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    Synthetic fused silica member
    83.
    发明授权
    Synthetic fused silica member 有权
    合成熔融石英片

    公开(公告)号：US06333284B1

    公开(公告)日：2001-12-25

    申请号：US09520442

    申请日：2000-03-07

    Applicant: Hisatoshi Otsuka ,  Kazuo Shirota ,  Kazuhiro Kumakura

    Inventor： Hisatoshi Otsuka ,  Kazuo Shirota ,  Kazuhiro Kumakura

    IPC: C03C306

    CPC classification number: C03C3/06 ,  C03C2201/12 ,  C03C2201/23

    Abstract: There is disclosed a synthetic fused silica member used at a wavelength of 200 nm or less which has a hydroxyl group-content of 1 to 50 ppm and a fluorine-content of 100 to 1000 ppm, and contains no chlorine, and has a birefringence of the synthetic fused silica member of 2 nm/cm or less. The synthetic fused silica member can be used as a synthetic fused silica substrate for photomask, or in an optical system wherein a fluorine excimer laser is used as a light source. There can be provided a synthetic fused silica member which can efficiently transmit a light having a wavelength as 200 nm or less, especially fluorine excimer laser (157 nm), and does not suffer from lowering of transmittance due to damage.

    Abstract translation: 公开了在200nm以下的波长下使用的合成石英玻璃构件，其羟基含量为1〜50ppm，氟含量为100〜1000ppm，不含氯，并且具有双折射率 合成石英玻璃成分为2nm / cm以下。 合成石英玻璃构件可用作光掩模的合成熔融二氧化硅基板，或其中使用氟准分子激光作为光源的光学系统。 可以提供能够有效透射波长为200nm以下的光，特别是氟准分子激光（157nm）的合成石英玻璃构件，不会由于损伤而导致透光率降低。

    Projection lithography photomasks and methods of making
    84.
    发明授权
    Projection lithography photomasks and methods of making 失效
    投影光刻光掩模和制作方法

    公开(公告)号：US06319634B1

    公开(公告)日：2001-11-20

    申请号：US09397572

    申请日：1999-09-16

    Applicant: George Edward Berkey ,  Lisa Anne Moore ,  Michelle Diane Pierson

    Inventor： George Edward Berkey ,  Lisa Anne Moore ,  Michelle Diane Pierson

    IPC: G03F900

    CPC classification number: C03C4/0085 ,  C03B19/1453 ,  C03B19/1469 ,  C03B23/043 ,  C03B23/045 ,  C03B23/051 ,  C03B23/07 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C3/06 ,  C03C2201/12 ,  C03C2203/50 ,  G03F1/60

    Abstract: The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content ≦10 ppm, a F wt. % concentration ≧0.5 wt. %.

    Abstract translation: 本发明是制造光刻光掩模和光掩模坯料的方法。 制造光刻光掩模和光掩模坯料的方法包括提供OH含量低于50ppm的氟氧化硅玻璃管。 该方法还包括切割氟氧化硅玻璃管，使氟氧化硅玻璃管扁平化，并将扁平切割的氟氧化硅玻璃管形成具有平坦表面的光掩模坯料。 本发明包括玻璃光刻掩模预制件。 玻璃光刻掩模预制件是具有OH含量<= 10ppm的纵向硅氧氟化物玻璃管，F wt。 ％浓度> = 0.5wt。 ％。

    Synthetic quartz glass and production process
    85.
    发明申请
    Synthetic quartz glass and production process 失效
    合成石英玻璃及生产工艺

    公开(公告)号：US20010018834A1

    公开(公告)日：2001-09-06

    申请号：US09747953

    申请日：2000-12-27

    Inventor： Koji Matsuo ,  Hisatoshi Otsuka ,  Kazuo Shirota

    IPC: C03B019/01 ,  C03B037/018 ,  C03B020/00

    CPC classification number: C03B19/1423 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/36 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/40

    Abstract: A process for producing synthetic quartz glass using a burner composed of a plurality of concentric nozzles involves the steps of feeding a silica-forming raw material gas and a fluorine compound gas to a reaction zone from a center nozzle, feeding oxygen gas from a second nozzle outside the center nozzle, and feeding oxygen gas and/or hydrogen gas from a third nozzle. The silica-forming raw material gas is hydrolyzed to form fine particles of silica, which particles are deposited on a rotatable substrate so as to form a porous silica matrix, which is then fused to give the quartz glass. The flow rate of the oxygen gas fed from the second nozzle and the flow rate of the raw material gas are controlled so as to provide a 1.1- to 3.5-fold stoichiometric excess of oxygen. The excess oxygen suppresses SinullSi bond formation in the quartz glass, enabling the production of synthetic quartz glass having a high transmittance in the vacuum ultraviolet region.

