公开(公告)号：US3445653A

公开(公告)日：1969-05-20

申请号：US3445653D

申请日：1965-10-04

Applicant: HITACHI LTD

Inventor： TOMURA TERUICHI

IPC: G21K1/06 ,  G01N23/20

CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/064

公开(公告)号：US3176131A

公开(公告)日：1965-03-30

申请号：US20319062

申请日：1962-06-18

Applicant: CENTRE NAT RECH SCIENT

Inventor： LOUIS ROMAND JACQUES ,  BORIS VODAR

IPC: G01J3/12 ,  G01J3/18 ,  G21K1/06

CPC classification number: G01J3/12 ,  G01J3/18 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067

公开(公告)号：US2688094A

公开(公告)日：1954-08-31

申请号：US28694752

申请日：1952-05-09

Applicant: CALIFORNIA INST RES FOUND

Inventor： DUMOND JESSE W M

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

公开(公告)号：US2474240A

公开(公告)日：1949-06-28

申请号：US60969545

申请日：1945-08-08

Applicant: HERBERT FRIEDMAN

Inventor： HERBERT FRIEDMAN

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

公开(公告)号：US11984236B2

公开(公告)日：2024-05-14

申请号：US16743025

申请日：2020-01-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Han-Kwang Nienhuys ,  Rilpho Ludovicus Donker ,  Gosse Charles De Vries

IPC: G03F7/00 ,  G02B5/02 ,  G21K1/06 ,  H01S3/23 ,  H05G2/00

CPC classification number: G21K1/067 ,  G02B5/0221 ,  G02B5/0268 ,  G02B5/0284 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70991 ,  G03F7/70191 ,  G21K2201/064 ,  H01S3/2308 ,  H05G2/008

Abstract: A radiation system includes a beam splitting apparatus configured to split a main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

公开(公告)号：US20240062928A1

公开(公告)日：2024-02-22

申请号：US17892020

申请日：2022-08-19

Applicant: UChicago Argonne, LLC

Inventor： Ayman H. Said ,  Thomas Gog ,  Jung Ho Kim ,  Emily K. Aran

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: The invention provides a method for fabricating analyzers, the method comprising providing a radiation manipulating material on a first surface of a flexible support; contacting a second surface of the flexible support to a permeable mold, wherein the mold has a first flexible support contact surface and a second surface; and applying negative pressure to the second side of the flexible support to cause the flexible support to conform to the first flexible support contact surface of the mold. Also provided is a system for fabricating crystal analyzers, the system comprising crystal structures reversibly attached to a flexible support; a porous mold reversibly contacting the flexible support, wherein the mold defines a topography; and a negative pressure applied to the flexible support to cause the crystal structures to conform to the topography.

公开(公告)号：US11796490B2

公开(公告)日：2023-10-24

申请号：US17366759

申请日：2021-07-02

Applicant: UNIVERSITY OF WASHINGTON

Inventor： Gerald Todd Seidler ,  Oliver Hoidn ,  William Holden

IPC: G01N23/207 ,  G01N23/20025 ,  G01N23/20091 ,  G01N23/20008 ,  G01T7/10 ,  G02B26/08 ,  G01T1/29 ,  G02B27/09 ,  G01N23/20

CPC classification number: G01N23/2076 ,  G01N23/207 ,  G01N23/20008 ,  G01N23/20025 ,  G01N23/20091 ,  G01N23/20 ,  G01N2223/052 ,  G01N2223/307 ,  G01N2223/309 ,  G01N2223/32 ,  G01N2223/5015 ,  G01N2291/045 ,  G01T1/2978 ,  G01T7/10 ,  G02B26/0816 ,  G02B27/0983 ,  G21K2201/062 ,  G21K2201/064

Abstract: A spectrometer includes a crystal analyzer having a radius of curvature that defines a Rowland circle, a sample stage configured to support a sample such that the sample is offset from the Rowland circle, x-ray source configured to emit unfocused x-rays toward the sample stage, and a position-sensitive detector that is tangent to the Rowland circle. A method performed via a spectrometer includes emitting, via an x-ray source, unfocused x-rays toward a sample that is mounted on a sample stage such that the sample is offset from the Rowland Circle, thereby causing the sample to emit x-rays that impinge on the crystal analyzer or transmit a portion of the unfocused x-rays to impinge on the crystal analyzer; scattering, via the crystal analyzer, the x-rays that impinge on the crystal analyzer; and detecting the scattered x-rays via a position-sensitive detector that is tangent to the Rowland circle.

公开(公告)号：US20180144901A1

公开(公告)日：2018-05-24

申请号：US15783855

申请日：2017-10-13

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  David Charles Reynolds ,  Alan Francis Lyon

IPC: H01J35/10 ,  H01J35/14 ,  H01J35/26 ,  H01J35/30 ,  G21K1/06

CPC classification number: G21K1/067 ,  G21K2201/064 ,  H01J35/105 ,  H01J35/108 ,  H01J35/14 ,  H01J35/26 ,  H01J35/30 ,  H01J2235/086 ,  H01J2235/088 ,  H01J2235/1204

Abstract: An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.

公开(公告)号：US20170315449A1

公开(公告)日：2017-11-02

申请号：US15650533

申请日：2017-07-14

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Norman Baer ,  Ulrich Loering ,  Oliver Natt ,  Gero Wittich ,  Timo Laufer ,  Peter Kuerz ,  Guido Limbach ,  Stefan Hembacher ,  Holger Walter ,  Yim-Bun-Patrick Kwan ,  Markus Hauf ,  Franz-Josef Stickel ,  Jan Van Schoot

IPC: G03F7/20 ,  G02B5/08 ,  G02B7/18 ,  G02B27/00 ,  G21K1/06 ,  G02B3/00 ,  G02B17/06 ,  G03B27/54 ,  B82Y10/00

CPC classification number: G03F7/7015 ,  B82Y10/00 ,  G02B3/00 ,  G02B5/08 ,  G02B5/0816 ,  G02B5/0891 ,  G02B7/1815 ,  G02B17/0647 ,  G02B27/0043 ,  G03B27/542 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70316 ,  G03F7/70825 ,  G03F7/70891 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064

Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

公开(公告)号：US09714907B2

公开(公告)日：2017-07-25

申请号：US14651813

申请日：2013-12-10

Applicant: Inter-University Research Institute Corporation High Energy Accelerator Research Organization

Inventor： Tadashi Matsushita ,  Wolfgang Voegeli ,  Tetsuro Shirasawa ,  Toshio Takahashi ,  Etsuo Arakawa

IPC: G01N23/20

CPC classification number: G01N23/20008 ,  G01N23/20 ,  G21K2201/062 ,  G21K2201/064

Abstract: It is an object of the present invention to provide a method and an apparatus for measuring a scattering intensity distribution capable of measuring a scattering intensity distribution in a reciprocal space in a short time. The method or apparatus for measuring a scattering intensity distribution causes X-rays emitted from an X-ray source (101) to be reflected by an X-ray optical element (102) so as to converge in the vicinity of a surface of a sample (SA), causes monochromatic X-rays condensed after passing through a plurality of optical paths to be incident on the sample at glancing angles (ω) that differ depending on the respective optical paths at a time in a state in which there is a correlation between an angle formed by each optical path of the monochromatic X-rays and a reference plane, and an angle formed by each optical path and a plane including the normal of the reference plane and an optical path located in the center of the respective optical paths, detects scattering intensities of the monochromatic X-rays scattered by the sample using a two-dimensional detector (103) and calculates a scattering intensity distribution in the reciprocal space based on the scattering intensity distribution detected by the two-dimensional detector and the correlation.