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    Electron beam emitter
    61.
    发明申请
    Electron beam emitter 有权
    电子束发射器

    公开(公告)号：US20080073549A1

    公开(公告)日：2008-03-27

    申请号：US11706075

    申请日：2007-02-13

    Applicant: Tzvi Avnery

    Inventor： Tzvi Avnery

    IPC: G01K1/08

    CPC classification number: G21K5/04 ,  A61L2202/23 ,  B65B55/08 ,  H01J33/02

    Abstract: An electron beam emitter including a vacuum chamber having a width. An electron generator can be positioned within the vacuum chamber for generating electrons. An elongate nozzle can extend from the vacuum chamber along a longitudinal axis and have an exit window at a distal end of the nozzle. The nozzle can have a width that is less than the width of the vacuum chamber. The electron generator can be shaped and dimensioned, and positioned with the vacuum chamber to form and direct a narrow electron beam that enters and travels through the nozzle, and exits out the exit window.

    Abstract translation: 一种电子束发射器，包括具有宽度的真空室。 电子发生器可以位于真空室内以产生电子。 细长的喷嘴可以沿着纵向轴线从真空室延伸并且在喷嘴的远端具有出口窗口。 喷嘴的宽度可以小于真空室的宽度。 电子发生器的形状和尺寸可以与真空室一起定位，以形成并引导进入并穿过喷嘴的窄电子束，并从出射窗口离开。

    Large-Area Shower Electron Beam Irradiator With Field Emitters As An Electron Source
    62.
    发明申请
    Large-Area Shower Electron Beam Irradiator With Field Emitters As An Electron Source 失效
    大面积淋浴电子束辐射器作为电子源的场发射器

    公开(公告)号：US20070278928A1

    公开(公告)日：2007-12-06

    申请号：US10591894

    申请日：2005-03-09

    Applicant: Byung-Cheol Lee ,  Young-Kyung Lim ,  Young-Hwan Han ,  Young-Uk Jung ,  Seong-Hee Park ,  Cheol-Jin Lee ,  Tae-Jae Lee

    Inventor： Byung-Cheol Lee ,  Young-Kyung Lim ,  Young-Hwan Han ,  Young-Uk Jung ,  Seong-Hee Park ,  Cheol-Jin Lee ,  Tae-Jae Lee

    IPC: H01J31/02

    CPC classification number: G21K5/02 ,  A61L2/087 ,  A61L2202/24 ,  B82Y10/00 ,  G21K5/10 ,  H01J33/02

    Abstract: An electron beam irradiator capable of performing electron beam irradiation in a wide area at a high current density with a field emitter tip. The electron beam irradiator comprises: a vacuum chamber having a beam irradiation window formed longitudinally in an outer periphery of the vacuum chamber; a cathode placed centrally and longitudinally inside the vacuum chamber, and having a field emitter tip formed on the cathode, corresponding to the beam irradiation window; and a high voltage supply placed at one end of the vacuum chamber, and adapted to apply high voltage toward the cathode. The electron beam irradiation can be made in a wide area without using an electromagnet as well as in a high current density without using a heater such as a filament or an additional power supply, thereby to ensure a simplified structure as well as a reduced size.

    Abstract translation: 一种电子束照射器，其能够利用场发射器尖端以高电流密度在广泛的区域中进行电子束照射。 电子束照射器包括：真空室，具有在真空室的外周纵向形成的光束照射窗口; 阴极，位于真空室的中央并纵向放置，并且具有形成在阴极上的对应于光束照射窗的场发射极尖端; 以及设置在真空室的一端的高压电源，并且适于向阴极施加高电压。 电子束照射可以在不使用电磁体以及高电流密度的情况下在广泛的区域进行，而不使用诸如灯丝或附加电源的加热器，从而确保简化的结构以及减小的尺寸。

    Multi-pixel electron microbeam irradiator systems and methods for selectively irradiating predetermined locations
    63.
    发明授权
    Multi-pixel electron microbeam irradiator systems and methods for selectively irradiating predetermined locations 有权
    多像素电子微束照射器系统和用于选择性地照射预定位置的方法

    公开(公告)号：US07220971B1

    公开(公告)日：2007-05-22

    申请号：US11320515

    申请日：2005-12-28

    Applicant: Sha X. Chang ,  Otto Z. Zhou

    Inventor： Sha X. Chang ,  Otto Z. Zhou

    IPC: G01K1/08

    CPC classification number: H01J37/304 ,  G21K5/04 ,  H01J33/02 ,  H01J33/04 ,  H01J37/302 ,  H01J37/317 ,  H01J2201/30469 ,  H01J2237/0635 ,  H01J2237/2004 ,  H01J2237/2006 ,  H01J2237/316

    Abstract: Multi-pixel electron microbeam irradiator systems and methods are provided with particular applicability for selectively irradiating predetermined cells or cell locations. A multi-pixel electron microbeam irradiator system can include a plurality of individually addressable electron field emitters sealed in a vacuum. The multi-pixel electron microbeam irradiator system can include an anode comprising one or more electron permeable portions corresponding to the plurality of electron field emitters. Further, the multi-pixel electron microbeam irradiator system can include a controller operable to individually control electron extraction from each of the electron field emitters for selectively irradiating predetermined locations such as cells or cell locations.

