Abstract:
The present invention relates to a substrate for EUV lithography optical member, comprising a silica glass containing TiO2, in which the substrate has two opposite surfaces, and the substrate has temperatures at which a coefficient of linear thermal expansion (CTE) is 0 ppb/° C. (Cross-Over Temperature: COT), and in which the two opposite surfaces have difference in the COTs of 5° C. or more.
Abstract:
On the basis of a known method for producing a blank of titanium-doped glass with a high silica content (glass) for a mirror substrate for use in EUV lithography which has a surface region that has an outer contour, is intended to be provided with a reflective coating and is specified as a highly loaded zone when the mirror substrate is used as intended, in order to provide a blank which can be produced at low cost and nevertheless meets high requirements with respect to homogeneity and freedom from blisters and striae, a procedure which comprises the following method steps is proposed: (a) producing a front body of titanium-doped high-quality glass with dimensions more than large enough to enclose the outer contour, (b) producing a cylindrical supporting body from titanium-doped glass, (c) bonding the front body and the supporting body to form a composite body, and (d) working the composite body to form the mirror substrate blank, wherein the step of producing the front body comprises a homogenizing process involving twisting a starting body obtained in the form of a strand by flame hydrolysis of a silicon-containing compound to form a front body blank, and the supporting body is formed as a monolithic glass block with less homogeneity than the front body.
Abstract:
A titania-doped quartz glass suited as an EUV lithographic member is prepared by feeding a silicon-providing reactant gas and a titanium-providing reactant gas through a burner along with hydrogen and oxygen, subjecting the reactant gases to oxidation or flame hydrolysis to form synthetic silica-titania fine particles, depositing the particles on a rotating target, and concurrently melting and vitrifying the deposited particles to grow an ingot of titania-doped quartz glass. The target is retracted such that the growth front of the ingot may be spaced a distance of at least 250 mm from the burner tip.
Abstract:
The present invention relates to a method for producing a glass body containing: hydrolyzing a silicon compound and a compound containing a metal serving as a dopant, in a flame projected from a burner to form glass fine particles; and depositing and growing the formed glass fine particles on a base material, in which a raw material mixed gas containing a gas of the silicon compound, a gas of the compound containing a metal serving as a dopant, and either one of a combustible gas and a combustion supporting gas is fed into a central nozzle (A) positioning in the center of the burner; the other gas of the combustible gas and the combustion supporting gas is fed into a nozzle (B) different from the central nozzle (A) of the burner; a combustible gas or a combustion supporting gas is arbitrarily fed into a nozzle different from the nozzles (A) and (B); and a flow rate of the raw material mixed gas is 50% or more and not more than 90% of the largest flow rate among flow rate(s) of the combustible gas(ses) and the combustion supporting gas(ses) fed from other nozzle or nozzles than the central nozzle (A).
Abstract:
A method for manufacturing a primary preform for optical fibres using an internal vapour deposition process, including the steps of: i) providing a hollow glass substrate tube having a supply side and a discharge side, ii) surrounding at least part of the hollow glass substrate tube by a furnace, iii) supplying a gas flow, doped or undoped, of glass-forming gases to the interior of the hollow glass substrate tube via the supply side thereof, iv) creating a reaction zone in which conditions such that deposition of glass will take place on the interior of the hollow glass tube are created, and v) moving the reaction zone back and forth in longitudinal direction over the hollow glass substrate tube between a reversal point located near the supply side and a reversal point located near the discharge side of the hollow glass substrate tube.
Abstract:
The present invention is to provide a TiO2—SiO2 glass having suitable thermal expansion properties as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a temperature, at which a coefficient of thermal expansion is 0 ppb/° C., falling within the range of 23±4° C. and a temperature width, in which a coefficient of thermal expansion is 0±5 ppb/° C., of 5° C. or more.
Abstract:
A titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours is suitable as the EUV lithography member.
Abstract:
A method for manufacturing a GRIN lens includes the steps of forming a wet gel provided with a concentration distribution having a different concentration of a refractive index distribution imparting metal that differs in concentration in a radial direction, drying the wet gel to form a dry gel having a bulk specific gravity ρ (g/cm3), sintering the dry gel to form a GRIN lens base material and stretching the GRIN lens base material while heating. The method is characterized in that, in the step of sintering the dry gel, partial pressures of oxygen during sintering at 800° C. or higher are 10−1 Pa or lower and also the relation between a rate of temperature increase v (° C./hr) and a bulk density ρ of the dry gel during sintering at 1,000 to 1,150° C. is defined by v≦105*EXP (−12ρ). As a result of this, the GRIN lens, which has a large numerical aperture and a small diameter, can stably and easily be manufactured.
Abstract:
The manufacture of a GRIN lens using a sol-gel process includes forming a wet gel from an alcohol solution containing a silicon alkoxide, a dopant alkoxide, and an aluminum alkoxide, first, an alcohol solution containing the silicon alkoxide and the aluminum alkoxide as is prepared, and then the dopant alkoxide is mixed thereto.
Abstract:
A method is provided for forming an optical fiber amplifier. The method comprises providing a composite preform having a gain material core that includes one or more acoustic velocity varying dopants to provide a longitudinally varying acoustic velocity profile along the gain material core to suppress Stimulated Brillouin Scattering (SBS) effects by raising the SBS threshold and drawing the composite preform to form the optical fiber amplifier.