中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

532 records (took 0.017 seconds)

    Composition and method for manufacturing a surface covering product having a controlled gloss surface coated wearlayer
    71.
    发明授权
    Composition and method for manufacturing a surface covering product having a controlled gloss surface coated wearlayer 有权
    用于制造具有受控光泽表面涂层耐磨层的表面覆盖产品的组合物和方法

    公开(公告)号：US06333076B1

    公开(公告)日：2001-12-25

    申请号：US09363902

    申请日：1999-07-28

    Applicant: Gary A. Sigel ,  Clifford M. Rosenau ,  Craig W. DeSantis ,  F. Joseph Appleyard

    Inventor： Gary A. Sigel ,  Clifford M. Rosenau ,  Craig W. DeSantis ,  F. Joseph Appleyard

    IPC: C08F250

    CPC classification number: B05D3/0209 ,  B05D3/067 ,  B05D3/068 ,  B05D3/12 ,  B32B37/08 ,  B32B37/24 ,  B32B38/06 ,  B32B2038/0076 ,  B32B2307/406 ,  B32B2307/554 ,  B32B2471/00 ,  C09D167/07 ,  Y10T428/31855

    Abstract: The invention is a method for manufacturing a surface covering product having a gloss controlled surface wearlayer coating and a curable composition used in that method. The preferred curable composition is a polymerizable coating which includes a di-isocyanate and/or isocyanurate structure, a polyester polyol, a hydroxy and acrylyl functional polyester, mono, di, or tri-functional acrylates, and a flatting agent and/or hard particulates. The preferred surface covering product is a floor covering product produced as a vinyl film that is precoated with preferably a wearlayer coating that is adhered to the vinyl film, and the surface of the film is preferably embossed. A gloss controlled surface coating is achieved by application of the preferred composition to the printed sheet of film, and the composition is then exposed to low intensity ultraviolet light followed by exposure to ionizing radiation from a low accelerating energy electron beam, which forms an abrasion resistant wearlayer with non-visible degradation of the printed film.

    Abstract translation: 本发明是一种用于制造具有光泽控制的表面磨损层涂层和用于该方法的可固化组合物的表面覆盖产品的方法。 优选的可固化组合物是包含二异氰酸酯和/或异氰脲酸酯结构的聚合性涂层，聚酯多元醇，羟基和丙烯酰基官能聚酯，单，二或三官能丙烯酸酯，以及平滑剂和/或硬颗粒 。 优选的表面覆盖产品是作为乙烯基膜制造的地板覆盖产品，其预先涂覆有优选的粘合到乙烯基膜上的耐磨层涂层，并且膜的表面优选地被压花。 通过将优选的组合物施加到印刷薄膜上来实现光泽控制的表面涂层，然后将组合物暴露于低强度紫外光，然后暴露于来自低加速能量电子束的电离辐射，其形成耐磨性 耐磨层具有不可见的劣化印刷膜。

    Coating method and coating apparatus
    72.
    发明申请
    Coating method and coating apparatus 失效
    涂布方法和涂布装置

    公开(公告)号：US20010026839A1

    公开(公告)日：2001-10-04

    申请号：US09812549

    申请日：2001-03-21

    Inventor： Masami Akimoto ,  Yoichi Deguchi

    IPC: B05D003/06 ,  B05D005/00

    CPC classification number: H01L21/6715 ,  B05D1/005 ,  B05D3/0263 ,  B05D3/0486 ,  B05D3/0493 ,  B05D3/068 ,  B05D5/00 ,  H01L21/31 ,  H01L21/3105

    Abstract: A closed space is formed in a reduced pressure drying station, and the closed space is brought to a vacuum state. In this state, an EB unit irradiates a wafer mounted on a hot plate with an electron beam to foam an insulating film material. Subsequently, the hot plate is raised to a predetermined temperature, and drying processing is performed under a reduced pressure. As described above, since the foaming processing is performed in the reduced pressure drying station, bubbles remain in the insulating film, so that the existence of the bubbles can decrease the relative dielectric constant.

