公开(公告)号：US20230383403A1

公开(公告)日：2023-11-30

申请号：US18446564

申请日：2023-08-09

Applicant: Taiwan Semiconductor Manufacturing Co, Ltd.

Inventor： Tze-Liang Lee ,  Po-Hsien Cheng

IPC: C23C16/455 ,  H01J37/32

CPC classification number: C23C16/45536 ,  H01J37/32522 ,  C23C16/45565 ,  H01J2237/2002 ,  H01J37/3244 ,  H01J37/32532 ,  H01J2237/332 ,  H01J37/32211

Abstract: A deposition apparatus and a method are provided. A method includes placing a substrate over a platform in a chamber of a deposition system. A precursor material is introduced into the chamber. A first gas curtain is generated in front of a first electromagnetic (EM) radiation source coupled to the chamber. A plasma is generated from the precursor material in the chamber, wherein the plasma comprises dissociated components of the precursor material. The plasma is subjected to a first EM radiation from the first EM radiation source. The first EM radiation further dissociates the precursor material. A layer is deposited over the substrate. The layer includes a reaction product of the dissociated components of the precursor material.

公开(公告)号：US20180096817A1

公开(公告)日：2018-04-05

申请号：US15716942

申请日：2017-09-27

Applicant: Mel-Build Corporation

Inventor： Hiroya Miyazaki

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J37/26 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/2005 ,  H01J2237/2007 ,  H01J2237/204

Abstract: The purpose of the present invention is to provide a specimen holder having a structure capable of maintaining a seal surface regardless of a change of environment. A specimen holder according to the present invention is characterized by comprising a specimen holder axis part having a specimen and/or a specimen mesh setting part, an external cylinder part capable of housing the specimen holder axis part, and a seal part for sealing the specimen and/or the specimen mesh setting part from atmosphere wherein the seal part is set to a step part which is set to a portion of the external cylinder part. Further, in a referred embodiment of a specimen holder according to the present invention, it is characterized in that the seal part set to the step part is as a first seal part, further the specimen holder has a second seal part which exists in a tip part of the specimen holder and exists in a direction of a central axis of an electron microscope comparing to the specimen and/or the specimen mesh setting part.

公开(公告)号：US09887064B2

公开(公告)日：2018-02-06

申请号：US15120919

申请日：2015-01-07

Applicant: Hitachi High-Technologies Corporation

Inventor： Akira Nishioka ,  Masaki Mizuochi ,  Shuichi Nakagawa ,  Nobuyuki Maki

IPC: H01J37/20 ,  H01L21/687 ,  H01L21/67 ,  H01L21/68 ,  H02K41/02 ,  H02K9/22 ,  H02K16/00

CPC classification number: H01J37/20 ,  H01J2237/2002 ,  H01J2237/20221 ,  H01J2237/20271 ,  H01J2237/20278 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/67253 ,  H01L21/68 ,  H01L21/68785 ,  H02K9/22 ,  H02K16/00 ,  H02K41/02

Abstract: To provide a stage device and a charged particle beam device using the same capable of effectively suppressing thermal deformation of a stage generated by temperature increase caused by heat generated by a linear motor. The stage device including a table, a linear motor driving the table in a prescribed direction, in which the table and a moving part of the linear motor are connected by components, a slide unit is attached to the component, movement of which is constrained by a rail fixed to a base, and at the same time, the slide unit is positioned vertically below a place where the component is joined to the table, thereby suppressing thermal deformation of the table.

公开(公告)号：US20180033586A1

公开(公告)日：2018-02-01

申请号：US15222708

申请日：2016-07-28

Applicant: Mapper Lithography IP B.V.

Inventor： Paul IJmert SCHEFFERS ,  Jerry Johannes Martinus Peijster

IPC: H01J37/04 ,  H01J37/147 ,  H01J37/20

CPC classification number: H01J37/045 ,  H01J37/147 ,  H01J37/20 ,  H01J2237/2002 ,  H01J2237/2602 ,  H01J2237/3175

Abstract: The invention relates to an apparatus and method for exposing a sample. The apparatus comprises a source for electromagnetic radiation or particles having energy, an exposing unit for exposing said sample to said electromagnetic radiation or particles, and a substrate holding device for holding said sample at least during said exposing.The exposing unit comprises a component for manipulating and/or blocking at least part of the electromagnetic radiation or charged particles. The component comprises a cooling arrangement which is arranged for substantially maintaining the component at a predetermined first temperature.The substrate holding device comprises a temperature stabilizing arrangement which is arranged to substantially stabilize the temperature of a sample arranged on said substrate holding device. The temperature stabilizing arrangement comprises a phase change material having a phase change at a second temperature, which is at or near the first temperature.

公开(公告)号：US20170323762A1

公开(公告)日：2017-11-09

申请号：US15525147

申请日：2014-11-11

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Toshiyuki OOYAGI ,  Takafumi YOTSUJI ,  Isao NAGAOKI

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/20 ,  H01J37/18 ,  H01J37/02 ,  H01J37/302 ,  G01N1/28

CPC classification number: H01J37/261 ,  G01N1/28 ,  H01J37/026 ,  H01J37/16 ,  H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/28 ,  H01J37/3023 ,  H01J2237/2002 ,  H01J2237/204 ,  H01J2237/206 ,  H01J2237/2065

Abstract: An electron microscope includes: a sample holder; a first optical system irradiating and scanning the sample; an electron detection unit detecting secondary electrons discharged from the sample; a first vacuum chamber which holds the sample holder, the first optical system, and the electron detection unit in a vacuum atmosphere; a display unit displaying a microscopic image of the sample; and a control unit which controls the sample holder and the operation of the first optical system. The electron microscope includes a second vacuum chamber different from the first vacuum chamber, and a second optical system in the second vacuum chamber and is different from the first optical system. The second optical system and the control unit are capable of mutual communication, and the second vacuum chamber has a state changing means which changes the state of the sample.

