公开(公告)号：US20150042976A1

公开(公告)日：2015-02-12

申请号：US14526023

申请日：2014-10-28

Applicant: ASML Holding N.V.

Inventor： Darya AMIN-SHAHIDI

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/707

Abstract: In a lithographic apparatus, slippage of a patterning device is substantially eliminated during movement of a patterning device stage by providing a magnetostrictive actuator to apply an accelerating force to the patterning device to compensate for forces that would otherwise tend to cause slippage when the patterning device stage moves.

Abstract translation: 在光刻设备中，通过提供磁致伸缩致动器来在图案形成装置台的移动期间基本上消除了图案形成装置的滑动，以将图形装置的加速力施加到图案形成装置以补偿当图案形成装置台阶上将趋于导致滑动的力 移动。

公开(公告)号：US20140253891A1

公开(公告)日：2014-09-11

申请号：US14281346

申请日：2014-05-19

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Arie Jeffrey DEN BOEF ,  Earl William EBERT, JR. ,  Harry SEWELL ,  Keith William ANDRESEN ,  Sanjeev Kumar SINGH

IPC: G03F7/20 ,  G02F1/11

CPC classification number: G03F7/70141 ,  G01B11/14 ,  G02F1/116 ,  G03F7/70191 ,  G03F9/7065

Abstract: A lithographic apparatus comprises an alignment system including a tunable narrow pass-band filter configured to receive a broad-band radiation and to filter the broad-band radiation into narrow-band linearly polarized radiation. The tunable narrow pass-band filter is further configured to modulate an intensity and wavelength of the narrow-band radiation and to provide a plurality of pass-band filters at a same time or nearly the same time. The alignment system further includes a relay and mechanical interface configured to receive the narrow-band radiation and to adjust a profile of the narrow-band radiation based on physical properties of alignment targets on a substrate. The adjusted narrow-band radiation is focused on the alignment targets using a focusing system.

Abstract translation: 光刻设备包括对准系统，其包括被配置为接收宽带辐射并将宽带辐射过滤成窄带线偏振辐射的可调谐窄带通滤波器。 可调谐窄带通滤波器还被配置为调制窄带辐射的强度和波长并且在同时或几乎同时提供多个通带滤波器。 对准系统还包括被配置为接收窄带辐射并基于衬底上的对准靶的物理特性来调整窄带辐射的轮廓的继电器和机械接口。 使用聚焦系统将经调整的窄带辐射聚焦在对准目标上。

公开(公告)号：US20140233003A1

公开(公告)日：2014-08-21

申请号：US14266534

申请日：2014-04-30

Applicant: ASML HOLDING N.V.

Inventor： Herman VOGEL ,  Klaus SIMON ,  Antonius Theodorus Anna Maria DERKSEN

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/20 ,  G03F7/70358 ,  G03F7/709 ,  H01L21/027

Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.

公开(公告)号：US08786832B2

公开(公告)日：2014-07-22

申请号：US13938746

申请日：2013-07-10

Applicant: ASML Holding N.V.

Inventor： Samir A. Nayfeh ,  Mark Edd Williams ,  Justin Matthew Verdirame

IPC: B25B11/00 ,  G03B27/58 ,  G03B27/62 ,  G03F7/20 ,  H01L21/687 ,  H01L21/683

CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70783 ,  H01L21/683 ,  H01L21/68714 ,  H01L21/6875 ,  Y10S414/141 ,  Y10T279/34

Abstract: A lithographic apparatus is described that comprises a support structure to hold an object. The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck, on which the object is supported, and an array of shear-compliant elongated elements normal to the chuck and the stage, such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.

Abstract translation: 描述了一种光刻设备，其包括用于保持物体的支撑结构。 该物体可以是图案形成装置或要暴露的基板。 支撑结构包括卡盘，物体被支撑在该卡盘上，以及与卡盘和台架垂直的剪切顺应的细长元件的阵列，使得细长元件的第一端接触卡盘的表面和卡盘的第二端 细长元件接触舞台。 通过使用细长元件阵列，载物台与卡盘之间的应力传递基本上是均匀的，从而在由于应力引起的卡盘变形期间，物体相对于卡盘表面的滑动最小化。