    Abstract translation: 在减压干燥站中形成封闭空间，封闭空间成为真空状态。 在这种状态下，EB单元用电子束照射安装在热板上的晶片，以发泡绝缘膜材料。 随后，将热板升高至预定温度，并在减压下进行干燥处理。 如上所述，由于在减压干燥站中进行发泡处理，所以在绝缘膜中残留有气泡，使得气泡的存在可以降低相对介电常数。

    Low dielectric constant films with high glass transition temperatures made by electron beam curing
    73.
    发明授权
    Low dielectric constant films with high glass transition temperatures made by electron beam curing 有权
    通过电子束固化制成的具有高玻璃化转变温度的低介电常数膜

    公开(公告)号：US06235353B1

    公开(公告)日：2001-05-22

    申请号：US09245060

    申请日：1999-02-05

    Applicant: James S. Drage ,  Jingjun Yang ,  Dong Kyu Choi

    Inventor： James S. Drage ,  Jingjun Yang ,  Dong Kyu Choi

    IPC: C08F248

    CPC classification number: H01L21/0212 ,  B05D3/0254 ,  B05D3/065 ,  B05D3/068 ,  H01L21/02282 ,  H01L21/02348 ,  H01L21/02351 ,  H01L21/312 ,  Y10S522/904 ,  Y10S522/905

    Abstract: Production of a dielectric coating on a substrate whereby a poly(arylene ethers) or fluorinated poly(arylene ethers) layer is cured by exposure to electron beam radiation. A wide area electron beam is used which causes chemical reactions to occur in the polymer structure which are thought to cause crosslinks between polymer chains. The crosslinks lead to higher mechanical strength and higher glass transition temperature, lower thermal expansion coefficient, greater thermal-chemical stability and greater resistance to aggressive organic solvents. The polymer layer may also be optionally heated, thermally annealed, and/or exposed to UV actinic light.

    Abstract translation: 在基底上制备电介质涂层，由此通过暴露于电子束辐射固化聚（亚芳基醚）或氟化聚（亚芳基醚）层。 使用广泛的电子束，其导致在聚合物结构中发生化学反应，这被认为引起聚合物链之间的交联。 交联导致更高的机械强度和更高的玻璃化转变温度，更低的热膨胀系数，更高的热化学稳定性和更大的抗侵蚀性有机溶剂的抵抗力。 聚合物层也可以任选地被加热，热退火和/或暴露于UV光化学光。

    Nanoporous silica dielectric films modified by electron beam exposure and having low dielectric constant and low water content
    74.
    发明授权
    Nanoporous silica dielectric films modified by electron beam exposure and having low dielectric constant and low water content 有权
    通过电子束曝光改性并具有低介电常数和低含水量的纳米二氧化硅介电膜

    公开(公告)号：US6042994A

    公开(公告)日：2000-03-28

    申请号：US227734

    申请日：1999-01-08

    Applicant: Jingjun Yang ,  James S. Drage ,  Lynn Forester

    Inventor： Jingjun Yang ,  James S. Drage ,  Lynn Forester

    IPC: B05D3/06 ,  B05D5/12 ,  H01L21/027 ,  H01L21/312 ,  H01L21/316 ,  G03F7/09

    CPC classification number: H01L21/316 ,  B05D3/068 ,  B05D5/12

    Abstract: Nanoporous silica dielectric films are modified by electron beam exposure after an optional hydrophobic treatment by an organic reactant. After formation of the film onto a substrate, the substrate is placed inside a large area electron beam exposure system. The resulting films are characterized by having a low dielectric constant and low water or silanol content compared to thermally cured films. Also, e-beam cured films have higher mechanical strength and better resistance to chemical solvents and oxygen plasmas compared to thermally cured films.

