公开(公告)号：US07408175B2

公开(公告)日：2008-08-05

申请号：US11783780

申请日：2007-04-12

Applicant: Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

Inventor： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

IPC: H01J37/18

CPC classification number: H01J37/222 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/082 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L2224/48227 ,  H01L2924/01019 ,  H01L2924/01025 ,  H01L2924/01057 ,  H01L2924/01067 ,  H01L2924/01078 ,  H01L2924/10253 ,  H01L2924/12032 ,  H01L2924/3025 ,  H01L2924/00

Abstract: A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.

Abstract translation: 本发明的基板检查装置1-1（图1）执行以下步骤：将要检查的基板“S”运送到检查室23-1中; 在所述检查室中保持真空; 将所述检查室与振动隔离; 通过至少一个自由度的阶段26-1连续地移动所述衬底; 照射具有指定宽度的电子束; 帮助所述电子束经由一次电子光学系统10-1到达所述衬底的表面; 通过二次电子光学系统20-1捕获从所述衬底发射的二次电子并将其引导到检测系统35-1; 基于由所述检测系统获得的二次电子束的检测信号，在图像处理系统中形成二次电子图像; 基于由所述图像处理系统形成的二次电子图像检测所述基板中的缺陷位置; 通过CPU37-1指示和/或存储所述衬底中的所述缺陷位置; 并将完全检查的基板从检查室中取出。 因此，可以以高水平的精度和效率以及更高的生产量连续地执行基板上的缺陷检查。

公开(公告)号：US07269995B2

公开(公告)日：2007-09-18

申请号：US10949069

申请日：2004-09-24

Applicant: Peter Heiland

Inventor： Peter Heiland

IPC: G01B5/28

CPC classification number: H01J37/20 ,  H01J37/02 ,  H01J2237/0216

Abstract: There is provided a method and an apparatus for isolating mechanical vibrations reacting to beam metrology tools. The apparatus includes an outer structure for supporting a metrology instrument, and a chuck for holding a specimen with respect to the metrology instrument in an intended defined position for performing measurements on the specimen by the metrology instrument. The apparatus also includes at least one active vibration isolator means coupled to the chuck for compensating relative movement between the specimen and the metrology instrument. A method is also provided that includes detecting change of position of the specimen in response to mechanical vibrations, and effectuating an active modification of the position of the chuck in response to the detection for counteracting a relative displacement between the specimen and the metrology instrument.

Abstract translation: 提供了一种用于隔离对梁计量工具反应的机械振动的方法和装置。 该装置包括用于支撑计量仪器的外部结构和用于相对于计量仪器将样本保持在用于通过计量仪器对样本进行测量的预定限定位置的卡盘。 该装置还包括耦合到卡盘的至少一个主动隔振装置，用于补偿试样和计量仪器之间的相对运动。 还提供了一种方法，其包括响应于机械振动检测样品的位置的变化，并且响应于用于抵消样品和计量仪器之间的相对位移的检测而实现卡盘的位置的主动修改。

公开(公告)号：US20050232749A1

公开(公告)日：2005-10-20

申请号：US11099062

申请日：2005-04-05

Applicant: John Vanderpot ,  John Pollock ,  Donald Berrian

Inventor： John Vanderpot ,  John Pollock ,  Donald Berrian

IPC: A61N5/00 ,  B65H1/00 ,  H01J37/317 ,  H01L21/00 ,  H01L21/687

CPC classification number: H01J37/20 ,  H01J37/3171 ,  H01J2237/0216 ,  H01J2237/20228 ,  H01J2237/20292 ,  H01J2237/31703 ,  H01L21/67069 ,  H01L21/67259 ,  H01L21/68764 ,  H01L21/68792

Abstract: A method for reciprocally transporting a workpiece on a scan arm through an ion beam is provided, wherein the scan arm is operably coupled to a motor comprising a rotor and stator that are individually rotatable about a first axis. An electromagnetic force applied between the rotor and stator rotates the rotor about the first axis and translates the workpiece through the ion beam along a first scan path. A position of the workpiece is sensed and the electromagnetic force between the rotor and stator is controlled in order to reverse the direction of motion of the workpiece along the first scan path, and wherein the control is based, at least in part, on the sensed position of the workpiece. The stator further rotates about the first axis in reaction to the rotation of the rotor, particularly in the reversal of direction of motion of the workpiece, thus acting as a reaction mass to the rotation of one or more of the rotor, scan arm, and workpiece.

