公开(公告)号：US20110139605A1

公开(公告)日：2011-06-16

申请号：US12967304

申请日：2010-12-14

Applicant: John MACNEIL ,  Paul George BENNETT

Inventor： John MACNEIL ,  Paul George BENNETT

IPC: C23C14/46 ,  H01J27/02

CPC classification number: H01J27/022 ,  C23C14/3485 ,  C23C14/46 ,  H01J37/243 ,  H01J37/305 ,  H01J2237/004 ,  H01J2237/043 ,  H01J2237/08 ,  H01J2237/304

Abstract: This invention relates an ion beam source (10) for use with a non-electrical conducting target (14) including a grid (13) for extracting ions and a power supply for supplying pass power to the grid (13) to extract the ions.

Abstract translation: 本发明涉及一种用于非导电靶（14）的离子束源（10），其包括用于提取离子的栅格（13）和用于向栅格（13）提供通过电力以提取离子的电源。

公开(公告)号：US07425702B2

公开(公告)日：2008-09-16

申请号：US10838342

申请日：2004-05-05

Applicant: Yuko Sasaki ,  Mitsugu Sato

Inventor： Yuko Sasaki ,  Mitsugu Sato

IPC: H01J37/244

CPC classification number: H01J37/265 ,  G01N23/2251 ,  H01J2237/043 ,  H01J2237/049 ,  H01J2237/28

Abstract: When conditions for an electron gun mainly represented by extraction voltage V1 and accelerating voltage V0 are changed, a charged particle beam is once focused on a fixed position by means of a condenser lens and a virtual cathode position is calculated from a lens excitation of the condenser lens at that time and the mechanical positional relation of the electron gun to set an optical condition. For more accurate setting of the optical condition, a deflecting electrode device is provided at a crossover position of the condenser lens and a voltage is applied to the deflecting electrode device at a constant period so as to control the lens excitation of the condenser lens such that the amount of movement of an image is minimized on an image display unit such as CRT.

公开(公告)号：US07348557B2

公开(公告)日：2008-03-25

申请号：US11208492

申请日：2005-08-22

Applicant: Andrew Philip Armit

Inventor： Andrew Philip Armit

IPC: G01J1/20

CPC classification number: H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/043 ,  H01J2237/1501 ,  H01J2237/2487 ,  H01J2237/2826

Abstract: A scanning particle beam instrument is provided, the instrument including a scanner, a radiation detector and a DC amplifier, the DC amplifier being operable to amplify a signal generated by the radiation detector to produce a video signal, the instrument further including a controller operable to so direct the beam relative to a specimen, or to determine when the beam is so directed relative to a specimen, that an actual video signal produced by the DC amplifier may be compared with a desired video signal, to compare actual and desired video signals and to adjust a DC offset of the DC amplifier so as to reduce a difference between the signals. Also provided is a method of producing a video signal using such an instrument.

Abstract translation: 提供了一种扫描粒子束仪器，该仪器包括扫描仪，辐射探测器和直流放大器，该直流放大器可操作以放大由该辐射探测器产生的信号以产生一视频信号，该仪器还包括一控制器， 因此使光束相对于样本直接，或者确定光束何时相对于样本如此定向，可以将由DC放大器产生的实际视频信号与期望的视频信号进行比较，以比较实际和期望的视频信号和 以调整DC放大器的DC偏移，以减少信号之间的差异。 还提供了使用这种仪器产生视频信号的方法。

公开(公告)号：US20080067402A1

公开(公告)日：2008-03-20

申请号：US11762180

申请日：2007-06-13

Applicant: Masato Muraki ,  Haruo Yoda

Inventor： Masato Muraki ,  Haruo Yoda

IPC: H01J3/14

CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/24507 ,  H01J2237/3045 ,  H01J2237/30455 ,  H01J2237/30477 ,  H01J2237/30483

Abstract: An exposure apparatus which draws a pattern on a substrate with a charged particle beam is disclosed. The exposure apparatus includes a blanker which controls, in accordance with a dose pattern including a plurality of pulses, whether to allow a charged particle beam to strike the substrate, and a controller which executes calibration for correcting the dose pattern to obtain a pattern having the target line width.

Abstract translation: 公开了一种在具有带电粒子束的基板上绘制图案的曝光装置。 曝光装置包括：消除器，其根据包括多个脉冲的剂量图案来控制是否允许带电粒子束撞击衬底;以及控制器，其执行用于校正剂量图案的校准，以获得具有 目标线宽。

公开(公告)号：US20060145097A1

公开(公告)日：2006-07-06

申请号：US10962049

申请日：2004-10-07

Applicant: N. Parker

Inventor： N. Parker

IPC: G21K5/10

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/043 ,  H01J2237/1534

Abstract: A direct-write electron beam lithography system employing a patterned beam-defining aperture to enable the generation of high current-density shaped beams without the need for multiple beam-shaping apertures, lenses and deflectors is disclosed. Beam blanking is accomplished without the need for an intermediate crossover between the electron source and the wafer being patterned by means of a double-deflection blanker, which also facilitates proximity effect correction. A simple type of “moving lens” is utilized to eliminate off-axis aberrations in the shaped beam. A method for designing the patterned beam-defining aperture is also disclosed.

