公开(公告)号：US11851364B2

公开(公告)日：2023-12-26

申请号：US16254191

申请日：2019-01-22

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Junichiro Nishida ,  Kazuo Shirota ,  Hisashi Yagi ,  Masaki Takeuchi

IPC: C03C21/00 ,  C03B23/04 ,  C03B25/02 ,  C03C23/00 ,  C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  C03C4/00

CPC classification number: C03C21/007 ,  C03B19/1469 ,  C03B23/04 ,  C03B25/025 ,  C03B32/00 ,  C03C3/06 ,  C03C4/0071 ,  C03C23/002 ,  C03C23/007 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/21 ,  C03C2203/52

Abstract: A synthetic quartz glass substrate having a controlled hydrogen molecule concentration is prepared by (a) hot shaping a synthetic quartz glass ingot into a glass block, (b) slicing the glass block into a glass plate, (c) annealing the glass plate at 500-1,250° C. for 15-60 hours, (d) hydrogen doping treatment of the glass plate in a hydrogen gas atmosphere at 300-450° C. for 20-40 hours, and (e) dehydrogenation treatment of the glass plate at 200-400° C. for 5-10 hours.

公开(公告)号：US09834468B2

公开(公告)日：2017-12-05

申请号：US14769382

申请日：2014-02-19

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Bodo Kuehn

IPC: F21V9/00 ,  G02B5/02 ,  G02C7/10 ,  G02F1/361 ,  G03B11/00 ,  C03C3/06 ,  C03B19/14 ,  C03B32/00 ,  G02B1/00 ,  G02B1/02 ,  C03B32/02 ,  C03C4/04 ,  C03C15/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B32/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03C4/04 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2203/54 ,  C03C2204/00 ,  G02B1/00 ,  G02B1/02 ,  Y02P40/57

Abstract: An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×1016 to 1.0×1018 molecules/cm3, an SiH group content of less than 2×1017 molecules/cm3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×109 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M193 nm when measured using the applied wavelength of 193 nm and a second measured value M633 nm when measured using a measured wavelength of 633 nm. The ratio M193 nm/M633 nm is less than 1.7.

公开(公告)号：US09611169B2

公开(公告)日：2017-04-04

申请号：US14958024

申请日：2015-12-03

Applicant: Corning Incorporated

Inventor： Sezhian Annamalai ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina

IPC: C03C3/06 ,  C03B19/14 ,  C03B25/02 ,  C03C3/112 ,  C03C4/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1461 ,  C03B25/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/14 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2201/50 ,  C03B2201/54 ,  C03C3/112 ,  C03C4/00 ,  C03C2201/12 ,  C03C2201/14 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2201/50 ,  C03C2201/54 ,  C03C2203/52

Abstract: A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %. Further, the glass article has an expansivity slope of less than 0.5 ppb/K2 at 20° C. The second dopant can be optional. The composition of the glass article may also contain an OH concentration of less than 100 ppm.

公开(公告)号：US09568818B2

公开(公告)日：2017-02-14

申请号：US14862707

申请日：2015-09-23

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Stefan Ochs ,  Klaus Becker

IPC: C03C3/06 ,  G03F1/22 ,  C03B19/06 ,  C03C3/04 ,  C03B19/14 ,  C03C23/00 ,  C03B32/00 ,  G03F7/00

CPC classification number: G03F1/22 ,  C03B19/06 ,  C03B19/14 ,  C03B19/1453 ,  C03B19/1461 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/04 ,  C03C3/06 ,  C03C21/007 ,  C03C23/00 ,  C03C23/007 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54 ,  G03F1/24 ,  G03F1/60 ,  G03F7/00

Abstract: A method for producing a silica glass blank co-doped with titanium and fluorine for use in EUV lithography includes (a) producing a TiO2—SiO2 soot body by flame hydrolysis of silicon- and titanium-containing precursor substances, (b) fluorinating the TiO2—SiO2 soot body to form a fluorine-doped TiO2—SiO2 soot body, (c) treating the fluorine-doped TiO2—SiO2 soot body in a water vapor-containing atmosphere to form a conditioned soot body, and (d) vitrifying the conditioned soot body to form the blank. The blank has an internal transmission of at least 60% in the wavelength range of 400 to 700 nm at a sample thickness of 10 mm, a mean OH content in the range of 10 to 100 wt. ppm and a mean fluorine content in the range of 2,500 to 10,000 wt. ppm. Titanium is present in the blank in the oxidation forms Ti3+ and Ti4+.

