公开(公告)号：US20210324518A1

公开(公告)日：2021-10-21

申请号：US17230047

申请日：2021-04-14

Applicant: ASM IP Holding B.V.

Inventor： Christianus G.M. de Ridder

IPC: C23C16/455 ,  F27D1/00 ,  F27D1/18 ,  F27D3/00 ,  F27B1/10 ,  F27B5/02 ,  F27B17/02 ,  H01L21/673 ,  H01L21/67 ,  C23C16/458

Abstract: An injector configured for arrangement within a reactor of a vertical furnace to inject gas in the reactor is provided. The injector is made substantial elongated and configured with an internal gas conduction channel to transport gas from a first end of the injector to a second end of the injector. An outer sidewall of the injector may be tapered towards the second end over at least 10%, preferably 30% and most preferably 50% of the length of the injector to increase tolerances for fitting the injector in the tube.

公开(公告)号：US20210333049A1

公开(公告)日：2021-10-28

申请号：US17236065

申请日：2021-04-21

Applicant: ASM IP Holding B.V.

Inventor： Melvin Verbaas ,  Christianus G.M. de Ridder

IPC: F27D3/00 ,  H01L21/67 ,  H01L21/677

Abstract: A vertical batch furnace assembly, comprising a core tube, an outer casing, a cooling chamber bounded and enclosed by the outer casing and the core tube, and at least one cooling gas supply emanating in the cooling chamber. The core tube has an elongated circumferential wall extending in a longitudinal direction, and is configured to accommodate wafers for processing in the vertical batch furnace. The outer casing extends around the core tube and comprises a heating element for applying a thermal treatment to wafers accommodated in the core tube. The at least one cooling gas supply comprises at least one cooling gas supply opening which is arranged such that the cooling gas enters the cooling chamber with a flow direction which is substantially tangent to the circumferential wall.

公开(公告)号：US20220268520A1

公开(公告)日：2022-08-25

申请号：US17668614

申请日：2022-02-10

Applicant: ASM IP Holding B.V.

Inventor： Theodorus G.M. Oosterlaken ,  Lucian C. Jdira ,  Christianus G.M. de Ridder

IPC: F27B1/14 ,  F27D1/14

Abstract: Vertical furnace reactor assembly, comprising: a reactor housing defining a processing chamber configured for processing substrates therein, the processing chamber having an opening for moving substrates into and out of the processing chamber along a main loading axis, the opening being surrounded by a stack of annular flange units including at least two of a housing flange, a gas divided ring unit, a liner suspension ring unit, a scavenger ring unit and a clamp ring unit, wherein at least two of the annular flange units are provided with mutually cooperating centering structures for centering the respective at least two flange units with respect to each other, wherein the mutually cooperating centering structures comprise a plurality of slots and a corresponding plurality of pins, wherein the slots each extend along a respective main slot axis, wherein the slot axes are directed to mutually intersect centrally with respect to the stack.

公开(公告)号：US20210375644A1

公开(公告)日：2021-12-02

申请号：US17326706

申请日：2021-05-21

Applicant: ASM IP Holding B.V.

Inventor： Christianus G.M. de Ridder ,  Klaas P. Boonstra

IPC: H01L21/673 ,  H01L21/677

Abstract: A purge nozzle assembly comprising a purge nozzle body including an inlet opening and an outlet opening. The outlet opening opens into a purge nozzle contact surface. Additionally, the purge nozzle assembly includes a mounting body for connecting the purge nozzle assembly to an external frame member. A mechanical coupling mechanism moveably couples the purge nozzle body with the mounting body and is configured to allow tilting of the purge nozzle body relative to the mounting body as well as to allow a substantial lateral movement of the purge nozzle body relative to the mounting body, wherein the lateral movement has a movement component which is substantially parallel to the purge nozzle contact surface.

公开(公告)号：US20210384046A1

公开(公告)日：2021-12-09

申请号：US17336494

申请日：2021-06-02

Applicant: ASM IP Holding B.V.

Inventor： Gijsbert Hendrik Ronner ,  Christianus G.M. de Ridder ,  Theodorus G.M. Oosterlaken ,  Klaas P. Boonstra ,  Jeroen de Jonge ,  Lucian Jdira ,  Chaggai Shmuel Ganani

IPC: H01L21/67 ,  B65G47/90

Abstract: The disclosure relates to a substrate processing apparatus for processing a plurality of substrates. The apparatus comprising a reactor mounted in the apparatus and configured for processing substrates and a reactor mover for moving the reactor for maintenance. The reactor mover is constructed and arranged with a lift to move the reactor to a lower height to allow for access to the reactor by a maintenance worker.

公开(公告)号：US20210111053A1

公开(公告)日：2021-04-15

申请号：US17063214

申请日：2020-10-05

Applicant: ASM IP Holding B.V.

Inventor： Christianus G.M. de Ridder

IPC: H01L21/677 ,  H01L21/67

Abstract: Vertical batch furnace assembly for processing wafers comprising a cassette handling space with a cassette storage, and a cassette handling mechanism. The cassette handling mechanism comprises a cassette handler which is configured to transfer wafer cassettes between cassette storage positions and a wafer transfer position by supporting and moving the wafer cassettes on a cassette handler arm. The cassette handler arm is provided with a detector to detect a cassette in a detection area. The cassette handler moves the detection area of the detector towards one of the cassette storage positions to detect whether a cassette is present.