    Abstract translation: 使用由多个同心喷嘴构成的燃烧器来生产合成石英玻璃的方法包括以下步骤：将来自中心喷嘴的二氧化硅生成原料气体和氟化合物气体供给到反应区域，从第二喷嘴 在中心喷嘴外部，并且从第三喷嘴供给氧气和/或氢气。 二氧化硅形成原料气体被水解以形成二氧化硅细颗粒，该颗粒沉积在可转动的基底上，以便形成多孔二氧化硅基质，然后熔化以得到石英玻璃。 控制从第二喷嘴供给的氧气的流量和原料气体的流量，从而提供1.1-3.5倍化学计量的过量的氧气。 过量的氧抑制石英玻璃中的Si-Si键的形成，能够在真空紫外线区域中制造具有高透射率的合成石英玻璃。

    Method for fabricating high-purity silica glass using sol-gel processing
    86.
    发明申请
    Method for fabricating high-purity silica glass using sol-gel processing 失效
    使用溶胶 - 凝胶法制造高纯度二氧化硅玻璃的方法

    公开(公告)号：US20010009102A1

    公开(公告)日：2001-07-26

    申请号：US09750510

    申请日：2000-12-28

    Applicant: SAMSUNG ELECTRONIC CO., LTD.

    Inventor： Jeong-Hyun Oh ,  Mi-Kyung Lee

    IPC: C03B008/02 ,  C03B037/016

    CPC classification number: C03B19/12 ,  C03B2201/12 ,  C03C1/006 ,  C03C2201/12 ,  C03C2203/20 ,  C03C2203/22 ,  C03C2203/30 ,  C03C2203/34

    Abstract: Disclosed is a method for fabricating high-purity silica glass using a sol-gel processing that includes the steps of: (a) mixing a deionized water with a fluorine compound and a dispersion agent to prepare an aqueous premix solution; (b) mixing the aqueous premix solution with a fumed silica; (c) mixing the resulting mixture to form a dispersed sol; (d) aging the sol at the ambient temperature to stabilize silica particles; and, (e) removing air voids from the sol and adding a gelation agent.

    Abstract translation: 公开了一种使用溶胶 - 凝胶法制造高纯度二氧化硅玻璃的方法，该方法包括以下步骤：（a）将去离子水与氟化合物和分散剂混合以制备含水预混物溶液; （b）将水性预混物溶液与煅制二氧化硅混合; （c）将所得混合物混合以形成分散的溶胶; （d）在环境温度下老化溶胶以稳定二氧化硅颗粒; 和（e）从溶胶中除去空气空隙并加入凝胶剂。

    Dispersion-compensating fiber and method of fabricating the same
    88.
    发明授权
    Dispersion-compensating fiber and method of fabricating the same 失效
    色散补偿光纤及其制造方法

    公开(公告)号：US5740297A

    公开(公告)日：1998-04-14

    申请号：US705993

    申请日：1996-08-30

    Applicant: Masashi Onishi ,  Chie Fukuda ,  Hiroo Kanamori

    Inventor： Masashi Onishi ,  Chie Fukuda ,  Hiroo Kanamori

    IPC: C03B37/012 ,  C03B37/027 ,  C03C13/04 ,  G02B6/22

    CPC classification number: G02B6/02261 ,  C03B37/01211 ,  C03B37/027 ,  C03C13/045 ,  G02B6/03627 ,  G02B6/03644 ,  G02B6/03655 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/31 ,  C03B2203/22 ,  C03B2203/222 ,  C03B2203/23 ,  C03B2203/26 ,  C03B2203/36 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/31

    Abstract: This invention relates to a dispersion-compensating fiber which can be drawn at a lower temperature and can further reduce optical transmission loss. This dispersion-compensating fiber comprises a core portion containing a high concentration of GeO.sub.2 and a cladding portion formed around the outer periphery of the core portion. The cladding portion comprises a first cladding containing fluorine or the like as an index reducer, a second cladding having a higher refractive index than that of the first cladding, and a third cladding which becomes a glass region substantially noncontributory to propagation of signal light. In particular, the third cladding contains a desired impurity such that the glass viscosity thereof becomes lower than that of the second cladding or pure silica cladding at a predetermined temperature.

    Abstract translation: 本发明涉及一种可在较低温度下拉制并能进一步降低光传输损耗的色散补偿光纤。 这种色散补偿光纤包括含有高浓度GeO 2的核心部分和形成在芯部分的外周周围的包层部分。 包层部分包括含有氟等作为折射率减少器的第一包层，具有比第一包层的折射率高的第二包层，以及变成与信号光的传播基本上不相容的玻璃区域的第三包层。 特别地，第三包层包含期望的杂质，使得其玻璃粘度在预定温度下变得低于第二包层或纯二氧化硅包层的玻璃粘度。

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