公开(公告)号：US08502144B2

公开(公告)日：2013-08-06

申请号：US13190847

申请日：2011-07-26

Applicant: Mayuka Oosaki ,  Chie Shishido ,  Hiroki Kawada ,  Tatsuya Maeda

Inventor： Mayuka Oosaki ,  Chie Shishido ,  Hiroki Kawada ,  Tatsuya Maeda

IPC: H01J37/28 ,  H01J37/256 ,  G01N23/00

CPC classification number: H01J37/28 ,  H01J2237/282

Abstract: A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning electron microscopes based on information extracted from secondary electron images which are captured by imaging a reference pattern, a tool state monitoring unit for monitoring tool states of each of the plural scanning electron microscopes, and an output unit for displaying on a screen a relationship between the tool-to-tool disparity between the plural scanning electron microscopes and tool states of each of the plural scanning electron microscopes monitored by the tool state monitoring unit. The tool state monitoring unit monitors the tool states of each of the plural scanning electron microscopes while imaging the reference pattern by using each of the plural scanning electron microscopes.

Abstract translation: 用于控制多个扫描电子显微镜之间的工具对工具差异的系统包括：测量单元，用于基于通过成像获得的二次电子图像提取的信息来测量多个扫描电子显微镜之间的工具对工具差异 参考图案，用于监视多个扫描电子显微镜中的每一个的工具状态的工具状态监视单元和用于在屏幕上显示多个扫描电子显微镜之间的工具与工具之间的差异与工具状态之间的关系的输出单元 由工具状态监视单元监视的多个扫描电子显微镜中的每一个。 工具状态监视单元通过使用多个扫描电子显微镜中的每一个来对多个扫描电子显微镜中的每个扫描电子显微镜的工具状态进行监视，同时对参考图案进行成像。

公开(公告)号：US08384030B2

公开(公告)日：2013-02-26

申请号：US12043946

申请日：2008-03-06

Applicant: Kazuhiro Ueda ,  Tatsuya Maeda

Inventor： Kazuhiro Ueda ,  Tatsuya Maeda

IPC: G01N23/00

CPC classification number: G01N23/2251 ,  H01J2237/0041 ,  H01J2237/221 ,  H01J2237/248 ,  H01J2237/28

Abstract: A method and apparatus for setting a sample observation condition and a method and apparatus for sample observation which allow sample observation by speedily and simply finding an optimum condition while suppressing damage to the sample are provided. The setting of a sample observation condition according to the present invention is realized by an electron beam apparatus acquiring a profile at a predetermined evaluation location of a sample under a reference observation condition, by a processing section judging whether or not the above described acquired profile is located within a predetermined setting range and setting an optimum observation condition to be used for sample observation based on this judgment result. More specifically, locations where the condition can be examined are registered beforehand first and then a jump is made to the corresponding location which is irradiated with an electron beam (hereinafter referred to as “predosing”) at a low magnification, the surface of the sample is charged, enlarged to an observation magnification and secondary electron information on the target location is obtained. After that, secondary electron information is obtained at any time while performing predosing, it is successively judged from the information whether the pattern bottom part can be observed/measured or whether or not the sample is destroyed and an optimum observation condition is thereby found.

Abstract translation: 提供了一种用于设置样品观察条件的方法和装置以及用于样品观察的方法和装置，其允许通过快速简单地找到最佳条件同时抑制对样品的损伤的样品观察。 根据本发明的样品观察条件的设定是通过电子束装置实现的，该电子束装置在参考观察条件下在样本的预定评估位置获取轮廓，通过处理部分判断上述获得的轮廓是否为 位于预定设定范围内，并且基于该判断结果设定用于样本观察的最佳观察条件。 更具体地说，可以首先登录可以检查条件的位置，然后跳转到以低倍率照射电子束的对应位置（以下称为预取），将样品的表面充电 获得放大到目标位置的观察倍率和二次电子信息。 之后，在执行预取时随时获得二次电子信息，根据信息连续判断图案底部是否可以被观察/测量，或者样品是否被破坏，从而找到最佳观察条件。

公开(公告)号：US08207512B2

公开(公告)日：2012-06-26

申请号：US12898455

申请日：2010-10-05

Applicant: Chie Shishido ,  Mayuka Oosaki ,  Mitsugu Sato ,  Hiroki Kawada ,  Tatsuya Maeda

Inventor： Chie Shishido ,  Mayuka Oosaki ,  Mitsugu Sato ,  Hiroki Kawada ,  Tatsuya Maeda

