公开(公告)号：US20050092721A1

公开(公告)日：2005-05-05

申请号：US10976620

申请日：2004-10-29

Applicant: Cheng-Min Pan ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Sheng-Feng Hung

Inventor： Cheng-Min Pan ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Sheng-Feng Hung

IPC: B26D7/00 ,  B23K26/38

CPC classification number: B26D7/0006 ,  H01J2237/31701 ,  Y10T29/49002 ,  Y10T29/4902 ,  Y10T29/49131 ,  Y10T29/49135 ,  Y10T82/10 ,  Y10T82/2502 ,  Y10T83/875

Abstract: The present invention provides a method and a set of trimming accessories for trimming rubber plate used in an ion implanter. The rubber plate is suitable for use in an ion implanter, wherein the ion implanter has a platform with multiple primary holes and multiple primary notches. In specific embodiments, the set of trimming accessories includes trimming equipment such as a knife or preferably a laser; a template with secondary holes corresponding to primary holes and secondary notches corresponding to primary notches. The template is used as a guide to form a plurality of tertiary holes in the rubber plate corresponding to the plurality of secondary holes of the template and to form a plurality of tertiary notches in the rubber plate corresponding to the plurality of secondary notches of the template. The trimmed rubber plate can then be placed on the platform so that the tertiary holes of the rubber plate match the primary holes of the platform and the tertiary notches of the rubber plate match the primary notches of the platform.

Abstract translation: 本发明提供了用于离子注入机中使用的修整橡胶板的修整配件的方法和一套。 橡胶板适用于离子注入机，其中离子注入机具有具有多个主孔和多个初级凹口的平台。 在具体实施例中，该组修剪配件包括修剪设备，例如刀或优选地是激光; 具有对应于主孔的次级孔和对应于初级凹口的次级凹口的模板。 该模板用作在对应于模板的多个次级孔的橡胶板中形成多个第三孔的指导，并且在对应于模板的多个次级凹口的橡胶板中形成多个第三缺口 。 然后将修剪后的橡胶板放置在平台上，使得橡胶板的第三孔与平台的主孔匹配，橡胶板的第三凹口与平台的主槽相匹配。

公开(公告)号：US06386139B1

公开(公告)日：2002-05-14

申请号：US09390319

申请日：1999-09-07

Applicant: Sheng-Feng Hung ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Gwo-Yuh Yang

Inventor： Sheng-Feng Hung ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Gwo-Yuh Yang

IPC: C23C1600

CPC classification number: C23C14/50 ,  C23C14/56

Abstract: A wafer load/unload apparatus used to load/unload the wafer into/from the clamp ring for performing the E-Gun evaporation process is disclosed. The apparatus comprises a base, a central cylinder and a plurality of peripheral cylinders. The base has an even upper surface, and the central cylinder and the plurality of the peripheral cylinders are connected to the upper surface of the base respectively, wherein the plurality of the peripheral cylinders are located around the central cylinders. A recessed trench penetrating through sidewalls of the central cylinder is formed on a top surface of the central cylinder. The central cylinder can penetrate through a clamp ring, wherein the clamp ring is used to load a wafer for performing the E-Gun evaporating process. The spacing distances between the plurality of peripheral cylinders and the central cylinder are bigger than the width of the clamp ring. The plurality of peripheral cylinders are used to prevent the wafer which is placed on the top surface of the central cylinder from falling down.

Abstract translation: 公开了一种用于将晶片装入/卸载夹持环的晶片装载/卸载装置，用于执行E-Gun蒸发过程。 该装置包括基座，中心圆筒和多个周边圆筒。 基座具有均匀的上表面，并且中心圆筒和多个周边圆筒分别连接到基座的上表面，其中多个周边圆柱体位于中心圆筒周围。 穿过中心圆筒的侧壁的凹槽形成在中心圆柱体的顶表面上。 中心圆筒可以穿过夹紧环，其中夹紧环用于加载用于执行电子枪蒸发过程的晶片。 多个周边圆筒和中心圆筒之间的间隔距离大于夹紧环的宽度。 多个周边圆筒用于防止放置在中心圆柱顶表面上的晶片掉落。

