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    DOUBLE-WALLED CHAMBER FOR ULTRA VIOLET RADIATION TREATMENT OF LIQUIDS
    72.
    发明申请
    DOUBLE-WALLED CHAMBER FOR ULTRA VIOLET RADIATION TREATMENT OF LIQUIDS 失效
    双层玻璃室用于超紫外线辐射处理液体

    公开(公告)号：US20100187437A1

    公开(公告)日：2010-07-29

    申请号：US12752965

    申请日：2010-04-01

    Applicant: PETER UEBERALL

    Inventor： PETER UEBERALL

    IPC: G21K5/00

    CPC classification number: A61L2/10 ,  B01J19/123 ,  B01J2219/0869 ,  B01J2219/0877 ,  C02F1/325 ,  C02F2201/3227 ,  C02F2301/02

    Abstract: The object of the invention is a double-walled chamber for the UV disinfection of liquids, preferably drinking water and/or waste water. It realizes a rectangular and/or square cross-sectional shape of the UV radiation chamber even at higher pressures, whereby the radiation chamber can moreover be provided with a thin-walled configuration and allows an optimal and close arrangement of UV radiators as compared with a round chamber. By applying the inventive idea, the known dead zones at the entrance are completely eliminated and an entrance turbulence is produced which runs simultaneously with the piston flow in the chamber.

    Abstract translation: 本发明的目的是用于对液体（优选饮用水和/或废水）进行紫外线消毒的双壁室。 即使在更高的压力下也能实现UV辐射室的矩形和/或正方形截面形状，由此辐射室还可以具有薄壁结构，并允许UV辐射器的最佳和紧密配置与 圆室。 通过应用本发明的想法，入口处的已知死区被完全消除，并且产生与腔室中的活塞流同时运行的入口湍流。

    Device for the UV treatment of flowing fluids
    73.
    发明授权
    Device for the UV treatment of flowing fluids 有权
    用于流动液体的UV处理的装置

    公开(公告)号：US07696490B2

    公开(公告)日：2010-04-13

    申请号：US10567835

    申请日：2004-06-29

    Applicant: Jan Boris Rudkowski ,  Ludwig Dinkloh ,  Dieter Neitemeier

    Inventor： Jan Boris Rudkowski ,  Ludwig Dinkloh ,  Dieter Neitemeier

    IPC: G01N21/01

    CPC classification number: C02F1/325 ,  B01J19/123 ,  B01J2219/002 ,  B01J2219/00234 ,  B01J2219/0024 ,  B01J2219/0877 ,  C02F2201/3227 ,  C02F2201/326 ,  G01J1/02 ,  G01J1/0271 ,  G01J1/429 ,  H05B3/0052

    Abstract: A device for the UV treatment of fluids flowing in a flow channel, including a plurality of cylindrical low-pressure mercury UV emitters arranged in groups in the flow channel. The longitudinal axes of the UV emitters are disposed substantially parallel to one another such that the emitters of a given group are disposed in a plane. At least one elongated sensor arrangement monitors the operating state of the emitters, and is spaced from and parallel to one of the groups of the emitters. The sensor arrangement extends essentially transverse to the longitudinal axes of the emitters of the adjacent group, and is provided with a separate UV sensor for each emitter. At least one unit connected with the sensor arrangement controls and/or regulates the emitters.