    Abstract translation: 在通过有机反应物进行任选的疏水处理之后，通过电子束暴露来修饰纳米多孔硅介电膜。 在将膜形成在基板上之后，将基板放置在大面积的电子束曝光系统的内部。 所得膜的特征在于与热固化膜相比具有低介电常数和低水或硅烷醇含量。 此外，与热固化膜相比，电子束固化膜具有更高的机械强度和更好的耐化学溶剂和氧等离子体的性能。

    Adjustable nozzle for evaporation or organic monomers
    75.
    发明授权
    Adjustable nozzle for evaporation or organic monomers 失效
    用于蒸发的可调喷嘴或有机单体

    公开(公告)号：US5904958A

    公开(公告)日：1999-05-18

    申请号：US45086

    申请日：1998-03-20

    Applicant: Kenneth W. Dick ,  Richard L. Marshall

    Inventor： Kenneth W. Dick ,  Richard L. Marshall

    IPC: B05D3/06 ,  B05D7/24 ,  C23C16/448 ,  C23C16/00

    CPC classification number: B05D1/60 ,  C23C16/4485 ,  B05D3/067 ,  B05D3/068

    Abstract: An apparatus for depositing a coating material, such as an organic monomer, in vapor form onto a substrate including a heated evaporation chamber having an inlet for introduction of the coating material into the chamber and a nozzle having an adjustable opening for adjusting cross direction coating uniformity. The nozzle may include a plurality of adjustment bolts spaced along the width of the nozzle for adjusting the opening of the nozzle. The adjustment bolts may be alternating push and pull adjustment bolts. Alternatively, the adjustable bolts are bolts having compound threads such that each bolt is capable of both pulling and pushing the adjustable opening of the nozzle. The substrate is preferably a moving web that defines the outer surface of a cooled drum. The apparatus further includes a radiation source positioned adjacent to the substrate for curing an organic monomer coating on said substrate. The radiation source may be an electron beam gun or an ultraviolet lamp. The evaporation chamber is operating under vacuum pressure of less than about 1 torr and preferably less than about 10.sup.-3 torr. The apparatus further includes a metal vaporization station positioned adjacent to the substrate for depositing an electrode material, such as aluminum, in vapor form onto the substrate. The nozzle may further include a nozzle plate securing the nozzle to the evaporation chamber.

    Abstract translation: 一种用于将蒸汽形式的涂料如有机单体沉积到基材上的装置，所述基材包括具有用于将涂料引入室中的入口的加热蒸发室和具有用于调节横向涂布均匀性的可调开口的喷嘴 。 喷嘴可以包括沿着喷嘴的宽度间隔开的多个调节螺栓，用于调节喷嘴的开口。 调整螺栓可以是交替的推拉调节螺栓。 或者，可调螺栓是具有复合螺纹的螺栓，使得每个螺栓能够拉动和推动喷嘴的可调节开口。 衬底优选地是限定冷却鼓的外表面的移动腹板。 该装置还包括邻近基板定位的辐射源，用于固化所述基底上的有机单体涂层。 辐射源可以是电子束枪或紫外灯。 蒸发室在小于约1托，优选小于约10 -3托的真空压力下操作。 该装置还包括邻近基板定位的金属蒸发站，用于将蒸汽形式的电极材料（例如铝）沉积到基板上。 喷嘴还可以包括将喷嘴固定到蒸发室的喷嘴板。

    Method and apparatus for forming magnetic recording media
    79.
    发明授权
    Method and apparatus for forming magnetic recording media 失效
    用于形成磁记录介质的方法和装置

    公开(公告)号：US4587066A

    公开(公告)日：1986-05-06

    申请号：US627054

    申请日：1984-07-02

    Applicant: Tomas Rodriguez

    Inventor： Tomas Rodriguez

    IPC: B05D3/06 ,  B29C35/08 ,  B29C70/62 ,  G11B5/845 ,  B29B13/08 ,  B29C35/10

    CPC classification number: B29C70/62 ,  B05D3/068 ,  G11B5/845 ,  B29C35/08 ,  B29L2017/008

    Abstract: A method of and apparatus for producing magnetic media are disclosed. Magnetic particles in a magnetic layer are oriented under the influence of a magnetic field positioned on one side of the layer and having its lines of flux extending in a direction which is generally perpendicular to the magnetic layer, while the latter is cured by being subjected to electron beams incident on an opposite side of the layer, whereby the particles are fixed in the desired orientation.

    Abstract translation: 公开了一种制造磁性介质的方法和装置。 磁性层中的磁性颗粒在位于该层的一侧上的磁场的影响下取向，并且其磁通线在大致垂直于磁性层的方向上延伸，而后者通过经受 入射在层的相对侧的电子束，由此颗粒以期望的方向固定。

Patent Agency Ranking