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    Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same
    7.
    发明申请
    Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same 有权
    不对称配体源，对称含金属化合物，以及包括其的体系和方法

    公开(公告)号：US20080214001A9

    公开(公告)日：2008-09-04

    申请号：US11169082

    申请日：2005-06-28

    Applicant: Dan Millward ,  Stefan Uhlenbrock ,  Timothy Quick

    Inventor： Dan Millward ,  Stefan Uhlenbrock ,  Timothy Quick

    IPC: H01L21/44 ,  H01L21/31

    CPC classification number: H01L21/0228 ,  C07C251/12 ,  C07F5/003 ,  C23C16/18 ,  C23C16/40 ,  H01L21/02175 ,  H01L21/02197 ,  H01L21/28556 ,  H01L21/3141 ,  H01L21/316

    Abstract: The present invention provides metal-containing compounds that include at least one β-diketiminate ligand, and methods of making and using the same. In some embodiments, the metal-containing compounds are homoleptic complexes that include unsymmetrical β-diketiminate ligands. In other embodiments, the metal-containing compounds are heteroleptic complexes including at least one β-diketiminate ligand. The compounds can be used to deposit metal-containing layers using vapor deposition methods. Vapor deposition systems including the compounds are also provided. Sources for β-diketiminate ligands are also provided.

    Abstract translation: 本发明提供含有至少一种β-二酮亚胺配体的含金属化合物及其制备和使用方法。 在一些实施方案中，含金属的化合物是包含不对称的β-二酮亚胺配体的均聚配合物。 在其它实施方案中，含金属化合物是包含至少一个β-二酮酸配体的杂光复合物。 该化合物可用于使用气相沉积方法沉积含金属层。 还提供了包括这些化合物的蒸镀系统。 还提供了β-二酮酸配体的来源。

    Beta-diketiminate ligand sources and metal-containing compounds thereof, and systems and methods including same
    8.
    发明申请
    Beta-diketiminate ligand sources and metal-containing compounds thereof, and systems and methods including same 有权
    β-二酮酸配体源及其含金属化合物，以及包括其的体系和方法

    公开(公告)号：US20060292303A1

    公开(公告)日：2006-12-28

    申请号：US11169065

    申请日：2005-06-28

    Applicant: Dan Millward ,  Timothy Quick

    Inventor： Dan Millward ,  Timothy Quick

    IPC: H01L21/00 ,  C07F5/00 ,  C23C16/00

    CPC classification number: C23C16/40 ,  C07C251/12 ,  C23C16/18 ,  H01L21/28556

    Abstract: The present invention provides metal-containing compounds that include at least one β-diketiminate ligand, and methods of making and using the same. In certain embodiments, the metal-containing compounds include at least one β-diketiminate ligand with at least one fluorine-containing organic group as a substituent. In other certain embodiments, the metal-containing compounds include at least one β-diketiminate ligand with at least one aliphatic group as a substituent selected to have greater degrees of freedom than the corresponding substituent in the β-diketiminate ligands of certain metal-containing compounds known in the art. The compounds can be used to deposit metal-containing layers using vapor deposition methods. Vapor deposition systems including the compounds are also provided. Sources for β-diketiminate ligands are also provided.

    Abstract translation: 本发明提供含有至少一种β-二酮亚胺配体的含金属化合物及其制备和使用方法。 在某些实施方案中，含金属化合物包括至少一种具有至少一个含氟有机基团作为取代基的β-二酮亚胺配体。 在其它某些实施方案中，含金属化合物包括至少一种具有至少一个脂族基团作为取代基的β-二酮酸酯配体，其被选择为具有比某些含金属化合物的β-二酮酸配体中的相应取代基更大的自由度 本领域已知 该化合物可用于使用气相沉积方法沉积含金属层。 还提供了包括这些化合物的蒸镀系统。 还提供了β-二酮酸配体的来源。

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