    Abstract translation: 用于在流动通道中流动的流体的紫外线处理的装置，包括在流动通道中分组布置的多个圆柱形低压汞紫外线发射器。 UV发射器的纵轴基本上彼此平行地设置，使得给定组的发射器设置在平面中。 至少一个细长的传感器装置监视发射器的操作状态，并且与发射器的组中的一个间隔开并平行。 传感器装置基本上横向于相邻组的发射器的纵向轴线延伸，并且为每个发射器设置有单独的UV传感器。 与传感器装置连接的至少一个单元控制和/或调节发射器。

    FILTER AND STERILIZATION APPARATUS
    74.
    发明申请
    FILTER AND STERILIZATION APPARATUS 有权
    过滤器和灭菌装置

    公开(公告)号：US20100018913A1

    公开(公告)日：2010-01-28

    申请号：US12521159

    申请日：2007-12-19

    Applicant: Holger Blum

    Inventor： Holger Blum

    IPC: B01D21/30

    CPC classification number: A61L2/10 ,  C02F1/004 ,  C02F1/325 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/326 ,  C02F2209/40 ,  C02F2209/42

    Abstract: A filter- and sterilizing apparatus comprising a gravity filter device with a liquid supply (L1), a downpipe filter (F) and a clean liquid drainage (L3) as well as a sterilizing device (U) hydraulically connected to the downpipe filter, is characterized in that the sterilizing device connected to the clean liquid circuit (L3) of the downpipe filter (F), is adjustable in height and has the shape of a supply channel to the overflow weir (Y), wherein the liquid level in the supply channel (K) before starting the filtration is approximately adjustable to the same height with the water level in the downpipe filter (F) above the filter medium (M). The sterilizing device (U) is an ultraviolet sluice.

    Abstract translation: 一种过滤消毒装置，包括具有液体供应源（L1）的重力过滤装置，下水管过滤器（F）和清洁液体排出装置（L3）以及液压连接到筒管过滤器的灭菌装置（U） 其特征在于，连接到下水管过滤器（F）的清洁液体回路（L3）的消毒装置的高度是可调节的，并且具有到溢流堰（Y）的供应通道的形状，其中供应中的液位 开始过滤之前的通道（K）大致可调节到与过滤介质（M）上方的下水过滤器（F）中的水位相同的高度。 灭菌装置（U）是紫外线闸。

    Method for processing and treating a biological fluid with light
    76.
    发明授权
    Method for processing and treating a biological fluid with light 有权
    用光处理和处理生物液体的方法

    公开(公告)号：US07601298B2

    公开(公告)日：2009-10-13

    申请号：US11443927

    申请日：2006-05-31

    Applicant: Jeffrey M. Waldo ,  Walter Page Hatch

    Inventor： Jeffrey M. Waldo ,  Walter Page Hatch

    IPC: A61L2/08

    CPC classification number: A61L2/0011 ,  A61L2/07 ,  A61L2/081 ,  A61L2/087 ,  A61L2/10 ,  A61L2/24 ,  A61L2/28 ,  A61L2202/122 ,  A61L2202/14 ,  A61M1/0209 ,  A61M1/0277 ,  A61M1/3681 ,  A61M1/3683 ,  A61M1/3686 ,  C02F1/325 ,  C02F2201/3227 ,  C02F2201/326 ,  G01J1/32 ,  G01J1/4228 ,  G01J1/429 ,  G01J1/44

    Abstract: Apparatus (10), systems and methods are disclosed for treating a biological fluid with light. A container (206) of biological fluid is introduced into a fluid treatment chamber (40) where it is contacted with light provided by one or more light sources (60, 70) in proximity to the fluid treatment chamber (40). A light sensing system (650) senses the intensity of illumination of the light. A radiometer (460) may be inserted into fluid treatment chamber (40) to calibrate the light sensing system (650). An electronic control system (600) utilizes an interface circuit board (606) to interface a computer circuit board (602) to a display panel (37), a user interface panel (39, 39a), a relay circuit board (640), light sensors 404 and various other sensors (649). A detector (385) senses agitating movement of a tray (90) that contains biological fluids. Methods include calibrating (781-785), sensing (770-773) and correcting (774-775) light intensity measurements, and determining the length of treatment (776) to reach a desired illumination dose. A radiometer (460) is equipped with a plurality of light sensors (469) disposed on both sides to measure light intensity in chamber (40) and to provide a reference for calibrating light sensing system (650).

