公开(公告)号：US20240021402A1

公开(公告)日：2024-01-18

申请号：US18454569

申请日：2023-08-23

Applicant: University College Dublin, National University of Ireland

Inventor： Denis Dowling ,  James N. Barry

IPC: H01J37/02 ,  H01J37/32

CPC classification number: H01J37/023 ,  H01J37/32055 ,  H01J37/32449 ,  H01J2237/24564 ,  H01J2237/24585 ,  H01J2237/336 ,  H01J2237/0203

Abstract: A surface preparation method (200) for a composite material (104) having an original surface (110), the material (104) comprising fibres (104a) within a matrix (104b), comprises removing (204) a surface portion of the matrix (104b) by plasma ablation so as to reveal and activate (206) a new surface (120) with at least a portion of a plurality of the fibres (104a) exposed thereon, without creating a residual heat-affected zone.

公开(公告)号：US20180269045A1

公开(公告)日：2018-09-20

申请号：US15806454

申请日：2017-11-08

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Stephen L. Brown ,  Bruce B. Doris ,  Mark C. Reuter

IPC: H01J37/34 ,  C23C14/34

CPC classification number: H01J37/3485 ,  C23C14/24 ,  C23C14/3414 ,  H01J37/32 ,  H01J37/3426 ,  H01J37/3447 ,  H01J2237/0203 ,  H01J2237/081 ,  H01J2237/3322

Abstract: A deposition tool includes a vacuum chamber and a physical vapor deposition module including a target source in the vacuum chamber. The target source includes a target material for depositing on a workpiece. An evaporator module is independent of the physical vapor deposition module and is mounted within an enclosure in the vacuum chamber. A gate is configured to selectively open the enclosure to permit evaporation of a coating element to coat the target source in the physical vapor deposition module.

公开(公告)号：US20170309438A1

公开(公告)日：2017-10-26

申请号：US15632477

申请日：2017-06-26

Applicant: Mapper Lithography IP B.V.

Inventor： Stijn Willem Herman Karel STEENBRINK ,  Johan Joost KONING ,  Peter VELTMAN

IPC: H01J37/12 ,  H01J37/317

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/004 ,  H01J2237/0203 ,  H01J2237/03 ,  H01J2237/04924 ,  Y10T29/49

Abstract: An electrostatic lens comprising a first conductive plate with a first aperture, a second conductive plate with a second aperture, the second aperture being substantially aligned with the first aperture, a voltage supply for supplying a first voltage to the first conductive plate and a second voltage to the second conductive plate, the first voltage being lower than the second voltage, and an insulating structure for separating the first conductive plate from the second conductive plate. The insulating structure comprises a first portion in contact with the first conductive plate and a second portion in contact with the second conductive plate, the first portion having an overhanging portion and the second portion having an indented portion at an edge of the insulating structure, so that a gap is formed between the overhanging portion and the second conductive plate.

公开(公告)号：USRE46452E1

公开(公告)日：2017-06-27

申请号：US14302522

申请日：2014-06-12

Applicant: Mapper Lithography IP B.V.

Inventor： Stijn Willem Herman Karel Steenbrink ,  Johan Joost Koning ,  Peter Veltman

IPC: G03B27/54 ,  H01J3/14 ,  B23P17/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/317

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/004 ,  H01J2237/0203 ,  H01J2237/03 ,  H01J2237/04924 ,  Y10T29/49

Abstract: An electrostatic lens comprising a first conductive plate with a first aperture, a second conductive plate with a second aperture, the second aperture being substantially aligned with the first aperture, a voltage supply for supplying a first voltage to the first conductive plate and a second voltage to the second conductive plate, the first voltage being lower than the second voltage, and an insulating structure for separating the first conductive plate from the second conductive plate. The insulating structure comprises a first portion in contact with the first conductive plate and a second portion in contact with the second conductive plate, the first portion having an overhanging portion and the second portion having an indented portion at an edge of the insulating structure, so that a gap is formed between the overhanging portion and the second conductive plate.

公开(公告)号：US20150293050A1

公开(公告)日：2015-10-15

申请号：US14679259

申请日：2015-04-06

Applicant: HONDA MOTOR CO., LTD.