IPC: G21K7/00 ,  A61N5/00 ,  G21G5/00

CPC classification number: H01J37/263 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2826

Abstract: The present invention provides a charged particle beam apparatus used to measure micro-dimensions (CD value) of a semiconductor apparatus or the like which captures images for measurement. For the present invention, a sample for calibration, on which a plurality of polyhedral structural objects with known angles on surfaces produced by the crystal anisotropic etching technology are arranged in a viewing field, is used. A beam landing angle at each position within a viewing field is calculated based on geometric deformation on an image of each polyhedral structural object. Beam control parameters for equalizing the beam landing angle at each position within the viewing field are pre-registered. The registered beam control parameters are applied according to the position of the pattern to be measured within the viewing field when performing dimensional measurement. Accordingly, the present invention provides methods for reducing the variation in the CD value caused by the variation in the electron beam landing angle with respect to the sample with an equal beam landing angle and methods for reducing the instrumental error caused by the difference in the electron beam landing angle between apparatuses.

Abstract translation: 本发明提供一种用于测量捕获用于测量的图像的半导体装置等的微尺寸（CD值）的带电粒子束装置。 对于本发明，使用用于校准的样品，其上在视场中排列有通过晶体各向异性蚀刻技术产生的表面上具有已知角度的多个多面体结构物体。 基于每个多面体结构物体的图像上的几何变形来计算视野内的每个位置处的束着陆角。 用于均衡视场内每个位置的束着陆角的光束控制参数被预先注册。 当进行尺寸测量时，根据待测图案的位置在观察区域中应用登记的光束控制参数。 因此，本发明提供了减少相对于具有相同束着陆角的样品的电子束着角的变化引起的CD值的变化的方法，以及用于减少由电子差异引起的仪器误差的方法 设备之间的束着陆角度。

公开(公告)号：US20110278453A1

公开(公告)日：2011-11-17

申请号：US13190847

申请日：2011-07-26

Applicant: Mayuka Oosaki ,  Chie Shishido ,  Hiroki Kawada ,  Tatsuya Maeda

Inventor： Mayuka Oosaki ,  Chie Shishido ,  Hiroki Kawada ,  Tatsuya Maeda

IPC: G01N23/00

CPC classification number: H01J37/28 ,  H01J2237/282

Abstract: A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning electron microscopes based on information extracted from secondary electron images which are captured by imaging a reference pattern, a tool state monitoring unit for monitoring tool states of each of the plural scanning electron microscopes, and an output unit for displaying on a screen a relationship between the tool-to-tool disparity between the plural scanning electron microscopes and tool states of each of the plural scanning electron microscopes monitored by the tool state monitoring unit. The tool state monitoring unit monitors the tool states of each of the plural scanning electron microscopes while imaging the reference pattern by using each of the plural scanning electron microscopes.

Abstract translation: 用于控制多个扫描电子显微镜之间的工具对工具差异的系统包括：测量单元，用于基于通过成像获得的二次电子图像提取的信息来测量多个扫描电子显微镜之间的工具对工具差异 参考图案，用于监视多个扫描电子显微镜中的每一个的工具状态的工具状态监视单元和用于在屏幕上显示多个扫描电子显微镜之间的工具与工具之间的差异与工具状态之间的关系的输出单元 由工具状态监视单元监视的多个扫描电子显微镜中的每一个。 工具状态监视单元通过使用多个扫描电子显微镜中的每一个来对多个扫描电子显微镜中的每个扫描电子显微镜的工具状态进行监视，同时对参考图案进行成像。

公开(公告)号：US07684937B2

公开(公告)日：2010-03-23

申请号：US12078840

申请日：2008-04-07

Applicant: Atsuko Yamaguchi ,  Hiroshi Fukuda ,  Hiroki Kawada ,  Tatsuya Maeda

Inventor： Atsuko Yamaguchi ,  Hiroshi Fukuda ,  Hiroki Kawada ,  Tatsuya Maeda

IPC: G01B5/28

CPC classification number: G01B15/08 ,  G01N23/2251 ,  G03F7/70625 ,  H01J2237/223 ,  H01J2237/2817

Abstract: Equipment extracts components of spatial frequency that need to be evaluated in manufacturing a device or in analyzing a material or process out of edge roughness on fine line patterns and displays them as indexes. The equipment acquires data of edge roughness over a sufficiently long area, integrates components corresponding to a spatial frequency region being set on a power spectrum by the operator, and displays them on a length measuring SEM. Alternatively, the equipment divides the edge roughness data of the sufficiently long area, computes long-period roughness and short-period roughness that correspond to an arbitrary inspection area by performing statistical processing and fitting based on theoretical calculation, and displays them on the length measuring SEM.