Abstract translation: 用于EUV光刻的共同掺杂钛和氟的二氧化硅玻璃毛坯的制造方法包括（a）通过含硅和钛的前体物质的火焰水解制备TiO 2 -SiO 2烟炱体，（b）氟化TiO 2 -SiO2烟灰体，形成氟掺杂的TiO 2 -SiO 2烟炱体，（c）在含水蒸气的气氛中处理氟掺杂的TiO 2 -SiO 2烟炱体以形成调节的烟灰体，（d） 烟灰体形成空白。 空白样品厚度为10mm时，在400〜700nm的波长范围内具有至少60％的内透射率，10〜100wt。范围内的平均OH含量。 ppm，平均氟含量在2500至10,000重量％的范围内。 ppm。 钛在氧化形式Ti3 +和Ti4 +中存在于坯料中。

公开(公告)号：US20160060155A1

公开(公告)日：2016-03-03

申请号：US14938069

申请日：2015-11-11

Applicant: j-plasma GmbH

Inventor： Lothar Brehm ,  Frank Coriand ,  Wolfgang Schmidt ,  Ulrich Strobel

IPC: C03B19/14

CPC classification number: C03B19/14 ,  C03B19/1407 ,  C03B19/1415 ,  C03B37/01884 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/66

Abstract: A method for producing rod lenses with an enveloping diameter of the rod lens face of up to 200 mm and an edge length of at least 800 mm. The method is characterized in that fabrication is performed from a cylindrical rod lens element made from synthetic quartz glass material configured as a fused silica ingot. This is performed using a flame hydrolysis method with a direct one stage deposition process of SIOx particles from a flame stream onto die that rotates and is moveable in a linear manner with respect to the flame stream.

公开(公告)号：US20150376049A1

公开(公告)日：2015-12-31

申请号：US14766276

申请日：2014-02-04

Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

Inventor： Stephan THOMAS ,  Klaus BECKER ,  Stefan OCHS

IPC: C03C3/06 ,  C03B25/02 ,  C03B19/14

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B25/02 ,  C03B32/00 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/52 ,  G02B5/0891 ,  G03F7/70316 ,  G03F7/70958

Abstract: A blank of TiO2—SiO2 glass for a mirror substrate for use in EUV lithography has a low need for adaptation to optimize the progression of the coefficient of thermal expansion, and consequently also the progression of the zero crossing temperature Tzc. The TiO2—SiO2 glass has at a mean value of the fictive temperature Tf in the range between 920° C. and 970° C. a dependence expressed as the differential quotient dTzc/dTf of its zero crossing temperature Tzc on the fictive temperature Tf of less than 0.3.

Abstract translation: 用于EUV光刻的用于镜面基板的TiO 2 -SiO 2玻璃的空白对于适应以优化热膨胀系数的进展以及因此也是过零点温度Tzc的进展的需求很低。 TiO 2 -SiO 2玻璃具有在920℃和970℃之间的范围内的假想温度Tf的平均值。表示为其过零点温度Tzc的差分商dTzc / dTf对虚构温度Tf的依赖关系 小于0.3。

公开(公告)号：US20150143851A1

公开(公告)日：2015-05-28

申请号：US14395468

申请日：2013-04-16

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Martin Trommer ,  Malte Schwerin ,  Steffen Zwarg

IPC: C03B37/014 ,  C03B37/018

CPC classification number: C03B37/01446 ,  C03B19/1453 ,  C03B37/01453 ,  C03B37/018 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/23

Abstract: The following method steps are known for producing cylindrical components from synthetic quartz glass containing fluorine: producing a SiO2 soot body, removing hydroxyl groups from the soot body, loading the soot body with fluorine, post-chlorinating the soot body loaded with fluorine, and vitrifying the soot body to form the cylindrical component. In order to achieve distributions in particular of fluorine that are especially reproducibly homogeneous axially and radially, according to the invention it is proposed that a concentration of hydroxyl groups in the range of 1 to 300 weight ppm is set in the soot body upon the drying and an average fluorine content of at least 1500 weight ppm is set upon the loading with fluorine, and that loading with chlorine occurs during the post-chlorination, which loading results in an average chlorine content of at least 50 weight ppm in the synthetic quartz glass after the vitrification, under the further stipulation that the weight ratio of the contents of fluorine and chlorine is less than 30.

Abstract translation: 以下的方法步骤已知用于由含氟的合成石英玻璃制造圆柱形部件：产生SiO 2烟炱体，从烟炱体中除去羟基，用氟装载烟炱体，对装有氟的烟炱体进行后氯化和玻璃化 烟炱体形成圆柱形部件。 为了实现特别是在轴向和径向上特别可重复地均匀分布的氟的分布，根据本发明，提出在干燥后在烟灰体中设定1〜300重量ppm范围内的羟基浓度， 在加载氟时，设定至少1500重量ppm的平均氟含量，并且在后氯化期间发生氯负载，该负载导致在合成石英玻璃中的平均氯含量至少为50重量ppm 玻璃化，进一步规定氟和氯含量的重量比小于30。

公开(公告)号：US08687936B2

公开(公告)日：2014-04-01

申请号：US13706458

申请日：2012-12-06

Applicant: Sumitomo Electric Industries, Ltd.