    Abstract translation: 提供了多像素电子微束照射器系统和方法，其特别适用于选择性地照射预定的细胞或细胞位置。 多像素电子微束照射器系统可以包括在真空中密封的多个可单独寻址的电子场发射器。 多像素电子微束照射器系统可以包括阳极，该阳极包括对应于多个电子场发射体的一个或多个电子透过部分。 此外，多像素电子微束照射器系统可以包括控制器，其可操作以单独地控制来自每个电子场发射器的电子提取，以选择性地照射诸如单元或单元位置的预定位置。

    Electron beam accelerator
    64.
    发明授权
    Electron beam accelerator 有权
    电子束加速器

    公开(公告)号：US06407492B1

    公开(公告)日：2002-06-18

    申请号：US09349592

    申请日：1999-07-09

    Applicant: Tzvi Avnery ,  Kenneth P. Felis

    Inventor： Tzvi Avnery ,  Kenneth P. Felis

    IPC: H01J3304

    CPC classification number: H01J3/027 ,  H01J33/00 ,  H01J33/02

    Abstract: An electron accelerator includes a vacuum chamber having an electron beam exit window. The exit window is formed of metallic foil bonded in metal to metal contact with the vacuum chamber to provide a gas tight seal therebetween. The exit window is less than about 12.5 microns thick. The vacuum chamber is hermetically sealed to preserve a permanent self-sustained vacuum therein. An electron generator is positioned within the vacuum chamber for generating electrons. A housing surrounds the electron generator. The housing has an electron permeable region formed in the housing between the electron generator and the exit window for allowing electrons to accelerate from the electron generator out the exit window in an electron beam when a voltage potential is applied between the housing and the exit window.

    Abstract translation: 电子加速器包括具有电子束出射窗的真空室。 出口窗由金属箔形成，金属箔与真空室金属接触以金属接触，以在其间提供气密封。 出口窗口小于约12.5微米厚。 真空室被密封以在其中保持永久的自持式真空。 电子发生器位于真空室内以产生电子。 壳体围绕电子发生器。 壳体具有形成在电子发生器和出射窗口之间的壳体中的电子透射区域，用于当在壳体和出射窗口之间施加电压电位时，允许电子以电子束从电子发生器从出射窗口加速。

    Cathode assembly for a line focus electron beam device
    65.
    发明授权
    Cathode assembly for a line focus electron beam device 失效
    用于线聚焦电子束装置的阴极组件

    公开(公告)号：US5637953A

    公开(公告)日：1997-06-10

    申请号：US589265

    申请日：1996-01-22

    Applicant: George Wakalopulos

    Inventor： George Wakalopulos

    IPC: H01J3/12 ,  H01J33/02 ,  H01J29/70 ,  H01J29/58

    CPC classification number: H01J3/12 ,  H01J33/02

    Abstract: An electron beam device has a cathode that generates a fan-shaped electron beam. A first focusing lens includes first and second plates on opposed sides of a filament. The edges of the plates closest to a positively charged anode are arcuate, so that as individual electrons are accelerated normal to the edge of the charged plates, the beam increases in length with departure from the filament. A second focusing lens includes third and fourth plates on opposed sides of the first focusing lens. Each of the third and fourth plates has an arcuate edge proximate to the positively charged anode. The plates of the first and second focusing lenses provide focusing in a widthwise direction, while defining the increase in the lengthwise direction. Preferably, the filament is also curved. In the preferred embodiment, the curvature of the plates of the first focusing lens defines a common radius with the plates of the second focusing lens. The electron beam may be projected from the interior of an evacuated tube and may have a length that is not limited by the length of the filament.

    Abstract translation: 电子束装置具有产生扇形电子束的阴极。 第一聚焦透镜包括在灯丝的相对侧上的第一和第二板。 最靠近正电荷的阳极的板的边缘是弧形的，使得随着各个电子垂直于带电板的边缘加速，光束随着灯丝的长度而增加。 第二聚焦透镜在第一聚焦透镜的相对侧上包括第三和第四平板。 第三和第四板中的每一个具有靠近带正电的阳极的弧形边缘。 第一和第二聚焦透镜的板在宽度方向上提供聚焦，同时限定长度方向上的增加。 优选地，细丝也是弯曲的。 在优选实施例中，第一聚焦透镜的板的曲率与第二聚焦透镜的平板形成共同的半径。 电子束可以从真空管的内部突出并且可以具有不受长丝长度限制的长度。

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