公开(公告)号：US06334258B1

公开(公告)日：2002-01-01

申请号：US09467877

申请日：1999-12-21

Applicant: Chun-chieh Lee ,  Hua-jen Tseng ,  Dong-tay Tsai ,  Yi-hua Chin

Inventor： Chun-chieh Lee ,  Hua-jen Tseng ,  Dong-tay Tsai ,  Yi-hua Chin

IPC: G01B320

CPC classification number: G01B3/14 ,  G01B5/20

Abstract: An inspection device for examining a piece of aperture graphite of an extraction electrode, and the aperture graphite includes a to-be-examined curve and a to-be-examined engagement portion. The inspection device includes a sidewall surface having a standard curve marked thereon, and an examination engagement portion having a predetermined positional relationship with the sidewall surface. After the to-be-examined engagement portion is engaged with the examination engagement portion, and after the to-be-examined curve is projected onto the sidewall surface, the suitability of the aperture graphite can be determined according to the amount of differences between the projected to-be-examined curve and the standard curve.

Abstract translation: 一种用于检查提取电极的孔径石墨片的检查装置，并且孔径石墨包括待检查的曲线和待检查的接合部分。 检查装置包括具有标记在其上的标准曲线的侧壁表面和与侧壁表面具有预定位置关系的检查接合部。 在待检查的接合部分与检查接合部分接合之后，并且待检查曲线投射到侧壁表面上之后，孔眼石墨的适用性可以根据 预计曲线和标准曲线。

公开(公告)号：US6130433A

公开(公告)日：2000-10-10

申请号：US303598

申请日：1999-05-03

Applicant: Pei-Wei Tsai ,  Hua-Jen Tseng ,  Dong-Tay Tsai ,  Chih-Hsien Chang

Inventor： Pei-Wei Tsai ,  Hua-Jen Tseng ,  Dong-Tay Tsai ,  Chih-Hsien Chang

IPC: H01J37/00 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J37/18 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/1825 ,  H01J2237/31701

Abstract: The present invention relates to an ion source chamber of a high energy implanter. The ion source chamber comprises a main chamber for generating ions for ion implantation, a vent-pipe having two open ends, one end of the vent-pipe being connected to the main chamber for releasing air from the main chamber, a releasing valve connected to another end of the vent-pipe for releasing the air in the main chamber when the pressure of the air in the main chamber exceeds a predetermined pressure, and a filtering device installed between the vent-pipe and the releasing valve for filtering impurities contained in the air carried by the vent-pipe so as to prevent the impurities from falling into the releasing valve.

Abstract translation: 本发明涉及高能注入机的离子源室。 离子源室包括用于产生用于离子注入的离子的主室，具有两个开放端的排气管，排气管的一端连接到主室，用于从主室释放空气，释放阀连接到 当主室中的空气的压力超过预定压力时，用于释放主室中的空气的排气管的另一端;以及安装在通气管和释放阀之间的过滤装置，用于过滤包含在主室中的杂质 由排气管携带的空气，以防止杂质落入释放阀。

公开(公告)号：US5892232A

公开(公告)日：1999-04-06

申请号：US735981

申请日：1996-10-25

Applicant: Pei-Wei Tsai ,  Tzu-Hsin Huang ,  Hua-Jen Tseng ,  Min-Huei Lin

Inventor： Pei-Wei Tsai ,  Tzu-Hsin Huang ,  Hua-Jen Tseng ,  Min-Huei Lin

IPC: H01J27/08 ,  H01J27/00

CPC classification number: H01J27/08

Abstract: An arc chamber including a reaction chamber, a filament element used to generate electrons, a first power supply means set for providing power to the filament element, a second power supply means utilized for creating a potential to increase the ionization efficiency, a plurality of gas injected openings set to inject suitable gas into the reaction chamber and be ionized in a gaseous plasma by impact from electrons, a first filament insulator, and three second filament insulators used for isolation. The first filament insulator includes a truncated corn portion and a ring portion. The truncated corn portion has a hole formed threrethrough itself. The ring portion is coaxially connected to the smaller surface of the truncated corn portion. The second filament insulator includes a truncated corn portion and two ring portions. Similarily, the truncated corn portion has a hole through formed therethrough. The ring portions are respectively coaxially connected to the two surfaces of the truncated corn portion. In the preferred embodiment, three first filament insulators and one second filament insulator are set on the filament element for isolation. The filament insulators are screwed into the filament element and exactly attached on the side wall of the reaction chamber.

