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    TRANSMISSION APPARATUS, DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
    71.
    发明申请
    TRANSMISSION APPARATUS, DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE 审中-公开
    传动装置，制图装置及制造方法

    公开(公告)号：US20140057212A1

    公开(公告)日：2014-02-27

    申请号：US13970652

    申请日：2013-08-20

    Applicant: CANON KABUSHIKI KAISHA

    Inventor： Shinji OHISHI ,  Kimitaka OZAWA ,  Go TSUCHIYA

    IPC: H01J37/30 ,  F21V8/00

    CPC classification number: H01J37/3007 ,  G02B6/0005 ,  G02B6/264 ,  G02B6/3644 ,  G02B6/3672 ,  H01J37/302 ,  H01J37/3177 ,  H01J2237/16 ,  H01J2237/2482

    Abstract: The present invention provides a transmission apparatus for transmitting a light signal between an outside and an inside of a vacuum chamber, comprising a plurality of first transmission lines configured to transmit a plurality of light signals outside the vacuum chamber, a plurality of second transmission lines configured to transmit the plurality of light signals inside the vacuum chamber, and a light-transmissive member configured to transmit the light signals between the plurality of first transmission lines and the plurality of second transmission lines, wherein the light-transmissive member has a structure formed to isolate light paths of the plurality of light signals between the plurality of first transmission lines and the plurality of second transmission lines from each other.

    Abstract translation: 本发明提供了一种用于在真空室的外部和内部之间传输光信号的传输装置，包括：多个第一传输线，被配置为在真空室外传输多个光信号，多个第二传输线配置 在所述真空室内透过所述多个光信号，以及透光构件，被配置为在所述多个第一传输线与所述多个第二传输线之间传输光信号，其中，所述透光构件具有形成为 将多个第一传输线与多条第二传输线之间的多个光信号的光路彼此隔离。

    Method and Apparatus for Scanning a Surface of an Object Using a Particle Beam
    72.
    发明申请
    Method and Apparatus for Scanning a Surface of an Object Using a Particle Beam 有权
    使用粒子束扫描物体表面的方法和装置

    公开(公告)号：US20130320226A1

    公开(公告)日：2013-12-05

    申请号：US13905067

    申请日：2013-05-29

    Applicant: Carl Zeiss Microscopy GmbH

    Inventor： Ralph Pulwey ,  Josef Biberger

    IPC: H01J3/26

    CPC classification number: H01J37/3026 ,  H01J3/26 ,  H01J37/302 ,  H01J37/3023 ,  H01J37/3056 ,  H01J37/3174 ,  H01J2237/1536 ,  H01J2237/30483 ,  H01J2237/30488

    Abstract: A method of scanning a surface of an object using a particle beam comprises: determining a surface portion of the surface of the object, wherein the surface portion is to be scanned; determining initial positions of a set of raster points within the surface portion; changing the positions of at least some raster points of the set of raster points; and then scanning the surface portion by directing the particle beam to the positions of the raster points.

    Abstract translation: 使用粒子束扫描物体的表面的方法包括：确定物体表面的表面部分，其中表面部分被扫描; 确定所述表面部分内的一组光栅点的初始位置; 改变该组光栅点的至少一些光栅点的位置; 然后通过将粒子束引导到光栅点的位置来扫描表面部分。

    Accelerator on a chip having a grid and plate cell
    73.
    发明授权
    Accelerator on a chip having a grid and plate cell 有权
    具有栅格和板单元的芯片上的加速器

    公开(公告)号：US08564225B1

    公开(公告)日：2013-10-22

    申请号：US13585832

    申请日：2012-08-15

    Applicant: Kim L. Hailey ,  Robert O. Conn

    Inventor： Kim L. Hailey ,  Robert O. Conn

    IPC: H05H7/00

    CPC classification number: H01J37/302 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/08 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0432 ,  H01J2237/0437 ,  H01J2237/04735 ,  H01J2237/061 ,  H01J2237/0802 ,  H01J2237/0815 ,  H01J2237/20228 ,  H01J2237/30416 ,  H01J2237/31749 ,  H01J2237/31755 ,  H01J2237/31766 ,  H05H9/042

    Abstract: An accelerator assembly includes an acceleration channel that passes in a straight line through a plurality of accelerator cells. Each cell includes an acceleration region and a drift region. The drift region includes a high voltage plate and a grid electrode, where the grid electrode is disposed between the high voltage plate and the channel. In each cell, a large DC voltage is present on the high voltage plate. A voltage on the grid electrode is controlled such that at a first time an ion in the channel is attracted toward the high voltage plate, and such that at a second time the ion is shielded and is not attracted toward the high voltage plate. In one specific example, the assembly is part of a Direct Write On Wafer (DWOW) printing system that can direct write an image onto a 300 mm diameter wafer in one minute.