公开(公告)号：US20140192333A1

公开(公告)日：2014-07-10

申请号：US14202835

申请日：2014-03-10

Applicant: ASML Holding N.V

Inventor： Harry SEWELL ,  Mircea Dusa ,  Richard Johannes Franciscus Van Haren ,  Manfred Gawein Tenner ,  Maya Angelova Doytcheva

IPC: G03F9/00

CPC classification number: G03F9/7046 ,  G03F7/0035 ,  G03F7/105 ,  G03F7/70466 ,  G03F9/7076 ,  H01L21/0273 ,  H01L21/32139

Abstract: A system and method of manufacturing a semiconductor device lithographically and an article of manufacture involving a lithographic double patterning process having a dye added to either the first or second lithographic pattern are provided. The dye is used to detect the location of the first lithographic pattern and to directly align the second lithographic pattern to it. The dye may be fluorescent, luminescent, absorbent, or reflective at a specified wavelength or a given wavelength band. The wavelength may correspond to the wavelength of an alignment beam. The dye allows for detection of the first lithographic pattern even when it is over coated with a radiation sensitive-layer (e.g., resist).

Abstract translation: 提供光刻制造半导体器件的系统和方法以及涉及具有添加到第一或第二光刻图案上的染料的光刻双重图案化工艺的制品。 该染料用于检测第一光刻图案的位置，并将第二光刻图案直接对准。 染料可以是在指定波长或给定波长带处的荧光，发光，吸收或反射。 波长可对应于对准光束的波长。 染料允许检测第一光刻图案，即使当其涂覆有辐射敏感层（例如抗蚀剂）时。

公开(公告)号：US20140096614A1

公开(公告)日：2014-04-10

申请号：US14102667

申请日：2013-12-11

Applicant: ASML Holding N.V.

Inventor： Geoffrey Alan SCHULTZ

IPC: G01L13/02

CPC classification number: G01L13/02 ,  G01B13/12 ,  G03F9/7026 ,  G03F9/7034 ,  G03F9/7053 ,  G03F9/7096

Abstract: In one embodiment of the present invention, there is provided a gas gauge for use in a vacuum environment having a measurement gas flow channel. The gas gauge may comprise a measurement nozzle in the measurement gas flow channel. The measurement nozzle may be configured to operate at a sonically choked flow condition of a volumetric flow being sourced from a gas supply coupled to the measurement gas flow channel. The gas gauge may further comprise a pressure sensor operatively coupled to the measurement gas flow channel downstream from the sonically choked flow condition of the volumetric flow to measure a differential pressure of the volumetric flow for providing an indication of a gap between a distal end of the measurement nozzle and a target surface proximal thereto.

Abstract translation: 在本发明的一个实施例中，提供一种用于具有测量气体流动通道的真空环境中的气量计。 气量计可以包括测量气体流动通道中的测量喷嘴。 测量喷嘴可以被配置为在来自耦合到测量气体流动通道的气体源的体积流的声波扼流流动条件下操作。 气量计还可以包括压力传感器，该压力传感器可操作地耦合到测量气体流动通道的下游，该体积流量的声波扼流流动条件以测量体积流量的压力差，以便提供体积流动的远端之间的间隙的指示 测量喷嘴和靠近其的目标表面。

公开(公告)号：US20130258316A1

公开(公告)日：2013-10-03

申请号：US13898973

申请日：2013-05-21

Applicant: ASML Holding N.V.

Inventor： Arie Jeffrey DEN BOEF ,  Earl William EBERT ,  Harry SEWELL ,  Keith William ANDRESEN ,  Sanjeev Kumar SINGH

IPC: G01B11/14 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G01B11/14 ,  G02F1/116 ,  G03F7/70191 ,  G03F9/7065

Abstract: A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable narrow pass-band filter filters the broad-band radiation into narrow-band linearly polarized radiation. The narrow-band radiation may be focused on alignment targets of a wafer so as to enable alignment of the wafer. In an embodiment, the filter is configured to modulate an intensity and wavelength of radiation produced by the radiation source and to have multiple simultaneous pass-bands. The radiation source generates radiation that has high spatial coherence and low temporal coherence.