Abstract translation: 设备提取在制造设备时需要评估的空间频率的组件，或者在细线图案上分析材料或工艺的边缘粗糙度并将其显示为索引。 设备在足够长的区域上获取边缘粗糙度的数据，对与操作者在功率谱上设置的空间频率区域相对应的分量进行积分，并将其显示在长度测量SEM上。 或者，设备对足够长的区域的边缘粗糙度数据进行分割，通过进行基于理论计算的统计处理和拟合来计算与任意检查区域相对应的长周期粗糙度和短周期粗糙度，并将其显示在长度测量 SEM。

公开(公告)号：US20090060251A1

公开(公告)日：2009-03-05

申请号：US12196383

申请日：2008-08-22

Applicant: Tatsuya MAEDA

Inventor： Tatsuya MAEDA

IPC: H04R9/06 ,  H04R7/02 ,  H04R1/00 ,  H04R11/02

CPC classification number: H04R7/02

Abstract: A loudspeaker diaphragm having a small overall height dimension, in which a dome portion has a sufficient rigidity and which is capable of realizing a stable loudspeaker operation, wherein the loudspeaker diaphragm can realize a desirable sound reproduction without noise, or the like, with a frequency response that is flat over a wide range. In the loudspeaker diaphragm of the present invention, the dome portion includes a concave dome portion formed at a center thereof, a convex dome portion along an outer periphery of the concave dome portion, a plurality of depressed ribs each extending in a radial direction across a boundary between the concave dome portion and the convex dome portion, a voice coil attachment portion along an outer periphery of the convex dome portion, and a plurality of protruding ribs extending in the radial direction across a boundary between the convex dome portion and the voice coil attachment portion, wherein each protruding rib is spaced apart in a circumferential direction from two adjacent depressed ribs.

Abstract translation: 具有小的整体高度尺寸的扬声器隔膜，其中圆顶部分具有足够的刚度并且能够实现稳定的扬声器操作，其中扬声器隔膜可以实现具有频率的无噪声等的期望的声音再现 反应平坦，范围广泛。 在本发明的扬声器隔膜中，圆顶部包括形成在其中心的凹形圆顶部，沿着凹形圆顶部的外周的凸形圆顶部，多个凹凸肋， 凹圆顶部分和凸形圆顶部分之间的边界，沿着凸出的圆顶部分的外周的音圈安装部分和沿径向延伸穿过凸起的圆顶部分和音圈之间的边界的多个突出的肋 附接部分，其中每个突出肋沿圆周方向与两个相邻的凹陷肋间隔开。

公开(公告)号：US20080215274A1

公开(公告)日：2008-09-04

申请号：US12078840

申请日：2008-04-07

Applicant: Atsuko Yamaguchi ,  Hiroshi Fukuda ,  Hiroki Kawada ,  Tatsuya Maeda

Inventor： Atsuko Yamaguchi ,  Hiroshi Fukuda ,  Hiroki Kawada ,  Tatsuya Maeda

IPC: G06F17/18 ,  G06F19/00 ,  G01N23/22

CPC classification number: G01B15/08 ,  G01N23/2251 ,  G03F7/70625 ,  H01J2237/223 ,  H01J2237/2817

Abstract: Equipment extracts components of spatial frequency that need to be evaluated in manufacturing a device or in analyzing a material or process out of edge roughness on fine line patterns and displays them as indexes. The equipment acquires data of edge roughness over a sufficiently long area, integrates a components corresponding to a spatial frequency region being set on a power spectrum by the operator, and displays them on a length measuring SEM. Alternatively, the equipment divides the edge roughness data of the sufficiently long area, computes long-period roughness and short-period roughness that correspond to an arbitrary inspection area by performing statistical processing and fitting based on theoretical calculation, and displays them on the length measuring SEM.

