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    DC offset estimation and compensaton for wideband systems
    1.
    发明授权
    DC offset estimation and compensaton for wideband systems 有权
    宽带系统的直流偏移估计和补偿

    公开(公告)号：US08953716B1

    公开(公告)日：2015-02-10

    申请号：US13611731

    申请日：2012-09-12

    Applicant: GuruGuha Venkatasubramanian ,  Balasubramanian Ramachandran

    Inventor： GuruGuha Venkatasubramanian ,  Balasubramanian Ramachandran

    IPC: H03K9/00

    CPC classification number: H04L25/061

    Abstract: Systems, methods, and other embodiments associated with a DC notch gear filter are described. According to one embodiment, an apparatus includes a digital high pass filter having a cutoff frequency and a gear mechanism configured to successively change the cutoff frequency of the high pass filter based on a sequence of cutoff frequencies. The apparatus also includes a direct current (DC) estimator configured to estimate a DC offset of a digital input signal to the high pass filter based, at least in part, on an output signal of the high pass filter as a cutoff frequency is successively changed. A direct current (DC) compensator is configured to subtract the estimated DC offset from the input signal to the high pass filter.

    Abstract translation: 描述了与直流凹口齿轮过滤器相关联的系统，方法和其它实施例。 根据一个实施例，一种装置包括具有截止频率和齿轮机构的数字高通滤波器，其被配置为基于截止频率序列连续改变高通滤波器的截止频率。 该装置还包括直流（DC）估计器，其被配置为至少部分地基于高通滤波器的输出信号来估计数字输入信号对高通滤波器的DC偏移，因为截止频率被连续地改变 。 直流（DC）补偿器被配置为从估计的直流偏移从输入信号减去高通滤波器。

    Lamp with internal fuse system
    2.
    发明授权
    Lamp with internal fuse system 有权
    带内部保险丝系统的灯

    公开(公告)号：US08217574B2

    公开(公告)日：2012-07-10

    申请号：US12753532

    申请日：2010-04-02

    Applicant: Balasubramanian Ramachandran ,  Nyi Oo Myo ,  Joseph M. Ranish ,  Akio Takahashi

    Inventor： Balasubramanian Ramachandran ,  Nyi Oo Myo ,  Joseph M. Ranish ,  Akio Takahashi

    IPC: H01K1/66 ,  H01K1/62

    CPC classification number: H01K1/66

    Abstract: Embodiments of a lamp having an internal fuse system are provided herein. In some embodiments, a lamp may include a transparent housing; a filament disposed in the housing, the filament having a main body disposed between a first end and a second end of the filament; a first conductor coupled to the filament at the first end of the filament; a first interceptor bar disposed in the housing and beneath the main body of the filament, wherein the first interceptor bar is coupled to the second end of the filament; a second conductor disposed proximate the first end of the filament and conductively coupled to the second end of the filament via the first interceptor bar, wherein the first interceptor bar is positioned such that an electrical short forms between the first and second conductors when the main body of the filament contacts the first interceptor bar.

    Abstract translation: 本文提供具有内部熔丝系统的灯的实施例。 在一些实施例中，灯可以包括透明外壳; 布置在所述壳体中的细丝，所述细丝具有设置在所述细丝的第一端和第二端之间的主体; 在灯丝的第一端处耦合到灯丝的第一导体; 设置在所述壳体中并在所述灯丝主体下方的第一拦截棒，其中所述第一拦截杆连接到所述灯丝的第二端; 第二导体，其设置在灯丝的第一端附近并且经由第一拦截棒与导电丝的第二端导电连接，其中第一拦截棒被定位成使得当主体 的灯丝接触第一拦截棒。

    Optical endpoint detection system
    6.
    发明授权
    Optical endpoint detection system 有权
    光端点检测系统

    公开(公告)号：US09347132B2

    公开(公告)日：2016-05-24

    申请号：US13440564

    申请日：2012-04-05

    Applicant: Balasubramanian Ramachandran ,  Masato Ishii ,  Aaron Muir Hunter

    Inventor： Balasubramanian Ramachandran ,  Masato Ishii ,  Aaron Muir Hunter

    IPC: B08B3/00 ,  C23C16/44 ,  H01L21/67 ,  C23C16/52

    CPC classification number: B08B9/46 ,  B08B3/08 ,  B08B3/10 ,  C23C16/4405 ,  C23C16/52 ,  G01N21/94 ,  G01N2021/8416 ,  H01L21/67253

    Abstract: Methods and apparatus for determining an endpoint of a process chamber cleaning process are provided. In some embodiments, a processing system having an endpoint detection system may include a process chamber having internal surfaces requiring periodic cleaning due to processes performed in the process chamber; and an endpoint detection system that includes a light detector positioned to detect light reflected off of a first internal surface of the process chamber; and a controller coupled to the light detector and configured to determine an endpoint of a cleaning process based upon the detected reflected light.

    Abstract translation: 提供了用于确定处理室清洁过程的端点的方法和装置。 在一些实施例中，具有端点检测系统的处理系统可以包括处理室，其具有由于处理室中执行的处理而需要定期清洁的内表面; 以及端点检测系统，其包括被定位成检测从所述处理室的第一内表面反射的光的光检测器; 以及耦合到光检测器并被配置为基于检测到的反射光来确定清洁处理的端点的控制器。

    Method and apparatus for reducing patterning effects on a substrate during radiation-based heating
    9.
    发明授权
    Method and apparatus for reducing patterning effects on a substrate during radiation-based heating 有权
    用于在基于辐射的加热期间减少对基板的图案化影响的方法和装置

    公开(公告)号：US08513626B2

    公开(公告)日：2013-08-20

    申请号：US11622908

    申请日：2007-01-12

    Applicant: Balasubramanian Ramachandran ,  Joseph Michael Ranish ,  Aaron Muir Hunter

    Inventor： Balasubramanian Ramachandran ,  Joseph Michael Ranish ,  Aaron Muir Hunter

    IPC: G02B5/00

    CPC classification number: H01L21/67248 ,  H01L21/67115

    Abstract: Patterning effects on a substrate are reduced during radiation-based heating by filtering the radiation source or configuring the radiation source to produce radiation having different spectral characteristics. For the filtering, an optical filter may be used to truncate specific wavelengths of the radiation. The different configurations of the radiation source include a combination of one or more continuum radiation sources with one or more discrete spectrum sources, a combination of multiple discrete spectrum sources, or a combination of multiple continuum radiation sources. Furthermore, one or more of the radiation sources may be configured to have a substantially non-normal angle of incidence or polarized to reduce patterning effects on a substrate during radiation-based heating.

    Abstract translation: 通过过滤辐射源或配置辐射源产生具有不同光谱特性的辐射，在基于辐射的加热过程中，对衬底的图案化效果降低。 为了滤波，可以使用滤光器来截断辐射的特定波长。 辐射源的不同配置包括一个或多个连续辐射源与一个或多个离散光谱源，多个离散光谱源的组合或多个连续辐射源的组合的组合。 此外，一个或多个辐射源可以被配置为具有基本上非正常的入射角或极化，以减少基于辐射的加热期间对衬底的图案化效应。

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