Abstract translation: 提供了一种用于通过离子束在扫描臂上往复运送工件的方法，其中扫描臂可操作地耦合到包括转子和定子的电动机，该转子和定子可以围绕第一轴线单独旋转。 施加在转子和定子之间的电磁力围绕第一轴线旋转转子，并使工件沿第一扫描路径平移离子束。 感测工件的位置，并且控制转子和定子之间的电磁力以便沿着第一扫描路径反转工件的运动方向，并且其中控制至少部分地基于感测的 工件位置。 定子进一步围绕第一轴线转动，以反应转子的旋转，特别是在反转工件的运动方向上，从而作为与转子，扫描臂和转子的一个或多个的旋转的反作用质量 工件。

公开(公告)号：US06884992B1

公开(公告)日：2005-04-26

申请号：US09423155

申请日：1998-04-29

Applicant: Peter Heiland

Inventor： Peter Heiland

IPC: H01J37/22 ,  G02B21/00 ,  H01J37/02 ,  H01J37/147 ,  H01J3/14

CPC classification number: H01J37/02 ,  G02B21/00 ,  H01J2237/0216 ,  H01J2237/28

Abstract: An imaging and raster-mode scanning apparatus has a compensation device for compensating for ambient influences that may degrade the imaging, comprising an electrical filter, and at least one sensor for providing a first signal dependent on the ambient influences the first signal passes through the filter directly and drives an internal actuator and a internal control elements of the apparatus, which has an effect on the imaging and on the image display, in a calibrated state of the apparatus, which comprises a setting of a transfer characteristic of the filter, image degradations are greatly reduced or essentially compensated for. The filter for calibrating the apparatus, has a calibration input and a second signal is applied to the calibration input of the filter.

Abstract translation: 成像和光栅模式扫描装置具有补偿装置，用于补偿可能降低成像的环境影响，包括电过滤器，以及至少一个传感器，用于提供取决于环境的第一信号影响第一信号通过过滤器 直接驱动装置的内部致动器和内部控制元件，其对成像和图像显示具有影响，该装置的校准状态包括滤波器的传送特性的设置，图像劣化 大大减少或基本上被补偿。 用于校准装置的滤波器具有校准输入，并且第二信号被施加到滤波器的校准输入。

公开(公告)号：US20040173755A1

公开(公告)日：2004-09-09

申请号：US10792849

申请日：2004-03-05

Inventor： Chang-wook Moon ,  In-kyeong Yoo ,  Dong-wook Kim

IPC: H01J003/14

CPC classification number: H01J37/3175 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/0216 ,  H01J2237/15

Abstract: An electron-beam focusing apparatus for controlling a path of electron beams emitted from an electron-beam emitter in an electron-beam projection lithography (EPL) system includes top and bottom magnets for creating a magnetic field within a vacuum chamber, the top and bottom magnets disposed above and below the vacuum chamber into which a wafer is loaded, respectively; upper and lower pole pieces magnetically contacting the top and bottom magnets, respectively, the upper and lower pole pieces penetrating a top wall and a bottom wall of the vacuum chamber, respectively; and upper and lower projections having a circular shape, extending outwardly from facing surfaces of the upper and lower pole pieces, respectively.