Abstract translation: 设备提取在制造设备时需要评估的空间频率的组件，或者在细线图案上分析材料或工艺的边缘粗糙度并将其显示为索引。 设备在足够长的区域上获取边缘粗糙度的数据，对与操作者在功率谱上设置的空间频率区域相对应的分量进行积分，并将其显示在长度测量SEM上。 或者，设备对足够长的区域的边缘粗糙度数据进行分割，通过进行基于理论计算的统计处理和拟合来计算与任意检查区域相对应的长周期粗糙度和短周期粗糙度，并将其显示在长度测量 SEM。

公开(公告)号：US07372047B2

公开(公告)日：2008-05-13

申请号：US11038478

申请日：2005-01-21

Applicant: Mitsugu Sato ,  Atsushi Takane ,  Shigeto Isakozawa ,  Takashi Iizumi ,  Tatsuya Maeda ,  Hiromi Inada

Inventor： Mitsugu Sato ,  Atsushi Takane ,  Shigeto Isakozawa ,  Takashi Iizumi ,  Tatsuya Maeda ,  Hiromi Inada

IPC: G21K5/00

CPC classification number: H01J37/28 ,  H01J2237/2826

Abstract: A charged particle beam apparatus capable of automatically measuring an image magnification error of an apparatus and capable of automatically calibrating the image magnification in high precision is provided. To this end, while an image processing operation of either an auto-correlation function or an FFT transformation is employed with respect to a scanning image of a reference material having a periodic structure, the averaged pitch dimension of which is known, averaged periodic information owned by the scanning image is detected so as to measure an image magnification error of the apparatus. Also, the information as to the acquired image magnification error is fed back to an image magnification control means of the apparatus so as to automatically execute a calibration as to the image magnification in high precision.

Abstract translation: 提供一种能够自动测量装置的图像放大误差并且能够以高精度自动校准图像放大率的带电粒子束装置。 为此，当对具有周期性结构的参考材料的扫描图像采用自相关函数或FFT变换的图像处理操作时，其平均间距尺寸已知，所拥有的平均周期信息 检测扫描图像以测量装置的图像放大误差。 此外，关于获取的图像放大误差的信息被反馈到装置的图像倍率控制装置，以便以高精度自动执行关于图像放大的校准。

公开(公告)号：US07366620B2

公开(公告)日：2008-04-29

申请号：US11185852

申请日：2005-07-21

Applicant: Atsuko Yamaguchi ,  Hiroshi Fukuda ,  Hiroki Kawada ,  Tatsuya Maeda

Inventor： Atsuko Yamaguchi ,  Hiroshi Fukuda ,  Hiroki Kawada ,  Tatsuya Maeda

IPC: G01B19/00 ,  G06F19/00

CPC classification number: G01B15/08 ,  G01N23/2251 ,  G03F7/70625 ,  H01J2237/223 ,  H01J2237/2817

Abstract: Equipment extracts components of spatial frequency that need to be evaluated in manufacturing a device or in analyzing a material or process out of edge roughness on fine line patterns and displays them as indexes. The equipment acquires data of edge roughness over a sufficiently long area, integrates a components corresponding to a spatial frequency region being set on a power spectrum by the operator, and displays them on a length measuring SEM. Alternatively, the equipment divides the edge roughness data of the sufficiently long area, computes long-period roughness and short-period roughness that correspond to an arbitrary inspection area by performing statistical processing and fitting based on theoretical calculation, and displays them on the length measuring SEM.

公开(公告)号：US20060188216A1

公开(公告)日：2006-08-24

申请号：US11357020

申请日：2006-02-21

Applicant: Tatsuya Maeda

Inventor： Tatsuya Maeda

IPC: H04N5/91

CPC classification number: H04N5/76 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2487 ,  H01J2237/2817 ,  H04N5/772 ,  H04N5/775 ,  H04N5/781 ,  H04N5/907 ,  H04N9/8205

Abstract: It is facilitated in a scanning electron microscope to save the labor of executing the reproduction test, conduct basic analysis on a problem caused in execution of the automatic observation process, and confirm details resulting in the error. Upon detecting an error from an abnormality, the scanning electron microscope extracts a sample image Im(t2) obtained by retroceding from a sample image Im(te) stored so as to be associated with time te of error occurrence by a predetermined video quantity (for example, total recording time period t2) previously set and registered by an input-output device, from sample images stored in a recording device while being overwritten, and stores a resultant sample image in another recording device.

Abstract translation: 在扫描电子显微镜中便于执行再现测试的劳动，对执行自动观察过程所引起的问题进行基本分析，并确认导致错误的细节。 扫描电子显微镜从检测到异常的误差时，提取通过从存储有与出现错误的时间te相关联的样本图像Im（te）所取得的样本图像Im（t 2） 例如由输入输出装置预先设定和登记的总记录时间段t 2），从被记录装置中存储的样本图像中被重写，并将得到的样本图像存储在另一个记录装置中。