    Abstract translation: 公开了用于用光处理生物流体的装置（10），系统和方法。 将生物流体的容器（206）引入到流体处理室（40）中，在该处理室（40）中，其与靠近流体处理室（40）的一个或多个光源（60,70）提供的光接触。 光感测系统（650）感测光的照明强度。 可以将辐射计（460）插入到流体处理室（40）中以校准光感测系统（650）。 电子控制系统（600）利用接口电路板（606）将计算机电路板（602）与显示面板（37），用户界面面板（39,39a），中继电路板（640）， 光传感器404和各种其它传感器（649）。 检测器（385）感测包含生物流体的托盘（90）的搅动运动。 方法包括校准（781-785），感测（770-773）和校正（774-775）光强度测量，以及确定治疗长度（776）以达到期望的照射剂量。 辐射计（460）配备有设置在两侧的多个光传感器（469），以测量室（40）中的光强度并提供用于校准光感测系统（650）的参考。

    Device for the uv treatment of flowing fluids
    78.
    发明授权
    Device for the uv treatment of flowing fluids 有权
    用于uv处理流体的装置

    公开(公告)号：US07427763B2

    公开(公告)日：2008-09-23

    申请号：US10567834

    申请日：2004-08-12

    Applicant: Jan Boris Rudkowski

    Inventor： Jan Boris Rudkowski

    IPC: A61L2/10 ,  C02F1/32

    CPC classification number: C02F1/325 ,  B01J19/123 ,  B01J2219/00191 ,  B01J2219/0877 ,  C02F2201/3227 ,  C02F2201/326 ,  G01J1/429 ,  H05B3/0052

    Abstract: A method of operating a UV disinfection device provided with at least one UV emitter, including supplying the emitter with an operating voltage for a firing and continuous operation thereof, modulating the operating voltage, an operating current, or an electrical power of the UV emitter, detecting the UV radiation emitted by the emitter with a UV sensor that is adapted to temporally resolve the modulation, evaluating the signal recorded by the UV sensor, and checking whether the modulation in the signal given off by the sensor corresponds to a desired value.

    Abstract translation: 一种操作设置有至少一个UV发射器的UV消毒装置的方法，包括向发射器提供用于其点火和连续操作的工作电压，调制UV发射器的工作电压，工作电流或电功率， 用适于暂时解析调制的UV传感器来检测由发射器发射的UV辐射，评估由UV传感器记录的信号，以及检查由传感器发出的信号中的调制是否对应于期望值。

    Substrate treating apparatus
    79.
    发明授权
    Substrate treating apparatus 有权
    底物处理装置

    公开(公告)号：US07422681B2

    公开(公告)日：2008-09-09

    申请号：US11121519

    申请日：2005-05-04

    Applicant: Toshio Hiroe ,  Tadashi Maegawa ,  Yoshitaka Abiko ,  Akira Morita

    Inventor： Toshio Hiroe ,  Tadashi Maegawa ,  Yoshitaka Abiko ,  Akira Morita

    IPC: B01J19/12 ,  B08B3/14

    CPC classification number: C02F1/325 ,  C02F1/004 ,  C02F1/38 ,  C02F2103/346 ,  C02F2201/3227 ,  Y10S134/902

    Abstract: A substrate treating apparatus for treating substrates having a film coating. The apparatus includes a treating unit for treating the substrates with a treating solution, a drain pipe for draining the treating solution from the treating unit, a filter mounted on the drain pipe, and an ultraviolet emitting unit for the filter for emitting ultraviolet light to the treating solution flowing through the filter.

    Abstract translation: 一种用于处理具有膜涂层的基板的基板处理装置。 该设备包括用处理溶液处理基板的处理单元，用于从处理单元排出处理液的排水管，安装在排水管上的过滤器，以及用于向紫外线发射紫外线的紫外线发射单元 处理溶液流过过滤器。

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