Inventor： Nariaki KURIYAMA ,  Yoshiya FUJIWARA

IPC: G01N27/404

CPC classification number: G01N27/404 ,  H01J37/22 ,  H01J37/26 ,  H01J2237/0203 ,  H01J2237/2003 ,  H01J2237/2008

Abstract: An analytical cell includes first and second holders. The first and second holders each contain a substrate having a through-hole and a transmission membrane with an electron beam permeability so as to cover the through-hole. The first and second holders are stacked to form an overlapping portion such that the transmission membranes face each other and that an inner space therein containing the electrolytic solution is sealed. The through-holes face each other across the transmission membranes to form an observation window. Negative and positive electrode active materials are separated from each other and contact the electrolytic solution in the observation window. A transmission body containing an electron beam permeable solid is formed between at least one of the negative and positive electrode active materials and the transmission membrane.

Abstract translation: 分析单元包括第一和第二支架。 第一和第二支架各自包含具有通孔的基板和具有电子束透过性的透光膜以覆盖通孔。 第一和第二保持器堆叠形成重叠部分，使得透膜彼此面对，并且其中包含电解液的内部空间被密封。 通孔在透过膜上面对面形成观察窗。 负极和正极活性物质彼此分离并与观察窗中的电解液接触。 在负极和正极活性物质和透射膜中的至少一个之间形成含有电子束透过性固体的透射体。

公开(公告)号：US08933630B2

公开(公告)日：2015-01-13

申请号：US13719309

申请日：2012-12-19

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chin-Tsung Lin ,  Hsiao-Yin Hsieh ,  Chi-Hao Huang ,  Hong-Hsing Chou ,  Yeh-Chieh Wang

IPC: H01J7/24 ,  H01J37/08 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J37/244 ,  H01J37/3171 ,  H01J2237/0203 ,  H01J2237/024 ,  H01J2237/026 ,  H01J2237/08 ,  H01J2237/303 ,  H01J2237/30405

Abstract: An apparatus for extending the useful life of an ion source, comprising an arc chamber containing a plurality of cathodes to be used sequentially and a plurality of repellers to protect cathodes when not in use. The arc chamber includes an arc chamber housing defining a reaction cavity, gas injection openings, a plurality of cathodes, and at least one repeller element. A method for extending the useful life of an ion source includes providing power to a first cathode of an arc chamber in an ion source, operating the first cathode, detecting a failure or degradation in performance of the first cathode, energizing a second cathode, and continuing operation of the arc chamber with the second cathode.

Abstract translation: 一种用于延长离子源的使用寿命的装置，包括电弧室，其包含要顺序使用的多个阴极，以及多个防水剂，以在不使用时保护阴极。 电弧室包括限定反应腔的电弧室壳体，气体注入开口，多个阴极和至少一个排斥元件。 用于延长离子源的使用寿命的方法包括向离子源中的电弧室的第一阴极提供电力，操作第一阴极，检测第一阴极的故障或性能下降，激励第二阴极，以及 与第二阴极连续操作电弧室。

公开(公告)号：US20140335698A1

公开(公告)日：2014-11-13

申请号：US13888754

申请日：2013-05-07

Applicant: LAM RESEARCH CORPORATION

Inventor： Harmeet Singh ,  Thorsten Lill

IPC: H01J37/32 ,  H01L21/48 ,  H01L21/02

CPC classification number: H01J37/32495 ,  C23C16/4404 ,  H01J37/32477 ,  H01J37/32715 ,  H01J37/32724 ,  H01J2237/0203 ,  H01J2237/332 ,  H01J2237/334 ,  H01J2237/3344 ,  H01L21/3065 ,  H01L21/67069 ,  H01L21/6715 ,  H01L21/68735

Abstract: A component of a plasma processing chamber having a protective liquid layer on a plasma exposed surface of the component. The protective liquid layer can be replenished by supplying a liquid to a liquid channel and delivering the liquid through liquid feed passages in the component. The component can be an edge ring which surrounds a semiconductor substrate supported on a substrate support in a plasma processing apparatus wherein plasma is generated and used to process the semiconductor substrate. Alternatively, the protective liquid layer can be cured or cooled sufficiently to form a solid protective layer.