Abstract translation: 用于控制电子束投影光刻（EPL）系统中从电子束发射器发射的电子束的路径的电子束聚焦装置包括用于在真空室内产生磁场的顶部和底部磁体，顶部和底部 分别设置在其上装载有晶片的真空室的上方和下方的磁体; 分别与顶部和底部磁体磁接触的上部和下部磁极件，上部和下部磁极片分别穿透真空室的顶壁和底壁; 以及分别具有圆形形状的上下突起，从上下极片的相对表面向外延伸。

公开(公告)号：US20020148975A1

公开(公告)日：2002-10-17

申请号：US09985324

申请日：2001-11-02

Inventor： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

IPC: G21G005/00

CPC classification number: H01J37/222 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/082 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L2224/48227 ,  H01L2924/01019 ,  H01L2924/01025 ,  H01L2924/01057 ,  H01L2924/01067 ,  H01L2924/01078 ,  H01L2924/10253 ,  H01L2924/12032 ,  H01L2924/3025 ,  H01L2924/00

Abstract: A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate nullSnull to be inspected into an inspection chamber 23-1 maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.

Abstract translation: 本发明的基板检查装置1-1（图1）执行以下步骤：将要检查的基板“S”运送到在检查室中保持真空的检查室23-1中; 将所述检查室与振动隔离; 通过具有至少一个自由度的平台26-1连续移动所述衬底; 照射具有指定宽度的电子束; 帮助所述电子束经由一次电子光学系统10-1到达所述衬底的表面; 通过二次电子光学系统20-1捕获从所述衬底发射的二次电子并将其引导到检测系统35-1; 基于由所述检测系统获得的二次电子束的检测信号，在图像处理系统中形成二次电子图像; 基于由所述图像处理系统形成的二次电子图像检测所述基板中的缺陷位置; 通过CPU37-1指示和/或存储所述衬底中的所述缺陷位置; 并将完全检查的基板从检查室中取出。 因此，可以以高水平的精度和效率以及更高的生产量连续地执行基板上的缺陷检查。

公开(公告)号：US06323494B1

公开(公告)日：2001-11-27

申请号：US09289249

申请日：1999-04-09

Applicant: Martin E. Lee

Inventor： Martin E. Lee

IPC: H01J3720

CPC classification number: F15B15/088 ,  F15B2015/1495 ,  H01J37/20 ,  H01J2237/0216 ,  Y10T137/2409

Abstract: A transducer includes a pneumatic actuator in combination with a stepper motor lifter mechanism to which is opposed an attractive E-I core actuator for precise vertical positioning of a load with minimal transmission of vibration. A typical application is for vertical positioning of a stage in a lithography machine. The use of a stepper motor driving a lead screw and pneumatic actuator together with an attractive E-I core actuator provides a large dynamic range force actuator. The transducer has a sensor which is located spaced away from the E-I core actuator gap and which operates inductively to measure the gap. A compliant diaphragm for the pneumatic actuation allows the load to move a small amount in all six degrees of freedom.

Abstract translation: 传感器包括气动致动器，与步进电动机提升机构相结合，其与有吸引力的E-I型芯致动器相对，用于以最小的振动传输精确地垂直定位负载。 典型的应用是在平版印刷机中垂直定位台。 驱动引导螺杆和气动执行器的步进电机与引人注目的E-I型执行器一起使用，可提供大动态范围的力致动器。 换能器具有一个传感器，该传感器位于距离E-I核心执行机构间隙的间隔处，并可感应地工作以测量间隙。 用于气动启动的柔性隔膜允许负载以所有六个自由度移动少量。

公开(公告)号：US20010011707A1

公开(公告)日：2001-08-09

申请号：US09767570

申请日：2001-01-23

Applicant: Philips Electron Optics B.V.