    Abstract translation: 加速器组件包括加速通道，其以直线通过多个加速器单元。 每个单元包括加速区和漂移区。 漂移区域包括高压板和栅格电极，其中格栅电极设置在高压板和通道之间。 在每个电池中，在高压板上存在大的直流电压。 控制栅电极上的电压，使得第一次将通道中的离子吸引到高压板，并且在第二时间离子被屏蔽并且不被吸引到高压板。 在一个具体的示例中，组件是直接写入晶圆（DWOW）打印系统的一部分，可以在一分钟内直接将图像写入到300mm直径的晶片上。

    Automated Ion Beam Idle
    74.
    发明申请
    Automated Ion Beam Idle 有权
    自动离子束空闲

    公开(公告)号：US20130256553A1

    公开(公告)日：2013-10-03

    申请号：US13436916

    申请日：2012-03-31

    Applicant: Tom Miller ,  Sean Kellogg ,  Jiri Zbranek

    Inventor： Tom Miller ,  Sean Kellogg ,  Jiri Zbranek

    IPC: H01J3/18 ,  H05H1/03

    CPC classification number: H01J37/08 ,  H01J37/045 ,  H01J37/243 ,  H01J37/302 ,  H01J2237/043 ,  H01J2237/0805 ,  H01J2237/0817 ,  H01J2237/30472 ,  H01J2237/31749

    Abstract: An improved method and apparatus for shutting down and restoring an ion beam in an ion beam system. Preferred embodiments provide a system for improved power control of a focused ion beam source, which utilizes an automatic detection of when a charged particle beam system is idle (the beam itself is not in use) and then automatically reducing the beam current to a degree where little or no ion milling occurs at any aperture plane in the ion column. Preferred embodiments include a controller operable to modify voltage to an extractor electrode and/or to reduce voltage to a source electrode when idle state of an ion source of the charged particle beam system is detected.

    Abstract translation: 一种用于在离子束系统中关闭和还原离子束的改进的方法和装置。 优选实施例提供了一种用于改进聚焦离子束源的功率控制的系统，其利用对带电粒子束系统何时空闲（束本身不使用）的自动检测，然后自动将束电流减小至 在离子柱中的任何孔径平面处都发生很少或没有离子研磨。 优选的实施例包括可操作以在检测到带电粒子束系统的离子源的空闲状态时，将电压修改为提取器电极和/或降低对源电极的电压的控制器。

    Method and Apparatus for Generating High Current Negative Hydrogen ION Beam
    75.
    发明申请
    Method and Apparatus for Generating High Current Negative Hydrogen ION Beam 有权
    用于产生大电流负氢离子束的方法和装置

    公开(公告)号：US20130255577A1

    公开(公告)日：2013-10-03

    申请号：US13800979

    申请日：2013-03-13

    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.

    Inventor： Shengwu Chang

    IPC: G21K5/00

    CPC classification number: G21K5/00 ,  H01J27/028 ,  H01J37/08 ,  H01J37/302 ,  H01J37/3171

    Abstract: An apparatus to generate negative hydrogen ions includes an ion source operative to generate positive hydrogen ions, a first component to adjust positive molecular hydrogen ion species in the ion source, a second component to adjust extraction voltage for extraction of the positive molecular hydrogen ions from the ion source, and a charge exchange cell comprising charge exchange species to convert the extracted positive molecular hydrogen ions to negative hydrogen ions. The adjusted extraction voltage is effective to generate an ion energy to maximize negative ion current yield in the charge exchange cell based upon a product of extraction efficiency of the positive molecular hydrogen ions and a peak in charge exchange efficiency for converting a species of the positive molecular hydrogen ions to negative hydrogen ions through charge exchange between the extracted hydrogen ions and charge exchange species.