Abstract translation: 包括反应室，用于产生电子的灯丝元件的电弧室，用于向灯丝元件供电的第一电源装置，用于产生提高电离效率的电位的第二电源装置，多个气体 注入的开口设置成将合适的气体注入反应室，并通过来自电子的冲击，第一细丝绝缘体和用于隔离的三个第二长丝绝缘体在气态等离子体中离子化。 第一长丝绝缘体包括截顶玉米部分和环部分。 截断的玉米部分具有自身形成的孔。 环部分同轴连接到截顶玉米部分的较小表面。 第二长丝绝缘体包括截顶玉米部分和两个环部分。 类似地，截头玉米部分具有通过其形成的孔。 环部分别同轴地连接到截顶玉米部分的两个表面。 在优选实施例中，将三个第一灯丝绝缘体和一个第二灯丝绝缘体设置在灯丝元件上用于隔离。 灯丝绝缘子拧入灯丝元件并精确地附着在反应室的侧壁上。

公开(公告)号：US06568988B1

公开(公告)日：2003-05-27

申请号：US09628138

申请日：2000-07-28

Applicant: Yi-Hua Chin ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Dong-Tay Tsai

Inventor： Yi-Hua Chin ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Dong-Tay Tsai

IPC: B24B4900

CPC classification number: B24B49/10 ,  B24B27/0023 ,  B24B37/04

Abstract: A chemical mechanical polishing apparatus has a plurality of electric machines for executing mechanical polishing motions, at least two control systems for controlling the mechanical polishing motions, at least two signal wires connected with the two control systems for transmitting signals of the two control systems, and a wave filter comprising two terminals connected with the two signal wires respectively for filtering out the signal whose voltage exceeds a predetermined value in the two signal wires.

Abstract translation: 化学机械抛光装置具有用于执行机械抛光运动的多个电机，用于控制机械抛光运动的至少两个控制系统，与两个控制系统连接的用于传送两个控制系统的信号的至少两个信号线，以及 一个滤波器，包括分别与两条信号线连接的两个端子，用于滤除两条信号线中电压超过预定值的信号。

公开(公告)号：US06299218B1

公开(公告)日：2001-10-09

申请号：US09262065

申请日：1999-03-04

Applicant: Pei-Wei Tsai ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Gwo-Yuh Yang

Inventor： Pei-Wei Tsai ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Gwo-Yuh Yang

IPC: F16L2700

CPC classification number: H01L21/67017 ,  F16L27/02

Abstract: A structure for connecting fluid channel of fluid delivery system is disclosed. This connecting structure limits the length of the flow-guiding pipe extending into the delivery channel, to reduce particle contaminates and the probability of crack. The present pipe union connecting structure comprises a first pipe, a second pipe mounted to the first pipe, and an inner pipe extending from the first pipe into the second pipe with a certain extending length. The extending length of the inner pipe is less than the proportion of the minimum distance between the inner wall of the second pipe and the outlet of the inner pipe when standstill, to the tangent value of a certain angle &thgr;, which is the maximum inclined angle between the second pipe and the inner pipe.

Abstract translation: 公开了一种用于连接流体输送系统的流体通道的结构。 这种连接结构限制了延伸到输送通道中的导流管的长度，以减少颗粒污染和裂纹的可能性。 本管接头连接结构包括第一管，安装到第一管的第二管和从第一管延伸到具有一定延伸长度的第二管中的内管。 内管的延伸长度小于当静止时第二管的内壁和内管的出口之间的最小距离与一定角度θ（其是最大倾斜角度）的切线值的比例 在第二管和内管之间。

公开(公告)号：US6019664A

公开(公告)日：2000-02-01

申请号：US281944

申请日：1999-03-31

Applicant: Pei-Wei Tsai ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Dong-Tay Tsai

Inventor： Pei-Wei Tsai ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Dong-Tay Tsai

IPC: G01B5/06 ,  B24B49/00

CPC classification number: G01B5/06

Abstract: A height gauge device for wafer, which is mounted under a cooling water pipe of a back-grinding machine; the device comprises a height gauge box, a measuring rod, a L-shaped linking rod and a resilient member; a signal sensor is mounted inside the height gauge box for measuring the height of a wafer; both ends of the measuring rod are connected with the signal sensor and the L-shaped linking rod respectively; the L-shaped linking rod is mounted with a probing needle; the resilient member is mounted between the L-shaped linking and the cooling water pipe; in height gauging operation, the probing needle on the L-shaped linking needle should be raised first so as to put a wafer under the probing needle, and to have the probing needle pressed against the wafer by means of the resilient force of the resilient member; consequently, the resilient member is subject to elastic fatigue or break; the resilient member of the height gauge device can be replaced directly without opening the height box so as to save time and maintenance cost.