公开(公告)号：US20170301509A1

公开(公告)日：2017-10-19

申请号：US15165658

申请日：2016-05-26

Applicant: DONGFANG JINGYUAN ELECTRON LIMITED

Inventor： Weimin Ma ,  Weiqiang Sun

IPC: H01J37/20 ,  H01J37/18

CPC classification number: H01J37/20 ,  G03F1/86 ,  G03F7/7065 ,  H01J37/18 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/18 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20292 ,  H01J2237/24571 ,  H01J2237/2817 ,  H01L22/12

Abstract: Techniques for yield management in semiconductor inspection systems are described. According to one aspect of the present invention, columns of sensing mechanism are configured with different functions, weights and performances to inspect a sample to significantly reduce the time that would be otherwise needed when all the columns were equally applied.

公开(公告)号：US09786469B2

公开(公告)日：2017-10-10

申请号：US15233176

申请日：2016-08-10

Applicant: University of Washington

Inventor： Liguo Wang

IPC: H01J37/20 ,  H01J37/16 ,  H01J37/26 ,  C23F1/40 ,  C23F4/00

CPC classification number: H01J37/16 ,  C23F1/40 ,  C23F4/00 ,  H01J37/20 ,  H01J37/26 ,  H01J37/261 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2004

Abstract: A grid assembly for cryo-electron microscopy may be fabricated using standard nanofabrication processes. The grid assembly may comprise two support members, each support member comprising a silicon substrate coated with an electron-transparent silicon nitride layer. These two support members are positioned together with the silicon nitride layers facing each other with a rigid spacer layer disposed therebetween. The rigid spacer layer defines one or more chambers in which a biological sample may be provided and fast frozen with a high degree of control of the ice thickness.

公开(公告)号：US20170278670A1

公开(公告)日：2017-09-28

申请号：US15608823

申请日：2017-05-30

Applicant: Protochips, Inc.

Inventor： John Damiano, JR. ,  David P. Nackashi ,  Stephen E. Mick

IPC: H01J37/26 ,  H01J37/30 ,  H01J37/18 ,  H01J37/20 ,  H01J37/16

CPC classification number: H01J37/20 ,  H01J37/16 ,  H01J37/18 ,  H01J37/26 ,  H01J37/29 ,  H01J37/30 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2007

Abstract: A novel sample holder for specimen support devices for insertion in electron microscopes. The novel sample holder of the invention allows for the introduction of gases or liquids to specimens for in situ imaging, as well as electrical contacts for electrochemical or thermal experiments.

公开(公告)号：US09691510B2

公开(公告)日：2017-06-27

申请号：US15298139

申请日：2016-10-19

Applicant: XYLECO, INC.

Inventor： Marshall Medoff ,  Thomas Craig Masterman ,  Robert Paradis

IPC: A61L2/08 ,  G21F3/00 ,  H01J37/20 ,  H01J37/317 ,  C08H8/00 ,  C13K13/00 ,  C13K1/02 ,  B01J19/08 ,  B01J19/12 ,  C10G1/02 ,  C10L5/44 ,  C10L5/40 ,  C10L5/46 ,  C10B53/02 ,  C10B19/00

CPC classification number: G21F3/00 ,  A61L2/087 ,  B01J19/082 ,  B01J19/085 ,  B01J19/12 ,  B01J19/123 ,  B01J19/125 ,  B01J19/22 ,  B01J2219/0869 ,  B01J2219/0871 ,  B01J2219/0879 ,  B01J2219/12 ,  B01J2219/1203 ,  B65G27/04 ,  C08H8/00 ,  C10B19/00 ,  C10B53/02 ,  C10G1/02 ,  C10G32/04 ,  C10L5/403 ,  C10L5/442 ,  C10L5/445 ,  C10L5/46 ,  C10L2200/0469 ,  C10L2290/24 ,  C10L2290/28 ,  C10L2290/36 ,  C10L2290/52 ,  C13K1/02 ,  C13K13/002 ,  D21B1/02 ,  G21K5/04 ,  G21K5/10 ,  H01J5/18 ,  H01J33/04 ,  H01J37/20 ,  H01J37/317 ,  H01J2237/2002 ,  H01J2237/202 ,  Y02E50/10 ,  Y02E50/14 ,  Y02E50/16 ,  Y02E50/30 ,  Y02E50/32 ,  Y02P20/145

Abstract: Biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) is processed to produce useful intermediates and products, such as energy, fuels, foods or materials. For example, systems and methods are described that can be used to treat feedstock materials, such as cellulosic and/or lignocellulosic materials, in a vault in which the equipment is protected from radiation and hazardous gases by equipment enclosures. The equipment enclosures may be purged with gas.

公开(公告)号：US20170154753A1

公开(公告)日：2017-06-01

申请号：US15320912

申请日：2015-06-18

Applicant: JEOL Ltd.

Inventor： Noriyuki Inoue ,  Yoshiko Takashima

IPC: H01J37/20 ,  H01J37/16 ,  G01N1/36

CPC classification number: H01J37/20 ,  G01N1/36 ,  H01J37/16 ,  H01J37/28 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2605 ,  H01J2237/2801

Abstract: A specimen loading method for loading a specimen that contains water into a specimen chamber of a charged particle beam device, includes: a step (S100) of mounting the specimen on a specimen support; a step (S102) of covering a predetermined area of the specimen with a water retention material; a step (S104) of evacuating the specimen chamber in which the specimen having the predetermined area covered with the water retention material is placed; and a step (S106) of exposing the predetermined area covered with the water retention material.