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公开(公告)号：US20130112890A1
公开(公告)日：2013-05-09
申请号：US13601818
申请日：2012-08-31
Applicant: N. William Parker , Wesley Hughes
Inventor： N. William Parker , Wesley Hughes
IPC: H01J3/18
CPC classification number: H01J37/05 , H01J37/3056 , H01J2237/043 , H01J2237/057 , H01J2237/1534
Abstract: A multi-element electrostatic chicane energy filter, with the addition of electrostatic quadrupole and hexapole excitations to the dipole elements. A charged particle energy filter according to the present invention with a combination of dipole, quadrupole, and hexapole elements capable of producing a line focus at an aperture reduces space-charge effects and aperture damage. A preferred embodiment allows the filter to act as a conjugate blanking system. The energy filter is capable of narrowing the energy spread to result in a smaller beam.
Abstract translation: 多元素静电智能能量滤波器，向偶极子元件添加静电四极和六极激发。 根据本发明的具有能够在孔处产生线焦点的偶极子，四极和六极元件的组合的带电粒子能量过滤器减少了空间电荷效应和孔径损伤。 优选的实施方案允许过滤器充当共轭体消隐系统。 能量过滤器能够使能量扩展变窄，导致较小的光束。
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公开(公告)号：US08399852B2
公开(公告)日：2013-03-19
申请号：US13303941
申请日：2011-11-23
Applicant: Alexander Klein , Matthew Wittman , Scott Rackey
Inventor： Alexander Klein , Matthew Wittman , Scott Rackey
Abstract: The systems and methods described herein relate to the use of electrostatic elements or combinations of electrostatic and magnetic elements to confine charged particles in stable recirculating, trapped orbits. More particularly, the invention relates to systems and methods for acceleration and focusing of multiple charged particle beams having multiple energies and arbitrary polarities along a common axis.
Abstract translation: 本文所述的系统和方法涉及使用静电元件或静电和磁性元件的组合来将带电粒子限制在稳定的再循环的被捕获的轨道中。 更具体地说，本发明涉及用于沿公共轴加速和聚焦具有多个能量和任意极性的多个带电粒子束的系统和方法。
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公开(公告)号：US20130009070A1
公开(公告)日：2013-01-10
申请号：US12934966
申请日：2009-03-23
Applicant: Akira Onoguchi , Kyoko Onoguchi , Kenichi Obori , Koichi Matsumoto , Shogo Awata , Satoshi Ohashi
Inventor： Akira Onoguchi , Kyoko Onoguchi , Kenichi Obori , Koichi Matsumoto , Shogo Awata , Satoshi Ohashi
IPC: H01J3/18
CPC classification number: H01J37/12 , H01J2237/121 , H01J2237/28
Abstract: Provided is an electrostatic lens for charged particle radiation with a lens performance relatively comparable to that of a magnetic type lens. A plurality of electrodes arranged on the incident side of charged particles form a first electric field area, wherein orbit radii of the charged particles are reduced without exceeding, on the way, the initial orbit radii that are orbit radii at the incident time, and a second electric field area, wherein force in the direction advancing in parallel with a central axis is applied to the charged particles that have passed through the first electric field area. A plurality of electrodes arranged on the projection side form a third electric field area, wherein the orbit radii of the charged particles do not exceed the initial orbit radii on the way and are curved to intersect with a central axis at angles larger than orbit angles defined with respect to the central axis of when the charged particles are projected from the second electric field area.
Abstract translation: 提供一种用于带电粒子辐射的静电透镜，其具有与磁性透镜相当的透镜性能。 布置在带电粒子的入射侧的多个电极形成第一电场区域，其中带电粒子的轨道半径减小而不超过在入射时为轨道半径的初始轨道半径， 第二电场区域，其中在与中心轴平行的方向上的力施加到已经通过第一电场区域的带电粒子。 布置在投影侧的多个电极形成第三电场区域，其中带电粒子的轨道半径在途中不超过初始轨道半径，并且弯曲成与中心轴相交，角度大于所定义的轨道角度 相对于带电粒子从第二电场区域突出时的中心轴线。
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公开(公告)号：US20120319001A1
公开(公告)日：2012-12-20
申请号：US13493833
申请日：2012-06-11
Applicant: Koichi Tsunoda
Inventor： Koichi Tsunoda
IPC: H01J3/18
CPC classification number: H01J37/12 , H01J2237/1205
Abstract: An electrostatic charged particle beam lens in a charged particle beam exposure apparatus includes a first electrode having at least one aperture; a second electrode having at least one aperture; and a supporting body disposed between the first electrode and the second electrode, the supporting body being configured to support the first electrode and the second electrode such that the first electrode and the second electrode are electrically separated from each other. The supporting body is made of alkali-free glass or low-alkali glass.