Inventor： Tetsuya Nakanishi ,  Tatsuya Konishi ,  Kazuya Kuwahara

IPC: G02B6/00

CPC classification number: G02B6/028 ,  C03B37/02718 ,  C03B37/02727 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2205/56 ,  C03C13/045 ,  C03C13/046

Abstract: Provided is an inexpensive low-loss optical fiber suitably used in an optical transmission network. An optical fiber includes a core, an optical cladding, and a jacket. The core has a relative refractive index difference between 0.2% and 0.32% and has a refractive index volume between 9%·μm2 and 18%·μm2. The jacket has a relative refractive index difference between 0.03% and 0.20%. Glass constituting the core has a fictive temperature between 1400° C. and 1560° C. Stress remaining in the core is compressive stress. A cutoff wavelength measured on a fiber having a length of 2 m is 1300 nm or more and a cutoff wavelength measured on a fiber having a length of 100 m is 1500 nm or less. An effective area at a wavelength of 1550 nm is 110 μm2 or more. A attenuation at a wavelength of 1550 nm is 0.19 dB/km or less.

Abstract translation: 提供了适用于光传输网络的便宜的低损耗光纤。 光纤包括芯，光学包层和外壳。 芯的相对折射率差为0.2％至0.32％，折射率体积在9％·μm2和18％·μm2之间。 护套的相对折射率差为0.03％至0.20％。 构成核心的玻璃具有1400℃至1560℃之间的假想温度。芯体中的应力是压应力。 在长度为2μm的光纤上测量的截止波长为1300nm以上，在长度为100μm的光纤上测定的截止波长为1500nm以下。 1550nm波长的有效面积为110μm2以上。 在1550nm波长处的衰减为0.19dB / km或更小。

公开(公告)号：US08650912B2

公开(公告)日：2014-02-18

申请号：US13097687

申请日：2011-04-29

Applicant: Hisatoshi Otsuka ,  Kazuo Shirota

Inventor： Hisatoshi Otsuka ,  Kazuo Shirota

IPC: C03B20/00

CPC classification number: F23D14/22 ,  C03B19/1423 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/08 ,  C03B2207/12 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/36 ,  C03B2207/40 ,  F23D14/32 ,  F23L2900/07002

Abstract: A method for manufacturing quartz glass using a main burner having a multi-tube assembly having a center tube, a first enclosure tube surrounding the center tube, a second enclosure tube surrounding the first enclosure tube, a tubular shell surrounding the multi-tube assembly, and a plurality of nozzles disposed within the tubular shell, a double-tube assembly surrounding at least a forward opening of the main burner includes feeding silica-forming compound to the center tube, a combustion-supporting gas to the first enclosure tube and the nozzles, a combustible gas to the second enclosure tube and the tubular shell, and a combustion-supporting gas to the double-tube assembly, forming oxyhydrogen flame for hydrolyzing or decomposing the silica-forming compound to form silica, depositing the silica on the target, and melting and vitrifying the deposited silica into quartz glass.

Abstract translation: 一种使用具有多管组件的主燃烧器制造石英玻璃的方法，所述多管组件具有中心管，围绕中心管的第一外壳管，围绕第一外壳管的第二外壳管，围绕多管组件的管状外壳， 以及设置在所述管状壳体内的多个喷嘴，围绕所述主燃烧器的至少前部开口的双管组件包括将二氧化硅形成化合物输送到所述中心管，将燃烧载体气体输送到所述第一外壳管和所述喷嘴 ，到第二外壳管和管状壳体的可燃气体，以及到双管组件的燃烧负载气体，形成用于水解或分解二氧化硅形成化合物以形成二氧化硅的氢氧焰，将二氧化硅沉积在靶上， 并将沉积的二氧化硅熔融并玻璃化成石英玻璃。

公开(公告)号：US08596094B2

公开(公告)日：2013-12-03

申请号：US12902238

申请日：2010-10-12

Applicant: Carlos Duran ,  Kenneth Edward Hrdina ,  Ulrich Wilhelm Heinz Neukirch

Inventor： Carlos Duran ,  Kenneth Edward Hrdina ,  Ulrich Wilhelm Heinz Neukirch

IPC: C03B13/00 ,  C03B15/00 ,  C03B19/00 ,  C03B25/00 ,  C03C3/06

CPC classification number: C03B25/02 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/22 ,  C03B2201/23

Abstract: A method of making a silica glass having a uniform fictive temperature. The glass article is heated at a target fictive temperature, or heated or cooled at a rate that is less than the rate of change of the fictive temperature, for a time that is sufficient to allow the fictive temperature of the glass to come within 3° C. of the target fictive temperature. The silica glass is then cooled from the target fictive temperature to a temperature below the strain point of the glass at a cooling rate that is greater than the relaxation rate of the glass at the target fictive temperature. The silica glass has a fictive temperature that varies by less than 3° C. after the annealing step. A silica glass made by the method is also described.

Abstract translation: 制造具有均匀的假想温度的二氧化硅玻璃的方法。 将玻璃制品在目标假想温度下加热，或以低于假想温度变化率的速率加热或冷却一段足以使玻璃的假想温度达到3°的时间 C.目标虚构温度。 然后将二氧化硅玻璃从目标假想温度冷却至低于玻璃应变点的温度，其冷却速率大于目标假想温度下玻璃的松弛率。 二氧化硅玻璃具有在退火步骤之后变化小于3℃的假想温度。 还描述了通过该方法制备的二氧化硅玻璃。