Abstract translation: 光刻设备具有对准系统，其包括被配置为将窄带辐射转换成连续，平坦和宽带辐射的辐射源。 声可调窄带通滤波器将宽带辐射滤波成窄带线偏振辐射。 窄带辐射可以聚焦在晶片的对准目标上，以便能够对准晶片。 在一个实施例中，滤波器被配置为调制由辐射源产生的辐射的强度和波长并且具有多个同时的通带。 辐射源产生具有高空间相干性和低时间相干性的辐射。

公开(公告)号：US20040240513A1

公开(公告)日：2004-12-02

申请号：US10448027

申请日：2003-05-30

Applicant: ASML Holding N.V.

Inventor： Santiago E. del Puerto

IPC: G01N025/18

CPC classification number: H01L21/67265 ,  H01L21/682

Abstract: A chuck having a high specific stiffness and high thermal conductivity compared to conventional chucks, with an apparatus for measuring thermal expansion in the chuck. High specific stiffness allows for a higher control bandwidth and improved scanning performance. High thermal conductivity enables excellent positioning accuracy because thermal expansion and strain may be accurately measured or predicted, and thus compensated.

Abstract translation: 与传统卡盘相比，具有高比刚度和高热导率的卡盘，具有用于测量卡盘热膨胀的装置。 高比刚度允许更高的控制带宽和改进的扫描性能。 由于热膨胀和应变可以被准确地测量或预测，因此高的导热性可以实现出色的定位精度，从而得到补偿。

公开(公告)号：US20040239283A1

公开(公告)日：2004-12-02

申请号：US10449001

申请日：2003-06-02

Applicant: ASML Holding N.V.

Inventor： Daniel N. Galburt ,  Frederick M. Carter ,  Stephen Roux

IPC: G05B011/32

CPC classification number: G03F7/70066

Abstract: A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.

Abstract translation: 一种用于在光刻系统中控制掩模掩模刀片的方法，装置和系统。 掩模版掩模刀片由掩模版掩模刀片托架组件支撑。 掩模版掩模刀片托架组件相对于参考框架在相对于参考框架的取向处悬浮。 优选地，掩模掩模刮板滑架组件是电磁悬浮的。 测量掩模版掩模片滑架组件的位置和取向中的至少一个。 掩模版掩模刀片支架组件的位置和取向中的至少一个被控制。 可选地，掩模版掩模刮板滑架组件在由参考框限定的范围内的尺寸内移动。 尺寸可以是两个维度。 可以控制掩模掩模刮板托架组件的运动。

公开(公告)号：US20040179270A1

公开(公告)日：2004-09-16

申请号：US10808436

申请日：2004-03-25

Applicant: ASML Holding N.V.

Inventor： Scott Coston ,  Wenceslao A. Cebuhar ,  Jason D. Hintersteiner

IPC: B41J027/00 ,  G02B027/10

CPC classification number: G03F7/70158 ,  B41J2/451 ,  G02B27/0905 ,  G03F7/70083 ,  G03F7/70183 ,  G03F7/70291

Abstract: An illumination method and system use a light source and illumination optics to illuminate a pattern generator. The illumination optics can include at least two devices. For example, if first and second diffractive and/or refractive devices are used, one can be a pupil defining element (PDE) and one can be a field defining element (FDE). In another example, a third diffractive or refractive element can be used to make light entering the illumination system uniform. When only two are used, the PDE forms one or more light beams having a defined profile. The FDE directs the one or more light beams having the defined profile, such that each directed beam substantially corresponds in size and shape to a desired illumination area(s) on the pattern generator. The directed beams are directed to impinge substantially only on the desired illumination area(s). Thus, using the PDE and the FDE increases optical efficiency of light impinging on the pattern generator and substantially reduces or eliminates stray light caused by light impinging on undesired areas of the pattern generator.

Abstract translation: 照明方法和系统使用光源和照明光学器件来照亮图案发生器。 照明光学器件可以包括至少两个装置。 例如，如果使用第一和第二衍射和/或折射装置，则可以是瞳孔限定元件（PDE），并且可以是场限定元件（FDE）。 在另一示例中，可以使用第三衍射或折射元件来使进入照明系统的光均匀。 当仅使用两个时，PDE形成一个或多个具有确定的轮廓的光束。 FDE引导具有限定轮廓的一个或多个光束，使得每个定向光束在尺寸和形状上基本对应于图案发生器上的期望的照明区域。 定向光束被引导以基本上仅在期望的照明区域上照射。 因此，使用PDE和FDE提高了照射在图案发生器上的光的光学效率，并且基本上减少或消除了光照射在图案发生器的不需要的区域上的杂散光。