Abstract translation: 一种用于晶片的高度计装置，安装在背磨机的冷却水管下; 该装置包括高度计箱，测量杆，L形连杆和弹性构件; 信号传感器安装在高度计盒内部，用于测量晶片的高度; 测量杆的两端分别与信号传感器和L形连杆相连; L型连杆安装有探针; 弹性件安装在L形连接件和冷却水管之间; 在高度测量操作中，应首先抬起L形连接针上的探针，以将晶片放置在探针下方，并使探针通过弹性构件的弹力将其推压到晶片上 ; 因此，弹性构件遭受弹性疲劳或断裂; 可以直接更换高度计装置的弹性构件而不打开高度盒，以节省时间和维护成本。

公开(公告)号：US06386213B1

公开(公告)日：2002-05-14

申请号：US09479535

申请日：2000-01-07

Applicant: Sheng-Feng Hung ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Yu-Hua Yeh

Inventor： Sheng-Feng Hung ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Yu-Hua Yeh

IPC: B08B304

CPC classification number: H01L21/67057 ,  H01L21/67028 ,  H01L21/68 ,  Y10S134/902

Abstract: A plate-tilting apparatus adapted to be used in a semiconductor-manufacturing process is disclosed. The plate-tilting apparatus is used for preventing thin wafers from being collected in a cassette contacted with each other after the thin wafers are taken out of a solution. It includes a plate having the container locked thereon and having a first edge pivotally connected to a basal plane of a tank used in the semiconductor-manufacturing process, and a plate-lifting device connected to a second edge of the plate opposite to the first edge for lifting the second edge of the plate, so that the plate can be tilted at a specific angle.

Abstract translation: 公开了一种适用于半导体制造工艺的平板倾斜装置。 平板倾斜装置用于在将薄晶片从溶液中取出之后防止薄晶片收集在彼此接触的盒中。 它包括具有锁定在其上的容器的板，并且具有可枢转地连接到在半导体制造工艺中使用的罐的基面的第一边缘，以及连接到板的与第一边缘相对的第二边缘的升降装置 用于提升板的第二边缘，使得板可以以特定的角度倾斜。

公开(公告)号：US6149078A

公开(公告)日：2000-11-21

申请号：US455359

申请日：1999-12-06

Applicant: Dong-tay Tsai ,  Hua-jen Tseng ,  Chun-chieh Lee ,  Yi-hua Chin

Inventor： Dong-tay Tsai ,  Hua-jen Tseng ,  Chun-chieh Lee ,  Yi-hua Chin

IPC: B05B1/14 ,  B05B1/28 ,  B24B37/04 ,  B24B57/02 ,  B05B1/26

CPC classification number: B24B37/04 ,  B05B1/14 ,  B05B1/28 ,  B24B57/02

Abstract: A slurry nozzle for supplying slurry in chemical mechanical polishing (CMP) including at least one slurry line, a slurry nozzle enclosure for accommodating the slurry line, and a baffle ring mounted at one end of the slurry nozzle enclosure. A plurality of apertures is formed on the sidewall of the slurry line for the slurry to spray out. The slurry spraying out from the slurry line flows down along the inner sidewall of the slurry baffle ring after the slurry impinges onto the slurry baffle ring.

Abstract translation: 一种用于在化学机械抛光（CMP）中供应浆料的浆料喷嘴，包括至少一个浆料管线，用于容纳浆料管线的浆料喷嘴外壳，以及安装在浆料喷嘴外壳的一端的挡板。 在泥浆管线的侧壁上形成多个孔，以使浆料喷出。 在浆料撞击到浆料挡板环上之后，从浆料管线喷出的浆料沿浆料挡板环的内侧向下流动。