Abstract translation: 带电粒子束曝光装置中的静电带电粒子束透镜包括具有至少一个孔径的第一电极; 具有至少一个孔的第二电极; 以及设置在所述第一电极和所述第二电极之间的支撑体，所述支撑体被配置为支撑所述第一电极和所述第二电极，使得所述第一电极和所述第二电极彼此电分离。 支撑体由无碱玻璃或低碱玻璃制成。
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公开(公告)号：US20120280121A1
公开(公告)日：2012-11-08
申请号：US13101008
申请日：2011-05-04
Applicant: Gangqiang Li
Inventor： Gangqiang Li
CPC classification number: H01J49/405 , H01J3/16
Abstract: Devices and systems for reflecting ions are provided. In general, the devices and systems include a plurality of curved lens plates adapted for connection to at least one voltage source and having a passage therein to allow the ions to pass therethrough. The plurality of curved lens plates generates electric fields having elliptic equipotential surfaces that reflect and focus the ions as they pass through the passage. Reflectron time-of-flight (RE-TOF) spectrometers are also provided that include an ion source, ion detector, and such a reflectron as described above. Mass spectrometer systems are provided that comprise an ion source that generates ions and a reflectron TOF spectrometer such as described above.
Abstract translation: 提供了用于反射离子的装置和系统。 通常，装置和系统包括适于连接至少一个电压源的多个弯曲透镜板，并且其中具有允许离子通过的通道。 多个弯曲透镜板产生具有椭圆等电位面的电场，它们在通过通道时反射和聚焦离子。 还提供了反射器飞行时间（RE-TOF）光谱仪，其包括如上所述的离子源，离子检测器和反射器。 提供包括产生离子的离子源和如上所述的反射体TOF光谱仪的质谱仪系统。
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Patent Agency Ranking
公开(公告)号：US20120187306A1
公开(公告)日：2012-07-26
申请号：US13303941
申请日：2011-11-23
Applicant: Alexander Klein , Matthew Wittman , Scott Rackey
Inventor： Alexander Klein , Matthew Wittman , Scott Rackey
Abstract: The systems and methods described herein relate to the use of electrostatic elements or combinations of electrostatic and magnetic elements to confine charged particles in stable recirculating, trapped orbits. More particularly, the invention relates to systems and methods for acceleration and focusing of multiple charged particle beams having multiple energies and arbitrary polarities along a common axis.
Abstract translation: 本文所述的系统和方法涉及使用静电元件或静电和磁性元件的组合来将带电粒子限制在稳定的再循环的被捕获的轨道中。 更具体地说，本发明涉及用于沿公共轴加速和聚焦具有多个能量和任意极性的多个带电粒子束的系统和方法。
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公开(公告)号：US20120145916A1
公开(公告)日：2012-06-14
申请号：US13397814
申请日：2012-02-16
Applicant: Marco Jan Jaco WIELAND , Alexander Hendrik Vincent VAN VEEN
IPC: H01J3/18
CPC classification number: H01J37/10 , B82Y10/00 , B82Y40/00 , H01J37/147 , H01J37/1471 , H01J37/1478 , H01J37/30 , H01J37/3007 , H01J37/3177 , H01J2237/0437 , H01J2237/0492
Abstract: The invention relates to a charged particle multi-beamlet lithographic system for exposing a target using a plurality of beamlets. The system comprises a beamlet generator for generating a plurality of beamlets, a beamlet blanker for controllably blanking beamlets, and an array of projection lens systems for projecting unblanked beamlets on to the surface of the target. The beamlet generator comprises at least one charged particle source for generating a charged particle beam, a sub-beam generator for defining a plurality of sub-beams from the charged particle beam, a sub-beam manipulator array for influencing the sub-beams, and an aperture array for defining beamlets from the sub-beams.