Abstract translation: 等离子体处理室的组件，其在组件的等离子体暴露表面上具有保护液层。 可以通过向液体通道供应液体并通过液体供给通道将液体输送到部件中来补充保护液体层。 该组件可以是围绕在等离子体处理装置中的支撑在基板支撑件上的半导体衬底的边缘环，其中产生等离子体并用于处理半导体衬底。 或者，可以将保护液层充分固化或冷却以形成固体保护层。

公开(公告)号：US08853647B2

公开(公告)日：2014-10-07

申请号：US14130919

申请日：2012-05-16

Applicant: Takeshi Ogashiwa ,  Masahiro Akatsu

Inventor： Takeshi Ogashiwa ,  Masahiro Akatsu

IPC: G21K5/10 ,  G21K5/08 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/20 ,  H01J2237/0203

Abstract: Provided is an electron microscope on which a specimen holder to have high voltage applied is mountable. The specimen holder has safety (electric shock prevention) features, and attention is paid to the specimen holder in terms of operability. The microscope includes a specimen holder having a function of applying a voltage to a specimen mount disposed to load a specimen, a voltage source that supplies the voltage to be applied to the specimen mount, a voltage cable connected at one end thereof to the specimen holder, and a relay unit to which the other end of the voltage cable is connected, the relay unit being placed on a supporting base that supports a lens barrel of the electron microscope.

Abstract translation: 提供一种电子显微镜，其上安装有施加高电压的试样保持器。 样品架具有安全（防电击）特征，在可操作性方面注意样品架。 该显微镜包括：试样保持器，其具有向载置试样的试样台架施加电压的电压，向试样台提供施加电压的电压源，将其一端连接于试样架的电压电缆 以及连接有电压电缆的另一端的中继单元，将继电器单元配置在支撑电子显微镜的镜筒的支撑基座上。

公开(公告)号：US08546770B2

公开(公告)日：2013-10-01

申请号：US13515717

申请日：2010-11-11

Applicant: Akinari Morikawa ,  Takeshi Sato ,  Eiko Nakazawa ,  Susumu Kuwabata

Inventor： Akinari Morikawa ,  Takeshi Sato ,  Eiko Nakazawa ,  Susumu Kuwabata

IPC: H01J40/00 ,  H01J47/00

CPC classification number: H01J37/305 ,  G01N1/2813 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/0203 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: There is provided a charged particle beam device which has a mechanism adjusting the shape of an ionic liquid droplet to be adhered to a sample and the thickness of a film of the ionic liquid, in such a manner that they are suitable for various types of observations by an electronic microscope and the like, and for processing using ion beams. The charged particle beam device is characterized in that it includes an ionic liquid holding member having an opening, an ionic liquid supplying unit for filling an ionic liquid into the opening, an observation unit for observing an adhesion state of the ionic liquid, and charged particle beam generating units for radiating charged particle beams, and can adjust the thickness of an ionic liquid droplet to be filled in the opening, when the charged particle beam device observes a sample in a state where it is floating in the ionic liquid by being dispersed into the ionic liquid or on a surface of the ionic liquid.

Abstract translation: 提供一种带电粒子束装置，其具有调节待粘附到样品上的离子液滴的形状和离子液体的膜厚度的机构，使得它们适合于各种类型的观察 通过电子显微镜等，并且使用离子束进行处理。 带电粒子束装置的特征在于它包括具有开口的离子液体保持构件，用于将离子液体填充到开口中的离子液体供给单元，用于观察离子液体的粘附状态的观察单元和带电粒子 用于照射带电粒子束的光束产生单元，并且当带电粒子束装置通过分散在离子液体中漂浮在离子液体中的状态下观察样品时，可以调节要填充在开口中的离子液滴的厚度 离子液体或离子液体的表面上。

公开(公告)号：US20130200270A1

公开(公告)日：2013-08-08

申请号：US13724323

申请日：2012-12-21

Applicant: FEI Company

Inventor： Casper Maria Smit ,  Johannes Antonius Maria van den Oetelaar

IPC: H01J37/24 ,  G05D23/00

CPC classification number: H01J37/26 ,  G05D23/00 ,  H01J37/16 ,  H01J37/24 ,  H01J2237/002 ,  H01J2237/0203

Abstract: A method and apparatus for reducing drift in a charged particle beam system. The method includes providing a charged particle beam column including a charged particle beam, a lens system, and a sample chamber; disposing a temperature-controlled device between the lens system and the sample chamber to control heat transfer between the lens system and the sample chamber; and controlling the temperature of the temperature-controlled device to reduce or eliminate the thermal drift of the position of a sample within the sample chamber relative to the position of the charged particle beam.

Abstract translation: 一种减少带电粒子束系统漂移的方法和装置。 该方法包括提供包括带电粒子束，透镜系统和样品室的带电粒子束柱; 在透镜系统和样品室之间设置温度控制装置，以控制透镜系统和样品室之间的热传递; 以及控制温度控制装置的温度以相对于带电粒子束的位置来减少或消除样品室内的样品位置的热漂移。