    Abstract translation: 产生负氢离子的装置包括可产生正氢离子的离子源，用于调节离子源中的正分子氢离子种类的第一组分，用于调节提取电压以提取正离子氢离子的第二组分 离子源和包含电荷交换物质的电荷交换单元，以将所提取的正分子氢离子转化为负的氢离子。 基于正分子氢离子的提取效率和电荷交换效率的峰值，用于转换正分子的种类，调整的提取电压有效产生离子能量以最大化电荷交换电池中的负离子电流产量 氢离子与负离子之间的氢离子通过电荷交换提取氢离子和电荷交换物质。

    APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING ION BEAM
    78.
    发明申请
    APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING ION BEAM 有权
    使用离子束处理基板的装置和方法

    公开(公告)号：US20120145535A1

    公开(公告)日：2012-06-14

    申请号：US13315567

    申请日：2011-12-09

    Applicant: Yasushi KAMIYA ,  Einstein Noel Abarra ,  Yuta Konno

    Inventor： Yasushi KAMIYA ,  Einstein Noel Abarra ,  Yuta Konno

    IPC: H01L21/02 ,  B44C1/22 ,  C23C14/34

    CPC classification number: H01J37/302 ,  G05B15/02 ,  H01J37/3053 ,  H01J2237/0044 ,  H01J2237/043 ,  H01J2237/334

    Abstract: A method of processing a substrate in an apparatus including a substrate holder which holds the substrate, an ion source which emits an ion beam, a neutralizer which emits electrons, and a shutter which is arranged between a space in which the ion source and the neutralizer are arranged and a space in which the substrate holder is arranged, and configured to shield the ion beam traveling toward the substrate, includes adjusting an amount of electrons which are emitted by the neutralizer and reach the substrate holder during movement of the shutter.

    Abstract translation: 一种在包括保持衬底的衬底保持器，发射离子束的离子源，发射电子的中和器和快门的设备中处理衬底的方法，该快门设置在离子源和中和器之间的空间中 布置有衬底保持器布置的空间，并且被构造成屏蔽朝向衬底行进的离子束，包括调节由中和器发射的电子的量并且在快门移动期间到达衬底保持器。

    METHOD AND SYSTEM FOR PREPARING A LAMELA
    79.
    发明申请
    METHOD AND SYSTEM FOR PREPARING A LAMELA 审中-公开
    用于制备LAMELA的方法和系统

    公开(公告)号：US20120080406A1

    公开(公告)日：2012-04-05

    申请号：US13172888

    申请日：2011-06-30

    Applicant: Dimitry BOGUSLAVSKY ,  Colin SMITH

    Inventor： Dimitry BOGUSLAVSKY ,  Colin SMITH

    IPC: G01N1/32

    CPC classification number: H01J37/3056 ,  G01N1/32 ,  H01J37/3005 ,  H01J37/302 ,  H01J2237/202 ,  H01J2237/26 ,  H01J2237/3151

    Abstract: A system and a method for preparing a lamella. The method may include aligning, by the manipulator, a mask and a sample. Positioning the mask and the sample in front of an ion miller while unchanging the spatial relationship between the mask and the sample. Milling a first exposed portion of the sample until exposing a first sidewall of the lamella. Positioning the mask and the sample in front of the ion miller so that the mask masks a second masked portion of the sample. Milling, by the ion miller, the second exposed portion of the sample until exposing a second sidewall of the lamella. Removing, by the miller, matter from both sides of the lamella; and detaching the lamella from the sample.

    Abstract translation: 一种制备薄片的系统和方法。 该方法可以包括通过操纵器对准掩模和样品。 将掩模和样品定位在离子磨机的前面，同时保持掩模和样品之间的空间关系。 铣削样品的第一暴露部分直到暴露薄片的第一侧壁。 将掩模和样品定位在离子磨机的前面，使得掩模掩盖样品的第二掩蔽部分。 通过离子研磨机将样品的第二暴露部分研磨直到暴露薄片的第二侧壁。 由磨机从薄片的两侧移走; 并从样品中分离薄片。

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