered radiation (Compton, fluorescent) is transported (for example, using X-ray lens 3) to one or more detectors 6. By moving the said zone, the target area 7 of object 5 is scanned, and based upon population of the intensity values of the secondary radiation, which are obtained with the help of one or more detectors 6 and which are determined concurrently with coordinates of the current point 6, judgment on the density of the object's substance in this point is made. Density values together with respective coordinate values obtained using sensors 11 are used in the means 12 for data processing and imaging to build up a picture of substance density distribution in the target area of the object.

Abstract translation: 旨在用于生产对象的内部结构，特别是生物体的视觉感测图像的视觉内装置的发明旨在提高确定所获得物体物质的相对密度指数的精度 形象与避免复杂和昂贵的工程; 当在医学中用于诊断目的时，减少了被检查的组织周围的组织的剂量。 来自源1的X射线在包括当前点4的区域中被集中（例如，使用X射线透镜2），测量结果被归因于并且位于对象5的目标区域7内的区域。 在该区域激发二次散射辐射（康普顿荧光灯）被传送（例如，使用X射线透镜3）到一个或多个检测器6.通过移动所述区域，对象5的目标区域7被扫描并基于 在通过一个或多个检测器6的帮助下获得的并且与当前点6的坐标同时确定的二次辐射的强度值的群体上，进行关于该点物体的密度的判断。 在用于数据处理和成像的装置12中使用密度值以及使用传感器11获得的各个坐标值，以建立物体的目标区域中物质密度分布的图像。

公开(公告)号：US20020126265A1

公开(公告)日：2002-09-12

申请号：US10057822

申请日：2002-01-24

Inventor： Takahiro Okura ,  Kazuya Shimizu ,  Masakazu Takei

IPC: G03B021/28 ,  C23C016/00 ,  H05H001/24

CPC classification number: C23C14/081 ,  C23C14/0021 ,  C23C14/0694 ,  C23C14/08 ,  C23C14/083 ,  C23C14/10 ,  C23C14/14 ,  C23C14/32 ,  C30B23/02 ,  C30B29/02 ,  G02B5/0858 ,  G21K1/06 ,  G21K2201/06 ,  Y10T428/12174 ,  Y10T428/12736 ,  Y10T428/12896 ,  Y10T428/12993 ,  Y10T428/31678

Abstract: The metal film of the present invention is a dense film of a single crystal that has very low surface roughness and very good crystal orientation because an arithmetic mean roughness of the surface is not larger than 2 nm and a (111) peak intensity of X-ray diffraction is not less than 20 times the sum of all other peaks. Also the metal oxide film of the present invention is a dense film that includes less oxygen defects and almost no voids therein because a content of a non-oxidized metal is not higher than 1 mole % of a metal component that constitutes the metal oxide and a packing density is 0.98 or higher.

Abstract translation: 本发明的金属膜是具有非常低的表面粗糙度和非常好的晶体取向的单晶的致密膜，因为表面的算术平均粗糙度不大于2nm，并且（111）的X-射线衍射峰强度， X射线衍射不小于所有其他峰的总和的20倍。 另外，本发明的金属氧化物膜是由于非氧化金属的含量不高于构成金属氧化物的金属成分的1摩尔％而含有较少的氧缺陷和几乎无空隙的致密膜， 填充密度为0.98以上。