Abstract translation: 公开了一种使用图案化的光束限定孔径以便能够产生高电流密度成形光束而不需要多个光束成形孔，透镜和偏转器的直写式电子束光刻系统。 实现光束消隐，而不需要通过双偏转消隐器对电子源和晶片进行图案化之间的中间交叉，这也有助于邻近效应校正。 使用简单类型的“移动透镜”来消除成形光束中的离轴像差。 还公开了一种用于设计图案化光束限定孔的方法。

公开(公告)号：US20060060783A1

公开(公告)日：2006-03-23

申请号：US11208492

申请日：2005-08-22

Applicant: Andrew Armit

Inventor： Andrew Armit

IPC: G21K7/00

CPC classification number: H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/043 ,  H01J2237/1501 ,  H01J2237/2487 ,  H01J2237/2826

Abstract: A scanning particle beam instrument is provided, the instrument including a scanner, a radiation detector and a DC amplifier, the DC amplifier being operable to amplify a signal generated by the radiation detector to produce a video signal, the instrument further including a controller operable to so direct the beam relative to a specimen, or to determine when the beam is so directed relative to a specimen, that an actual video signal produced by the DC amplifier may be compared with a desired video signal, to compare actual and desired video signals and to adjust a DC offset of the DC amplifier so as to reduce a difference between the signals. Also provided is a method of producing a video signal using such an instrument.

Abstract translation: 提供了一种扫描粒子束仪器，该仪器包括扫描仪，辐射探测器和直流放大器，该直流放大器可操作以放大由该辐射探测器产生的信号以产生一视频信号，该仪器还包括一控制器， 因此使光束相对于样本直接，或者确定光束何时相对于样本如此定向，可以将由DC放大器产生的实际视频信号与期望的视频信号进行比较，以比较实际和期望的视频信号和 以调整DC放大器的DC偏移，以减少信号之间的差异。 还提供了使用这种仪器产生视频信号的方法。

公开(公告)号：US20060038137A1

公开(公告)日：2006-02-23

申请号：US11196094

申请日：2005-08-03

Applicant: Toshiaki Fujii ,  Masao Abe ,  Kunji Shigeto ,  Minuru Kawamura ,  Alekber Kasumov ,  Kazuhito Tsukagoshi ,  Yoshinobu Aoyagi

Inventor： Toshiaki Fujii ,  Masao Abe ,  Kunji Shigeto ,  Minuru Kawamura ,  Alekber Kasumov ,  Kazuhito Tsukagoshi ,  Yoshinobu Aoyagi

IPC: G21K7/00

CPC classification number: H01J37/3056 ,  H01J37/304 ,  H01J2237/043 ,  H01J2237/30466 ,  H01J2237/31732 ,  H01J2237/31737 ,  H01J2237/31749

Abstract: A focused ion beam apparatus having two pieces of probers brought into contact with two points of a surface of a sample, a voltage source for applying a constant voltage between the two points with which the probers are brought into contact, and an ammeter for measuring a current flowing between the two points, in which a conductive film is formed to narrow a gap thereof between the two points by operating a deflection electrode and a gas gun and the current flowing between the two points is monitored, and when the current becomes a predetermined value, a focused charged particle beam irradiated to the surface of the sample is made OFF by the blanking electrode.

Abstract translation: 一种聚焦离子束装置，其具有与样品表面的两个点接触的两个探测器，用于在与探测器接触的两个点之间施加恒定电压的电压源，以及用于测量 在两点之间流动的电流，其中通过操作偏转电极和气枪来形成导电膜以使两点间的间隙变窄，并且监测在两点之间流动的电流，并且当电流变为预定的 通过消隐电极使照射到样品表面的聚焦带电粒子束截止。

公开(公告)号：US06924482B2

公开(公告)日：2005-08-02

申请号：US10395197

申请日：2003-03-25

Applicant: Mari Nozoe ,  Mitsuo Suga ,  Yoichiro Neo ,  Hidetoshi Nishiyama

Inventor： Mari Nozoe ,  Mitsuo Suga ,  Yoichiro Neo ,  Hidetoshi Nishiyama

IPC: G01R31/28 ,  G01Q10/00 ,  G01Q30/04 ,  G01R31/307 ,  H01L21/00 ,  H01L21/66 ,  G21K7/00

CPC classification number: H01J37/222 ,  G01R31/307 ,  H01J37/256 ,  H01J37/263 ,  H01J37/265 ,  H01J37/266 ,  H01J2237/043 ,  H01J2237/24564 ,  H01J2237/2594 ,  H01J2237/2813 ,  H01J2237/2817 ,  H01J2237/304