Abstract translation: 本发明涉及一种用于使用多个子束曝光目标的带电粒子多子束光刻系统。 该系统包括用于产生多个子束的子波发生器，用于可控制地遮挡子束的子束消除器，以及用于将未平坦化的子束投影到目标表面上的投影透镜系统的阵列。 小波发生器包括用于产生带电粒子束的至少一个带电粒子源，用于从带电粒子束定义多个子光束的子光束发生器，用于影响子光束的子光束操纵器阵列，以及 用于从子光束定义子束的孔径阵列。
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公开(公告)号：US20110147605A1
公开(公告)日：2011-06-23
申请号：US12914252
申请日：2010-10-28
Applicant: Roland JANZEN
Inventor： Roland JANZEN
IPC: H01J3/18
CPC classification number: H01J37/153 , B82Y10/00 , B82Y40/00 , H01J37/12 , H01J37/26 , H01J37/3177 , H01J2237/1205 , H01J2237/121 , H01J2237/1516 , H01J2237/1532
Abstract: A correction device for a charged particle beam device for decreasing, correcting or inverting (that is adjusting) the spherical aberration of a charged particle beam is described. The correction principle is similar to that of common multipole-Correctors. But unlike common devices of that kind this new correction device gets along entirely with plane apertures having specially shaped holes in order to supply the multipoles required for correction and is therefore predestined for miniaturization and the use in multi column devices.
Abstract translation: 描述了用于减少，校正或反转（即调整）带电粒子束的球面像差的带电粒子束装置的校正装置。 校正原理与普通多极校正器相似。 但是与这种常见的装置不同，这种新的校正装置完全与具有特殊形状的孔的平面孔相交，以便提供校正所需的多极，因此被预定为用于小型化和在多列装置中的使用。
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公开(公告)号：US20100270474A1
公开(公告)日：2010-10-28
申请号：US11990067
申请日：2006-08-08
Applicant: Elmar Platzgummer , Gerhard Stengl , Helmut Falkner
Inventor： Elmar Platzgummer , Gerhard Stengl , Helmut Falkner
CPC classification number: H01J37/12 , B82Y10/00 , B82Y40/00 , H01J37/3177
Abstract: The present invention relates to a multi-beamlet multi-column particle-optical system comprising a plurality of columns which are disposed in an array for simultaneously exposing a substrate, each column having an optical axis and comprising: a beamlet generating arrangement comprising at least one multi-aperture plate for generating a pattern of multiple beamlets of charged particles, and an electrostatic lens arrangement comprising at least one electrode element; the at least one electrode element having an aperture defined by an inner peripheral edge facing the optical axis, the aperture having a center and a predetermined shape in a plane orthogonal to the optical axis; wherein in at least one of the plurality of columns, the predetermined shape of the aperture is a non-circular shape with at least one of a protrusion and an indentation from an ideal circle about the center of the aperture.
Abstract translation: 多子束多列粒子光学系统技术领域本发明涉及一种多子束多列粒子光学系统，该多子束多列粒子光学系统包括多个列，其被布置成阵列以同时暴露衬底，每个列具有光轴，并且包括：子束产生装置，其包括至少一个 用于产生多个带电粒子束的图案的多孔板，以及包括至少一个电极元件的静电透镜装置; 所述至少一个电极元件具有由面向光轴的内周边缘限定的孔，所述孔在与所述光轴正交的平面中具有中心和预定形状; 其中在所述多个列中的至少一个列中，所述孔的预定形状是非圆形形状，其具有围绕所述孔的中心的来自理想圆的突起和凹陷中的至少一个。
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公开(公告)号：US20090026384A1
公开(公告)日：2009-01-29
申请号：US12181171
申请日：2008-07-28
Applicant: Pavel ADAMEC , Carlo SALVESEN , Ivo LISKA
Inventor： Pavel ADAMEC , Carlo SALVESEN , Ivo LISKA
CPC classification number: H01J37/12 , H01J37/145 , H01J2237/032 , H01J2237/038 , H01J2237/121 , H01J2237/1405 , H01J2237/28
Abstract: A lens assembly having an electrostatic lens component for a charged particle beam system is provided. The assembly includes: a first electrode having a conically shaped portion, a second electrode having a conically shaped portion, and a first insulator having a conically shaped portion, wherein the first insulator comprises two extending portions towards each of its ends, and wherein the two extending portions are formed to generate a gap between the insulator and each of the adjacent electrodes.
Abstract translation: 提供一种具有用于带电粒子束系统的静电透镜部件的透镜组件。 组件包括：具有锥形部分的第一电极，具有锥形部分的第二电极和具有锥形部分的第一绝缘体，其中第一绝缘体包括朝向其每个端部的两个延伸部分，并且其中两个 形成延伸部分以在绝缘体和每个相邻电极之间产生间隙。
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