公开(公告)号：US12057290B2

公开(公告)日：2024-08-06

申请号：US17572767

申请日：2022-01-11

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Hans Fritz ,  Ingo Mueller

IPC: H01J37/317 ,  H01J37/10 ,  H01J37/145 ,  H01J37/147 ,  H01J37/26 ,  H01J37/302

CPC classification number: H01J37/3177 ,  H01J37/10 ,  H01J37/145 ,  H01J37/147 ,  H01J37/263 ,  H01J37/3023 ,  H01J2237/0453 ,  H01J2237/04926

Abstract: A method includes operating a multiple particle beam system at different working points. The numerical aperture can be set for each of the working points in such a way that the resolution of the multiple particle beam system is optimal. In the process, the beam pitch between adjacent individual particle beams on the sample to be scanned is kept constant as a boundary condition. There are no mechanical reconfigurations of the system whatsoever for the purposes of varying the numerical aperture.

公开(公告)号：US20240242933A1

公开(公告)日：2024-07-18

申请号：US18509474

申请日：2023-11-15

Applicant: NuFlare Technology, Inc.

Inventor： Hirofumi MORITA ,  Haruyuki NOMURA

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/141 ,  H01J37/145

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/141 ,  H01J37/145

Abstract: A multi charged particle beam writing apparatus includes two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus the beam on a substrate, n (n≥3) correction lenses correcting an imaging state of the multi charged particle beam, and an electric field control electrode to which a positive constant voltage with respect to the substrate is applied. The electric field control electrode generates an electric field between the substrate and the electrode. The objective lenses include a first objective lens, and a second objective lens placed most downstream in a travel direction of the beam. m (n≥m≥1) correction lenses of the n correction lenses are magnetic correction lenses placed in a lens magnetic field of the second objective lens. (n−m) correction lenses are placed upstream of the lens magnetic field of the second objective lens in the travel direction.

公开(公告)号：US20240242922A1

公开(公告)日：2024-07-18

申请号：US18493961

申请日：2023-10-25

Applicant: NuFlare Technology, Inc.

Inventor： Hirofumi MORITA ,  Haruyuki NOMURA

IPC: H01J37/153 ,  H01J37/04 ,  H01J37/09 ,  H01J37/145 ,  H01J37/317

CPC classification number: H01J37/153 ,  H01J37/045 ,  H01J37/09 ,  H01J37/145 ,  H01J37/3174 ,  H01J2237/04735 ,  H01J2237/31754 ,  H01J2237/31774

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus the multi charged particle beam on a substrate, which has passed through the limiting aperture member, three or more correction lenses correcting an imaging state of the multi charged particle beam on the substrate, and an electric field control electrode to which a positive constant voltage with respect to the substrate is applied, the electric field control electrode generating an electric field between the substrate and the electric field control electrode. The two or more-stage objective lenses include a first objective lens, and a second objective lens placed most downstream in a travel direction of the multi charged particle beam. The three or more correction lenses are placed upstream of a lens magnetic field of the second objective lens in the travel direction of the multi charged particle beam.

公开(公告)号：US20240242920A1

公开(公告)日：2024-07-18

申请号：US18482093

申请日：2023-10-06

Applicant: NuFlare Technology, Inc.

Inventor： Hirofumi MORITA

IPC: H01J37/145 ,  H01J37/153 ,  H01J37/21 ,  H01J37/317

CPC classification number: H01J37/145 ,  H01J37/153 ,  H01J37/21 ,  H01J37/3177 ,  H01J37/045

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes an acceleration lens comprised of an electrostatic lens including a plurality of electrodes and configured to accelerate a multi charged particle beam, two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus the multi charged particle beam on a substrate, which has passed through a limiting aperture member, and three or more correction lenses including a first correction lens, a second correction lens and a third correction lens, and configured to correct an imaging state of the multi charged particle beam on the substrate. One or no electrostatic correction lens is placed in a magnetic field of each of the two or more-stage objective lenses. The first correction lens is an electrostatic correction lens that also serves as at least one of the plurality of electrodes of the acceleration lens.

公开(公告)号：US20230420224A1

公开(公告)日：2023-12-28

申请号：US18230722

申请日：2023-08-07

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Andreas Schmaunz

IPC: H01J37/32 ,  H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J37/304

CPC classification number: H01J37/32449 ,  H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/006 ,  H01J2237/2065

Abstract: Operating a gas feed device for a particle beam apparatus includes predetermining a flow rate of a precursor through an outlet of a precursor reservoir containing the precursor to be fed onto an object, loading a temperature of the precursor reservoir, the temperature being associated with the predetermined flow rate, from a database into a control unit, setting a temperature of the precursor reservoir to the temperature loaded from the database using a temperature setting unit, and determining at least one functional parameter of the precursor reservoir depending on the flow rate and the temperature, loaded from the database, using the control unit and informing a user of the gas feed device about the determined functional parameter. Informing the user of the gas feed device about the functional parameter may include displaying the functional parameter on a display unit, outputting an optical signal, or outputting an acoustic signal.

