Quartz Glass Component For A Uv Radiation Source And Method For Producing And Testing The Aptitude Of Such A Quartz Glass Component
    72.
    发明申请
    Quartz Glass Component For A Uv Radiation Source And Method For Producing And Testing The Aptitude Of Such A Quartz Glass Component 审中-公开
    用于Uv辐射源的石英玻璃组件和用于生产和测试这种石英玻璃组分的能力的方法

    公开(公告)号:US20070272685A1

    公开(公告)日:2007-11-29

    申请号:US11578393

    申请日:2005-04-05

    Abstract: In a known method, a quartz glass component is produced for a UV radiation source by melting SiO2-containing grain. Starting therefrom, to indicate an inexpensive method by means of which a quartz glass component is obtained that is characterized by high radiation resistance, it is suggested according to the invention that synthetically produced quartz crystals are molten to obtain a pre-product which consists of quartz glass containing hydroxyl groups in a number greater than the number of SiH groups, and that for the elimination of SiH groups the pre-product is subjected to an annealing treatment at a temperature of at least 850° C., whereby the quartz glass component is obtained. In the quartz glass component of the invention, the quartz glass is molten from synthetically produced quartz crystals, and it has a content of SiH groups of less than 5×1017 molecules/cm3.

    Abstract translation: 在已知的方法中,通过熔化含SiO 2的晶粒来生产用于UV辐射源的石英玻璃组分。 从其开始,为了表明一种廉价的方法,通过该方法获得了以高耐辐射性为特征的石英玻璃组分,根据本发明提出,将合成的石英晶体熔融以获得由石英组成的预制品 含有数量大于SiH基数的羟基的玻璃,并且为了除去SiH基,将前产物在至少850℃的温度下进行退火处理,由此石英玻璃成分为 获得。 在本发明的石英玻璃组分中,石英玻璃从合成产生的石英晶体熔化,并且其SiH基含量小于5×10 17分子/ cm 3 / >。

    Deuteroxyle-doped silica glass, optical member and lithographic system comprising same and method of making same
    73.
    发明申请
    Deuteroxyle-doped silica glass, optical member and lithographic system comprising same and method of making same 审中-公开
    氘氧基掺杂石英玻璃,光学元件和包含其的光刻系统及其制造方法

    公开(公告)号:US20070105703A1

    公开(公告)日:2007-05-10

    申请号:US11348956

    申请日:2006-02-06

    Abstract: What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm. OD-doped synthetic silica glass was found to have significantly lower polarization-induced birefringence value than non-OD-doped silica glass with comparable concentration of OH. Also disclosed are processes for making OD-dopes synthetic silica glasses, optical member comprising such glasses, and lithographic systems comprising such optical member. The glass is particularly suitable for immersion lithographic systems due to the exceptionally low polarization-induced birefringence values at about 193 nm.

    Abstract translation: 公开的内容包括能够用于低于约300nm的光刻中的光学元件的OD掺杂合成石英玻璃。 发现OD掺杂的合成二氧化硅玻璃具有比具有相当浓度的OH的非OD掺杂的石英玻璃具有显着更低的偏振诱导双折射值。 还公开了制备OD-掺杂合成二氧化硅玻璃,包括这种玻璃的光学部件以及包括这种光学部件的光刻系统的方法。 由于在约193nm处极度低的偏振诱发双折射值,该玻璃特别适用于浸没式光刻系统。

    Projection lithography photomask blanks, preforms and method of making
    79.
    发明授权
    Projection lithography photomask blanks, preforms and method of making 失效
    投影光刻光掩模坯料,预成型件和制造方法

    公开(公告)号:US06783898B2

    公开(公告)日:2004-08-31

    申请号:US09876194

    申请日:2001-06-06

    Abstract: The invention includes methods of making lithography photomask blanks. The invention also includes lithography photomask blanks and preforms for producing lithography photomask. The method of making a lithography photomask blank includes providing a soot deposition surface, producing SiO2 soot particles and projecting the SiO2 soot particles toward the soot deposition surface. The method includes successively depositing layers of the SiO2 soot particle on the deposition surface to form a coherent SiO2 porous glass preform body comprised of successive layers of the SiO2 soot particles and dehydrating the coherent SiO2 glass preform body to remove OH from the preform body. The SiO2 is exposed to and reacted with a fluorine containing compound and consolidated into a nonporous silicon oxyfluoride glass body with parallel layers of striae. The method further includes forming the consolidated silicon oxyfluoride glass body into a photomask blank having a planar surface with the orientation of the striae layer parallel to the photomask blank planar surface.

    Abstract translation: 本发明包括制造光刻光掩模坯料的方法。 本发明还包括光刻光掩模坯料和用于生产光刻光掩模的预成型件。 制造光刻光掩模坯料的方法包括提供烟灰沉积表面,产生SiO 2烟灰颗粒并将SiO 2烟灰颗粒投射到烟灰沉积表面。 该方法包括在沉积表面上依次沉积SiO 2烟灰颗粒的层,以形成由SiO 2烟灰颗粒的连续层组成的粘结SiO 2多孔玻璃预制体,并使相干的SiO 2玻璃预制体脱水以从预成型体中去除OH。 将SiO 2暴露于含氟化合物并与其反应,并固化成具有平行的条纹层的无孔氟氧化硅玻璃体。 该方法还包括将固化的氟氧化硅玻璃体形成为具有平坦表面的光掩模坯料,其中条纹层的取向平行于光掩模坯料平面。

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