Inventor： Albert Visscher

IPC: G21K005/10 ,  G21K007/00

CPC classification number: H01L21/6875 ,  H01J37/20 ,  H01J2237/0216

Abstract: Objects such as semiconductor wafers to be studied in a scanning electron microscope (SEM) are subject to vibrations which are intensified by vibration resonance of the (thin) wafer, so that the resolution of the SEM is severely degraded. In prior art it is known to support the wafer by means of elastic support members. However, such support members do not counteract the detrimental vibrations. According to the invention there are provided elastic support elements 28 that can accommodate to the inevitable shape errors of the wafer 18 and hence remain in contact with the wafer surface 32. Moreover, the support elements are embodied in such a manner that frictional contact exists between the moving part 38 of the support element and the body 34 of the object carrier 20. The support elements thus provide support which is elastic for macroscopic support but hard for the vibrational movements in the nanometer range, thus inhibiting such vibrational movements.

Abstract translation: 在扫描电子显微镜（SEM）中研究的诸如半导体晶片的物体受到由（薄）晶片的振动共振而增强的振动，使得SEM的分辨率严重劣化。 在现有技术中，已知通过弹性支撑构件支撑晶片。 然而，这种支撑构件不能抵消有害振动。 根据本发明，提供了可以适应晶片18的不可避免的形状误差并且因此保持与晶片表面32接触的弹性支撑元件28.此外，支撑元件以这样的方式实现：摩擦接触存在于 支撑元件的移动部分38和物体载体20的主体34.因此，支撑元件提供对宏观支撑弹性的支撑，但对于纳米范围内的振动运动是困难的，从而抑制这种振动运动。

公开(公告)号：US06184519B2

公开(公告)日：2001-02-06

申请号：US09061800

申请日：1998-04-16

Applicant: Shigeru Wakiyama ,  Naohiko Fujino

Inventor： Shigeru Wakiyama ,  Naohiko Fujino

IPC: G12B2120

CPC classification number: G01Q70/04 ,  H01J37/02 ,  H01J2237/0216 ,  Y10S977/86

Abstract: A probe microscope carries a so-called active anti-vibration table in which a vibration to a anti-vibration table plate by a floor vibration is detected by a shift meter, an acceleration sensor or the like, and a vibration having an opposite phase to that of this vibration is given to the anti-vibration table plate, thereby reducing an external vibration component from the floor vibration also in the apparatus installation site having frequencies from a low frequency component to a high frequency component.

Abstract translation: 探针显微镜带有所谓的主动防振台，其中通过移动计，加速度传感器等检测到通过地板振动对抗振台板的振动，并且具有与 这种振动的振动给予防振台板，从而在具有从低频分量到高频分量的频率的装置安装地点中减少来自地板振动的外部振动分量。

公开(公告)号：US6155542A

公开(公告)日：2000-12-05

申请号：US773010

申请日：1997-03-10

Applicant: Hiroaki Kato ,  Takehiko Mayama

Inventor： Hiroaki Kato ,  Takehiko Mayama

IPC: F16F15/02 ,  G03F7/20 ,  G05D19/02 ,  H01J37/02 ,  H01L21/00 ,  H01L21/027 ,  H01L21/68 ,  H01L21/30

CPC classification number: H01L21/67259 ,  G03F7/70716 ,  G03F7/709 ,  H01J37/02 ,  H01L21/68 ,  H01J2237/0216

Abstract: A vibration damping apparatus includes a plurality of actuators for removing vibration of a table as an object of vibration damping, a detection device for detecting a vibration status of the table, an acquisition device for acquiring compensation amounts for a plurality of directional elements, from the vibration status detected by the detection device, and an allocation device for allocating an actuator-driving force corresponding to a compensation amount for a predetermined directional element, among the compensation amounts acquired by the acquisition device, to an actuator having a small amount of driving force, allocated based on a compensation amount for another directional element.

Abstract translation: 一种减震装置，包括多个用于去除作为减振对象的工作台的振动的致动器，用于检测工作台的振动状态的检测装置，用于从多个方向元件获取补偿量的获取装置， 由检测装置检测到的振动状态，以及分配装置，用于将与由采集装置获取的补偿量中的预定方向元件的补偿量相对应的致动器驱动力分配给具有少量驱动力的致动器 ，基于另一方向元件的补偿量分配。