公开(公告)号：US11837431B2

公开(公告)日：2023-12-05

申请号：US16018008

申请日：2018-06-25

Applicant: Hermes Microvision, Inc.

Inventor： Shuai Li ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/145 ,  H01J37/28 ,  H01J37/141

CPC classification number: H01J37/145 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/1477

Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).

公开(公告)号：US11764028B2

公开(公告)日：2023-09-19

申请号：US17056993

申请日：2018-05-22

Applicant: Hitachi High-Tech Corporation

Inventor： Yuta Imai ,  Masahiro Sasajima ,  Yoshihiro Takahoko

IPC: H01J37/14 ,  H01J37/15 ,  H01J37/21 ,  H01J37/28 ,  H01J37/145 ,  H01J37/12 ,  H01J37/141

CPC classification number: H01J37/145 ,  H01J37/15 ,  H01J37/21 ,  H01J37/12 ,  H01J37/141 ,  H01J37/28

Abstract: A charged particle beam device is provided in which axis adjustment as a superimposing lens is facilitated by aligning an axis of an electrostatic lens resulting from a deceleration electric field with an axis of a magnetic field lens. The charged particle beam device includes: an electron source; an objective lens that focuses a probe electron beam from the electron source on a sample; a first beam tube and a second beam tube through each of which the probe electron beam passes; a deceleration electrode arranged between the first beam tube and a sample; a first voltage source that forms a deceleration electric field for the probe electron beam between the first beam tube and the deceleration electrode by applying a first potential to the first beam tube; and a first moving mechanism that moves a position of the first beam tube.

公开(公告)号：US20230170182A1

公开(公告)日：2023-06-01

申请号：US17921737

申请日：2020-04-28

Applicant: Hitachi High-Tech Corporation

Inventor： Kazufumi YACHI ,  Muneyuki FUKUDA ,  Ichiro TACHIBANA ,  Hiroya OHTA

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/145

CPC classification number: H01J37/28 ,  H01J37/145 ,  H01J37/244 ,  H01J2237/057 ,  H01J2237/2806

Abstract: Proposed is a charged particle beam apparatus for the purpose of detecting a charged particle emitted from a sample in a specific direction by discriminating between the charged particle and a charged particle emitted in another direction. As one aspect of achieving the above purpose, proposed is a charged particle beam apparatus including an objective lens configured to focus a beam emitted from a charged particle source, a detector (8) configured to detect at least one of a first charged particle (23) emitted from a sample by irradiating the sample with the beam and a second charged particle emitted from a charged particle collided member by causing the first charged particle to collide with the charged particle collision member disposed on a trajectory of the first charged particle, and an electrostatic lens (12) including a plurality of electrodes disposed between the objective lens and the detector, in which the electrostatic lens is a Butler type.

公开(公告)号：US10074513B2

公开(公告)日：2018-09-11

申请号：US15414517

申请日：2017-01-24

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Alon Litman ,  Efim Vinnitsky ,  Ofir Arzouan ,  Igor Petrov

IPC: H01J37/244 ,  H01J37/28 ,  H01J37/20

CPC classification number: H01J37/244 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/047 ,  H01J2237/2445 ,  H01J2237/24475 ,  H01J2237/2448

Abstract: A method for evaluating a specimen includes positioning a detector in an inserted position in which a first distance between a tip of the detector and a plane extending along a surface of the specimen is less than a distance between the plane and a tip of charged particle beam optics. While maintaining the detector at the inserted position, the surface of the specimen is scanned by a primary beam that exits from the tip of the charged particle beam optics. The detector detects x-ray photons and/or charged particles emitted or reflected from the specimen as a result of scanning the specimen with the primary beam. After completion of the scanning, the detector is positioned at a retracted position in which a second distance between the tip of the detector and the plane exceeds a distance between the tip of the charged particle beam optics and the plane.

公开(公告)号：US10008360B2

公开(公告)日：2018-06-26

申请号：US15007873

申请日：2016-01-27

Applicant: Hermes-Microvision, Inc.

Inventor： Shuai Li ,  Zhongwei Chen

IPC: H01J37/14 ,  H01J37/145 ,  H01J37/147 ,  H01J37/141

CPC classification number: H01J37/145 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/1477

Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).