Abstract: Electron beam is irradiated to a wafer in the midst of steps at predetermined intervals by a plurality of times under a condition in which a junction becomes rearward bias and a difference in characteristic of a time period of alleviating charge in the rearward bias is monitored. As a result, charge is alleviated at a location where junction leakage is caused in a time period shorter than that of a normal portion and therefore, a potential difference is produced between the normal portion and a failed portion and is observed in a potential contrast image as a difference in brightness. By consecutively repeating operation of acquiring the image, executing an image processing in real time and storing a position and brightness of the failed portion, the automatic inspection of a designated region can be executed. Information of image, brightness and distribution of the failed portion is preserved and outputted automatically after inspection.

Abstract translation: 电子束在连接点成为向后偏置的状态下以预定间隔在步骤中照射到晶片，并且监视在向后偏置中减轻电荷的时间段的特性差。 结果，在比正常部分短的时间段内产生结漏电的位置处的电荷被减轻，因此在正常部分和失效部分之间产生电位差，并且在潜在对比图像中观察到电荷 作为亮度的差异。 通过连续重复获取图像的操作，实时执行图像处理并存储失败部分的位置和亮度，可以执行指定区域的自动检查。 故障部分的图像，亮度和分布信息在检查后自动保存并输出。

公开(公告)号：US20010052781A1

公开(公告)日：2001-12-20

申请号：US09881000

申请日：2001-06-15

Inventor： Mari Nozoe ,  Mitsuo Suga ,  Yoichiro Neo ,  Hidetoshi Nishiyama

IPC: G01R031/305

CPC classification number: H01J37/222 ,  G01R31/307 ,  H01J37/256 ,  H01J37/263 ,  H01J37/265 ,  H01J37/266 ,  H01J2237/043 ,  H01J2237/24564 ,  H01J2237/2594 ,  H01J2237/2813 ,  H01J2237/2817 ,  H01J2237/304

Abstract: Electron beam is irradiated to a wafer in the midst of steps at predetermined intervals by a plurality of times under a condition in which a junction becomes rearward bias and a difference in characteristic of a time period of alleviating charge in the rearward bias is monitored. As a result, charge is alleviated at a location where junction leakage is caused in a time period shorter than that of a normal portion and therefore, a potential difference is produced between the normal portion and a failed portion and is observed in a potential contrast image as a difference in brightness. By consecutively repeating operation of acquiring the image, executing an image processing in real time and storing a position and brightness of the failed portion, the automatic inspection of a designated region can be executed. Information of image, brightness and distribution of the failed portion is preserved and outputted automatically after inspection.

Abstract translation: 电子束在连接点成为向后偏置的状态下以预定间隔在步骤中照射到晶片，并且监视在向后偏置中减轻电荷的时间段的特性差。 结果，在比正常部分短的时间段内产生结漏电的位置处的电荷被减轻，因此在正常部分和失效部分之间产生电位差，并且在潜在对比图像中观察到电荷 作为亮度的差异。 通过连续重复获取图像的操作，实时执行图像处理并存储失败部分的位置和亮度，可以执行指定区域的自动检查。 故障部分的图像，亮度和分布信息在检查后自动保存并输出。

公开(公告)号：US4937458A

公开(公告)日：1990-06-26

申请号：US257872

申请日：1988-10-14

Applicant: Yoichi Fujikura

Inventor： Yoichi Fujikura

IPC: G03F7/20 ,  H01J37/304 ,  H01J37/317 ,  H01L21/027

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/30472 ,  H01J2237/31776

Abstract: In an electron beam lithography apparatus having an electron gun for producing an electron beam, an electron beam shaping lens and a deflector for deflecting the electron beam in accordance with a pattern to be drawn on an object, a blanking electrode unit and a stop electrode unit having an aperture therein are provided so that when a pattern need not be drawn the electron beam is deviated by the blanking electrode unit away from the aperture in the stop electrode unit. In one embodiment, the stop electrode unit serves to detect the amount of that portion of the electron beam which does not pass through the aperture so that a detection value corresponding to the detected amount of the electron beam is compared with a reference value. When the detection value exceeds the reference value, it is determined that a shot of pattern drawing is effected with the electron beam.

Abstract translation: 在具有用于产生电子束的电子枪的电子束光刻设备中，电子束整形透镜和偏转器，用于根据要被抽取的图案偏转电子束，消隐电极单元和停止电极单元 设置有孔径，使得当不需要绘制图案时，电子束被消隐电极单元偏离停止电极单元中的孔。 在一个实施例中，停止电极单元用于检测不通过孔的电子束的那部分的量，使得与检测到的电子束的量相对应的检测值与参考值进行比较。 当检测值超过参考值时，确定用电子束实现图案绘制的镜头。